1. Preparación del soporte <ol><li> Cortar 1 cm x 1 cm sustratos de silicio de una oblea de Si, el silicio es bueno para la caracterización SEM (vista en planta y sección transversal). </li><li> Cortar 1 cm x 1 cm de vidrio (de sosa y cal, 1 mm de espesor), el vidrio es óptima para la caracterización óptica y eléctrica. </li><li> Si los contactos se necesitan sobre sustratos de vidrio, contactos Au puede ser evaporado en vacío mediante el uso de una máscara. Depósito 10 nm de Cr como capa intermedia para mejorar la adhesión de Au, depósito de 50 nm de Au. </li><li> Cortar 1 cm x 1 cm de la muestra de polímero (por ejemplo, etileno tetrafluoroetileno, ETFE). </li><li> Limpie los substratos mediante sonicación en isopropanol durante 5-10 minutos y enjuagar con isopropanol y seco, con un flujo de N2. </li></ol> 2. Alineación Láser y Selección de parámetros del láser <ol><li> Un calentamiento del láser Nd: YAG y de selección de emisión IV armónico (266 nm longitud de onda) mediante el uso de un generador de cuarto armónico (FHG) constituida por dos síClimatizador de generadores de armónicos (SHG) en cascada. </li><li> Montar un peso del 2%. Al 2 O 3:. ZnO objetivo circular (2 &quot;de diámetro) en el manipulador de destino Alinear el punto de láser en el centro de la diana, iniciar la rotación de destino y de la traducción y establecer el rango vertical máxima Compruebe que el punto de láser nunca toca el externo. anillo de acero utilizado para fijar el objetivo. El objetivo se mueve con un movimiento de roto-traslación para una ablación uniforme de la superficie objetivo en su conjunto. </li><li> Seleccione tasa de repetición (por ejemplo, 10 Hz) y energía de pulso (por ejemplo, 75 mJ). Ajuste pulso de energía láser y la estabilidad del monitor por un medidor de potencia. </li><li> Mover la lente de enfoque hasta una posición seleccionada y el uso de una hoja de papel sensible unido al objetivo para medir el tamaño del punto. Para cualquier posición de los disparos por lentes fuego láser 1-5 en el papel. Seleccione una posición de la lente para tener una fluencia del láser de aproximadamente 1 J / cm 2. </li></ol> 3. La creación de un PLDSelección de parámetros de deposición d <ol><li> Alineación de la posición de sustrato <ol><li> Montar una hoja de papel circular alrededor de 2 &quot;de diámetro como sustrato para pruebas de alineación. </li><li> Mueva el soporte de sustrato a una distancia a la diana-a-sustrato TS d = 50 mm. </li><li> Empiece a bombear hacia abajo de la cámara de bombas turbomolecular primaria y hasta el nivel de vacío alcanza 10 -2 Pa </li><li> Seleccione un tipo de gas (oxígeno por ejemplo) y ajustar la velocidad de bombeo y flujo de gas para que la presión de gas adecuada (véanse las secciones 4 y 5). Ajuste de la posición xy del manipulador sustrato fuera del eje con respecto al centro de la pluma para obtener el espesor de película uniforme sobre una corona circular. </li><li> Comience ablación mediante la eliminación de la viga tapón / medidor de potencia. Si el destino es nuevo o si no se usa durante mucho tiempo, esta ablación usada es necesario limpiar el objetivo. </li><li> Detener la ablación cuando un depósito se puede ver en el paper mirando desde una ventana. </li></ol></li><li> Determinación de la longitud de la pluma de plasma <ol><li> Siga los pasos 3.1.1. a 3.1.5, durante la ablación tomar fotos con una cámara digital con 0,5 - 1 vez acumulación sa media en plasma plumas diferentes. </li><li> Medir la longitud de plasma del penacho visible de las imágenes que toman d TS como referencia (véase la Figura 3). </li></ol></li><li> La calibración del espesor de la película <ol><li> Mueva el sustrato lejos de la diana (es decir, 100 mm y más) y mover el cuarzo Micro-Balance (QCM) a una distancia igual a d TS de la diana. </li><li> Depósito 1000 disparos láser (es decir, 1 &#39;40&#39;&#39;) y medir el valor de la masa depositada, a continuación, mueva el QCM distancia. </li><li> Montar un substrato de Si como en 1.1. </li><li> Depositar una muestra de ensayo (por ejemplo, 18.000 disparos de láser, es decir, 30 &#39;) y el uso de las secciones transversales imágenes de SEM a calibrate la tasa de deposición (nm / pulso). </li></ol></li></ol> 4. La deposición de películas nanoingeniería AZO <ol><li> Montar los sustratos preparados como en la sección 1 en el manipulador soporte de la muestra mediante el uso de cinta adhesiva. </li><li> Siga los pasos 3.1.2 - 3.1.3. </li><li> Inicie la rotación del sustrato. </li><li> La deposición de películas compactas AZO <ol><li> Conectar la pistola de iones y la energía de iones en el conjunto 100 eV, la potencia RF en 75-100 W y flujo de gas Ar en 20 sccm (la presión está en el rango de 10 -2 Pa). Sustratos limpios con Ar + pistola de iones durante 5-10 minutos. Después de la entrada de gas de limpieza por tratamiento estrecha y bombear la cámara para retirar argón. </li><li> Inserte gas oxígeno y ajustar la velocidad de bombeo y el flujo de gas a tener 2 Pa oxígeno. </li><li> iniciar la ablación y depósito para 18.000 disparos (30 &#39;). Durante el registro de ablación que la longitud de la pluma es el mismo que se determinó en el paso 3,2. </li><li> detener la ablación, cerca gcomo entrada, bombee la cámara. </li></ol></li><li> La deposición de películas AZO jerárquicamente estructurados <ol><li> Inserte gas oxígeno y ajustar la velocidad de bombeo y el flujo de gas a tener 160 Pa oxígeno. </li><li> iniciar la ablación y depósito para 18.000 disparos (30 &#39;). Durante el registro de ablación que la longitud de la pluma es el mismo que se determinó en el paso 3,2. </li><li> detener la ablación, cerca de la entrada de gas, evacue la cámara. </li></ol></li><li> Purgar la cámara y extraer muestras </li></ol> 5. Caracterización Eléctrica y Óptica <ol><li> Medir las propiedades de transporte en el plano utilizando cuatro sondas técnicas (es decir, Van der Pauw método). Ver la Figura 4 para un esquema de los contactos. Los valores típicos de la corriente de la sonda están en la μA 1 a 10 mA. Las mediciones se realizaron sobre un área de la muestra reducida a 0,7 cm x 0,7 cm para asegurar una mejor uniformidad de espesor (aproximadamente 5%). </li><li> Mida la óptical transmitancia de la muestra y del sustrato desnudo. Corregir los espectros para la contribución sustrato estableciendo en 1 la intensidad en la interfase vidrio / película. Para un procedimiento de corrección precisa asegurarse de que la muestra se monta con el sustrato de cristal hacia el haz incidente. Determinar la transparencia de la luz visible mediante el cálculo de la transmitancia media en el intervalo de 400-700 nm. Utilice una esfera de diámetro 150 mm para medir la integración de la fracción de dispersión de la luz, el factor de Haze se puede calcular dividiendo la fracción dispersada por la luz total transmitida (es decir, dispersada y transmitida hacia adelante), ver Figura 5. </li></ol>

<ol>
	<li>Chrisey, D. B., Hubler, G. K. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Pulsed Laser Deposition of Thin Films. , (1994).</li><li>Lowndes, D. H., Geohegan, D. B., Puretzky, A. A., Norton, D. P., Rouleau, C. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Synthesis+of+novel+thin-film+materials+by+pulsed+laser+deposition.">Synthesis of novel thin-film materials by pulsed laser deposition.</a> Science. 273, 898 (1996).</li><li>Di Fonzo, F., Bailini, A., Russo, V., Baserga, A., Cattaneo, D., Beghi, M. G., Ossi, P. M., Casari, C. S., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Synthesis+and+characterization+of+nanostructured+tungsten+and+tungsten+oxide+films.">Synthesis and characterization of nanostructured tungsten and tungsten oxide films.</a> Catalysis Today. 116, 69-73 (2006).</li><li>Casari, C. S., Foglio, S., Passoni, M., Siviero, F., Bottani, C. E., Li Bassi, A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Energetic+regimes+and+growth+mechanisms+of+pulsed+laser+deposited+Pd+clusters+on+Au(111)+investigated+by+in+situ+Scanning+Tunneling+Microscopy.">Energetic regimes and growth mechanisms of pulsed laser deposited Pd clusters on Au(111) investigated by in situ Scanning Tunneling Microscopy.</a> Physical Review B. 84 (111), 155441 (2011).</li><li>Cattaneo, D., Foglio, S., Casari, C. S., Li Bassi, A., Passoni, M., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Different+W+cluster+deposition+regimes+in+pulsed+laser+ablation+observed+by+in+situ+Scanning+Tunneling+Microscopy.">Different W cluster deposition regimes in pulsed laser ablation observed by in situ Scanning Tunneling Microscopy.</a> Surface Science. 601, 1892-1897 (2007).</li><li>Bailini, A., Di Fonzo, F., Fusi, M., Casari, C. S., Li Bassi, A., Russo, V., Baserga, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Pulsed+laser+deposition+of+tungsten+and+tungsten+oxide+thin+films+with+tailored+structure+at+the+nano-+and+mesoscale.">Pulsed laser deposition of tungsten and tungsten oxide thin films with tailored structure at the nano- and mesoscale.</a> Applied Surface Science. 253, 8130-8135 (2007).</li><li>Fusi, M., Russo, V., Casari, C. S., Li Bassi, A., A, C. E., Bottani, <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Titanium+oxide+nanostructured+films+by+reactive+pulsed+laser+deposition.">Titanium oxide nanostructured films by reactive pulsed laser deposition.</a> Applied Surface Science. 255 (10), 5334-5337 (2009).</li><li>Dellasega, D., Facibeni, A., Fonzo, F. D. i., Russo, V., Conti, C., Ducati, C., Casari, C. S., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanostructured+High+Valence+Silver+Oxide+Produced+by+Pulsed+laser+Deposition.">Nanostructured High Valence Silver Oxide Produced by Pulsed laser Deposition.</a> Applied Surface Science. 255 (10), 5248-5251 (2009).</li><li>Di Fonzo, F., Tonini, D., Li Bassi, A., Casari, C. S., Beghi, M. G., Bottani, C. E., Gastaldi, D., Vena, P., Contro, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Growth+regimes+in+pulsed+laser+deposition+of+alumina+films.">Growth regimes in pulsed laser deposition of alumina films.</a> Applied Physics A. 93, 765-769 (2008).</li><li>Bailini, A., Donati, F., Zamboni, M., Russo, V., Passoni, M., Casari, C. S., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Pulsed+Laser+Deposition+of+Bi2Te3+Thermoelectric+Films.">Pulsed Laser Deposition of Bi2Te3 Thermoelectric Films.</a> Applied Surface Science. 254, 1249-1254 (2007).</li><li>Baserga, A., Russo, V., Fonzo, F. D. i., Bailini, A., Cattaneo, D., Casari, C. S., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanostructured+Tungsten+Oxide+With+Controlled+Properties:+Synthesis+And+Raman+Characterization.">Nanostructured Tungsten Oxide With Controlled Properties: Synthesis And Raman Characterization.</a> Thin Solid Films. 515, 6465-6469 (2007).</li><li>Dellasega, D., Facibeni, A., Di Fonzo, F., Bogana, M., Polissi, A., Conti, C., Ducati, C., Casari, C. S., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanostructured+Ag4O4+films+with+enhanced+antibacterial+activity.">Nanostructured Ag4O4 films with enhanced antibacterial activity.</a> Nanotechnology. 19, 475602 (2008).</li><li>Fonzo, F. D. i., Casari, C. S., Russo, V., Brunella, M. F., Li Bassi, A., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Hierarchically+organized+nanostructured+TiO2+for+photocatalysis+applications.">Hierarchically organized nanostructured TiO2 for photocatalysis applications.</a> Nanotechnology. 20, 015604 (2009).</li><li>Torta, F., Fusi, M., Casari, C. S., Bottani, C. E., Bachi, A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Titanium+Dioxide+Coated+MALDI+plate+for+on+target+Analysis+of+Phosphopeptides.">Titanium Dioxide Coated MALDI plate for on target Analysis of Phosphopeptides.</a> Journal of Proteome Research. 8, 1932-1942 (2009).</li><li>Ponzoni, A., Russo, V., Bailini, A., Casari, C. S., Ferroni, M., Li Bassi, A., Migliori, A., Morandi, V., Ortolani, L., Sberveglieri, G., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Structural And Gas-Sensing Characterization Of Tungsten Oxide Nanorods And Nanoparticles. Sensors &amp; Actuators: B. Chemical B. 153, 340-346 (2011).</li><li>Li Bassi, A., Bailini, A., Donati, F., Russo, V., Passoni, M., Mantegazza, A., Casari, C. S., Bottani, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Thermoelectric+properties+of+Bi-Te+Films+with+controlled+structure+and+morphology.">Thermoelectric properties of Bi-Te Films with controlled structure and morphology.</a> Journal of Applied Physics. 105, 124307 (2009).</li><li>Sauvage, F., Di Fonzo, F., Li Bassi, A., Casari, C. S., Russo, V., Divitini, G., Ducati, C., Bottani, C. E., Comte, P., Graetzel, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Bio-inspired+hierarchical+TiO2+photo-anode+for+dye-sensitized+solar+cells.">Bio-inspired hierarchical TiO2 photo-anode for dye-sensitized solar cells.</a> Nano Letters. 10, 2562-2567 (2010).</li><li>Grankvist, C. G. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Transparent+conductors+as+solar+energy+materials:+A+panoramic+review.">Transparent conductors as solar energy materials: A panoramic review.</a> Solar Energy Materials &amp; Solar Cells. 91, 1529 (2007).</li><li>Minami, T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Transparent+conducting+oxide+semiconductors+for+transparent+electrodes.">Transparent conducting oxide semiconductors for transparent electrodes.</a> Semicond. Sci. Technol. 20, S35 (2005).</li><li>Fortunato, E., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Transparent+Conducting+Oxides+for+Photovoltaics.">Transparent Conducting Oxides for Photovoltaics.</a> MRS Bulletin. 32, 242 (2007).</li><li>Exarhos, G. J., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Discovery-based+design+of+transparent+conducting+oxide+films.">Discovery-based design of transparent conducting oxide films.</a> Thin Solid Films. 515, 7025 (2007).</li><li>Gondoni, P., Ghidelli, M., Fonzo, F. D. i., Russo, V., Bruno, P., Mart-Rujas, J., Bottani, C. E., Li Bassi, A., Casari, C. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Structural+and+functional+properties+of+Al:ZnO+thin+films+grown+by+Pulsed+Laser+Deposition+at+room+temperature.">Structural and functional properties of Al:ZnO thin films grown by Pulsed Laser Deposition at room temperature.</a> Thin Solid Films. 520, 4707-4711 (2012).</li><li>Gondoni, P., Ghidelli, M., Fonzo, F. D. i., Carminati, M., Russo, V., Li Bassi, A., Casari, C. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Structure-dependent+optical+and+electrical+transport+properties+of+nanostructured+Al-doped+ZnO.">Structure-dependent optical and electrical transport properties of nanostructured Al-doped ZnO.</a> Nanotechnology. 23, 365706 (2012).</li><li>Casari, C. S., Li Bassi, A., Arkin, W. T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Pulsed+Laser+Deposition+of+Nanostructured+Oxides:+from+Clusters+to+Functional+Films.">Pulsed Laser Deposition of Nanostructured Oxides: from Clusters to Functional Films.</a> Advances in Laser and Optics Research. 7, 65-100 (2012).</li><li>Amoruso, S., Sambri, A., Vitiello, M., Wang, X. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plume+expansion+dynamics+during+laser+ablation+of+manganates+in+oxygen+atmosphere.">Plume expansion dynamics during laser ablation of manganates in oxygen atmosphere.</a> Applied Surface Science. 252, 4712-4716 (2006).</li><li>Uccello, A., Dellasega, D., Perissinotto, S., Lecis, N., Passoni, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanostructured+Rhodium+Films+for+Advanced+Mirrors+Produced+by+Pulsed+Laser+Deposition.">Nanostructured Rhodium Films for Advanced Mirrors Produced by Pulsed Laser Deposition.</a> Journal of Nuclear Materials. , (2013).</li><li>Gondoni, P., Ghidelli, M., Fonzo, F. D. i., Russo, V., Bruno, P., Mart&#237;-Rujas, J., Bottani, C. E., Li Bassi, A., Casari, C. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Highly+Performing+Al:ZnO+Thin+Films+grown+by+Pulsed+Laser+Deposition+at+Room+Temperature.">Highly Performing Al:ZnO Thin Films grown by Pulsed Laser Deposition at Room Temperature.</a> Nanoscience and Nanotechnology. , (2013).</li></ol>

No hay conflictos de interés declarado.

La forma de pluma de plasma está estrechamente relacionado con el proceso de ablación, especialmente en presencia de un gas, el seguimiento de la pluma de plasma mediante inspección visual es importante para controlar la deposición. Al depositar un óxido de metal mediante la ablación de un blanco de óxido, el oxígeno es necesario para compensar las pérdidas de oxígeno durante el proceso de ablación. Al disminuir la presión de oxígeno de gas de fondo, el material depositado puede tener vacantes de oxígeno. ...

Deposición por láser pulsado (PLD) emplea la ablación con láser de un blanco sólido que resulta en la formación de un plasma de especies de ablación que pueden ser depositados sobre un sustrato para crecer una película (véase la Figura 1) 1. Interacción con una atmósfera de fondo (inerte o reactivo) se puede utilizar para inducir la nucleación homogénea de clúster en la fase de gas (véase la Figura 2) 2,3. Nuestra estrategia para la síntesis de material por PLD se basa en el ajuste de las propiedades del material en un enfoque de abajo arriba al controlar cuidadosamente la dinámica del plasma generado en el proceso de PLD. Tamaño de clúster, la energía cinética y la composición se puede variar por un ajuste adecuado de los parámetros de deposición que afectan el crecimiento de la película y dan como resultado cambios 4,5 morfológicas y estructurales. Al explotar el método descrito aquí se demuestra, por un número de óxidos (por ejemplo, WO 3, 4 O 4 Ag, Al 2 O 3 unand TiO 2), la capacidad para sintonizar la morfología, la densidad, la porosidad, el grado de orden estructural, la estequiometría y fase mediante la modificación de la estructura del material en la nanoescala 6-11. Esto permite el diseño de materiales para aplicaciones específicas 12-16. Con referencia a las aplicaciones fotovoltaicas, se sintetizó nanoestructurada TiO 2 se organizan jerárquicamente por nanopartículas de montaje (&lt;10 nm) en un nano-y mesoestructura que se asemeja a una &quot;bosque de los árboles 13 &#39;que muestra resultados interesantes cuando se emplea como photoanodes en células solares de colorante sensibilizadas (DSSC ) 17. Basándose en estos resultados anteriores se describe el protocolo para la deposición de Al-ZnO dopada (AZO) las películas como un óxido conductor transparente. Óxidos conductores transparentes (TCOs) son bandgap alta (&gt; 3 eV) transformar en materiales conductores por dopaje pesado, mostrando resistividad &lt;10 -3 ohm-cm y más de 80% óptica transmittance en el rango visible. Ellos son un elemento clave para muchas aplicaciones tales como pantallas táctiles y células solares 18-21 y que se cultivan normalmente por diferentes técnicas, tales como la deposición de pulverización catódica, láser pulsado, la deposición química en fase vapor, la pirólisis de pulverización y con métodos químicos basados ​​en soluciones. Entre las TCO, indio-estaño-óxido (ITO) ha sido ampliamente estudiado por su baja resistividad, pero adolece del inconveniente del alto coste y baja disponibilidad de indio. La investigación se orienta ahora hacia indio sistemas libres tales como dopado con F SnO 2 (FTO), Al-ZnO dopado (AZO) y ZnO dopado con F (FZO). Los electrodos capaces de proporcionar una gestión inteligente de la luz incidente (retención de la luz) son particularmente interesantes para aplicaciones fotovoltaicas. Para aprovechar la posibilidad de dispersar la luz visible a través de las estructuras y morfologías moduladas en una escala comparable a la longitud de onda de la luz (por ejemplo, 300-1,000 nm), un buen control de lamorfología de la película y en arquitecturas de ensamblaje de racimo que se necesita. En particular, se describe cómo ajustar la morfología y la estructura de las películas AZO. Compacto AZO depositados a baja presión (2 oxígeno Pa) a temperatura ambiente y se caracteriza por una baja resistividad (4,5 x 10 cm ohmios -4) y transparencia a la luz visible (&gt; 90%) que es competitivo con AZO depositado a altas temperaturas, mientras AZO estructuras jerárquicas se obtienen mediante la ablación en O 2 presiones por encima de 100 Pa. Estas estructuras muestran una capacidad de dispersión de luz fuerte con factor de turbidez de hasta 80% y más 22,23.

<table border="1"><tbody><tr><td> Nombre del reactivo / material </td><td> Empresa </td><td> Número de Catálogo </td></tr><tr><td> Láser Pulsado </td><td> Continuum-Quantronix </td><td> Powerlite 8010 </td></tr><tr><td> Medidor de potencia </td><td> Coherente </td><td> FieldMaxII-A </td></tr><tr><td> Ion Gun </td><td> Mantis Dep </td><td> RFMax60 </td></tr><tr><td> Controlador de flujo de masa </td><td> Mks </td><td> 2179 ° </td></tr><tr><td> Microbalanza de cristal de cuarzo </td><td> Infcon </td><td> XTC / 2 </td></tr><tr><td> Antecedentes gas </td><td> Rivoira-Praxair </td><td> 5.0 oxígeno </td></tr><tr><td> Objetivo </td><td> Kurt Lesker </td><td> (Hecho a pedido) </td></tr><tr><td> Isopropanol </td><td> Sigma Aldrich </td><td> 190764-2L </td></tr><tr><td> Fuente metros </td><td> Keithley </td><td> K2400 </td></tr><tr><td> Magnet Kit </td><td> Ecopia </td><td> 0.55T-Kit </td></tr><tr><td> Espectrofotómetro </td><td> PerkinElmer </td><td> Lambda 1050 </td></tr></tbody></table>

fabrication of nano-engineered transparent conducting oxides by pulsed laser deposition

Deposición nanosegundo Láser Pulsado (PLD) en presencia de un gas de fondo permite la deposición de óxidos metálicos con morfología sintonizable, la estructura, la densidad y la estequiometría por un adecuado control de la dinámica de la expansión del plasma del penacho. Esta versatilidad puede ser explotado para producir películas nanoestructuradas de nanoporoso compacto y denso para caracterizado por un conjunto jerárquico de tamaño nano-clusters. En particular, se describe la metodología detallada para fabricar dos tipos de Al-ZnO dopada (AZO) películas como electrodos transparentes en dispositivos fotovoltaicos: 1) a baja presión 2 O, películas compactas con conductividad eléctrica y transparencia óptica estrecha con el estado de la técnica óxidos conductores transparentes (TCO) se puede depositar a temperatura ambiente, para ser compatible con materiales térmicamente sensibles tales como los polímeros usados ​​en la fotovoltaica orgánica (OPV), 2) la gran dispersión de la luz estructuras jerárquicas se asemejan a un bosque de nano-árboles son produced a presiones más altas. Estas estructuras muestran factor de Haze alta (&gt; 80%) y puede ser explotado para mejorar la capacidad de retención de la luz. El método aquí descrito para películas AZO se puede aplicar a otros óxidos metálicos pertinentes para las aplicaciones tecnológicas tales como TiO 2, Al 2 O 3, WO 3 y Ag 4 O 4.

La deposición de AZO por PLD en atmósfera de oxígeno produce compactos películas transparentes conductoras a baja presión de gas de fondo (es decir, 2 Pa) y mesoporosos como bosques estructuras constituidas por agrupaciones jerárquicamente reunidos a altas presiones (es decir, 160 Pa). El material está constituido por los dominios nanocristalinos cuyo tamaño es máximo (30 nm) a 2 Pa 22. Debido a las colisiones entre las especies de ablación y el gas de ...

Watch this Scientific Journal Video about Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition at JoVE.com

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Se describe el método experimental para depositar películas delgadas de óxido nanoestructurados por deposición por láser pulsado nanosegundo (PLD) en presencia de un gas de fondo. Mediante el uso de este método Al-ZnO dopada (AZO) películas, desde los compactos hasta jerárquicamente estructurada como bosques nano-árbol, pueden ser depositados.

La fabricación de nano-ingeniería óxidos conductores transparentes por deposición por láser pulsado

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

fabrication-nano-engineered-transparent-conducting-oxides-pulsed

Research

JoVE Journal

Engineering

15.4K vistas.  Politecnico di Milano. Se describe el método experimental para depositar películas delgadas de óxido nanoestructurados por deposición por láser pulsado nanosegundo (PLD) en presencia de un gas de fondo. Mediante el uso de este método Al-ZnO dopada (AZO) películas, desde los compactos hasta jerárquicamente estructurada como bosques nano-árbol, pueden ser depositados.

Video: Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Investigation of Early Plasma Evolution Induced by Ultrashort Laser Pulses

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a significant role in laser-material interaction, especially in the air environment1-11.
Early plasma evolution has been captured through pump-probe shadowgraphy1-3 and interferometry1,4-7. However, the studied time frames and applied laser parameter ranges are limited. For example, direct examinations of plasma front locations and electron number densities within a delay time of 100 picosecond (ps) with respect to the laser pulse peak are still very few, especially for the ultrashort pulse of a duration around 100 femtosecond (fs) and a low power density around 1014 W/cm2. Early plasma generated under these conditions has only been captured recently with high temporal and spatial resolutions12. The detailed setup strategy and procedures of this high precision measurement will be illustrated in this paper. The rationale of the measurement is optical pump-probe shadowgraphy: one ultrashort laser pulse is split to a pump pulse and a probe pulse, while the delay time between them can be adjusted by changing their beam path lengths. The pump pulse ablates the target and generates the early plasma, and the probe pulse propagates through the plasma region and detects the non-uniformity of electron number density. In addition, animations are generated using the calculated results from the simulation model of Ref. 12 to illustrate the plasma formation and evolution with a very high resolution (0.04 ~ 1 ps).
Both the experimental method and the simulation method can be applied to a broad range of time frames and laser parameters. These methods can be used to examine the early plasma generated not only from metals, but also from semiconductors and insulators.

An experimental method to examine the early plasma evolution induced by ultrashort laser pulses is described. Using this method, high quality images of early plasma are obtained with high temporal and spatial resolutions. A novel integrated atomistic model is used to simulate and explain the mechanisms of early plasma.

Investigación de la Evolución de plasma precoz inducida por pulsos láser ultracortos

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a ...

Investigación

Ingeniería

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

La fabricación de óxidos complejos espacialmente confinados

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Making Record-efficiency SnS Solar Cells by Thermal Evaporation and Atomic Layer Deposition

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent thermal evaporation, and it absorbs visible light strongly. However, for a long time the record power conversion efficiency of SnS solar cells remained below 2%. Recently we demonstrated new certified record efficiencies of 4.36% using SnS deposited by atomic layer deposition, and 3.88% using thermal evaporation. Here the fabrication procedure for these record solar cells is described, and the statistical distribution of the fabrication process is reported. The standard deviation of efficiency measured on a single substrate is typically over 0.5%. All steps including substrate selection and cleaning, Mo sputtering for the rear contact (cathode), SnS deposition, annealing, surface passivation, Zn(O,S) buffer layer selection and deposition, transparent conductor (anode) deposition, and metallization are described. On each substrate we fabricate 11 individual devices, each with active area 0.25 cm2. Further, a system for high throughput measurements of current-voltage curves under simulated solar light, and external quantum efficiency measurement with variable light bias is described. With this system we are able to measure full data sets on all 11 devices in an automated manner and in minimal time. These results illustrate the value of studying large sample sets, rather than focusing narrowly on the highest performing devices. Large data sets help us to distinguish and remedy individual loss mechanisms affecting our devices.

Tin sulfide (SnS) is a candidate material for Earth-abundant, non-toxic solar cells. Here, we demonstrate the fabrication procedure of the SnS solar cells employing atomic layer deposition, which yields 4.36% certified power conversion efficiency, and thermal evaporation which yields 3.88%.

Haciendo eficiencia Registro SnS Células solares por evaporación térmica y la deposición de capas atómicas

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent ...

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of biosensing devices. We report on a protocol of using KrF and ArF lasers irradiating Si (001) samples immersed in a liquid environment with low number of pulses and operating at moderately low pulse fluences to induce Si wettability modification. Wafers immersed for up to 4 hr in a 0.01% H2O2/H2O solution did not show measurable change in their initial contact angle (CA) ~75&#176;. However, the 500-pulse KrF and ArF lasers irradiation of such wafers in a microchamber filled with 0.01% H2O2/H2O solution at 250 and 65 mJ/cm2, respectively, has decreased the CA to near 15&#176;, indicating the formation of a superhydrophilic surface. The formation of OH-terminated Si (001), with no measurable change of the wafer&#8217;s surface morphology, has been confirmed by X-ray photoelectron spectroscopy and atomic force microscopy measurements. The selective area irradiated samples were then immersed in a biotin-conjugated fluorescein-stained nanospheres solution for 2 hr, resulting in a successful immobilization of the nanospheres in the non-irradiated area. This illustrates the potential of&#160;the method for selective area biofunctionalization and fabrication of advanced Si-based biosensing architectures. We also describe a similar protocol of irradiation of wafers immersed in methanol (CH3OH) using ArF laser operating at pulse fluence of 65 mJ/cm2 and in situ formation of a strongly hydrophobic surface of Si (001) with the CA of 103&#176;. The XPS results indicate ArF laser induced formation of Si&#8211;(OCH3)x compounds responsible for the observed hydrophobicity. However, no such compounds were found by XPS on the Si surface irradiated by KrF laser in methanol, demonstrating the inability of the KrF laser to photodissociate methanol and create -OCH3 radicals.

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with&#160;H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

Área selectivo Modificación de humectabilidad de la superficie del silicio por pulsos láser UV irradiación en Ambiente Líquido

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of ...

Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using femtosecond laser-induced ablation. We show that thousands of periodic nano-craters are fabricated on an optical nanofiber by irradiating with just a single femtosecond laser pulse. For a typical sample, periodic nano-craters with a period of 350 nm and with diameter gradually varying from 50 - 250 nm over a length of 1 mm are fabricated on a nanofiber with diameter around 450 - 550 nm. A key aspect of such a nanofabrication is that the nanofiber itself acts as a cylindrical lens and focuses the femtosecond laser beam on its shadow surface. Moreover, the single-shot fabrication makes it immune to mechanical instabilities and other fabrication imperfections. Such periodic nano-craters on nanofiber, act as a 1-D PhC and enable strong and broadband reflection while maintaining the high transmission out of the stopband. We also present a method to control the profile of the nano-crater array to fabricate apodized and defect-induced PhC cavities on the nanofiber. The strong confinement of the field, both transverse and longitudinal, in the nanofiber-based PhC cavities and the efficient integration to the fiber networks, may open new possibilities for nanophotonic applications and quantum information science.

We present a protocol for fabricating 1-D photonic crystal cavities on subwavelength diameter silica fibers (optical nanofibers) using femtosecond laser-induced ablation.

La fabricación de 1-D de cristal fotónico cavidad en un nanofibras Uso de ablación inducida por láser de femtosegundo

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

Fabricación de microesferas de polímero para aplicaciones de resonador óptico y láser

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a polymer film. This paper also presents a low-cost, vacuum-free fabrication method for this novel TE; the approach combines lithography, electroplating, and imprint transfer (LEIT) processing. The embedded nature of the EMTEs offers many advantages, such as high surface smoothness, which is essential for organic electronic device production; superior mechanical stability during bending; favorable resistance to chemicals and moisture; and strong adhesion with plastic film. LEIT fabrication features an electroplating process for vacuum-free metal deposition and is favorable for industrial mass production. Furthermore, LEIT allows for the fabrication of metal mesh with a high aspect ratio (i.e., thickness to linewidth), significantly enhancing its electrical conductance without adversely losing optical transmittance. We demonstrate several prototypes of flexible EMTEs, with sheet resistances lower than 1 &#937;/sq and transmittances greater than 90%, resulting in very high figures of merit (FoM) &#8211; up to 1.5 x 104 &#8211; which are amongst the best values in the published literature.

This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.

Estrategia escalable de fabricación procesada por soluciones para electrodos transparentes de alto rendimiento y flexibles con malla metálica integrada

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

Fabricación de películas ultra delgadas Color con altamente absorbente de los medios de comunicación mediante deposición oblicua

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

Production of Single Tracks of Ti-6Al-4V by Directed Energy Deposition to Determine the Layer Thickness for Multilayer Deposition

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal powder is injected as particles. In general, this technique is employed to either fabricate or repair different components. In this technique, the final characteristics are affected by many factors. Indeed, one of the main tasks in building components by DED is the optimization of process parameters (such as laser power, laser speed, focus, etc.) which is usually carried out through an extensive experimental investigation. However, this sort of experiment is extremely lengthy and costly. Thus, in order to accelerate the optimization process, an investigation was conducted to develop a method based on the melt pool characterizations. In fact, in these experiments, single tracks of Ti-6Al-4V were deposited by a DED process with multiple combinations of laser power and laser speed. Surface morphology and dimensions of single tracks were analyzed, and geometrical characteristics of melt pools were evaluated after polishing and etching the cross-sections. Helpful information regarding the selection of optimal process parameters can be achieved by examining the melt pool features. These experiments are being extended to characterize the larger blocks with multiple layers. Indeed, this manuscript describes how it would be possible to quickly determine the layer thickness for the massive deposition, and avoid over or under-deposition according to the calculated energy density of the optimum parameters. Apart from the over or under-deposition, time and materials saving are the other great advantages of this approach in which the deposition of multilayer components can be started without any parameter optimization in terms of layer thickness.

In this research, a rapid method based on melt pool characterization is developed to estimate the layer thickness of Ti-6Al-4V components produced by directed energy deposition.

Producción de pistas individuales de Ti-6Al-4V por deposición de energía dirigida a determinar el espesor de la capa de deposición multicapa

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal ...

Generation and Coherent Control of Pulsed Quantum Frequency Combs

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional states on-chip in a practical way have remained elusive due to the increasing complexity of the quantum circuitry needed to prepare and process such states. Here, we outline how high-dimensional, frequency-bin entangled, two-photon states can be generated at a stable, high generation rate by using a nested-cavity, actively mode-locked excitation of a nonlinear micro-cavity. This technique is used to produce pulsed quantum frequency combs. Moreover, we present how the quantum states can be coherently manipulated using standard telecommunications components such as programmable filters and electro-optic modulators. In particular, we show in detail how to accomplish state characterization measurements such as density matrix reconstruction, coincidence detection, and single photon spectrum determination. The presented methods form an accessible, reconfigurable, and scalable foundation for complex high-dimensional state preparation and manipulation protocols in the frequency domain.

A protocol is presented for the practical generation and coherent manipulation of high-dimensional frequency-bin entangled photon states using integrated micro-cavities and standard telecommunications components, respectively.

Generación y Control coherente de peines de frecuencia pulsada Quantum

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional ...