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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

DOI :

10.3791/3725-v

July 2nd, 2012

July 2nd, 2012

14,538 Views

1Mechanical and Aerospace Engineering, University of Texas at Arlington

A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.

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