עבודה זו נתמכה על ידי חוזה מDARPA (N66001-08-C-2040) ועל ידי מענק מקרן הטכנולוגיה המתפתח של מדינת טקסס. המחברים מבקשים להודות Jiyoung קים, גרג מורדי, אנג&#39;לה Azcatl, וטום שרף על תרומתם הקשורים לתצהיר שכבה אטומי סלקטיבית, כמו גם וואלאס מרטין וגורדון פולוק לעיבוד מדגם לשעבר באתר.

<ol>
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The authors have nothing to disclose.

ביצוע המטרולוגיה על ננו שתואר לעיל דורש את היכולת לגשר על מיקום הקצה במיקום HDL ודפוס שימוש בכלים אחרים, כגון AFM וSEM. בניגוד לכלים אחרים מפותחים דפוסים עם קידוד עמדה ברזולוציה גבוהה כגון ליתוגרפיה קורה אלקטרוני, HDL ביצע כאן בוצע עם STM ללא מיצוב גס מבוקר היטב, כך פרוטוקולי...

כננוטכנולוגיה הופכת להיות יותר חשובה במגוון רחב של זירות, הבנת המבנים מתגבש חשיבות רווחים, במיוחד בתחומים של יתוגרפיה ואלקטרוניקה. כדי להדגיש את החשיבות של המטרולוגיה בקנה המידה ננומטרי, במיוחד בקני מידה מתחת ל -10 ננומטר, יש לציין כי שינוי בגודל תכונה של רק 1 ננומטר מציין וריאציה חלקית לפחות 10%. וריאציה זו יכולה להיות השלכות משמעותיות על ביצועי מכשיר ואופי חומר 1,2 -. 4 שימוש בשיטות סינתטיות, יכולות להיות מפוברקות תכונות אישיות שנוצרו דווקא מאוד כגון נקודות קוונטיות או מולקולות מורכבות אחרות, 2,5,6 אבל בדרך כלל חסרות את אותו הדיוק במיקום תכונה וכיוון, למרות עבודה לשיפור שליטה בגודל ובמיקום. מסמך זה מדגים גישה לבודת ננו עם דיוק ליד אטומי גודל ודיוק אטומי במיקום תכונה, כמו גםעם המטרולוגיה אטומית במיקום תכונה. שימוש בדיוק האטומי של סריקת תיעול מיקרוסקופים (STM) מימן מושרה Depassivation ליתוגרפיה (HDL), דפוסים אטומי מדויקים עם ניגוד כימי רגיש נוצרים על משטח. אטומי שכבת הפקדת סלקטיבי (ALD) ולאחר מכן חלה חומר תחמוצת קשה באזורי הדוגמת, עם תגובתי יון תחריט (RIE) סופו של דבר להעביר את הדפוסים לחומר בתפזורת, כפי שמוצג באופן סכמטי באיור 1. שילוב תהליך HDL מאוד מדויק עם סטנדרטי אלד וRIE מעבדים תוצאות בשיטה גמישה כדי לייצר ננו על משטח עם צורה ומיקום שרירותיים. <img alt="איור 1" src="/files/ftp_upload/52900/52900fig1.jpg" /> איור 1. שלבי תהליך הראשוני Nanofabrication. כדוגמא, ריבוע x 200 ננומטר 200 ננומטר מוצג. כל חץ עיגול מציין צעד של חשיפה ולא אטמוספריransport בין אתרים. לאחר הכנת מדגם UHV, המדגם הוא בדוגמת באמצעות UHV HDL אחרי המטרולוגיה STM (למעלה משמאל). אלד לאחר מכן ביצע, ואחריו המטרולוגיה AFM (מימין). RIE מעביר את הדפוסים לSi (100), ואחריו המטרולוגיה SEM (למטה משמאל). <a href="https://www.jove.com/files/ftp_upload/52900/52900fig1large.jpg" target="_blank">אנא לחץ כאן כדי לצפות בגרסה גדולה יותר של דמות זו.</a> ליתוגרפיה המדויקת ביותר עד כה בדרך כלל טכניקות בדיקה סרוקות, דפוסים במיוחד מבוסס STM בי דפוסי רזולוציה אטומית וfunctionalization הודגמו עבור יישומים רבים. 7 ננו בעבר, מניפולציה אטום הפיק עם דיוק אולטימטיבי באמצעות אטומים בודדים כאבני בניין, 8 , 9,10 אבל ננו נדרש תנאי קירור וכך היה חסר לטווח ארוך חוסן. המניפולציה אטום RT על ידי הסרת אטומי מימן מפני השטח הוכחה, specifically HDL. 11,12,13 HDL מבטיח לאפשר סוגים חדשים של אלקטרוניקה והתקנים אחרים המבוססים על הלוקליזציה המרחבי של ניגוד פני השטח. באמצעות HDL ללא עיבוד נוסף, ארכיטקטורות מכשיר שונות אפשריות כוללים משתלשלים חוטי אג&quot;ח או מכשירי היגיון. 14,15,16 בנוסף לאספקת חשמל ניגוד, HDL יכול להציג ניגוד כימי על פני השטח שבו שכבת H passivating הוסרה, בהשפעה יצירת תבנית לשינוי כימי נוסף. שינוי כימי זה הודגם על סיליקון ומשטחים אחרים, המציג סלקטיביות לתצהיר של מתכות, 17 מבודדים, 18 ומוליכים למחצה אפילו. 16,19 כל אחת מדוגמאות אלה מייצר שני מבנים ממדיים, מדרגות עיבוד כל כך אחרות חייבים לשמש לייצור אמיתי שלוש מבנים ממדיים עם השליטה האטומית החליטה שהובטחה על ידי ה- HDL. דפוסים חוזרים ונשנים בעבר, זה נדרש, 19,20,21 חישול, 22 </sup&gt; או פחות טוב נפתר תהליכים כגון תצהיר מושרה קורה אלקטרוני מבוסס-קצה. 23 בדומה ליתוגרפיה קורה אלקטרוני, HDL משתמש שטף של אלקטרונים מקומיים לחשוף בפניו. כמה קווי דמיון קיימים כגון היכולת לבצע יתוגרפיה מצב מרובה עם גודל נקודה משתנה ויעילות דפוסים. 24 עם זאת, את הכח האמיתי של HDL נובע ממה הוא שונים מיתוגרפיה הקורה האלקטרוני. ראשית, להתנגד בHDL הוא monolayer של מימן אטומי, כך שלהתנגד חשיפה הופכת תהליך דיגיטלי; להתנגד אטום או הוא או היא לא קיימת. 25 מאז הנפקת אטום H המתאימה לSi הבסיס (100) סריג תהליך HDL יכול להיות תהליך אטומי מדויק, אם כי יש לציין כי במאמר זה HDL יש דיוק ננומטר כ בניגוד לכך ששלמות אטומית ולכן אינו דיגיטלי במקרה זה. מכיוון שמקור האלקטרונים בHDL הוא מקומי אל פני השטח, המצבים השונים של פעולת STM להקל שניאופטימיזציה תפוקה כמו גם בדיקת שגיאות. בקצה מדגם הטיות למטה ~ 4.5 V, ליתוגרפיה עשויה להתבצע ברמת האטום הבודד עם דיוק אטומי, הידוע בשם אטומי מצב מדויק (מצב AP). לעומת זאת, בהטיות מעל 7 ~ V, אלקטרונים נפלטים ישירות מהקצה למדגם עם linewidths הרחב ויעילות הגבוהה depassivation, מכונה כאן מצב שדה פליטה (מצב FE). אז יכולה להיות מותאמת תפוקה HDL על ידי שילוב זהיר של שני המצבים הללו, אם כי תפוקה הכוללת תישאר קטן יחסית לדואר הקורה ליתוגרפיה עם דפוסים עד 1 מיקרומטר 2 דקות / אפשריות. כאשר ההטיה היא הפוכה, כך שהמדגם שנערך ב~ -2.25 V, מנהרת אלקטרונים מהמדגם לקצה עם יעילות depassivation נמוכה מאוד, ובכך מאפשר בדיקה של המבנה האטומי של פני השטח הן לתיקון שגיאות ולמטרולוגיה בקנה מידה אטומית . תהליך ייצור זה ננו-מבנה שמוצג באיור 1 </stronז&gt; מתחיל בצעד UHV-HDL, כפי שתואר לעיל. בעקבות HDL, המדגם פרק לאווירה, בו בזמן באזורי הדוגמת להיות רוויים במים, ויצר דק (כלומר, ~ monolayer 1) SiO 2 שכבה. 26 אחרי התחבורה, המדגם מוכנס לתוך תא אלד לתצהיר של טיטניה (Tio 2), עם עובי סביב 2-3 ננומטר הופקד כאן, כפי שנמדד על ידי AFM וXPS. 27 מאז תגובת טיטניה תלויה רוויה מים של פני השטח, תהליך זה הוא אפשרי למרות חשיפת אווירה שמרווה את המשטח במים . בשלב הבא, להעביר את תבנית המסכה אלד לתפזורת המדגם נחרט באמצעות RIE כך כי 20 ננומטר של Si מוסר, עם העומק לחרוט נקבע על ידי AFM וSEM. על מנת להקל צעדי המטרולוגיה, רקיק Si (100) הוא בדוגמת עם רשת של קווים שנועדו להיות גלוי לאחר UHV הכנה על ידי מיקרוסקופ עבודה ארוכה מרחק אופטי, הדמיה אופטית AFM תכנית-נוף, וההדמיה SEM תכנית צפייה נמוכה הגדלה. כדי לסייע בזיהוי המבנים ננומטריים, דפוסים מתפתל 1 מיקרומטר 2 (SERP) הם בדוגמת על הדגימות עם nanopatterns המבודד ביותר ממוקם במקומות קבועים ביחס לתוצאות החיפוש. שילוב זה של HDL, אלד סלקטיבית, וRIE יכול להיות תהליך חשוב לייצור ננו-מבנה, והוא כולל המטרולוגיה בקנה מידה אטומית כתוצר לוואי טבעי של התהליך. להלן, אנו כוללים תיאור מפורט של השלבים הכרוכים לפברק ננו ננומטר תת-10 בSi (100) באמצעות ה- HDL, אלד סלקטיבית, וRIE. ההנחה היא כי אחד היא מיומן בכל אחד מתהליכים אלה, אך המידע ייכלל קשור לכיצד לשלב התהליכים השונים. דגש מיוחד יינתן לאלה קשיים בלתי צפויים שחוו המחברים כדי למנוע אותם הקשיים, במיוחד קשור להובלה והמטרולוגיה.

<table border="0" cellpadding="0" cellspacing="0">
	<tbody>
		<tr>
			<td>Si Wafer</td>
			<td>VA Semiconductor</td>
			<td></td>
			<td>P type (Boron) Si&#60;100&#62; +/- 2 degrees, 280 mm +/- 25 mm thick, 0.01-0.02 ohm-cm</td>
		</tr>
		<tr>
			<td>Ta foil</td>
			<td>Alfa Aesar</td>
			<td>335</td>
			<td>0.025mm (0.001in) thick, 99.997% (metals basis)</td>
		</tr>
		<tr>
			<td>Methanol</td>
			<td>Alfa Aesar</td>
			<td>19393</td>
			<td>Semiconductor Grade, 99.9%</td>
		</tr>
		<tr>
			<td>2-Propanol</td>
			<td>Alfa Aesar</td>
			<td>19397</td>
			<td>Semiconductor Grade, 99.5%</td>
		</tr>
		<tr>
			<td>Acetone</td>
			<td>Alfa Aesar</td>
			<td>19392</td>
			<td>Semiconductor Grade, 99.5%</td>
		</tr>
		<tr>
			<td>Argon</td>
			<td>Praxair</td>
			<td></td>
			<td>Ultra high purity (grade 5.0)</td>
		</tr>
		<tr>
			<td>Deionized water</td>
			<td>Millipore</td>
			<td>Milli-Q Water Purification System</td>
			<td>&#62;18 MW resistance water produced on demand.</td>
		</tr>
		<tr>
			<td>TiCl4</td>
			<td>Sigma Aldrigh</td>
			<td>254312</td>
			<td>&#8805;99.995% trace metals basis</td>
		</tr>
		<tr>
			<td>O2</td>
			<td>Matheson</td>
			<td>G2182101</td>
			<td>Research Grade</td>
		</tr>
		<tr>
			<td>SF6</td>
			<td>Matheson</td>
			<td>G2658922</td>
			<td>Ultra high purity (grade 4.7)</td>
		</tr>
		<tr>
			<td>Blue Medium Tack Roll</td>
			<td>Semiconductor Equipment Corporation</td>
			<td>18074</td>
			<td>Thickness 75 um / .003&#8221;&#160; Length 200 M / 660&#8217;&#160;</td>
		</tr>
	</tbody>
</table>

atomically traceable nanostructure fabrication

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a method for tracking atomically resolved and controlled structures from initial template definition through final nanostructure metrology, opening up a pathway for top-down atomic control over nanofabrication. Hydrogen depassivation lithography is the first step of the nanoscale fabrication process followed by selective atomic layer deposition of up to 2.8 nm of titania to make a nanoscale etch mask. Contrast with the background is shown, indicating different mechanisms for growth on the desired patterns and on the H passivated background. The patterns are then transferred into the bulk using reactive ion etching to form 20 nm tall nanostructures with linewidths down to ~6 nm. To illustrate the limitations of this process, arrays of holes and lines are fabricated. The various nanofabrication process steps are performed at disparate locations, so process integration is discussed. Related issues are discussed including using fiducial marks for finding nanostructures on a macroscopic sample and protecting the chemically reactive patterned Si(100)-H surface against degradation due to atmospheric exposure.

במקרים שתוארו כאן, HDL מתבצע באמצעות יתוגרפיה מצב מרובה. 24 במצב FE, הופיע עם 8 V הטיה מדגם, 1 Na, וMC 0.2 / סנטימטר (שווה ערך ל 50 ננומטר / מהירות קצה שניות), הקצה עובר מעל המשטח או מקביל או בניצב לסריג Si, הפקת קווים של depassivation. בעוד lineshape זה מאוד תלוי קצה, במקרה כאן, חלק depassivated לח...

Watch this Scientific Journal Video about Atomically Traceable Nanostructure Fabrication at JoVE.com

Atomically Traceable Nanostructure Fabrication

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

ייצור ננו-מבנה אטומי למעקב

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process ...

atomically-traceable-nanostructure-fabrication

Research

JoVE Journal

Engineering

8.6K Views.  Zyvex Labs. We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated. 

Video: Atomically Traceable Nanostructure Fabrication

Fabrication of Silica Ultra High Quality Factor Microresonators

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the quality factor (Q) of the cavity, can be in excess of 500ns for cavities with Q factors above 100 million. As a result of their low material losses, silica microcavities have demonstrated some of the longest photon lifetimes to date1-2. Since a portion of the circulating light extends outside the resonator, these devices can also be used to probe the surroundings. This interaction has enabled numerous experiments in biology, such as single molecule biodetection and antibody-antigen kinetics, as well as discoveries in other fields, such as development of ultra-low-threshold microlasers, characterization of thin films, and cavity quantum electrodynamics studies.3-7
The two primary silica resonant cavity geometries are the microsphere and the microtoroid. Both devices rely on a carbon dioxide laser reflow step to achieve their ultra-high-Q factors (Q&gt;100 million).1-2,8-9 However, there are several notable differences between the two structures. Silica microspheres are free-standing, supported by a single optical fiber, whereas silica microtoroids can be fabricated on a silicon wafer in large arrays using a combination of lithography and etching steps. These differences influence which device is optimal for a given experiment.
Here, we present detailed fabrication protocols for both types of resonant cavities. While the fabrication of microsphere resonant cavities is fairly straightforward, the fabrication of microtoroid resonant cavities requires additional specialized equipment and facilities (cleanroom). Therefore, this additional requirement may also influence which device is selected for a given experiment.
Introduction
An optical resonator efficiently confines light at specific wavelengths, known as the resonant wavelengths of the device. 1-2 The common figure of merit for these optical resonators is the quality factor or Q. This term describes the photon lifetime (&tau;o) within the resonator, which is directly related to the resonator's optical losses. Therefore, an optical resonator with a high Q factor has low optical losses, long photon lifetimes, and very low photon decay rates (1/&tau;o). As a result of the long photon lifetimes, it is possible to build-up extremely large circulating optical field intensities in these devices. This very unique property has allowed these devices to be used as laser sources and integrated biosensors.10
A unique sub-class of resonators is the whispering gallery mode optical microcavity. In these devices, the light is confined in circular orbits at the periphery. Therefore, the field is not completely confined within the device, but evanesces into the environment. Whispering gallery mode optical cavities have demonstrated some of the highest quality factors of any optical resonant cavity to date.9,11 Therefore, these devices are used throughout science and engineering, including in fundamental physics studies and in telecommunications as well as in biodetection experiments. 3-7,12
Optical microcavities can be fabricated from a wide range of materials and in a wide variety of geometries. A few examples include silica and silicon microtoroids, silicon, silicon nitride, and silica microdisks, micropillars, and silica and polymer microrings.13-17 The range in quality factor (Q) varies as dramatically as the geometry. Although both geometry and high Q are important considerations in any field, in many applications, there is far greater leverage in boosting device performance through Q enhancement. Among the numerous options detailed previously, the silica microsphere and the silica microtoroid resonator have achieved some of the highest Q factors to date.1,9 Additionally, as a result of the extremely low optical loss of silica from the visible through the near-IR, both microspheres and microtoroids are able to maintain their Q factors over a wide range of testing wavelengths.18 Finally, because silica is inherently biocompatible, it is routinely used in biodetection experiments.
In addition to high material absorption, there are several other potential loss mechanisms, including surface roughness, radiation loss, and contamination loss.2 Through an optimization of the device size, it is possible to eliminate radiation losses, which arise from poor optical field confinement within the device. Similarly, by storing a device in an appropriately clean environment, contamination of the surface can be minimized. Therefore, in addition to material loss, surface scattering is the primary loss mechanism of concern.2,8
In silica devices, surface scattering is minimized by using a laser reflow technique, which melts the silica through surface tension induced reflow. While spherical optical resonators have been studied for many years, it is only with recent advances in fabrication technologies that researchers been able to fabricate high quality silica optical toroidal microresonators (Q&gt;100 million) on a silicon substrate, thus paving the way for integration with microfluidics.1
The present series of protocols details how to fabricate both silica microsphere and microtoroid resonant cavities. While silica microsphere resonant cavities are well-established, microtoroid resonant cavities were only recently invented.1 As many of the fundamental methods used to fabricate the microsphere are also used in the more complex microtoroid fabrication procedure, by including both in a single protocol it will enable researchers to more easily trouble-shoot their experiments.

We describe the use of a carbon dioxide laser reflow technique to fabricate silica resonant cavities, including free-standing microspheres and on-chip microtoroids. The reflow method removes surface imperfections, allowing long photon lifetimes within both devices. The resulting devices have ultra high quality factors, enabling applications ranging from telecommunications to biodetection.

ייצור של אולטרה סיליקה Microresonators באיכות גבוהה פקטור

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the ...

Simulation, Fabrication and Characterization of THz Metamaterial Absorbers

Metamaterials (MM), artificial materials engineered to have properties that may not be found in nature, have been widely explored since the first theoretical1 and experimental demonstration2 of their unique properties. MMs can provide a highly controllable electromagnetic response, and to date have been demonstrated in every technologically relevant spectral range including the optical3, near IR4, mid IR5 , THz6 , mm-wave7 , microwave8 and radio9 bands. Applications include perfect lenses10, sensors11, telecommunications12, invisibility cloaks13 and filters14,15. We have recently developed single band16, dual band17 and broadband18 THz metamaterial absorber devices capable of greater than 80% absorption at the resonance peak. The concept of a MM absorber is especially important at THz frequencies where it is difficult to find strong frequency selective THz absorbers19. In our MM absorber the THz radiation is absorbed in a thickness of ~ &lambda;/20, overcoming the thickness limitation of traditional quarter wavelength absorbers. MM absorbers naturally lend themselves to THz detection applications, such as thermal sensors, and if integrated with suitable THz sources (e.g. QCLs), could lead to compact, highly sensitive, low cost, real time THz imaging systems.

This protocol outlines the simulation, fabrication and characterization of THz metamaterial absorbers. Such absorbers, when coupled with an appropriate sensor, have applications in THz imaging and spectroscopy.

סימולציה, ייצור ואפיון של בולמי metamaterial THz

Metamaterials (MM),  artificial materials engineered to have properties that may not be found in  nature, have been widely explored since the first ...

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

המצאה של תחמוצות מורכבות מוקפות מרחבית

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Fabrication of VB2/Air Cells for Electrochemical Testing

A technique to investigate the properties and performance of new multi-electron metal/air battery systems is proposed and presented. A method for synthesizing nanoscopic VB2 is presented as well as step-by-step procedure for applying a zirconium oxide coating to the VB2 particles for stabilization upon discharge. The process for disassembling existing zinc/air cells is shown, in addition construction of the new working electrode to replace the conventional zinc/air cell anode with a the nanoscopic VB2 anode. Finally, discharge of the completed VB2/air battery is reported. We show that using the zinc/air cell as a test bed is useful to provide a consistent configuration to study the performance of the high-energy high capacity nanoscopic VB2 anode.

Fabrication of VB2/Air Cells for Electrochemical Testing

A protocol is presented to study multi-electron metal/air battery systems by using previous technology developed for the zinc/air cell. Electrochemical testing is then performed on fabricated batteries to evaluate performance.

המצאה של VB<sub&gt; 2</sub&gt; / תאי אוויר לבדיקת אלקטרוכימי

A technique to investigate the properties and performance of new multi-electron metal/air battery systems is proposed and presented. A method for ...

Fabrication and Testing of Microfluidic Optomechanical Oscillators

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including microresonators. However, because of the increased acoustic radiative losses during direct liquid immersion of optomechanical devices, almost all published optomechanical experiments have been performed in solid phase. This paper discusses a recently introduced hollow microfluidic optomechanical resonator. Detailed methodology is provided to fabricate these ultra-high-Q microfluidic resonators, perform optomechanical testing, and measure radiation pressure-driven breathing mode and SBS-driven whispering gallery mode parametric vibrations. By confining liquids inside the capillary resonator, high mechanical- and optical- quality factors are simultaneously maintained.

Parametric optomechanical excitations have recently been experimentally demonstrated in microfluidic optomechanical resonators by means of optical radiation pressure and stimulated Brillouin scattering. This paper describes the fabrication of these microfluidic resonators along with methodologies for generating and verifying optomechanical oscillations.

ייצור ובדיקה של מתנדים optomechanical Microfluidic

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including ...

Patterning via Optical Saturable Transitions - Fabrication and Characterization

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical Saturable Transitions (POST). In this technique the chemical properties of organic photochromic molecules that undergo single-photon reactions are exploited, enabling rapid top-down nanopatterning over large areas at low light intensities, thereby, allowing for the circumvention of the far-field diffraction barrier.4 Simple, cost-effective, high throughput and resolution alternatives to nanopatterning are being explored, such as, two-photon polymerization5,6, beam pen lithography (BPL)7, scanning electron beam lithography (SEBL), and focused ion beam (FIB) patterning. However, multi-photon approaches require high light intensities, which limit their potential for high throughput and offer low image contrast. Although, electron and ion beam lithographic processes offer increased resolution, the serial nature of the process is limited to slow writing speeds, which also prevents patterning of features over large areas. Beam-pen lithography is an approach towards parallel near-field optical lithography. However, the gap between the source of the beam and the surface of the photoresist needs to be controlled extremely precisely for good pattern uniformity and this is very challenging to accomplish for large arrays of beams. Patterning via Optical Saturable Transitions (POST) is an alternative optical nanopatterning technique for patterning sub-wavelength features1-3. Since this technique uses single photons instead of electrons, it is extremely fast and does not require high light intensities1-3, opening the door to massive parallelization.

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

דפוסים באמצעות מעברי Saturable אופטיים - ייצור ואפיון

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

ייצור ואפיון של מהודי מוליכים

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Fabrication of 3D Carbon Microelectromechanical Systems (C-MEMS)

A wide range of carbon sources are available in nature, with a variety of micro-/nanostructure configurations. Here, a novel technique to fabricate long and hollow glassy carbon microfibers derived from human hairs is introduced. The long and hollow carbon structures were made by the pyrolysis of human hair at 900 &#176;C in a N2 atmosphere. The morphology and chemical composition of natural and pyrolyzed human hairs were investigated using scanning electron microscopy (SEM) and electron-dispersive X-ray spectroscopy (EDX), respectively, to estimate the physical and chemical changes due to pyrolysis. Raman spectroscopy was used to confirm the glassy nature of the carbon microstructures. Pyrolyzed hair carbon was introduced to modify screen-printed carbon electrodes ; the modified electrodes were then applied to the electrochemical sensing of dopamine and ascorbic acid. Sensing performance of the modified sensors was improved as compared to the unmodified sensors. To obtain the desired carbon structure design, carbon micro-/nanoelectromechanical system (C-MEMS/C-NEMS) technology was developed. The most common C-MEMS/C-NEMS fabrication process consists of two steps: (i) the patterning of a carbon-rich base material, such as a photosensitive polymer, using photolithography; and (ii) carbonization through the pyrolysis of the patterned polymer in an oxygen-free environment. The C-MEMS/NEMS process has been widely used to develop microelectronic devices for various applications, including in micro-batteries, supercapacitors, glucose sensors, gas sensors, fuel cells, and triboelectric nanogenerators. Here, recent developments of a high-aspect ratio solid and hollow carbon microstructures with SU8 photoresists are discussed. The structural shrinkage during pyrolysis was investigated using confocal microscopy and SEM. Raman spectroscopy was used to confirm the crystallinity of the structure, and the atomic percentage of the elements present in the material before and after pyrolysis was measured using EDX.

Fabrication of 3D Carbon Microelectromechanical Systems C-MEMS

Long and hollow glassy carbon microfibers were fabricated based on the pyrolysis of a natural product, human hair. The two fabrication steps of carbon microelectromechanical and carbon nanoelectromechanical systems, or C-MEMS and C-NEMS, are: (i) photolithography of a carbon-rich polymer precursor and (ii) pyrolysis of the patterned polymer precursor.

ייצור של 3D מערכות מיקרואלקטרו-מכניות פחמן (C-MEMS)

A wide range of carbon sources are available in nature, with a variety of micro-/nanostructure configurations. Here, a novel technique to fabricate long ...

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing in combination with new nanofabrication techniques. A plasmon is a quantum of charge density oscillation that lends nanoscale metals such as gold and silver unique optical properties. In particular, gold and silver nanoparticles exhibit localized surface plasmon resonances-collective charge density oscillations on the surface of the nanoparticle-in the visible spectrum. Here, we focus on the fabrication of periodic arrays of anisotropic plasmonic nanostructures. These half-shell (or nanocup) structures can exhibit additional unique light-bending and polarization-dependent optical properties that simple isotropic nanostructures cannot. Researchers are interested in the fabrication of periodic arrays of nanocups for a wide variety of applications such as low-cost optical devices, surface-enhanced Raman scattering, and tamper indication. We present a scalable technique based on colloidal lithography in which it is possible to easily fabricate large periodic arrays of nanocups using spin-coating and self-assembled commercially available polymeric nanospheres. Electron microscopy and optical spectroscopy from the visible to near-infrared (near-IR) was performed to confirm successful nanocup fabrication. We conclude with a demonstration of the transfer of nanocups to a flexible, conformal adhesive film.

We demonstrate the fabrication of periodic gold nanocup arrays using colloidal lithographic techniques and discuss the importance of nanoplasmonic films.

ייצור של מערכים Nanocup זהב תקופתיים באמצעות Colloidal ליתוגרפיה

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing ...

Fabrication of Superhydrophobic Metal Surfaces for Anti-Icing Applications

Several ways to produce superhydrophobic metal surfaces are presented in this work. Aluminum was chosen as the metal substrate due to its wide use in industry. The wettability of the produced surface was analyzed by bouncing drop experiments and the topography was analyzed by confocal microscopy. In addition, we show various methodologies to measure its durability and anti-icing properties. Superhydrophobic surfaces hold a special texture that must be preserved to keep their water-repellency. To fabricate durable surfaces, we followed two strategies to incorporate a resistant texture. The first strategy is a direct incorporation of roughness to the metal substrate by acid etching. After this surface texturization, the surface energy was decreased by silanization or fluoropolymer deposition. The second strategy is the growth of a ceria layer (after surface texturization) that should enhance the surface hardness and corrosion resistance. The surface energy was decreased with a stearic acid film.
The durability of the superhydrophobic surfaces was examined by a particle impact test, mechanical wear by lateral abrasion, and UV-ozone resistance. The anti-icing properties were explored by studying the ability to repeal subcooled water, freezing delay, and ice adhesion.

We illustrate several methodologies to produce superhydrophobic metal surfaces and to explore their durability and anti-icing properties.

ייצור של משטחי מתכת Superhydrophobic עבור יישומים ציפוי אנטי

Several ways to produce superhydrophobic metal surfaces are presented in this work. Aluminum was chosen as the metal substrate due to its wide use in ...