Name: a fabrication and measurement method for a flexible ferroelectric element based on van der waals heteroepitaxy
Uploaded: 2018-04-08T14:00:00.000+00:00
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Description: Watch this Scientific Journal Video about A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy at JoVE.com

Bu eser Ulusal Doğa Bilimleri Foundation of China (Grant NOS 11402221 ve 11502224), devlet anahtar laboratuvar, yoğun darbeli radyasyon simülasyon ve etkisi (SKLIPR1513) ve Hunan eyalet anahtar araştırma ve geliştirme planı (No tarafından desteklenmiştir 2016 WK 2014).

1. esnek PZT ince filmler imalatı
<ol><li>1 cm x 1 cm Mika substrat Mika sayfasından makasla kesme.</li>
	<li>Bu 1 cm x 1 cm Mika substrat çift taraflı bant kullanarak bir masa üzerine düzeltmek.</li>
	<li>Mika katman--bir mikrometre ile ölçülen katman kadar istediğiniz kalınlıkta (50 µm), besleme için cımbız kullanın.</li>
	<li>Bu taze hamur i ciddi Mika substrat ince bir tabaka gümüş boya kullanarak bir 5'' substrat tutucu üzerinde ve mika substrat üzerine sıkıca eklemesi 10 dakika sıcak tabakta 120 ° C'de tedavi.</li>
	<li>PLD (Geniş puls lazer biriktirme) substrat tutucu PLD odasına koy.</li>
	<li>Enerji (örneğin, 300 mJ) lazer ve tekrarlama oranı (örneğin, 10 Hz) seçin.</li>
	<li>Odaklama lens kümesi konuma getirin.</li>
	<li>Objektif kapağı açın ve bir 5 nm CoFe2O4 (CFO) mevduat [lazer enerji: 300 mJ, oksijen basıncı: 50 mTorr, numune sıcaklığı: 590 ° C, biriktirme zaman: 5 min] ince film bir arabellek katman olarak lazer (şekil 1) tetikleyici tarafından.</li>
	<li>20-80 nm SrRuO3 (SRO) mevduat [lazer enerji: 300 mJ, oksijen basıncı: 100 mTorr, numune sıcaklığı: 680 ° C, biriktirme zaman: 10-30 dk] katman üzerinde bulunan CFO arabellek alt elektrot tetikleme lazer (tarafından sonraki elektrik performans testleri için Şekil 1).</li>
	<li>Depozito 150 a nm PZT [lazer enerji: 300 mJ, oksijen basıncı: 100 mTorr, numune sıcaklığı: 650 ° C, ifade Saat: 60 dk] ince film SRO alt elektrot üstünde lazer (şekil 1) tetikleyici tarafından.</li>
	<li>N2 kullanarak odası delik ve sıcaklığı oda sıcaklığına ulaştığında PZT/Mika örnek (Şekil 2) kaldırın.</li>
	<li>Örnek bir cam parçası koymak.</li>
	<li>Önceden tasarlanmış bir mesh ile 200 µm çapı örnek üstüne koy. Mesh de düzeltmek ve kafes-örnek sputtering odanın içine koymak.</li>
	<li>DC SAÇTIRMA (10 mA, 8 mbar, 6 dk.) Pt üst elektrotlar film yatırmak için kullanın. Örnek SAÇTIRMA sonra kaldırın.</li>
	<li>Bir bıçak ya da % 20 HF asit 1 mm x 1 mm PZT bölümü kaldırmak için kullanın. Bu alt SRO elektrot ortaya çıkarmak ve birçok küçük esnek ferroelectric Kondansatörler oluşturmak içindir. Not: SRO alt elektrot olarak büyümek ve sonra şekil 3' te gösterilen PZT ince film elektronik özelliklerini ölçmek için birçok küçük kapasitörler kurmaya SAÇTIRMA DC tarafından filmlerde elektrotlar üstüne Pt mevduat.</li>
	<li>Alt SRO elektrot elektriksel iletkenlik artırmak için maruz SRO iletken gümüş bir kat boya. İletken gümüş maruz SRO ulaşabilirsiniz emin olun.</li>
</ol>2. ferroelectric karakterizasyonu
<ol><li>Bükme testi<ol>
<li>Arka esnek örnek için basit nakletmek-in örnek bir sahneden diğerine örnek olarak aynı boyutta kağıt tutkal.</li>
		<li>PZT/Mika ferroelectric test sistemi ve yarı iletken cihaz analyzer test kartını üzerinde yerleştirin.</li>
		<li>Bir ölçüm probu ferroelectric test sistemi ve yarı iletken cihaz Analyzer Pt üst elektrot ve diğer ölçüm probu polarizasyon-elektriksel alan (P-E) histeresis döngüleri almak için gümüş-SRO katmanda koydu ve örnek unbent ise kapasite-elektriksel alan (C-E) eğrileri.<ol>
<li>2 kHz frekans iki problar ile P-E histeresis döngüleri ölçmek ve 4'te V. ölçü C-E eğrileri ile iki probları 1 MHz frekans ve 4 Kaldır V. unbent örnek.</li>
		</ol>
</li>
		<li>Esnek PZT/Mika ince film çift taraflı bant kullanarak istediğiniz kalıp üzerinde güvenli. Ölçüm sırasında kayma/kayma Mika önlemek için dikkat ediniz.</li>
		<li>Ferroelectric test sistemi ve yarı iletken cihaz analyzer test tahtaya monte edin.</li>
		<li>Alt SRO elektrot benzer daha önce kullanılan yapılandırma kaplama Gümüş (Adım 2.1.3) aracılığıyla diğer sonda dokunur bir sonda Pt üst elektrot bir kenara bırakıp.</li>
		<li>P-E histeresis döngüleri ve C-E eğrileri çeşitli çekme dayanımı ve bükme yarıçapı (şekil 4) basınç altında ölçün.<ol>
<li>P-E histeresis döngüleri, iki problar 2 kHz frekans ve 4 V. ölçü C-E eğrileri 1 MHz frekans ve 4 V iki problar ile ölçü.</li>
		</ol>
</li>
		<li>P-E ve C-E ölçümler tamamlandığında esnek PZT örnek kaldırın.</li>
	</ol>
</li>
	<li>Termal kararlılık<ol>
<li>PZT/Mika ferroelectric test sistemi ve yarı iletken cihaz analyzer test tahtaya yaz.</li>
		<li>Bir ölçüm probu Pt üst elektrot ve diğer ölçüm probu gümüş-SRO katmanda koydu.</li>
		<li>Örnek ısı sıcaklık kontrol sistemi açın.</li>
		<li>Farklı sıcaklıklarda (25 ° C, 50 ° C, 75 ° C, 100 ° C, 125 ° C, 150 ° C, 175 ° C) P-E ve C-E ölçümleri yapmak.</li>
		<li>Ölçümleri tamamladıktan sonra ısıtıcı montaj dön.</li>
	</ol>
</li>
	<li>Bükme cyclability testleri<ol>
<li>Esnek PZT/Mika bu kurulum iki oluklar monte.</li>
		<li>Bir motor yardımı ile diğer ucundan bükülmüş iken örnek bir ucunu düzeltmek.</li>
		<li>PZT/Mika uzunluğu ile birlikte motorlu 8 mm bükme işlemi (şekil 5) önce (eğilme) hareket yönünü ölçmek için bir cetvel kullanın.</li>
		<li>Örnek 5 mm formüle göre eğmek için hareket uzunluğu C hesaplamak: nerede L PZT/Mika unbent devlet uzunluğu, R olan bükme yarıçapı ise C motor hareketi uzunluğu C=L-2Rsin(L/2R).</li>
		<li>Bilgisayar (şekil 6) döngüsü (1000) bükme sayısını ayarlayın.</li>
		<li>Motor ileri geri hareket başlatmak için Başlat düğmesini (şekil 6) tıklatın.</li>
		<li>Örnek kaldırmak ve P-E ferroelectric özellikleri korunur olup olmadığını kontrol etmek için ölçmek.</li>
	</ol>
</li>
</ol>

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Yazarlar ifşa rakip hiçbir mali ilgi alanlarına sahip.

Ferroelectric elemanları imalatı anahtar adımda bir temiz ve hatta/düz yüzey yüzey kullanımında yatıyor. Taze i ciddi Mika yüzey atomik pürüzsüz olmasına rağmen bu yüzeyleri görünür dağılma acı önlemek için dikkat, Katmanlar, çatlaklar, kapanımlar, vb PZT katman birikimi sonra bölmek gereklidir, örnek altında soğutmalı bir yüksek oksijen basıncı (oksijen boş pozisyonlar azaltmak için 200-500 Torr). Ex situ üst Platin elektrotlar birçok Pt/PZT/SRO kapasitör öğeler...

Esnek geçici olmayan bellek öğeleri (NVME) başarılı imalatı esnek elektronik tam potansiyelini önemli bir rol oynar. NVME hafif, düşük maliyetli, düşük güç tüketimi, hızlı hızlı ve yüksek depolama yoğunluğu yetenekleri yanı sıra veri depolama, bilgi işlem ve iletişim özelliği. Perovskite Pb (Zr, Ti) O3 (PZT) onun büyük polarizasyon, hızlı polarizasyon geçiş, yüksek Curie sıcaklık, düşük zorlayıcı alan ve yüksek piezoelektrik katsayısı düşünüyorsanız bu tür uygulamalar için popüler bir sistem olarak davranır. Ferroelectric kalıcı anılar, bir dış gerilim darbe iki kalan kutuplaşmalar '0' ve '1' tarafından temsil edilen iki istikrarlı yönde arasında geçiş yapabilirsiniz. Bu non-maymun iştahlı ve yazma/okuma işlemi nanosaniye içinde tamamlanabilir. Organik1,2,3,4,5,6 ve inorganik7,8,9,10 NVME dayalı ,11,12,13,14,15 ferroelectric malzeme esnek yüzeyler üzerinde çalıştı. Ancak, bu tür entegrasyon sadece yüzeylerde yetersizlik yüksek sıcaklık büyüme aynı zamanda bozulmuş aygıtı performansını, geçerli sızıntı ve elektrik onların kaba yüzeyler nedeniyle kısa devre ile sınırlıdır. Umut verici sonuçlar rağmen stratejileri substrat8 inceltme gibi alternatif ve esnek substrat15 Epitaksiyel katman transferinde acı içinde görüş-in karmaşık multistep işlemi sınırlı canlılığı Tahmin edilemezlik transfer ve sınırlı uygulanabilirliği.
Yukarıda belirtilen nedenlerden dolayı daha fazla esnek elektronik ilerlemek için yumuşak yüzeylerde sınırlı termal ve operasyonel stabiliteleri üstesinden yapabiliyor uygun bir substrat keşfetmek için önemlidir. Doğal Moskof Mika (KAl2(AlSi3O10) (OH)2) substrat atomik pürüzsüz gibi yüzeyler, yüksek termal kararlılık, kimyasal hareketsizlik, yüksek şeffaflık, mekanik esneklik, benzersiz özellikleri ile ve Geçerli imalat yöntemleri ile uyumluluk etkili bu sorunları ile başa çıkmak için kullanılabilir. Daha çok, iki boyutlu katmanlı yapısı monoclinic Mika, kafes ve termal koşullar önemli ölçüde etkisi sıkma substrat bastırmak, eşleşen vektöründeki etkisini azaltır, van der Waals epitaxy destekler. Bu avantajları fonksiyonel oksitler16,17,18,19,20,21,22doğrudan büyüme istismar, 23 Moskof tarihinde son zamanlarda, içinde görüş-in esnek aygıt uygulamaları.
Burada, biz doğrudan Epitaksiyel henüz esnek kurşun zirkonyum titanate (PZT) ince filmler Moskof Mika üzerinde büyümek için bir protokol tanımlamak. Bu Mika, van der Waals heteroepitaxy kaynaklanan çok yönlü özelliklerini dayanarak bir lazer biriktirme işlem aracılığıyla elde edilir. Bu tür uydurma yapıların Epitaksiyel PZT katı tek kristal yüzeyler üzerinde tüm üstün özellikleri korumak ve mükemmel termal ve mekanik sağlamlık sergiler. Bu basit ve güvenilir bir yaklaşım multistep aktarımı ve stratejileri inceltme yüzey üzerinde teknolojik bir avantaj sağlar ve çok beklenen esnek henüz tek kristal geçici olmayan bellek öğeleri için önkoşul gelişimini kolaylaştırır yeni nesil akıllı aygıtlar ile yüksek ifa.

<table><tbody><tr><td>&lt;strong&gt;Equipment&lt;/strong&gt;</td><td></td><td></td><td></td></tr><tr><td>hot plate</td><td>Polish</td><td>P-20</td><td></td></tr><tr><td>PLD system</td><td>PVD products</td><td>PLD 5000</td><td></td></tr><tr><td>Ferroelectric test system&amp;nbsp;</td><td>Radiant Technologies Precisions workstations&amp;nbsp;</td><td>RT66A</td><td></td></tr><tr><td>Semiconductor device analyzer&amp;nbsp;</td><td>Agilent&amp;nbsp;</td><td>B1500A</td><td></td></tr><tr><td>Bending molds</td><td>home-made</td><td></td><td>Machined teflon material</td></tr><tr><td>Bending stage</td><td>home-built</td><td></td><td>Labview interfaced setup which provides a prescise displacemnt as small as 1 micrometer</td></tr><tr><td>Sputtering system</td><td>Beijing&amp;nbsp;Elaborate</td><td>ETD-3000</td><td></td></tr><tr><td>&lt;strong&gt;Materials&lt;/strong&gt;</td><td></td><td></td><td></td></tr><tr><td>mica(001) sheets</td><td>Nilaco corporation&amp;nbsp;</td><td>990066</td><td></td></tr><tr><td>conductive silver paint</td><td>Ted Pella, INC</td><td>No.16033</td><td></td></tr><tr><td>CoFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; target</td><td>Kurt J.Lesker</td><td></td><td></td></tr><tr><td>SrRuO&lt;sub&gt;3&lt;/sub&gt; target</td><td>Kurt J.Lesker</td><td></td><td></td></tr><tr><td>PbZr&lt;sub&gt;0.2&lt;/sub&gt;Ti&lt;sub&gt;0.8&lt;/sub&gt;O&lt;sub&gt;3 &lt;/sub&gt;target</td><td>Kurt J.Lesker</td><td></td><td></td></tr><tr><td>Pt target</td><td>Hefei Ke jing</td><td></td><td></td></tr></tbody></table>

a fabrication and measurement method for a flexible ferroelectric element based on van der waals heteroepitaxy

Gelecekte, yüksek yoğunluklu veri depolama ve düşük güç tüketimi yetenekleri üzerinde güvenerek taşınabilir akıllı elektronik cihaz için geçerli olduğu gibi esnek geçici olmayan anılar çok dikkat aldık. Ancak, yüksek kaliteli oksit dayalı geçici olmayan bellek esnek yüzeyler üzerinde kez malzeme özellikleri ve kaçınılmaz yüksek sıcaklık imalat süreci tarafından sınırlanır. Bu yazıda, bir protokol Epitaksiyel henüz esnek kurşun zirkonyum titanate bellek öğe üzerinde Moskof Mika doğrudan büyümeye önerilmiştir. Çok yönlü ifade tekniği ve ölçüm yöntemi etkinleştirmek esnek henüz tek kristal geçici olmayan bellek öğeleri yeni nesil akıllı aygıtlar için gerekli imalatı.

Epitaksiyel PZT/SRO/CFO/Mika ince filmler lazer biriktirme tekniği ile adım 1'de özetlenen tevdi. Büyüme şeması şekil 1 gösterir ve Şekil 2 PZT üzerinde dayalı bir gerçek esnek NVM öğesini gösterir.

Mekanik istikrar esnek aygıt kullanma çok önemli bir yönüdür. Mekanik esneme karşı heterostructure makroskopik ferroelectric performansını ...

Watch this Scientific Journal Video about A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy at JoVE.com

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy

Bu yazıda, biz Moskof Mika esnek kurşun zirkonyum titanate bellek öğesini doğrudan bir Epitaksiyel henüz büyümeye bir iletişim kuralı mevcut.

Bir imalat ve Van Der Waals Heteroepitaxy dayanan esnek bir Ferroelectric öğesi için ölçüm yöntemi

Flexible non-volatile memories have received much attention as they are applicable for portable smart electronic device in the future, relying on ...

a-fabrication-measurement-method-for-flexible-ferroelectric-element

Research

JoVE Journal

Engineering

8.2K Görüntüleme.  Xiangtan University. Bu yazıda, biz Moskof Mika esnek kurşun zirkonyum titanate bellek öğesini doğrudan bir Epitaksiyel henüz büyümeye bir iletişim kuralı mevcut.

Video: A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

Mekansal Kapalı Karmaşık Oksitler Fabrikasyon

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Mühendislik

Sputter Growth and Characterization of Metamagnetic B2-ordered FeRh Epilayers

Chemically ordered alloys are useful in a variety of magnetic nanotechnologies. They are most conveniently prepared at an industrial scale using sputtering techniques. Here we describe a method for preparing epitaxial thin films of B2-ordered FeRh by sputter deposition onto single crystal MgO substrates. Deposition at a slow rate onto a heated substrate allows time for the adatoms to both settle into a lattice with a well-defined epitaxial relationship with the substrate and also to find their proper places in the Fe and Rh sublattices of the B2 structure. The structure is conveniently characterized with X-ray reflectometry and diffraction and can be visualised directly using transmission electron micrograph cross-sections. B2-ordered FeRh exhibits an unusual metamagnetic phase transition: the ground state is antiferromagnetic but the alloy transforms into a ferromagnet on heating with a typical transition temperature of about 380 K. This is accompanied by a 1% volume expansion of the unit cell: isotropic in bulk, but laterally clamped in an epilayer. The presence of the antiferromagnetic ground state and the associated first order phase transition is very sensitive to the correct equiatomic stoichiometry and proper B2 ordering, and so is a convenient means to demonstrate the quality of the layers that can be deposited with this approach. We also give some examples of the various techniques by which the change in phase can be detected.

A method to prepare epitaxial layers of ordered alloys by sputtering is described. The B2-ordered FeRh compound is used as an example, as it displays a metamagnetic transition that depends sensitively on the degree of chemical order and the exact composition of the alloy.

Metamagnetic B2 sıralı ferh Epilayers püskürtülerek Büyüme ve karakterizasyonu

Chemically ordered alloys are useful in a variety of magnetic nanotechnologies. They are most conveniently prepared at an industrial scale using ...

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene

Recent progress in the field of organic materials has yielded devices such as organic light emitting diodes (OLEDs) which have advantages not found in traditional materials, including low cost and mechanical flexibility. In a similar vein, it would be advantageous to expand the use of organics into high frequency electronics and spin-based electronics. This work presents a synthetic process for the growth of thin films of the room temperature organic ferrimagnet, vanadium tetracyanoethylene (V[TCNE]x, x~2) by low temperature chemical vapor deposition (CVD). The thin film is grown at &#60;60 &#176;C, and can accommodate a wide variety of substrates including, but not limited to, silicon, glass, Teflon and flexible substrates. The conformal deposition is conducive to pre-patterned and three-dimensional structures as well. Additionally this technique can yield films with thicknesses ranging from 30 nm to several microns. Recent progress in optimization of film growth creates a film whose qualities, such as higher Curie temperature (600 K), improved magnetic homogeneity, and narrow ferromagnetic resonance line-width (1.5 G) show promise for a variety of applications in spintronics and microwave electronics.

We present the synthesis of the organic-based ferrimagnet vanadium tetracyanoethylene (V[TCNE]x, x~2) via low temperature chemical vapor deposition (CVD). This optimized recipe yields an increase in Curie temperature from 400 K to over 600 K and a dramatic improvement in magnetic resonance properties.

Bir Organik Magnet CVD, Vanadyum Tetracyanoethylene

Recent progress in the field of organic materials has yielded devices such as organic light emitting diodes (OLEDs) which have advantages not found in ...

Kimya

Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials

Novel electronic materials are often produced for the first time by synthesis processes that yield bulk crystals (in contrast to single crystal thin film synthesis) for the purpose of exploratory materials research. Certain materials pose a challenge wherein the traditional bulk Hall bar device fabrication method is insufficient to produce a measureable device for sample transport measurement, principally because the single crystal size is too small to attach wire leads to the sample in a Hall bar configuration. This can be, for example, because the first batch of a new material synthesized yields very small single crystals or because flakes of samples of one to very few monolayers are desired. In order to enable rapid characterization of materials that may be carried out in parallel with improvements to their growth methodology, a method of device fabrication for very small samples has been devised to permit the characterization of novel materials as soon as a preliminary batch has been produced. A slight variation of this methodology is applicable to producing devices using exfoliated samples of two-dimensional materials such as graphene, hexagonal boron nitride (hBN), and transition metal dichalcogenides (TMDs), as well as multilayer heterostructures of such materials. Here we present detailed protocols for the experimental device fabrication of fragments and flakes of novel materials with micron-sized dimensions onto substrate and subsequent measurement in a commercial superconducting magnet, dry helium close-cycle cryostat magnetotransport system at temperatures down to 0.300 K and magnetic fields up to 12 T.

We describe the methodology of mechanical exfoliation and deposition of flakes of novel materials with micron-sized dimensions onto substrate, fabrication of experimental device structures for transport experimentation, and the magnetotransport measurement in a dry helium close-cycle cryostat at temperatures down to 0.300 K and magnetic fields up to 12 T.

Yeni Malzemelerin Düşük sıcaklık Magnetotransport Ölçüm İleri Deneysel Yöntemler

Novel electronic materials are often produced for the first time by synthesis processes that yield bulk crystals (in contrast to single crystal thin film ...

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potential for next-generation electronic materials, but to-date have mostly been deposited by physical methods. This work outlines a method for depositing SrTiO3 (STO) on germanium using ALD. Germanium has higher carrier mobilities than silicon and therefore offers an alternative semiconductor material with faster device operation. This method takes advantage of the instability of germanium's native oxide by using thermal deoxidation to clean and reconstruct the Ge (001) surface to the 2&#215;1 structure. 2-nm thick, amorphous STO is then deposited by ALD. The STO film is annealed under ultra-high vacuum and crystallizes on the reconstructed Ge surface. Reflection high-energy electron diffraction (RHEED) is used during this annealing step to monitor the STO crystallization. The thin, crystalline layer of STO acts as a template for subsequent growth of STO that is crystalline as-grown, as confirmed by RHEED. In situ X-ray photoelectron spectroscopy is used to verify film stoichiometry before and after the annealing step, as well as after subsequent STO growth. This procedure provides framework for additional perovskite oxides to be deposited on semiconductors via chemical methods in addition to the integration of more sophisticated heterostructures already achievable by physical methods.

This work details the procedures for the growth and characterization of crystalline SrTiO3 directly on germanium substrates by atomic layer deposition. The procedure illustrates the ability of an all-chemical growth method to integrate oxides monolithically onto semiconductors for metal-oxide semiconductor devices.

Atomik Katman Biriktirme aracılığıyla Germanyum üzerinde Perovskit Stronsiyum Titanate Epitaksiyel Büyüme

Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and ...

Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

Flexible photodetectors have been intensely studied for the use of curved image sensors, which are a crucial component in bio-inspired imaging systems, but several challenging points remain, such as a low absorption efficiency due to a thin active layer and low flexibility. We present an advanced method to fabricate a flexible phototransistor array with an improved electrical performance. The outstanding electrical performance is driven by a low dark current owing to deep impurity doping. Stretchable and flexible metal interconnectors simultaneously offer electrical and mechanical stabilities in a highly deformed state. The protocol explicitly describes the fabrication process of the phototransistor using a thin silicon membrane. By measuring I-V characteristics of the completed device in deformed states, we demonstrate that this approach improves the mechanical and electrical stabilities of the phototransistor array. We expect that this approach to a flexible phototransistor can be widely used for the applications of not only next-generation imaging systems/optoelectronics but also wearable devices such as tactile/pressure/temperature sensors and health monitors.

We present a detailed method to fabricate a deformable lateral NIPIN phototransistor array for curved image sensors. The phototransistor array with an open mesh form, which is composed of thin silicon islands and stretchable metal interconnectors, provides flexibility and stretchability. The parameter analyzer characterizes the electrical property of the fabricated phototransistor.

Esnek görüntü sensörü imalatı Lateral NIPIN Phototransistors dayalı.

Flexible photodetectors have been intensely studied for the use of curved image sensors, which are a crucial component in bio-inspired imaging systems, ...

Bulk and Thin Film Synthesis of Compositionally Variant Entropy-stabilized Oxides

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (Cu variant) entropy-stabilized oxides. Phase pure and chemically homogeneous (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (x = 0.20, 0.27, 0.33) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (x = 0.11, 0.27) ceramic pellets are synthesized and used in the deposition of ultra-high quality, phase pure, single crystalline thin films of the target stoichiometry. A detailed methodology for the deposition of smooth, chemically homogeneous, entropy-stabilized oxide thin films by pulsed laser deposition on (001)-oriented MgO substrates is described. The phase and crystallinity of bulk and thin film materials are confirmed using X-ray diffraction. Composition and chemical homogeneity are confirmed by X-ray photoelectron spectroscopy and energy dispersive X-ray spectroscopy. The surface topography of thin films is measured with scanning probe microscopy. The synthesis of high quality, single crystalline, entropy-stabilized oxide thin films enables the study of interface, size, strain, and disorder effects on the properties in this new class of highly disordered oxide materials.

The synthesis of high quality bulk and thin film (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O entropy-stabilized oxides is presented.

Toplu ve bileşimsel varyant entropi stabilize oksit ince Film sentezi

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and ...

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

Two-dimensional (2D) materials have attracted huge attention due to their unique properties and potential applications. Since wafer scale synthesis of 2D materials is still in nascent stages, scientists cannot fully rely on traditional semiconductor techniques for related research. Delicate processes from locating the materials to electrode definition need to be well controlled. In this article, a universal fabrication protocol required in manufacturing nanoscale electronics, such as 2D quasi-heterojunction bipolar transistors (Q-HBT), and 2D back-gated transistors are demonstrated. This protocol includes the determination of material position, electron beam lithography (EBL), metal electrode definition, et al. A step by step narrative of the fabrication procedures for these devices are also presented. Furthermore, results show that each of the fabricated devices has achieved high performance with high repeatability. This work reveals a comprehensive description of process flow for preparing 2D nano-electronics, enables the research groups to access this information, and pave the way toward future electronics.

The article aims to introduce a standard and reliable fabrication procedure for the development of future low dimensional nanoelectronics.

İki boyutlu nanoelektronik imal etmek standart ve güvenilir bir yöntem

Two-dimensional (2D) materials have attracted huge attention due to their unique properties and potential applications. Since wafer scale synthesis of 2D ...

Measuring Magnetically-Tuned Ferroelectric Polarization in Liquid Crystals

Materials showing coupling phenomena between magnetism and (ferro)electricity, i.e., magnetoelectric effects, have attracted a great deal of attention due to their potential applications for future device technologies such as sensors and storage. However, conventional approaches, which usually utilize materials containing magnetic metal ions (or radicals), have a major problem: only a few materials have been found to show the coupling phenomena at room temperature. Recently, we proposed a new approach to achieve room-temperature magnetoelectrics. In contrast to conventional approaches, our alternative proposal focuses on a completely different material, a &#34;liquid crystal&#34;, free from magnetic metal ions. In such liquid crystals, a magnetic field can be utilized to control the orientational state of constituent molecules and the corresponding electric polarization through magnetic anisotropy of the molecules; it is an unprecedented mechanism of the magnetoelectric effect. In this context, this paper provides a protocol to measure ferroelectric properties induced by a magnetic field, that is, the direct magnetoelectric effect, in a liquid crystal. With the method detailed here, we successfully detected magnetically-tuned electric polarization in the chiral smectic C phase of a liquid crystal at room temperature. Taken together with the flexibility of constituent molecules, which directly affects the magnetoelectric responses, the introduced method will serve to allow liquid crystal cells to acquire more functions as room-temperature magnetoelectrics and associated optical materials.

In this report, we present a protocol to examine direct magnetoelectric effects, i.e., induction of ferroelectric polarization by applying magnetic fields, in liquid crystals. This protocol provides a unique approach, supported by the softness of liquid crystals, to achieve room-temperature magnetoelectrics.

Manyetik olarak ayarlı ölçüm Ferroelectric polarizasyon sıvı kristaller içinde

Materials showing coupling phenomena between magnetism and (ferro)electricity, i.e., magnetoelectric effects, have attracted a great deal of attention due ...

Fabricating van der Waals Heterostructures with Precise Rotational Alignment

In this work we describe a technique for creating new crystals (van der Waals heterostructures) by stacking distinct ultrathin layered 2D materials. We demonstrate not only lateral control but, importantly, also control over the angular alignment of adjacent layers. The core of the technique is represented by a home-built transfer setup which allows the user to control the position of the individual crystals involved in the transfer. This is achieved with sub-micrometer (translational) and sub-degree (angular) precision. Prior to stacking them together, the isolated crystals are individually manipulated by custom-designed moving stages that are controlled by a programmed software interface. Moreover, since the entire transfer setup is computer controlled, the user can remotely create precise heterostructures without coming into direct contact with the transfer setup, labeling this technique as &#8220;hands-free&#8221;. In addition to presenting the transfer set-up, we also describe two techniques for preparing the crystals that are subsequently stacked.

In this work we describe a technique that is used to create new crystals (van der Waals heterostructures) by stacking ultrathin layered 2D materials with precise control over position and relative orientation.

Hassas rotasyonel hizalama ile Van der Waals Heterostructures imalatı

In this work we describe a technique for creating new crystals (van der Waals heterostructures) by stacking distinct ultrathin layered 2D materials. We ...