SDJ衷心感谢对工程教育/ NRL博士后奖学金计划，与康拉德Bussmann保险丝（NRL）和武明中（美国科罗拉多州立大学）对材料的磁特性的讨论，罗恩霍尔姆（NRL）美国协会为他的部分支持设计和实施夺标AD系统。

1.粉体的制备<ol><li>作为筛接收的钇铁石榴石（YIG）粉末，得到100-150克团块的尺寸小于53微米。 </li><li>将筛分的粉末放入炉内干燥至少24小时，在温度高于300℃。 </li></ol> 2.基板制备<ol><li>清洁的衬底所需尺寸的， 例如 3 x 3毫米，用丙酮，然后异丙醇。干燥使用氮气。 </li></ol> 3.执行气溶胶沉积<ol><li>装入样品至翻译安装阶段。 <ol><li>放置双面铜带到安装阶段。将洗净的衬底上的铜带。 </li><li>测量从上述载放台的边缘的距离与样品的各边缘。记录在历史样本的板尺寸和样品位置。 </li><li>检查载物台对准平行于平移摩托的主体R的测量从上述载放台的边缘的距离，以在电机本体的使用卡尺的边缘。加载样品到沉积室。 </li><li>夹紧凸缘以密封的沉积室中。附上3 15针D-sub控制电缆的翻译电机。 </li></ol></li><li>加载粉和关闭了气溶胶室。 <ol><li>从炉中取出干燥的粉末，并将其放置在气溶胶腔室底部。滑动滤波器去堵塞棒附着到过滤器去堵塞棒。 </li><li>放置该气溶胶腔室的主体到气雾室底部。允许为主体被附接到所述底部部分中的过滤器去堵塞竿安装到搁置在搅动板。 </li><li>钳主体，以底部。附上该气溶胶室压力计到侧端口上的气溶胶腔室的主体。 </li><li>夹紧喷嘴入口部到顶部端口上的主体Òf用一个夹子QF气溶胶室。提高喷嘴进口管上的沉积室中的进气口并固定在顶部和底部接头。 </li><li>记录在历史样本的纸粉和气溶胶室身份证号码。 </li></ol></li><li>打开低真空泵用它从系统的其余部分隔离。打开淀积室照明灯。上打开旁通管线的收缩阀，开始对整个系统的抽空。 </li><li>安装压力监控软件与沉积运行标识。 </li><li>通过在命令行终端窗口中键入“pitrans”运行阶段控制器宏创建者和输入所需的信息。在创建运行日志电子表格中的新的工作表并记录沉积参数和设置说明。 </li><li>当系统压力达到约150-200毫米汞柱，稍微打开阀门unconstricted。保持约1托/ sec的抽空速率。第一次低于100毫米汞柱Ë压力开始下降的压力监控软件和翻译阶段电机控制器软件。 </li><li>一旦系统压力达到约1乇关闭所有三个阀的旁通管路和打开主泵送阀。紧固夹具上的沉积室的顶盖。 </li><li>打开鼓风机泵。打开超高纯（UHP）的氮气气缸。监控压力并记录该系统的基础压力（它典型地达到15-25毫托）。 </li><li>设置在喷嘴和基片之间的距离。使用载物台控制软件的图形用户界面窗口移动安装基板上的喷嘴。降低基板，直至其接触喷嘴。移动衬底7.5毫米在该位置上的垂直方向。 </li><li>关闭主泵送管路和监视系统上的压力监控软件的泄漏率。注意在关闭阀门的最初泄漏率。如果这LEA施钾量小于3.33毫托/秒继续，否则首先检查是否有泄漏。一个典型的泄漏速率小于1.2毫乇/秒。 </li><li>设置在沉积室蝶阀到500乇预置值。质量流量控制器值设置为13.63升/分钟（不要打开它）。 </li><li>移动的安装阶段，以用于沉积的开始位置。加载在步骤3.7到控制器软件创建的宏。 </li><li>程序函数发生器扫线之间每135和145赫兹10秒。打开函数发生器。打开氮气流。 3秒倒计时开始后，舞台控制器宏。 </li><li>监视沉积并根据需要调整气体流速来保持压力差，在500±0.5乇（或根据需要的运行）的沉积的持续时间。 注意：在淀积室中的压力通常为0.65乇，在淀积室中的压力通常为501乇。不可控制的变化在压力通常表明，超高压氮已经不多了。在压力略有下降（1-2托）在运行期间是典型的。这可通过增加气体流量来补救。在最初通过一个可见膜应形成在基板上，缺乏成膜表明该粉末和/或显著过滤器堵塞的不足雾化。 </li><li>在沉积结束时注意确切沉积运行时间。关闭氮气，函数发生器和泵。完全开放的沉积室蝶阀。 </li><li>打开位于所述沉积腔室侧的旁通阀。打开房子氮气气体调节到零，并将其重定向到淀积室中。关闭主阀抽水一边慢慢增加了温室气体调节器压力。 </li><li>家喷嘴至X = 25毫米，Y = 25mm时，和Z = 25毫米，然后关闭阶段控制器软件。 </li><li>一旦在系统中的压力已上升高于100毫米汞柱停止压力监控软件。记录用和时间来完成沉积的总的氮气。房子气压作必要的调整，直到系统达到的气氛。 </li><li>拔下3 15针D-sub阶段控制电缆和松开顶盖。除去从沉积室顶盖和卸载样品。 </li></ol> 4.沉积后检验<ol><li>从安装阶段取出样品，并检查它在显微镜下。如果有必要，清洗样品在异丙醇除去散粉。完成电影计划中的刻画。 </li></ol>

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图4中的SEM图像表明，显著骨折和致密化在沉积过程正在发生。图像被拍摄的电影，其示出了少数的空隙和晶粒的顶面的。可观察区域是最后的材料的待沉积，因此不从随后粒子的进一步的影响和致密化过程中受益， 如图1所示通过冲击从粒子2和3的样品的体积内的膜密度可以由截面图像在图5中，该图像中可以看出，随着横截面的高倍放大的插图，提供了进一...

气溶胶沉积（AD）是可以制作的层厚度达其密度大于95％的体积为1的几百微米的厚膜沉积工艺。沉积过程被认为是发生通过冲击，断裂或变形，粘合性，颗粒的致密化一个连续的过程。 图1描述为一系列步骤，表示粒子的影响和致密化过几个步骤这一过程。如图所示，颗粒移动朝向与100-500米/秒的典型速度在衬底。作为最初的粒子撞击与基底断裂，他们坚持到基板。此锚定层提供在衬底和体膜之间的机械粘附力。随后的影响发生了下面的颗粒越来越裂缝，粘附，并进一步致密化。的连续冲击，断裂，并致密化这个过程的工作方式压缩的底层膜和粘接CRYStallites和产生的膜的密度达到大于95％的松散材料。 <img alt="图1" src="/files/ftp_upload/52843/52843fig1.jpg" /> 图1.在沉积过程。图A示出了三个粒子朝着与100-500米/秒的典型速度在衬底。面板B显示了冲击第一粒子的，骨折，和粘附的结果。面板C和D示出了第二和第三颗粒的后续影响，这进一步致密的底层膜和粘接微晶。其结果是密度大于95％的散装材料（从参考19转载许可）的电影。 <a href="https://www.jove.com/files/ftp_upload/52843/52843fig1highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a> AD的主要优点是，depos银行足球比赛完全发生在环境RT;从而使膜生长，例如，高的熔融温度的材料（原料粉末）上的低熔融温度的衬底。沉积速率可高达每分钟几微米和在1-20乇淀积室中的中等真空条件下进行。该过程显示扩展到非常大的沉积区，最后，它可以存保形的能力。2 有研究了AD，用于各种用途的许多材料系统，例如感应器3，耐磨涂层4，压电5，multiferroics 6，magnetoelectrics 7热敏电阻8，热电膜9，柔性电介质10中，硬组织植入物和生物陶瓷11，固体电解质12， ​​和光催化剂13。对于应用到微波器件，Severa的磁性膜需升几百微米的厚度，将理想地被直接集成到电路板的元件。一个挑战实现这一整合是需要用于制造铁氧体膜高温制度（见综述由哈里斯等人 14），例如钇铁石榴石（YIG）。出于这个原因，广告似乎是实现潜在的新进展磁集成电路技术的一个自然的选择。低成本的操作指令，高沉积速率和简单性刺激下，研究人员在德国，法国，日本，韩国的兴趣，现在在美国。 图2是绘图概述基本设置进行气溶胶沉积。压力是在位置，分别监测标记P 交流 ，P 直流和P H为气溶胶腔室，沉积腔室，和泵头。的气流，由质量流量控制器（MFC）的控制，进入气雾剂室和aerosolizes粉末。沉积室被泵来创建两个腔室之间的压力差，通过矩形（0.6毫米×4.8毫米）喷嘴开口使颗粒的流动。 <img alt="图2" src="/files/ftp_upload/52843/52843fig2.jpg" /> 图中的夺标ADM系统2.主要成分。压力处于的位置，分别标有监控P 交流 ，P DC，和P H为气溶胶室，沉积室和泵头。详见说明书。 （版权所有（2014）应用物理，从20引用转载的日本协会）。 <a href="https://www.jove.com/files/ftp_upload/52843/52843fig2highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a> 在这项工作中的个体的YIG颗粒的平均尺寸为0.5微米。凝聚的效果会导致这些小颗粒，以形成尺寸范围从约10微米至约400微米的大得多的聚集体。团块的尺寸和输送速率的控制是必不可少的，以实现一个密合式膜。这就需要一个气雾室，允许大小选择和均匀的粒子通量到沉积室的结构。该粉末是预筛分以除去大于53微米之前被装入气雾室的任何团块。在这项工作中所用的气溶胶室结构示于图3中 。氮气进入通过四个入口喷嘴（显示了两个在图3中）位于所述腔室的底侧。气体相互作用与YIG粉末（以绿色显示），以产生由凝聚粒子的分布的气溶胶尺寸小于53微米。在气溶胶腔室由不锈钢板连续地振动的基部的搅拌器，以保持粉末移入气流。附聚物撞击一个45微米的过滤器，只允许附聚物尺寸小于45微米，进入喷嘴入口。在进入喷嘴入口的附聚物被加速到一个大的速度和喷出到沉积室（未示出）来执行沉积。不锈钢棒的过滤器的底部连接到搅拌器（未示出）中解除堵塞的过滤器，以帮助的基极。 <img alt="图3" src="/files/ftp_upload/52843/52843fig3.jpg" /> 图3.内部气溶胶室的配置，带过滤器，入口喷嘴，并显示YIG粉末。详见说明书。 这份报告详细的实验程序，使用上述的定制系统产生的YIG的致密薄膜来执行的AD。对于在本系统中产生的11微米厚的膜代表性结果使用scannin呈现克电子显微镜（SEM），厚度轮廓和铁磁共振（FMR）。给出的结果是不打算成为磁性或薄膜材料结构的深入研究，但由于用这种技术生产的薄膜的演示。 <a href="https://www.jove.com/files/ftp_upload/52843/52843fig3highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a>

<table border="0" cellpadding="0" cellspacing="0">
	<tbody>
		<tr>
			<td>Ferromagnetic Resonance Spectrometer</td>
			<td>www.bruker.com/</td>
			<td>9.5 GHz Spectrometer</td>
			<td></td>
		</tr>
		<tr>
			<td>Scanning Electron Microscope</td>
			<td>www.zeiss.com</td>
			<td>LEO Supra 55</td>
			<td></td>
		</tr>
		<tr>
			<td>Profilometer</td>
			<td>www.kla-tencor.com/</td>
			<td>D-120</td>
			<td></td>
		</tr>
		<tr>
			<td>Stereo Microscope</td>
			<td>www.microscopes.com</td>
			<td>Omano Stereo Microscope</td>
			<td>Used for inspection directly after removal from deposition chamber</td>
		</tr>
		<tr>
			<td>Double-sided Copper Tape</td>
			<td>www.2spi.com</td>
			<td>05085A-AB</td>
			<td>hold-down clips or other adhesives may be used</td>
		</tr>
		<tr>
			<td>Nitrile Exam Gloves</td>
			<td>www.fishersci.com</td>
			<td>19-130-1597D</td>
			<td></td>
		</tr>
		<tr>
			<td>2-propanol</td>
			<td>www.fishersci.com</td>
			<td>A451SK-4</td>
			<td></td>
		</tr>
		<tr>
			<td>Acetone</td>
			<td>www.fishersci.com</td>
			<td>A11-1</td>
			<td></td>
		</tr>
		<tr>
			<td>Yttrium Iron Garnet Powder</td>
			<td>www.trans-techinc.com/</td>
			<td>Call for Product Information</td>
			<td>Powder is custom made to order and ground to specifications</td>
		</tr>
		<tr>
			<td>Stainless Steel Spoon</td>
			<td>www.fishersci.com</td>
			<td>14-429E</td>
			<td>Used for scooping and transferring powder</td>
		</tr>
		<tr>
			<td>Alumina Boats</td>
			<td>www.coorstek.com/</td>
			<td>65580</td>
			<td></td>
		</tr>
		<tr>
			<td>Drying Furnace</td>
			<td>www.paragonweb.com</td>
			<td>KM14 ceramic furnace</td>
			<td>Furnace is connected to air during drying</td>
		</tr>
		<tr>
			<td>Powder Sieves</td>
			<td>www.advantechmfg.com/</td>
			<td>270SS8F</td>
			<td>A selection of mesh openings are needed to sieve from large down to target size</td>
		</tr>
		<tr>
			<td>Ultra High Purity Nitrogen Gas</td>
			<td>www.praxairdirect.com</td>
			<td>NI 5.0UH-3K</td>
			<td>Used as medium for aerosol.</td>
		</tr>
		<tr>
			<td>Air Breathing Quality</td>
			<td>www.praxairdirect.com</td>
			<td>AI BR-4KN</td>
			<td>Used inside furnace during drying</td>
		</tr>
		<tr>
			<td>Lab Balance</td>
			<td>www.balances.com/</td>
			<td>Sartorius ED224S Lab Balance</td>
			<td>Used for weighing powder</td>
		</tr>
		<tr>
			<td>Sapphire Wafers</td>
			<td>www.pmoptics.com/</td>
			<td>PWSP-313211</td>
			<td></td>
		</tr>
	</tbody>
</table>

formation of thick dense yttrium iron garnet films using aerosol deposition

气溶胶沉积（AD）是可以制作的层厚度达其密度大于95％的体积为几百微米的厚膜沉积工艺。 AD的主要优点是该沉积完全发生在环境温度下;由此使薄膜的生长在与不同熔融温度的材料体系。本报告描述了详细的处理步骤制备的粉末和使用该定制系统中执行的AD。代表性的表征结果显示从扫描电子显微镜，轮廓，和铁磁共振对于在本系统中生长的薄膜。作为系统的功能的代表性概述，焦点是考虑到以下所描述的协议和系统设置产生一个样本。结果表明，该系统可以成功地沉积11微米厚的钇铁石榴石薄膜在&gt; 90％的堆积密度在一个单一的5分钟沉积ř联合国。提供的方法，得到更好的控制气溶胶和粒子选择用于改善的厚度和在该膜的粗糙度变化的探讨。

在沉积完成之后，将涂覆的衬底从淀积室中取出，并使用光学立体显微镜检查。样品典型地刷，用异丙醇洗涤以除去过量的粉末，其仍然在重新加压到大气中。膜表征上这里提出使用扫描电子显微镜来评估膜的形态的代表性结果进行的，轮廓，以评估膜的厚度，均匀性，和粗糙度，以及铁磁共振来评估膜的磁特性（见参考文献20，用于在表征方法的其他详细信息）。在这项研究中，有3 x 3毫米蓝宝...

Watch this Scientific Journal Video about Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition at JoVE.com

Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition

本报告描述了使用定制系统来在RT执行的钇铁石榴石厚膜的气溶胶沉积在蓝宝石衬底。使用扫描电子显微镜，轮廓，和铁磁谐振得到的技术的功能的代表性概述淀积膜的特征在于。

浓稠钇铁石榴石薄膜的形成使用气溶胶沉积

Aerosol deposition (AD) is a thick-film deposition process that can produce layers up to several hundred micrometers thick with densities greater than 95% ...

formation-thick-dense-yttrium-iron-garnet-films-using-aerosol

Research

JoVE Journal

Engineering

9.1K 次观看.  Naval Research Laboratory. 本报告描述了使用定制系统来在RT执行的钇铁石榴石厚膜的气溶胶沉积在蓝宝石衬底。使用扫描电子显微镜，轮廓，和铁磁谐振得到的技术的功能的代表性概述淀积膜的特征在于。 

视频: Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas allows the deposition of metal oxides with tunable morphology, structure, density and stoichiometry by a proper control of the plasma plume expansion dynamics. Such versatility can be exploited to produce nanostructured films from compact and dense to nanoporous characterized by a hierarchical assembly of nano-sized clusters. In particular we describe the detailed methodology to fabricate two types of Al-doped ZnO (AZO) films as transparent electrodes in photovoltaic devices: 1) at low O2 pressure, compact films with electrical conductivity and optical transparency close to the state of the art transparent conducting oxides (TCO) can be deposited at room temperature, to be compatible with thermally sensitive materials such as polymers used in organic photovoltaics (OPVs); 2) highly light scattering hierarchical structures resembling a forest of nano-trees are produced at higher pressures. Such structures show high Haze factor (&gt;80%) and may be exploited to enhance the light trapping capability. The method here described for AZO films can be applied to other metal oxides relevant for technological applications such as TiO2, Al2O3, WO3 and Ag4O4.

We describe the experimental method to deposit nanostructured oxide thin films by nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas. By using this method Al-doped ZnO (AZO) films, from compact to hierarchically structured as nano-tree forests, can be deposited.

制备纳米设计的脉冲激光沉积透明导电氧化物

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

科研

工程学

Speciation and Bioavailability Measurements of Environmental Plutonium Using Diffusion in Thin Films

The biological uptake of plutonium (Pu) in aquatic ecosystems is of particular concern since it is an alpha-particle emitter with long half-life which can potentially contribute to the exposure of biota and humans. The diffusive gradients in thin films technique is introduced here for in-situ measurements of Pu bioavailability and speciation. A diffusion cell constructed for laboratory experiments with Pu and the newly developed protocol make it possible to simulate the environmental behavior of Pu in model solutions of various chemical compositions. Adjustment of the oxidation states to Pu(IV) and Pu(V) described in this protocol is essential in order to investigate the complex redox chemistry of plutonium in the environment. The calibration of this technique and the results obtained in the laboratory experiments enable to develop a specific DGT device for in-situ Pu measurements in freshwaters. Accelerator-based mass-spectrometry measurements of Pu accumulated by DGTs in a karst spring allowed determining the bioavailability of Pu in a mineral freshwater environment. Application of this protocol for Pu measurements using DGT devices has a large potential to improve our understanding of the speciation and the biological transfer of Pu in aquatic ecosystems.

The technique of diffusive gradients in thin films (DGT) is proposed for speciation studies of plutonium. This protocol describes diffusion experiments probing the behavior of Pu(IV) and Pu(V) in presence of organic matter. DGTs deployed in a karstic spring allow assessment of the bioavailability of Pu.

环境钚的薄膜弥散形态和生物利用度测量

The biological uptake of plutonium (Pu) in aquatic ecosystems is of particular concern since it is an alpha-particle emitter with long half-life which can ...

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two chalcogenide compositions are demonstrated: Ge23Sb7S70 and As40S60, which have both been studied extensively for planar mid-infrared (mid-IR) microphotonic devices. In this approach, uniform thickness films are fabricated through the use of computer numerical controlled (CNC) motion. Chalcogenide glass (ChG) is written over the substrate by a single nozzle along a serpentine path. Films were subjected to a series of heat treatments between 100 &#176;C and 200 &#176;C under vacuum to drive off residual solvent and densify the films. Based on transmission Fourier transform infrared (FTIR) spectroscopy and surface roughness measurements, both compositions were found to be suitable for the fabrication of planar devices operating in the mid-IR region. Residual solvent removal was found to be much quicker for the As40S60 film as compared to Ge23Sb7S70. Based on the advantages of electrospray, direct printing of a gradient refractive index (GRIN) mid-IR transparent coating is envisioned, given the difference in refractive index of the two compositions in this study.

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.

厚度均匀葛电沉积<sub&gt; 23</sub&gt;锑<sub&gt; 7</sub&gt;取值<sub&gt; 70</sub&gt;和As<sub&gt; 40</sub&gt;取值<sub&gt; 60</sub&gt;硫系玻璃薄膜

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

An Analog Macroscopic Technique for Studying Molecular Hydrodynamic Processes in Dense Gases and Liquids

An analog, macroscopic method for studying molecular-scale hydrodynamic processes in dense gases and liquids is described. The technique applies a standard fluid dynamic diagnostic, particle image velocimetry (PIV), to measure: i) velocities of individual particles (grains), extant on short, grain-collision time-scales, ii) velocities of systems of particles, on both short collision-time- and long, continuum-flow-time-scales, iii) collective hydrodynamic modes known to exist in dense molecular fluids, and iv) short- and long-time-scale velocity autocorrelation functions, central to understanding particle-scale dynamics in strongly interacting, dense fluid systems. The basic system is composed of an imaging system, light source, vibrational sensors, vibrational system with a known media, and PIV and analysis software. Required experimental measurements and an outline of the theoretical tools needed when using the analog technique to study molecular-scale hydrodynamic processes are highlighted. The proposed technique provides a relatively straightforward alternative to photonic and neutron beam scattering methods traditionally used in molecular hydrodynamic studies.

An experimentally accessible analog method for studying molecular hydrodynamic processes in dense fluids is presented. The technique uses particle image velocimetry of vibrated, high-restitution grain piles and allows direct, macroscopic observation of dynamical processes known and predicted to exist in strongly interacting, high density gases and liquids.

一种研究稠密气体和液体分子流体力学过程的模拟宏观技术

An analog, macroscopic method for studying molecular-scale hydrodynamic processes in dense gases and liquids is described. The technique applies a ...

Production of Single Tracks of Ti-6Al-4V by Directed Energy Deposition to Determine the Layer Thickness for Multilayer Deposition

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal powder is injected as particles. In general, this technique is employed to either fabricate or repair different components. In this technique, the final characteristics are affected by many factors. Indeed, one of the main tasks in building components by DED is the optimization of process parameters (such as laser power, laser speed, focus, etc.) which is usually carried out through an extensive experimental investigation. However, this sort of experiment is extremely lengthy and costly. Thus, in order to accelerate the optimization process, an investigation was conducted to develop a method based on the melt pool characterizations. In fact, in these experiments, single tracks of Ti-6Al-4V were deposited by a DED process with multiple combinations of laser power and laser speed. Surface morphology and dimensions of single tracks were analyzed, and geometrical characteristics of melt pools were evaluated after polishing and etching the cross-sections. Helpful information regarding the selection of optimal process parameters can be achieved by examining the melt pool features. These experiments are being extended to characterize the larger blocks with multiple layers. Indeed, this manuscript describes how it would be possible to quickly determine the layer thickness for the massive deposition, and avoid over or under-deposition according to the calculated energy density of the optimum parameters. Apart from the over or under-deposition, time and materials saving are the other great advantages of this approach in which the deposition of multilayer components can be started without any parameter optimization in terms of layer thickness.

In this research, a rapid method based on melt pool characterization is developed to estimate the layer thickness of Ti-6Al-4V components produced by directed energy deposition.

用定向能沉积法生产 Ti-6Al-4V 层厚度的单车道多层沉积

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal ...

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with wafer-scale uniformity and angstrom level control of thickness, the method of atomic-layer deposition was chosen. This ALD process enables high-quality, low-temperature (&#8804;150 &#176;C) growth of ultrathin films (100-1000 &#197;) of VO2. For this demonstration, the VO2 films were grown on sapphire substrates. This low temperature growth technique produces mostly amorphous VO2 films. A subsequent anneal in an ultra-high vacuum chamber with a pressure of 7x10-4 Pa of ultra-high purity (99.999%) oxygen produced oriented, polycrystalline VO2 films. The crystallinity, phase, and strain of the VO2 were determined by Raman spectroscopy and X-ray diffraction, while the stoichiometry and impurity levels were determined by X-ray photoelectron spectroscopy, and finally the morphology was determined by atomic force microscopy. These data demonstrate the high-quality of the films grown by this technique. A model was created to fit to the data for VO2 in its metallic and insulating phases in the near infrared spectral region. The permittivity and refractive index of the ALD VO2 agreed well with the other fabrication methods in its insulating phase, but showed a difference in its metallic state. Finally, the analysis of the films&#39; optical properties enabled the creation of a wavelength- and temperature-dependent model of the complex optical refractive index for developing VO2 as a tunable refractive index material.

Thin films (100-1000 &#197;) of vanadium dioxide (VO2) were created by atomic-layer deposition (ALD) on sapphire substrates. Following this, the optical properties were characterized through the metal-insulator transition of VO2. From the measured optical properties, a model was created to describe the tunable refractive index of VO2.

二氧化钒原子层沉积与温度依赖性光学模型

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with ...

Film Control to Study Contributions of Waves to Droplet Impact Dynamics on Thin Flowing Liquid Films

Droplet impact is a very common phenomenon in nature and attracts attention due to its aesthetic fascination and wide-ranging applications. Previous studies on flowing liquid films have neglected the contributions of spatial structures of waves to the impact outcome, while this has recently been shown to have a significant influence on the drop impact dynamics. In this report, we outline a step-by-step procedure to investigate the effect of periodic inlet forcing of a flowing liquid film leading to the production of spatiotemporally regular wave structures on drop impact dynamics. A function generator in connection with a solenoid valve is used to excite these spatiotemporally regular wave structures on the film surface while the impact dynamics of uniform-sized droplets are captured using a high-speed camera. Three distinct regions are then studied; viz. the capillary wave region preceding the large wave peak, the flat film region, and the wave hump region. The effects of important dimensionless quantities such as film Reynolds, drop Weber and Ohnesorge numbers parameterized by the film flow rate, drop speed, and drop size are also examined. Our results show interesting, hitherto undiscovered dynamics brought about by this application of film inlet forcing of the flowing film for both low and high inertia drops.

A protocol to study the contributions of waves to droplet impact dynamics on flowing liquid films is presented.

薄膜控制研究波浪对液滴冲击动力学的影响薄流动液体薄膜

Droplet impact is a very common phenomenon in nature and attracts attention due to its aesthetic fascination and wide-ranging applications. Previous ...

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films

This article describes a procedure for growing Mg3N2 and Zn3N2 films by plasma-assisted molecular beam epitaxy (MBE). The films are grown on 100 oriented MgO substrates with N2 gas as the nitrogen source. The method for preparing the substrates and the MBE growth process are described. The orientation and crystalline order of the substrate and film surface are monitored by the reflection high energy electron diffraction (RHEED) before and during growth. The specular reflectivity of the sample surface is measured during growth with an Ar-ion laser with a wavelength of 488 nm. By fitting the time dependence of the reflectivity to a mathematical model, the refractive index, optical extinction coefficient, and growth rate of the film are determined. The metal fluxes are measured independently as a function of the effusion cell temperatures using a quartz crystal monitor. Typical growth rates are 0.028 nm/s at growth temperatures of 150 &#176;C and 330 &#176;C for Mg3N2 and Zn3N2 films, respectively.

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films

This article describes the growth of epitaxial films of Mg3N2 and Zn3N2 on MgO substrates by plasma-assisted molecular beam epitaxy with N2 gas as the nitrogen source and optical growth monitoring.

Mg3N2和 Zn3N2薄膜的等离子辅助分子束外延生长

This article describes a procedure for growing Mg3N2 and Zn3N2 films by plasma-assisted molecular beam epitaxy (MBE). The films are grown on 100 oriented ...

Procedure for the Transfer of Polymer Films Onto Porous Substrates with Minimized Defects

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support substrates. Accomplishing this transfer in a highly controlled, mechanized, and reproducible manner can eliminate the creation of macroscale defect structures (e.g., tears, cracks, and wrinkles) within the thin film that compromise device performance and the usable area per sample. Here, we describe a general protocol for the highly controlled and mechanized transfer of a polymeric thin film onto an arbitrary porous support substrate for eventual use as a water filtration membrane device. Specifically, we fabricate a block copolymer (BCP) thin film on top of a sacrificial, water-soluble poly(acrylic acid) (PAA) layer and silicon wafer substrate. We then utilize a custom-designed, 3D-printed transfer tool and drain chamber system to deposit, lift-off, and transfer the BCP thin film onto the center of a porous anodized aluminum oxide (AAO) support disc. The transferred BCP thin film is shown to be consistently placed onto the center of the support surface due to the guidance of the meniscus formed between the water and the 3D-printed plastic drain chamber. We also compare our mechanized transfer-processed thin films to those that have been transferred by hand with the use of tweezers. Optical inspection and image analysis of the transferred thin films from the mechanized process confirm that little-to-no macroscale inhomogeneities or plastic deformations are produced, as compared to the multitude of tears and wrinkles produced from manual transfer by hand. Our results suggest that the proposed strategy for thin film transfer can reduce defects when compared to other methods across many systems and applications.

We present a procedure for highly controlled and wrinkle-free transfer of block copolymer thin films onto porous support substrates using a 3D-printed drain chamber. The drain chamber design is of general relevance to all procedures involving transfer of macromolecular films onto porous substrates, which is normally done by hand in an irreproducible fashion.

聚合物薄膜在多孔基板上的转移程序,具有最小化的缺陷

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support ...