7.1K Views
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07:00 min
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June 25th, 2020
DOI :
June 25th, 2020
•0:04
Introduction
0:40
Atmospheric-Pressure Chemical Vapor Deposition (APCVD) Growth of Graphene on Nano-Patterned SapphireSubstrate (NPSS) and Nitrogen (N2)-Plasma Treatment
2:03
Metal-Organic Chemical Vapor Deposition (MOCVD) Growth of Aluminum Nitrogen (AlN) on Graphene-NPSS and of Aluminum-Gallium-Nitrogen (AlGaN) Multiple Quantum Wells (MQW)
3:08
AlGaN-Based Deep Ultraviolet Light-Emitting Diode (DUV-LED) Fabrication
6:02
Results: Representative AIN Characterization
6:32
Conclusion
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