1。基材的准备<ol><li>切1厘米×1厘米的硅衬底，从一个Si晶片，硅是良好的用于SEM表征（平面视图和横截面）。 </li><li>切1厘米×1厘米的玻璃（钠钙，1mm厚），玻璃是最佳的光学和电气特性。 </li><li>互惠接触如果接触，需要在玻璃基板上，可以在真空中蒸发，通过使用掩模。存款10 nm的Cr为提高层间附着力金，存款50 nm的金。 </li><li>切1厘米×1厘米的聚合物样品（ 如四氟乙烯，ETFE）。 </li><li>清洁基板在异丙醇中通过超声处理5-10分钟，并使用N 2流量，在异丙醇中，干燥的冲洗。 </li></ol> 2。激光准直和激光参数的选择<ol><li>暖机的Nd：YAG激光，并选择IV的谐波发射（266 nm波长）通过使用四分之一谐波发生器（FHG）由两个本身构成COND的谐波发电机组（SHG）在级联。 </li><li>安装2％的重量。的Al 2 O 3：氧化锌的圆形目标（直径为2“）的目标机械手将激光光斑中心的目标，开始旋转和平移目标和设定的最大垂直范围。检查的激光光斑不会接触到外部钢圈用于修复目标，目标移动用鼓式平移运动的整个目标表面具有均匀的消融。 </li><li>选择重复率（ 例如 10赫兹）和脉冲能量（ 如 75兆焦耳）。调整脉冲能量和监视器激光稳定性由功率计。 </li><li>聚焦透镜移动到选定的位置，并使用一块敏感纸附着到目标测量光斑尺寸。对于聚焦透镜火1-5次激光照射在纸张上的任何位置。中选择的透镜位置，有大约1焦耳/厘米2的激光能量密度。 </li></ol> 3。设置PLD的D选择沉积参数<ol><li>基板上的位置对齐<ol><li> 2“直径的底物校准测试安装一个圆形的纸张。 </li><li>将衬底支架靶与基片的距离d TS = 50毫米。 </li><li>开始抽了下来，室主泵和涡轮分子泵的真空度达到10 -2帕</li><li>优先选择的气体类型（ 即氧气）和调整泵送速度和气体流量，以有适当的气体的压力（参见第4和5）。调整相对于的羽流中心，以获得均匀的膜厚度超过圆形电晕基板操纵离轴的xy位置。 </li><li>消除电子束制动器/功率计，开始消融。如果目标是新的，或者，如果它是很长一段时间不使用，预消融术是必要的，清洁的目标。 </li><li>停止消融时，存款可以看出，在佩普ŕ从视口中。 </li></ol></li><li>等离子体羽辉的长度的测定<ol><li>按照步骤3.1.1。 3.1.5，在消融过程中采取用数码相机拍摄的照片0.5 - 1秒积累时间平均在不同的等离子羽状物。 </li><li>测量D TS作为参考（参见图3）从照片上可见的等离子羽状物的长度。 </li></ol></li><li>的膜厚度的校准<ol><li>移动衬底的目标（ 即 100毫米及以上）和远离移动石英微天平（QCM）的距离等于从目标到d TS。 </li><li>存款1000激光射击（ 即 1&#39;40&#39;&#39;），并测量沉积的质量值，然后将QCM的路程。 </li><li>在1.1版中，Si基板上安装。 </li><li>存了测试样品（ 例如 18,000个激光脉冲， 即 30&#39;），并使用横截面的SEM图像到calibrate沉积速率（纳米/脉冲）。 </li></ol></li></ol> 4。沉积AZO薄膜的纳米工程<ol><li>安装衬底上制备的样品架机械手，在第1，使用胶带。 </li><li>按照步骤3.1.2 - 3.1.3。 </li><li>启动底物旋转。 </li><li>紧凑的AZO薄膜的沉积<ol><li>离子枪和集离子能量在100 eV的，RF功率在75-100 W和Ar气体通量在20 sccm的（压力是在10 -2 Pa的范围内）的切换。清洁基板用Ar +离子枪5-10分钟。经过清洗剂，关闭进气口和泵的腔室，以除去氩气。 </li><li>将氧气和泵送速度和气体通量有2 Pa的氧进行调整。 </li><li>开始消融和存款为18,000张（30&#39;）。在消融过程中检查该羽长度是相同的，如在步骤3.2中确定。 </li><li>停止消融，密切克为进，泵室。 </li></ol></li><li>分层结构的AZO薄膜的沉积<ol><li>将氧气和调整抽速和气体流量有160帕的氧气。 </li><li>开始消融和存款为18,000张（30&#39;）。在消融过程中检查该羽长度是相同的，如在步骤3.2中确定。 </li><li>停止消融，关闭进气口，泵室。 </li></ol></li><li>发泄室和删除样本</li></ol> 5。电气和光学特性<ol><li>测量在平面输运性质采用四探针技术（ 即范德堡法）。请参阅图4为计划的接触。探针电流的典型值是在1μA到10 mA范围内。测量进行减少到0.7厘米×0.7厘米，以确保更好的厚度的均匀性（约5％）以上的样品区域。 </li><li>测量光学升的样品的透射率和裸露的衬底。更正为基材的光谱贡献，通过设置为1的玻璃/膜界面处的强度。对于一个精确的校正程序，使确定该样本是安装面临的入射光束与玻璃基板上。确定可见光透明度，通过计算在400-700 nm范围内的平均透射率。使用一个150毫米直径的积分球测量的光的散射分数，雾度因子，可以计算由全部的透射光（ 即分散和向前传送）除以散射馏分，请参阅图5。 </li></ol>

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没有利益冲突的声明。

的等离子羽状物的形状是消融过程密切相关，特别是在气体的存在下;监测等离子体羽流通过视觉检查是重要的控制沉积。当沉积金属氧化物，消融的氧化物靶，氧是必要的，以支持在消融过程中的氧损失。在较低的氧背景气体的压力，所沉积的材料可以具有氧空位。这种效果是通过增加的气体压力降低。为了分离从形态学的气体混合物（ 即氩：O 2或He：O 2）的化学计量比?...

脉冲激光沉积（PLD）采用这导致在可沉积在衬底上生长的膜（参见图1）1的等离子体烧蚀物种形成在固体靶的激光烧蚀。带有背景气氛（惰性或反应性）的相互作用，可以用于诱导在气相中（参见图2）2,3均相群集成核。我们的策略的材料合成PLD的基础上调整材料的性能在一个自底向上的方法，通过仔细控制的PLD过程中产生的等离子体动力学。簇的大小，动能和组合物可以是多种多样的沉积参数影响膜的成长，并导致在形态和结构的变化4,5由一个适当的设置。这里描述的方法通过利用我们表明，一些氧化物（ 例如，WO 3银4 O 4，Al 2 O 3届TiO 2的 ）的能力来调整形态，密度，孔隙率，通过修改的材料在纳米级的结构6-11度的结构顺序，化学计量和相位。这允许为特定应用程序12-16的材料的设计。随着光伏应用，我们合成了纳米二氧化钛分层组织通过组装纳米颗粒（&lt;10 nm）的纳米和介孔结构，类似于一个“森林树木13时在染料敏化太阳能电池的光阳极有趣的结果（DSSC ）17。这些先前的结果的基础上，我们描述用于沉积的掺Al的ZnO（AZO）膜，作为透明导电氧化物的协议。 透明导电氧化物（干事）是高的带隙（&gt; 3 eV）的转换成由重掺杂的导体材料，显示电阻率&lt;10 -3欧姆-厘米和80％以上的光学transmittance在可见光范围内。它们是许多应用中的一个关键因素，如触摸屏，太阳能电池18-21，它们通常是由不同的技术，例如溅射，脉冲激光沉积法，化学气相沉积，喷雾热解和解决方案为基础的化学方法生长。其中干事，铟 - 锡 - 氧化物（ITO）已被广泛的研究，它的低电阻率，但患有成本高的缺点和低可用性的铟。 F掺杂的SnO 2（FTO），掺Al的ZnO（AZO）和F-掺杂的氧化锌（FZO），例如铟-自由系统研究现在走向。 能够提供智能化管理的入射光（灯光诱捕）的电极是特别有趣的光伏发电应用。要利用散射调制的规模结构和形貌与光的波长（ 例如：300-1000 nm）的，很好的控制在可见光通过的可能性膜的形态和在群集组件架构是必要的。 特别是，我们将介绍如何调整的AZO膜的形貌和结构。紧凑型AZO沉积在低压力（2帕氧），并在室温下，而其特征在于低电阻率（4.5×10 -4欧姆-厘米）和可见光透明度（&gt; 90％），它是具有竞争力AZO沉积在高温下AZO层次结构是通过消融O 2大于100帕的压力，这些结构显示出强烈的光散射能力，雾度高达80％以上22,23。

<table border="1"><tbody><tr><td> 的试剂/材料名称 </td><td> 公司 </td><td> 目录编号 </td></tr><tr><td>脉冲激光</td><td>连续的Quantronix </td><td> POWERLITE 8010 </td></tr><tr><td>功率计</td><td>连贯</td><td> FieldMaxII-TO </td></tr><tr><td>离子枪</td><td>螳螂出发</td><td> RFMax60 </td></tr><tr><td>质量流量控制器</td><td> MKS </td><td> 2179° </td></tr><tr><td>石英晶体微天平</td><td> Infcon </td><td> XTC / 2 </td></tr><tr><td>背景气体</td><td> Rivoira - 普莱克斯</td><td> 5.0氧气</td></tr><tr><td>目标</td><td>库尔特Lesker </td><td> （要求） </td></tr><tr><td>异丙醇</td><td> Sigma Aldrich公司</td><td> 190764-2L </td></tr><tr><td>源表</td><td>吉时利</td><td> K2400 </td></tr><tr><td>磁铁套装</td><td> ECOPIA </td><td> 0.55T试剂盒</td></tr><tr><td>分光光度计</td><td>珀金埃尔默</td><td> LAMBDA 1050 </td></tr></tbody></table>

fabrication of nano-engineered transparent conducting oxides by pulsed laser deposition

纳秒的脉冲激光沉积（PLD）中的背景气体的存在下，使金属氧化物的沉积，与可调的形态，结构，密度和化学计量由一个适当的控制的等离子羽状物的膨胀动力学。这种通用性可以被利用来产生纳米薄膜从紧凑的和致密的纳米多孔其特征在于由一个分层组件的纳米尺寸的簇。特别是，我们描述了详细的方法，制备两种类型的掺Al的ZnO（AZO）膜，作为透明电极在光生伏打器件中：1）在低O 2压力，紧凑的薄膜的导电性和光学透明性本领域的状态接近透明导电氧化物（TCO），可以沉积在室温下，与热敏感材料，如用的聚合物在有机光伏（OPVs）; 2）高的光散射的层次结构类似于森林纳米树兼容产品在更高压力uced。这种结构显示出高的雾度因子（&gt; 80％），并且可能被利用，提高光俘获能力。 AZO薄膜为这里所描述的方法可以适用于其他金属氧化物有关的技术的应用，例如WO 3中的Al 2 O 3，TiO 2的 ，和Ag 4 O 4。

通过PLD在氧气氛中沉积的AZO产生紧凑的透明导电膜在低背景气体的压力（ 即 2帕）和介孔的森林状结构通过分层组装在高压力（ 即 160帕）的簇构成。该材料是由纳米晶域的大小是最大（30纳米）22 2帕。 由于烧蚀物种之间的碰撞和背景气体，等离子羽状物的形状和长度的变化与在腔室中的氧气压力显着。 （请参阅图2和图3中的照...

Watch this Scientific Journal Video about Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition at JoVE.com

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

我们描述了实验的背景气体的存在下，在纳秒的脉冲激光沉积（PLD）方法来沉积纳米结构的氧化物薄膜。通过使用此方法的掺Al的ZnO（AZO）膜，从紧凑型分层结构为纳米树森林，可以沉积。

制备纳米设计的脉冲激光沉积透明导电氧化物

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

fabrication-nano-engineered-transparent-conducting-oxides-pulsed

Research

JoVE Journal

Engineering

15.4K 次观看.  Politecnico di Milano. 我们描述了实验的背景气体的存在下，在纳秒的脉冲激光沉积（PLD）方法来沉积纳米结构的氧化物薄膜。通过使用此方法的掺Al的ZnO（AZO）膜，从紧凑型分层结构为纳米树森林，可以沉积。

视频: Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Investigation of Early Plasma Evolution Induced by Ultrashort Laser Pulses

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a significant role in laser-material interaction, especially in the air environment1-11.
Early plasma evolution has been captured through pump-probe shadowgraphy1-3 and interferometry1,4-7. However, the studied time frames and applied laser parameter ranges are limited. For example, direct examinations of plasma front locations and electron number densities within a delay time of 100 picosecond (ps) with respect to the laser pulse peak are still very few, especially for the ultrashort pulse of a duration around 100 femtosecond (fs) and a low power density around 1014 W/cm2. Early plasma generated under these conditions has only been captured recently with high temporal and spatial resolutions12. The detailed setup strategy and procedures of this high precision measurement will be illustrated in this paper. The rationale of the measurement is optical pump-probe shadowgraphy: one ultrashort laser pulse is split to a pump pulse and a probe pulse, while the delay time between them can be adjusted by changing their beam path lengths. The pump pulse ablates the target and generates the early plasma, and the probe pulse propagates through the plasma region and detects the non-uniformity of electron number density. In addition, animations are generated using the calculated results from the simulation model of Ref. 12 to illustrate the plasma formation and evolution with a very high resolution (0.04 ~ 1 ps).
Both the experimental method and the simulation method can be applied to a broad range of time frames and laser parameters. These methods can be used to examine the early plasma generated not only from metals, but also from semiconductors and insulators.

An experimental method to examine the early plasma evolution induced by ultrashort laser pulses is described. Using this method, high quality images of early plasma are obtained with high temporal and spatial resolutions. A novel integrated atomistic model is used to simulate and explain the mechanisms of early plasma.

超短激光脉冲诱导的等离子体演化早期的调查

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a ...

科研

工程学

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

空间密闭的复合氧化物制备

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Making Record-efficiency SnS Solar Cells by Thermal Evaporation and Atomic Layer Deposition

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent thermal evaporation, and it absorbs visible light strongly. However, for a long time the record power conversion efficiency of SnS solar cells remained below 2%. Recently we demonstrated new certified record efficiencies of 4.36% using SnS deposited by atomic layer deposition, and 3.88% using thermal evaporation. Here the fabrication procedure for these record solar cells is described, and the statistical distribution of the fabrication process is reported. The standard deviation of efficiency measured on a single substrate is typically over 0.5%. All steps including substrate selection and cleaning, Mo sputtering for the rear contact (cathode), SnS deposition, annealing, surface passivation, Zn(O,S) buffer layer selection and deposition, transparent conductor (anode) deposition, and metallization are described. On each substrate we fabricate 11 individual devices, each with active area 0.25 cm2. Further, a system for high throughput measurements of current-voltage curves under simulated solar light, and external quantum efficiency measurement with variable light bias is described. With this system we are able to measure full data sets on all 11 devices in an automated manner and in minimal time. These results illustrate the value of studying large sample sets, rather than focusing narrowly on the highest performing devices. Large data sets help us to distinguish and remedy individual loss mechanisms affecting our devices.

Tin sulfide (SnS) is a candidate material for Earth-abundant, non-toxic solar cells. Here, we demonstrate the fabrication procedure of the SnS solar cells employing atomic layer deposition, which yields 4.36% certified power conversion efficiency, and thermal evaporation which yields 3.88%.

通过热蒸发和原子层沉积使记录效率的SnS太阳能电池

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent ...

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of biosensing devices. We report on a protocol of using KrF and ArF lasers irradiating Si (001) samples immersed in a liquid environment with low number of pulses and operating at moderately low pulse fluences to induce Si wettability modification. Wafers immersed for up to 4 hr in a 0.01% H2O2/H2O solution did not show measurable change in their initial contact angle (CA) ~75&#176;. However, the 500-pulse KrF and ArF lasers irradiation of such wafers in a microchamber filled with 0.01% H2O2/H2O solution at 250 and 65 mJ/cm2, respectively, has decreased the CA to near 15&#176;, indicating the formation of a superhydrophilic surface. The formation of OH-terminated Si (001), with no measurable change of the wafer&#8217;s surface morphology, has been confirmed by X-ray photoelectron spectroscopy and atomic force microscopy measurements. The selective area irradiated samples were then immersed in a biotin-conjugated fluorescein-stained nanospheres solution for 2 hr, resulting in a successful immobilization of the nanospheres in the non-irradiated area. This illustrates the potential of&#160;the method for selective area biofunctionalization and fabrication of advanced Si-based biosensing architectures. We also describe a similar protocol of irradiation of wafers immersed in methanol (CH3OH) using ArF laser operating at pulse fluence of 65 mJ/cm2 and in situ formation of a strongly hydrophobic surface of Si (001) with the CA of 103&#176;. The XPS results indicate ArF laser induced formation of Si&#8211;(OCH3)x compounds responsible for the observed hydrophobicity. However, no such compounds were found by XPS on the Si surface irradiated by KrF laser in methanol, demonstrating the inability of the KrF laser to photodissociate methanol and create -OCH3 radicals.

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with&#160;H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

硅表面润湿性的选择区域改性脉冲紫外激光照射在液体环境

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of ...

Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using femtosecond laser-induced ablation. We show that thousands of periodic nano-craters are fabricated on an optical nanofiber by irradiating with just a single femtosecond laser pulse. For a typical sample, periodic nano-craters with a period of 350 nm and with diameter gradually varying from 50 - 250 nm over a length of 1 mm are fabricated on a nanofiber with diameter around 450 - 550 nm. A key aspect of such a nanofabrication is that the nanofiber itself acts as a cylindrical lens and focuses the femtosecond laser beam on its shadow surface. Moreover, the single-shot fabrication makes it immune to mechanical instabilities and other fabrication imperfections. Such periodic nano-craters on nanofiber, act as a 1-D PhC and enable strong and broadband reflection while maintaining the high transmission out of the stopband. We also present a method to control the profile of the nano-crater array to fabricate apodized and defect-induced PhC cavities on the nanofiber. The strong confinement of the field, both transverse and longitudinal, in the nanofiber-based PhC cavities and the efficient integration to the fiber networks, may open new possibilities for nanophotonic applications and quantum information science.

We present a protocol for fabricating 1-D photonic crystal cavities on subwavelength diameter silica fibers (optical nanofibers) using femtosecond laser-induced ablation.

1-D光子晶体空穴对纳米纤维使用飞秒激光诱导消融制造

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

用于光学谐振器和激光应用的聚合物微球的制造

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a polymer film. This paper also presents a low-cost, vacuum-free fabrication method for this novel TE; the approach combines lithography, electroplating, and imprint transfer (LEIT) processing. The embedded nature of the EMTEs offers many advantages, such as high surface smoothness, which is essential for organic electronic device production; superior mechanical stability during bending; favorable resistance to chemicals and moisture; and strong adhesion with plastic film. LEIT fabrication features an electroplating process for vacuum-free metal deposition and is favorable for industrial mass production. Furthermore, LEIT allows for the fabrication of metal mesh with a high aspect ratio (i.e., thickness to linewidth), significantly enhancing its electrical conductance without adversely losing optical transmittance. We demonstrate several prototypes of flexible EMTEs, with sheet resistances lower than 1 &#937;/sq and transmittances greater than 90%, resulting in very high figures of merit (FoM) &#8211; up to 1.5 x 104 &#8211; which are amongst the best values in the published literature.

This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.

具有嵌入式金属网的高性能，灵活，透明电极的可扩展解决方案处理制造策略

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

Production of Single Tracks of Ti-6Al-4V by Directed Energy Deposition to Determine the Layer Thickness for Multilayer Deposition

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal powder is injected as particles. In general, this technique is employed to either fabricate or repair different components. In this technique, the final characteristics are affected by many factors. Indeed, one of the main tasks in building components by DED is the optimization of process parameters (such as laser power, laser speed, focus, etc.) which is usually carried out through an extensive experimental investigation. However, this sort of experiment is extremely lengthy and costly. Thus, in order to accelerate the optimization process, an investigation was conducted to develop a method based on the melt pool characterizations. In fact, in these experiments, single tracks of Ti-6Al-4V were deposited by a DED process with multiple combinations of laser power and laser speed. Surface morphology and dimensions of single tracks were analyzed, and geometrical characteristics of melt pools were evaluated after polishing and etching the cross-sections. Helpful information regarding the selection of optimal process parameters can be achieved by examining the melt pool features. These experiments are being extended to characterize the larger blocks with multiple layers. Indeed, this manuscript describes how it would be possible to quickly determine the layer thickness for the massive deposition, and avoid over or under-deposition according to the calculated energy density of the optimum parameters. Apart from the over or under-deposition, time and materials saving are the other great advantages of this approach in which the deposition of multilayer components can be started without any parameter optimization in terms of layer thickness.

In this research, a rapid method based on melt pool characterization is developed to estimate the layer thickness of Ti-6Al-4V components produced by directed energy deposition.

用定向能沉积法生产 Ti-6Al-4V 层厚度的单车道多层沉积

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal ...

Generation and Coherent Control of Pulsed Quantum Frequency Combs

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional states on-chip in a practical way have remained elusive due to the increasing complexity of the quantum circuitry needed to prepare and process such states. Here, we outline how high-dimensional, frequency-bin entangled, two-photon states can be generated at a stable, high generation rate by using a nested-cavity, actively mode-locked excitation of a nonlinear micro-cavity. This technique is used to produce pulsed quantum frequency combs. Moreover, we present how the quantum states can be coherently manipulated using standard telecommunications components such as programmable filters and electro-optic modulators. In particular, we show in detail how to accomplish state characterization measurements such as density matrix reconstruction, coincidence detection, and single photon spectrum determination. The presented methods form an accessible, reconfigurable, and scalable foundation for complex high-dimensional state preparation and manipulation protocols in the frequency domain.

A protocol is presented for the practical generation and coherent manipulation of high-dimensional frequency-bin entangled photon states using integrated micro-cavities and standard telecommunications components, respectively.

脉冲量子频率梳的产生与相干控制

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional ...