这项工作是由DARPA从（N66001-08-C-2040）合同，由得克萨斯州的新兴科技基金资助项目。作者要感谢智英金，格雷格Mordi，安吉拉Azcatl，汤姆沙尔夫对有关选择性原子层沉积的贡献，以及马丁·华莱士和戈登·波洛克易地来样加工。

1. 前原位样品制备<ol><li>芯片的准备<ol><li>设计适当的蚀刻掩模将确定在硅（100）晶圆标记。使用标准的光刻和RIE，蚀刻线作为基准标记成从该STM样品将要采取的晶片的一个网格。该线应为10微米宽，1微米深，并在500微米的间距。蚀刻后，剥去样本剩余的光刻胶。 注意：基准标记必须是可识别的原位上的样品，以及在AFM及SEM计量期间尖端位置。 </li><li>通过采用标准的粘性蓝色切割带，胶粘面朝下保护晶圆表面。 </li><li>骰子晶片成使用金刚石片放倒陶瓷切割锯成适合特定UHV-STM工具尺寸正用于执行高密度脂蛋白。这里，将样品分别为8.1毫米×8.1毫米正方形。 </li></ol></li><li>切割后，准备芯片插入UHV-STM图案化模具轻轻剥开切割带，注意不要接触芯片与任何含镍的工具，这将导致特高压准备下文第2节之后的不利表面重建。 <ol><li>清洁芯片通过漂洗正面每10秒用丙酮，异丙醇，甲醇和去离子水分别流，而夹持样品的侧面与聚四氟乙烯（PTFE）镊子。最后，用干超纯N 2或Ar，仍与聚四氟乙烯镊子夹取。 </li><li>用于高密度脂蛋白使用适合于特定UHV-STM工具的方法中的STM样品架安装样品块。 <ol><li>如果安装在一个含镍的样品架，切割用钛剪刀钽箔阻隔带（APPX 4毫米乘试样高度）。声处理箔片，每次5分钟，在超纯丙酮，异丙醇，甲醇和去离子水，分别通过部分地覆盖有铝箔和注入烧杯干燥用超纯N 2气荷兰国际集团的N 2喷嘴进入的开口。气体流量，直到所有的液体蒸发。使用镍游离镊子，形式箔围绕结束样品然后夹紧在样品架以分离样品的正面和背面，从样品架。 </li></ol></li><li>安装，等离子体清洗和样品架在氧等离子体去除碳污染后。28 </li></ol></li></ol> 2.特高压样品制备<ol><li>通过负载锁或另一优选UHV-安全的方法引入样品放入超高真空系统，使特高压处理和HDL通常可保持在低于1.3×10 -9毫巴（除了下面步骤2.5.1.1）。 </li><li>德加O / N在650℃，监测温度与高温计。确保该室压力是内的背景的25％。在这里所描述的情况下，典型的背景压力是约4.5×10 -10毫巴。 </li><li>德加钨氢裂化灯丝在1,500℃下进行5分钟。如果可能的话激活钛升华泵。 </li><li>执行样本“闪光”的怪圈。 <ol><li>通过加热到1250℃持续20秒，监测T搭配高温计和使用10℃/秒的加热梯度闪样品。不要超过7×10 -9毫巴的最大压力。凉爽通过去除加热电流在小于5秒。 </li><li>在350℃下进行5分钟休息样品。以允许压力恢复到基线。重复3倍。 </li></ol></li><li>执行样本钝化。 <ol><li>使用高温计来监视温度设定样品温度至350℃。介绍1.3×10 -6毫巴超纯H 2到准备室使用泄漏阀。 <ol><li>把对H 2线非常接近系统中的一个泄漏阀冷阱，以进一步纯化的H 2。 </li><li>如果可能的话，泵系统与高速涡轮泵，而不是一个离子泵。这是为了让离子泵不被世博污染样品sed的高压力和排出的污染物。所述泵被放回正常状态大部分氢已被除去之后与样品仍是热的（350℃）。 </li></ol></li><li>打开钨氢裂化灯丝至1400℃下进行12分钟的温度，然后关闭灯丝和H 2气体流量。凉爽样品至室温。 </li></ol></li></ol> 3.扫描隧道显微镜和光刻<ol><li>样品转移到STM，并把样品和STM针尖进入隧道范围内。使用照相机与拆分比20μm的光斑尺寸更好的功率，利用针尖 - 样品结高分辨率光学图像。偏移校正和调整的光学图像，它代表的不失真再现基准标记。 </li><li>卸下所有的照明，以降低系统热不稳定性。确定的表面质量。 <ol><li>使用传统的STM技术与-2.25 V和200 pA的样本偏差，识别麻木尔的表面上的缺陷。 </li><li>如果表面缺陷均低于可接受的水平，移动到下一个步骤。可接受的最大缺陷水平如下：1％的悬挂键; 3％的Si空缺;的1％的污染物。 </li></ol></li><li>要生产设计的HDL型态，包括实验模式和大（1微米×1微米） 的SERP的识别模式。在SERP图案应与垂直于预期的原子力显微镜快速扫描轴长轴矢量绘制，用15-20纳米的间距。骨折的总体格局基本成形状定义应用HDL条件时，其次是尖的路径。24 </li><li>使用矢量输出来自前一步骤中，执行使用HDL FE模式光刻对于大的地区时，7-9 V样值的偏差，1 nA的电流，和0.2 MC /厘米和AP模式光刻用于需要原子精度边缘的小区域或这些区域24 <ol><li>确定最佳AP模式光刻条件由PErforming HDL具有各种范围从2至4个nA的样品偏压条件范围从3.5至4.5伏，电流和线的剂量为2〜4 MC /厘米。选择产生最窄完全取消钝化线的条件。 </li></ol></li><li>执行STM计量上所需的高密度脂蛋白形成图案的区域通过成像在-2.25 V样值偏差和0.2 nA的隧道电流。 <ol><li> [可选]进行纠错。 STM计量后，比较在STM图像与来自步骤3.5的所需图案去钝化图案。如果任何区域显示悬空键的形成不足，重复光刻周期在这些领域。 </li></ol></li><li>完成STM HDL后，脱离样品尖，移动样品装入锁。 </li><li>宣泄和消除样本。在发泄着超纯N 2，通过与惰性，平的基底如蓝宝石清洁接触它保护样本。29后的表面保护，关闭阀门，以任何泵然后介绍尾气作为QUICKLY越好。从系统中删除样本。 </li></ol> 4.样品运输<ol><li>从负载锁定取出样品。从样品架释放样品，其中包括如果可能的话去除箔片障碍。使用聚四氟乙烯（或Ti）的镊子，将样品转运，保持样品的保护的前侧，试图保持大气暴露至小于10分钟。 </li><li>安装在盖样品和松散组装加压样本转运。冲洗与超纯氩1分钟。 在任何点不要疏散系统，或者可能会发生表面损伤。29最后，用Ar的一个小的正压力（〜50-100毫巴）密封样品转运使得样品保持稳定长达一个月。 </li></ol> 5.原子层沉积<ol><li>确保ALD是在适当的沉积温度（100℃）。慢慢增加，在ALD腔室中的氩气压力，直到大气压已经实现。 </li><li>打开ALD室。 </li><li>用一对聚四氟乙烯镊子抓住上边缘的样本的开放样品转运，并迅速转移到ALD室，然后关闭ALD处理室和清洗用氩气流在&lt;2×10 -1毫巴1小时脱气的压力样本。设置进程执行ALD的80次重复成长无定型氧化钛是2.8nm。 <ol><li>使用未修饰的商用的ALD系统在100-150℃的样品温度下，用四氯化钛（ 四氯化钛）和水（H 2 O）的前体在0.3毫巴和0.8毫巴的压力进行沉积与反应物，用的脉冲时间0.1秒和0.05秒，分别为27 </li><li>以下各气体脉冲，吹扫用Ar反应器，持续60秒，在0.2毫巴，以确保最小的背景沉积由于物理吸附的反应物。在这项工作中的掩模，80次ALD循环中使用在100℃下生长大约2.8纳米的无定型氧化钛。 </li></ol&gt; </li><li>慢慢地发泄ALD室与氩气和开放。重复步骤4.1和4.2的样品运输。 </li></ol> 6.原子力显微镜（AFM） <ol><li>保证按照制造商的协议的原子力显微镜的正确校准。打开样品转运，轻轻用镊子取出样品。 </li><li>从转运除去后，牢固地安装示例成使用机械安装方法的原子力显微镜，例如夹紧系统如果可能的话。聚焦AFM相机到样品上，并定位在样品表面上的基准标记对准针尖到基于在步骤3.2的光学计量的图案。 </li><li>确保AFM设置将显示高度和相位信息，并设置扫描尺寸为20至40微米的宽。搞针尖到样品。 </li><li>在使用最高分辨率的高度和相位信息，扫描，直到定位器模式区域被确定。放大到重新构图祗园和定位在其中的图像所需的区域。 </li><li>使用适当的图像质量和分辨率（通常最高可能）取所需的区域的图像。一旦所有期望区域都被扫描，脱开来自样品的小费。卸载样品。重复步骤4.1和4.2的样品运输。 </li></ol> 7.反应离子蚀刻<ol><li>寒意电容耦合的RIE反应器中，以-110℃，然后将样品加载到其前奏室和抽气至7.5×10 -6毫巴。 <ol><li>稳定的温度下进行3分钟。然后把煤气上的O 2流量在8 SCCM（每分钟标准立方厘米），氩在40 SCCM和SF 6在20 SCCM。 </li><li>使用150W的RF放电击等离子体，然后修改该气流以蚀刻为使用SF 6在52标准立方厘米和O 2在8标准立方厘米1分钟。这些气体有Si的相互作用将蚀刻在约20nm / min的速率。30 </sup&gt; </li><li>泵真空至7.5×10 -6毫巴。排气系统RIE。重复步骤4.1和4.2的样品运输。 </li></ol></li></ol> 8.扫描电子显微术（SEM） <ol><li> SEM样品放置和样品引入到系统中。 <ol><li>将非粘性样品安装到一个方便的位置，以方便安装示例。 </li><li>打开样品转运，轻轻用镊子的边缘抢样品，安全地安装到SEM卡口，然后介绍样品组装成SEM样品取出。 </li><li>发泄和开放的SEM室。牢固安装样品组装的SEM样品台。抽空SEM室。 </li></ol></li><li>定位基准。 <ol><li>把放大倍数最低值。选择加速电压和束流的设置，将提供良好的解决方案。先从最低可接受的设置。上去需要。 </li><li>转电子束上。带给广大区域感兴趣的推荐工作距离和eucentric高度。 </li><li>找到并专注于1.1的基准。调整工作距离是必要的。优化聚焦，亮度和对比度。 </li></ol></li><li>定位和图像模式。 <ol><li>相对于基准，定位基于3.2节和第6的原子力显微镜测量的光学测量为了尽量减少对模式的积碳，用附近的非必要功能，优化对焦模式。一旦优化，移动到图案，并获得平面图图像和测量。 </li><li>如果需要的话，倾斜的样品的3D图像和图案高度的测量。对于其他模式，从8.3根据需要重复。 </li></ol></li><li>进行SEM系统结算例程和卸载样本/秒，规定由SEM制造商。样品固定回转运。 </li><li>重复步骤4.3和4.4的样品运输和储存。此时，样品是健壮和可存放的时间无限期。执行后成像分析，如果有必要的。 </li></ol>

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Lett. 98 (16), 163102 (2011).</li><li>Ye, W., Pe&#241;a Martin, P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Direct+writing+of+sub-5+nm+hafnium+diboride+metallic+nanostructures.">Direct writing of sub-5 nm hafnium diboride metallic nanostructures.</a> ACS Nano. 4 (11), 6818-6824 (2010).</li><li>Brien, J. L., Schofield, S. R., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Scanning+tunnelling+microscope+fabrication+of+arrays+of+phosphorus+atom+qubits+for+a+silicon+quantum+computer.">Scanning tunnelling microscope fabrication of arrays of phosphorus atom qubits for a silicon quantum computer.</a> Smart. 11 (5), 741-748 (2002).</li><li>Van Oven, J. C., Berwald, F., Berggren, K. K., Kruit, P., Hagen, C. 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B., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Atomic+precision+patterning+on+Si:+An+opportunity+for+a+digitized+process.">Atomic precision patterning on Si: An opportunity for a digitized process.</a> Microelec. Eng. 87 (5-8), 955-958 (2010).</li><li>Perrine, K. A., Teplyakov, A. V. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Reactivity+of+selectively+terminated+single+crystal+silicon+surfaces.">Reactivity of selectively terminated single crystal silicon surfaces.</a> Chem. Soc. Rev. 39 (8), 3256-3274 (2010).</li><li>McDonnell, S., Longo, R. C., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Controlling+the+Atomic+Layer+Deposition+of+Titanium+Dioxide+on+Silicon:+Dependence+on+Surface+Termination.">Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination.</a> The J. Phys. Chem. C. 117 (39), 20250-20259 (2013).</li><li>Kane, D. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plasma+cleaning+of+metal+surfaces.">Plasma cleaning of metal surfaces.</a> J. Vac. Sci. Tech. 11 (3), 567 (1974).</li><li>Hersam, M. C., Guisinger, N. P., Lyding, J. W., Thompson, D. S., Moore, J. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Atomic-level+study+of+the+robustness+of+the+Si(100)-2&#215;1:H+surface+following+exposure+to+ambient+conditions.">Atomic-level study of the robustness of the Si(100)-2&#215;1:H surface following exposure to ambient conditions.</a> App. Phys. Lett. 78 (7), 886-888 (2001).</li><li>Agostino, R., Flamm, D. L. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plasma+etching+of+Si+and+SiO2+in+SF6&#8211;O2+mixtures.">Plasma etching of Si and SiO2 in SF6&#8211;O2 mixtures.</a> J. App. Phys. 52 (1), 162 (1981).</li><li>Longo, R. C., McDonnell, S., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Selectivity+of+metal+oxide+atomic+layer+deposition+on+hydrogen+terminated+and+oxidized+Si(001)-(2&#215;1)+surface.">Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2&#215;1) surface.</a> J. Vac. Sci Tech. B. 32 (3), 03D112 (2014).</li><li>Ruess, F. J., Oberbeck, L., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=The+use+of+etched+registration+markers+to+make+four-terminal+electrical+contacts+to+STM-patterned+nanostructures.">The use of etched registration markers to make four-terminal electrical contacts to STM-patterned nanostructures.</a> Nanotechnology. 16 (10), 2446-2449 (2005).</li><li>Ruess, F. J., Pok, W., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Realization+of+Atomically+Controlled+Dopant+Devices+in+Silicon.">Realization of Atomically Controlled Dopant Devices in Silicon.</a> Small. 3 (4), 563-567 (2007).</li><li>Li, K., Namboodiri, P., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Controlled+formation+of+atomic+step+morphology+on+micropatterned+Si+(100).">Controlled formation of atomic step morphology on micropatterned Si (100).</a> J. Vac. Sci. Tech. B. 29 (4), 041806 (2011).</li><li>Ballard, J. B., Owen, J. H. G., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Pattern+transfer+of+hydrogen+depassivation+lithography+patterns+into+silicon+with+atomically+traceable+placement+and+size+control.">Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control.</a> Journal of Vacuum Science and Technology B. 32 (4), 041804 (2014).</li><li>Gusev, E. P., Cabral, C., Copel, M., D&#8217;Emic, C., Gribelyuk, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=U+ltrathin+HfO+2+films+grown+on+silicon+by+atomic+layer+deposition+for+advanced+gate+dielectrics+applications.">U ltrathin HfO 2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications.</a> Microelectronic Engineering. 69, 145-151 (2003).</li></ol>

The authors have nothing to disclose.

上面所描述的纳米结构进行计量要求弥合期间使用其他工具如原子力显微镜和SEM HDL和图案位置的前端定位的能力。与此相反，以具有高分辨率位置编码其它发达构图工具，如电子束光刻，在这里进行的高密度脂蛋白，用一个STM进行而得到很好的控制粗定位，所以额外位置识别的协议被使用， 如图3首先，一个长焦距显微镜定位在超高真空系统从针尖 - 样品的结约20cm外。样品被构图为1...

由于纳米技术变得在各种各样领域，认识结构更重要形成增益重要性，特别是在光刻和电子领域。强调计量的重要性在纳米尺度，特别在低于10纳米尺度，但是应当指出，在仅1纳米的特征尺寸的变化表示的分数变化至少10％。该变型可以具有对器件的性能和材料性质显著影响1,2 - 。4使用合成方法，非常精确地形成单独的特征，例如量子点或其它复杂分子可被制造，2,5,6-但通常缺乏相同精度在功能布局和方向，尽管为了提高大小和位置的控制工作。本文阐述的用于制造纳米结构邻近的原子尺寸精度和特征放置原子精度，以及一种方法在功能布局原子计量。使用扫描隧道显微镜（STM）的诱导氢取消钝化光刻（HDL）的原子精度，以原子精确图案与化学敏感的对比度形成在一个表面上。选择性原子层沉积（ALD），然后施加一个硬质的氧化物材料中的图案化的区域，用反应离子蚀刻（RIE）最终转印图案到散装物料，如在图1示意性示出。与标准相结合的高度精确的HDL过程ALD和RIE处理的结果以灵活的方法，以产生纳米结构上以任意形状和定位的表面。 <img alt="图1" src="/files/ftp_upload/52900/52900fig1.jpg" /> 图1.原发性纳米制造工艺步骤。作为一个例子，一个200纳米×200平方纳米被示出。每个圆圈的箭头表示大气暴露和t的步骤站点之间ransport。特高压后，样品制备，样品是用特高压HDL其次是STM计量（左上）图案。 ALD然后进行，接着用AFM测量（右）。 RIE转成图案的Si（100），其次是SEM计量（左下）。 <a href="https://www.jove.com/files/ftp_upload/52900/52900fig1large.jpg" target="_blank">请点击此处查看该图的放大版本。</a> 最精确的光刻迄今为止通常涉及扫描探针技术，具体地基于STM的图案化，其中原子分辨率的图案化和官能化已被证明对于许多应用7以前，原子操纵已生产纳米结构的最终精度通过使用单个原子作为构建块，8 ，9,10，但需要在低温条件，从而纳米结构缺乏长期稳定性。 RT原子操纵通过除去从表面的氢原子已被示出，specificalLY高密度脂蛋白。11,12,13的HDL有望使新的类的基础上，表面处理的对比空间定位电子和其他设备。使用的HDL，而不进一步处理，不同的器件架构是可能的，包括悬挂键合线或逻辑器件。14,15,16除了提供电相反，高密度脂蛋白可引入其中，所述钝化H膜层已被除去的表面上的化学对比，在效果创建用于进一步化学修饰的模板。这种化学修饰已被证明在硅和其它表面，显示出对金属，17绝缘体18，甚至半导体的沉积选择性。16,19这些例子都产生二维结构，因此其它处理步骤，必须使用以产生真正的三三维结构的原子分辨控制由高密度脂蛋白承诺。此前，这需要重复图案，19,20,21退火，22 </suP&gt;或更少的很好的解决方法，如尖为基础的电子束诱导沉积。23 类似于电子束光刻，高密度脂蛋白使用电子的局部的磁通，以暴露抗蚀剂。有几个相似之处存在，如与临场变盘的大小和图案效率进行多模式光刻技术的能力。24然而，高密度脂蛋白的真正动力源于它是如何不同于电子束光刻。首先，抗蚀剂中的HDL是氢原子的单层以便抗蚀剂曝光成为数字过程;抗蚀原子或者是或不存在。25由于氢原子的位置对应于底层的Si（100）晶格HDL的过程可以是一个原子精确的过程，尽管应当注意的是，在本文所述的HDL具有纳米精度反对具有原子完美，因此不是数字在这种情况下。由于在高密度脂蛋白的电子源是本地到表面，STM操作的各种模式促进两者吞吐量的优化以及错误检查。在低于〜4.5 V针尖样的偏见，光刻可以在以原子精度，被称为以原子的精确模式（AP模式）的单个原子水平上进行。与此相反，在偏压以上〜7伏，电子直接从尖端到具有宽线宽并高去钝化效率，这里被称为场发射模式（FE模式）样品发出。 HDL吞吐量然后，可以通过仔细组合这两种模式进行优化，虽然整体的吞吐量保持小相对于电子束光刻用构图高达1微米2 /分钟的可能。当偏置被颠倒，使得样品保持在〜-2.25伏，电子隧道从样品到尖端极低激活操作效率，从而使该表面的原子结构的检查既用于纠错和原子级计量。 在图1中所示的该纳米结构物的制造工艺</strong&gt;的用UHV-HDL的步骤开始时，如上所述。以下的HDL，将样品排放到大气中，在该时间所述图案化的区域变得饱和与水，形成一个薄的（ 即，〜1单层）SiO 2层26中传输后，将样品插入到一ALD室，用于沉积二氧化钛（TiO 2的），其厚度约2-3纳米这里沉积，如通过AFM和XPS 27由于二氧化钛反应取决于表面的水饱和度测量，该方法是可能的，尽管这浸透表面与水的气氛曝光。接着，在该ALD掩模图案转移到散装使用的RIE，使硅为20nm除去样品进行蚀刻，用原子力显微镜和SEM测定的蚀刻深度。为了便于计量步骤，在Si（100）晶片图案化有其目的是特高压制备由长工作距离的光学显微镜，原子力显微镜俯视光学成像后是可见的网格线，和低倍率俯视SEM图像。为了帮助识别纳米级结构，1微米2蛇形图案（ 养老金计划 ）进行构图到样品与位于相对于养老金计划固定位置最偏远的纳米图案。 高密度脂蛋白，选择性ALD，和RIE的这种组合可以是用于纳米结构制造的一个重要的过程，它包括在原子尺度计量作为该过程的一个天然副产品。下面，我们包括涉及制造亚10纳米的纳米结构中的Si（100），使用高密度脂蛋白，选择性ALD，和RIE步骤的详细描述。假定一个是本领域技术人员在这些方法中，但信息将包含有关如何对各种处理进行集成。特别强调将给予由作者，以防止同样的困难经历的那些意想不到的困难，特别是涉及到运输和计量。

<table border="0" cellpadding="0" cellspacing="0">
	<tbody>
		<tr>
			<td>Si Wafer</td>
			<td>VA Semiconductor</td>
			<td></td>
			<td>P type (Boron) Si&#60;100&#62; +/- 2 degrees, 280 mm +/- 25 mm thick, 0.01-0.02 ohm-cm</td>
		</tr>
		<tr>
			<td>Ta foil</td>
			<td>Alfa Aesar</td>
			<td>335</td>
			<td>0.025mm (0.001in) thick, 99.997% (metals basis)</td>
		</tr>
		<tr>
			<td>Methanol</td>
			<td>Alfa Aesar</td>
			<td>19393</td>
			<td>Semiconductor Grade, 99.9%</td>
		</tr>
		<tr>
			<td>2-Propanol</td>
			<td>Alfa Aesar</td>
			<td>19397</td>
			<td>Semiconductor Grade, 99.5%</td>
		</tr>
		<tr>
			<td>Acetone</td>
			<td>Alfa Aesar</td>
			<td>19392</td>
			<td>Semiconductor Grade, 99.5%</td>
		</tr>
		<tr>
			<td>Argon</td>
			<td>Praxair</td>
			<td></td>
			<td>Ultra high purity (grade 5.0)</td>
		</tr>
		<tr>
			<td>Deionized water</td>
			<td>Millipore</td>
			<td>Milli-Q Water Purification System</td>
			<td>&#62;18 MW resistance water produced on demand.</td>
		</tr>
		<tr>
			<td>TiCl4</td>
			<td>Sigma Aldrigh</td>
			<td>254312</td>
			<td>&#8805;99.995% trace metals basis</td>
		</tr>
		<tr>
			<td>O2</td>
			<td>Matheson</td>
			<td>G2182101</td>
			<td>Research Grade</td>
		</tr>
		<tr>
			<td>SF6</td>
			<td>Matheson</td>
			<td>G2658922</td>
			<td>Ultra high purity (grade 4.7)</td>
		</tr>
		<tr>
			<td>Blue Medium Tack Roll</td>
			<td>Semiconductor Equipment Corporation</td>
			<td>18074</td>
			<td>Thickness 75 um / .003&#8221;&#160; Length 200 M / 660&#8217;&#160;</td>
		</tr>
	</tbody>
</table>

atomically traceable nanostructure fabrication

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a method for tracking atomically resolved and controlled structures from initial template definition through final nanostructure metrology, opening up a pathway for top-down atomic control over nanofabrication. Hydrogen depassivation lithography is the first step of the nanoscale fabrication process followed by selective atomic layer deposition of up to 2.8 nm of titania to make a nanoscale etch mask. Contrast with the background is shown, indicating different mechanisms for growth on the desired patterns and on the H passivated background. The patterns are then transferred into the bulk using reactive ion etching to form 20 nm tall nanostructures with linewidths down to ~6 nm. To illustrate the limitations of this process, arrays of holes and lines are fabricated. The various nanofabrication process steps are performed at disparate locations, so process integration is discussed. Related issues are discussed including using fiducial marks for finding nanostructures on a macroscopic sample and protecting the chemically reactive patterned Si(100)-H surface against degradation due to atmospheric exposure.

在这里所描述的情况下，高密度脂蛋白是使用多模光刻进行。24在FE模式，具有8 V样品偏压，1 Na和0.2 MC /厘米（相当于50毫微米/秒尖端速度）进行，尖端移过的表面平行或垂直于硅晶格，产生激活操作的行。虽然这种线形很尖依赖，在这里的情况下，线的完全去钝化部分约为6纳米宽，具有部分去钝化延伸的线两侧另一个为2nm的尾巴。当高精细图案需要，可以使用4 V样值的偏差，4 nA的，和4 ...

Watch this Scientific Journal Video about Atomically Traceable Nanostructure Fabrication at JoVE.com

Atomically Traceable Nanostructure Fabrication

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

原子纳米结构可追溯制造

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process ...

atomically-traceable-nanostructure-fabrication

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JoVE Journal

Engineering

8.6K 次观看.  Zyvex Labs. We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated. 

视频: Atomically Traceable Nanostructure Fabrication

Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view and for its considerable potential for practical applications. Slow light photonic crystal waveguides, in particular, have played a major part and have been successfully employed for delaying optical signals1-4 and the enhancement of both linear5-7 and nonlinear devices.8-11
Photonic crystal cavities achieve similar effects to that of slow light waveguides, but over a reduced band-width. These cavities offer high Q-factor/volume ratio, for the realization of optically12 and electrically13 pumped ultra-low threshold lasers and the enhancement of nonlinear effects.14-16 Furthermore, passive filters17 and modulators18-19 have been demonstrated, exhibiting ultra-narrow line-width, high free-spectral range and record values of low energy consumption.
To attain these exciting results, a robust repeatable fabrication protocol must be developed. In this paper we take an in-depth look at our fabrication protocol which employs electron-beam lithography for the definition of photonic crystal patterns and uses wet and dry etching techniques. Our optimised fabrication recipe results in photonic crystals that do not suffer from vertical asymmetry and exhibit very good edge-wall roughness. We discuss the results of varying the etching parameters and the detrimental effects that they can have on a device, leading to a diagnostic route that can be taken to identify and eliminate similar issues.
The key to evaluating slow light waveguides is the passive characterization of transmission and group index spectra. Various methods have been reported, most notably resolving the Fabry-Perot fringes of the transmission spectrum20-21 and interferometric techniques.22-25 Here, we describe a direct, broadband measurement technique combining spectral interferometry with Fourier transform analysis.26 Our method stands out for its simplicity and power, as we can characterise a bare photonic crystal with access waveguides, without need for on-chip interference components, and the setup only consists of a Mach-Zehnder interferometer, with no need for moving parts and delay scans.
When characterising photonic crystal cavities, techniques involving internal sources21 or external waveguides directly coupled to the cavity27 impact on the performance of the cavity itself, thereby distorting the measurement. Here, we describe a novel and non-intrusive technique that makes use of a cross-polarised probe beam and is known as resonant scattering (RS), where the probe is coupled out-of plane into the cavity through an objective. The technique was first demonstrated by McCutcheon et al.28 and further developed by Galli et al.29

Use of photonic crystal slow light waveguides and cavities has been widely adopted by the photonics community in many differing applications. Therefore fabrication and characterization of these devices are of great interest. This paper outlines our fabrication technique and two optical characterization methods, namely: interferometric (waveguides) and resonant scattering (cavities).

光子晶体慢光波导和腔体的制备与表征

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view ...

科研

工程学

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

空间密闭的复合氧化物制备

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Fabrication and Testing of Microfluidic Optomechanical Oscillators

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including microresonators. However, because of the increased acoustic radiative losses during direct liquid immersion of optomechanical devices, almost all published optomechanical experiments have been performed in solid phase. This paper discusses a recently introduced hollow microfluidic optomechanical resonator. Detailed methodology is provided to fabricate these ultra-high-Q microfluidic resonators, perform optomechanical testing, and measure radiation pressure-driven breathing mode and SBS-driven whispering gallery mode parametric vibrations. By confining liquids inside the capillary resonator, high mechanical- and optical- quality factors are simultaneously maintained.

Parametric optomechanical excitations have recently been experimentally demonstrated in microfluidic optomechanical resonators by means of optical radiation pressure and stimulated Brillouin scattering. This paper describes the fabrication of these microfluidic resonators along with methodologies for generating and verifying optomechanical oscillations.

制造和微流控光机振荡器测试

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including ...

Patterning via Optical Saturable Transitions - Fabrication and Characterization

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical Saturable Transitions (POST). In this technique the chemical properties of organic photochromic molecules that undergo single-photon reactions are exploited, enabling rapid top-down nanopatterning over large areas at low light intensities, thereby, allowing for the circumvention of the far-field diffraction barrier.4 Simple, cost-effective, high throughput and resolution alternatives to nanopatterning are being explored, such as, two-photon polymerization5,6, beam pen lithography (BPL)7, scanning electron beam lithography (SEBL), and focused ion beam (FIB) patterning. However, multi-photon approaches require high light intensities, which limit their potential for high throughput and offer low image contrast. Although, electron and ion beam lithographic processes offer increased resolution, the serial nature of the process is limited to slow writing speeds, which also prevents patterning of features over large areas. Beam-pen lithography is an approach towards parallel near-field optical lithography. However, the gap between the source of the beam and the surface of the photoresist needs to be controlled extremely precisely for good pattern uniformity and this is very challenging to accomplish for large arrays of beams. Patterning via Optical Saturable Transitions (POST) is an alternative optical nanopatterning technique for patterning sub-wavelength features1-3. Since this technique uses single photons instead of electrons, it is extremely fast and does not require high light intensities1-3, opening the door to massive parallelization.

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

通过光学吸收跃迁图案 - 制备与表征

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

制备与表征超导谐振器的

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing in combination with new nanofabrication techniques. A plasmon is a quantum of charge density oscillation that lends nanoscale metals such as gold and silver unique optical properties. In particular, gold and silver nanoparticles exhibit localized surface plasmon resonances-collective charge density oscillations on the surface of the nanoparticle-in the visible spectrum. Here, we focus on the fabrication of periodic arrays of anisotropic plasmonic nanostructures. These half-shell (or nanocup) structures can exhibit additional unique light-bending and polarization-dependent optical properties that simple isotropic nanostructures cannot. Researchers are interested in the fabrication of periodic arrays of nanocups for a wide variety of applications such as low-cost optical devices, surface-enhanced Raman scattering, and tamper indication. We present a scalable technique based on colloidal lithography in which it is possible to easily fabricate large periodic arrays of nanocups using spin-coating and self-assembled commercially available polymeric nanospheres. Electron microscopy and optical spectroscopy from the visible to near-infrared (near-IR) was performed to confirm successful nanocup fabrication. We conclude with a demonstration of the transfer of nanocups to a flexible, conformal adhesive film.

We demonstrate the fabrication of periodic gold nanocup arrays using colloidal lithographic techniques and discuss the importance of nanoplasmonic films.

用胶体光刻制备周期性金 Nanocup 阵列

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing ...

Fabrication of Superhydrophobic Metal Surfaces for Anti-Icing Applications

Several ways to produce superhydrophobic metal surfaces are presented in this work. Aluminum was chosen as the metal substrate due to its wide use in industry. The wettability of the produced surface was analyzed by bouncing drop experiments and the topography was analyzed by confocal microscopy. In addition, we show various methodologies to measure its durability and anti-icing properties. Superhydrophobic surfaces hold a special texture that must be preserved to keep their water-repellency. To fabricate durable surfaces, we followed two strategies to incorporate a resistant texture. The first strategy is a direct incorporation of roughness to the metal substrate by acid etching. After this surface texturization, the surface energy was decreased by silanization or fluoropolymer deposition. The second strategy is the growth of a ceria layer (after surface texturization) that should enhance the surface hardness and corrosion resistance. The surface energy was decreased with a stearic acid film.
The durability of the superhydrophobic surfaces was examined by a particle impact test, mechanical wear by lateral abrasion, and UV-ozone resistance. The anti-icing properties were explored by studying the ability to repeal subcooled water, freezing delay, and ice adhesion.

We illustrate several methodologies to produce superhydrophobic metal surfaces and to explore their durability and anti-icing properties.

防结冰用超疏水性金属表面的制备

Several ways to produce superhydrophobic metal surfaces are presented in this work. Aluminum was chosen as the metal substrate due to its wide use in ...

Fabrication of Soft Pneumatic Network Actuators with Oblique Chambers

Soft pneumatic network actuators have become one of the most promising actuation devices in soft robotics which benefits from their large bending deformation and low input. However, their monotonous bending motion form in two-dimensional (2-D) space keeps them away from wide applications. This paper presents a detailed fabrication method of soft pneumatic network actuators with oblique chambers, to explore their motions in three-dimensional (3-D) space. The design of oblique chambers enables actuators with tunable coupled bending and twisting capabilities, which gives them the possibility to move dexterously in flexible manipulators, to become biologically inspired robots and medical devices. The fabrication process is based on the molding method, including the silicone elastomer preparation, chamber and base parts fabrication, actuator assembly, tubing connections, checks for leaks, and actuator repair. The fabrication method guarantees the rapid manufacturing of a series of actuators with only a few modifications in the molds. The test results show the high quality of the actuators and their prominent bending and twisting capabilities. Experiments of the gripper demonstrate the advantages of the development in adapting to objects with different diameters and providing sufficient friction.

Here we present a fabrication method of soft pneumatic network actuators with oblique chambers. The actuators are capable of generating coupled bending and twisting motions, which broadens their application in soft robotics.

斜腔软气动网络驱动器的研制

Soft pneumatic network actuators have become one of the most promising actuation devices in soft robotics which benefits from their large bending ...

Scalable Stamp Printing and Fabrication of Hemiwicking Surfaces

Hemiwicking is a process where a fluid wets a patterned surface beyond its normal wetting length due to a combination of capillary action and imbibition. This wetting phenomenon is important in many technical fields ranging from physiology to aerospace engineering. Currently, several different techniques exist for fabricating hemiwicking structures. These conventional methods, however, are often time consuming and are difficult to scale-up for large areas or are difficult to customize for specific, nonhomogeneous patterning geometries. The presented protocol provides researchers with a simple, scalable, and cost-effective method for fabricating micro-patterned hemiwicking surfaces. The method fabricates wicking structures through the use of stamp printing, polydimethylsiloxane (PDMS) molding, and thin-film surface coatings. The protocol is demonstrated for hemiwicking with ethanol on PDMS micropillar arrays coated with a 70 nm thick aluminum thin-film.

A simple protocol is provided for the fabrication of hemiwicking structures of varying sizes, shapes, and materials. The protocol uses a combination of physical stamping, PDMS molding, and thin-film surface modifications via common materials deposition techniques.

可缩放邮票印刷及不堪砌面的制作

Hemiwicking is a process where a fluid wets a patterned surface beyond its normal wetting length due to a combination of capillary action and imbibition. ...

Fabrication and Design of Wood-Based High-Performance Composites

Delignified densified wood is a new promising and sustainable material that possesses the potential to replace synthetic materials, such as glass fiber reinforced composites, due to its excellent mechanical properties. Delignified wood, however, is rather fragile in a wet state, which makes handling and shaping challenging. Here we present two fabrication processes, closed-mold densification and vacuum densification, to produce high-performance cellulose composites based on delignified wood, including an assessment of their advantages and limitations. Further, we suggest strategies for how the composites can be re-used or decomposed at the end-of-life cycle. Closed-mold densification has the advantage that no elaborate lab equipment is needed. Simple screw clamps or a press can be used for densification. We recommend this method for small parts with simple geometries and large radii of curvature. Vacuum densification in an open-mold process is suitable for larger objects and complex geometries, including small radii of curvature. Compared to the closed-mold process, the open-mold vacuum approach only needs the manufacture of a single mold cavity.

Delignified densified wood represents a new promising lightweight, high-performance and bio-based material with great potential to partially substitute natural fiber reinforced- or glass fiber reinforced composites in the future. We here present two versatile fabrication routes and demonstrate the possibility to create complex composite parts.

基于木材的高性能复合材料的制造与设计

Delignified densified wood is a new promising and sustainable material that possesses the potential to replace synthetic materials, such as glass fiber ...