U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
7.9K Views
•
12:05 min
•
February 21st, 2019
DOI :
February 21st, 2019
•Chapters in this video
0:04
Title
1:06
The Labstation Modular Machine
2:11
Introduction of the Sample and Sample Holder into the Labstation
3:10
Transfer the Sample Holder to the Preparation Chamber
4:03
In situ Cleaning of the Sample Holder and Sample Holder Characterization
5:39
Deposition of a UO2 Thin Film
6:50
UO2 Sample Characterization
7:38
Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained
8:52
Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained
9:45
Results: Identification of Uranium(V) in Thin Films
10:51
Conclusion
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