Questo lavoro è stato finanziato in parte attraverso NSFDMI-0508454, NSF / LEQSF (2006)-Pfund-53, NSF-CMMI-0811888, e NSF-CMMI-0900595 sovvenzioni.

<ol>
	<li>Menon, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Conducting+polymers:+Nobel+Prize+in+Chemistry,+2000.">Conducting polymers: Nobel Prize in Chemistry, 2000.</a> Current Science. 79, 1632 (2000).</li><li>Inzelt, G., Pineri, M., Schultze, J. W., Vorotyntsev, M. A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Electron+and+proton+conducting+polymers:+recent+developments+and+prospects.">Electron and proton conducting polymers: recent developments and prospects.</a> Electrochimica Acta. 45, 2403 (2000).</li><li>Adhikari, B., Majumdar, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Polymers+in+sensor+applications.">Polymers in sensor applications.</a> Progress in Polymer Science. 29, 699 (2004).</li><li>Chakraborty, A., Liu, X., Parthasarathi, G., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=An+intermediate-layer+lithography+method+for+generating+multiple+microstructures+made+of+different+conducting+polymers.">An intermediate-layer lithography method for generating multiple microstructures made of different conducting polymers.</a> Microsystem Technologies. 13 (8), 1175 (2007).</li><li>Madou, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Fundamentals of Microfabrication. , (1995).</li><li>Bustillo, J. M., Howe, R. T., Muller, R. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Surface+micromachining+for+microelectromechanical+systems.">Surface micromachining for microelectromechanical systems.</a> Proceedings of the IEEE. 86, 1552 (1998).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Intermediate-layer+lithography+for+producing+metal+micropatterns.">Intermediate-layer lithography for producing metal micropatterns.</a> Journal of Vacuum Science and Technology B. 25, 677 (2007).</li><li>Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Multiple+conducting+polymer+microwire+sensors.">Multiple conducting polymer microwire sensors.</a> Microsystem Technologies. 15, 1737 (2009).</li><li>Chakraborty, A., Liu, X., Luo, C., Mason, E. C., Weber, A. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Polypyrrole: A new patterning approach and applications. Polypyrrole: Properties, Performance and Applications. , (2011).</li><li>Poddar, R., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=A+novel+approach+to+fabricate+a+PPy/p-type+Si+heterojunction.">A novel approach to fabricate a PPy/p-type Si heterojunction.</a> Solid-State Electronics. 50, 1687 (2006).</li><li>Liu, X., Chakraborty, A., Luo, C., Martingale, J. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Generation of all-polymeric diodes and capacitors using an innovative intermediate-layer lithography. Progress in Solid State Electronics Research. , 127-139 (2008).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+Au+sidewall+micropatterns+using+a+Si-reinforced+PDMS+mold.">Fabrication of Au sidewall micropatterns using a Si-reinforced PDMS mold.</a> Sensors and Actuators A. 152, 96 (2009).</li><li>Liu, X., Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+the+sidewalls+of+a+thermal+shape+memory+polystyreme+block.">Fabrication of micropatterns on the sidewalls of a thermal shape memory polystyreme block.</a> Journal of Micromechanics and Microengineering. 20, 095025 (2010).</li><li>Chakraborty, A., Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+channel+sidewalls+using+strain-recovery+property+of+a+shape-memory+polymer.">Fabrication of micropatterns on channel sidewalls using strain-recovery property of a shape-memory polymer.</a> Sensors and Actuators A. , (2011).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+supe-hydrophobic+channels.">Fabrication of supe-hydrophobic channels.</a> Journal of Micromechanics and Microengineering. 20, 25029 (2010).</li><li>Luo, C., Meng, F., Liu, X., Guo, Y. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Reinforcement+of+PDMS+master+using+an+oxide-coated+silicon+plate.">Reinforcement of PDMS master using an oxide-coated silicon plate.</a> Microelectronics Journal. 37, 5 (2006).</li><li>Luo, C., Garra, J., Schneider, T., White, R., Currie, J., Paranjape, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Thermal+ablation+of+PMMA+for+water+release+using+a+microheater.">Thermal ablation of PMMA for water release using a microheater.</a> Sensors and Actuators A. 114, 123 (2004).</li></ol>

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Risoluzione dei problemi di informazioni: i punti critici per quanto riguarda la generazione di microdisegnature single-e multi-strato di polimeri conduttori e metalli usando l&#39;operazione di &quot;taglio&quot;: (1) Temperatura di goffratura assicura fluidità dello strato intermedio PMMA che genera i risultati ottimali. Si consiglia di avviare al limite inferiore dell&#39;intervallo di temperatura e aumentare gradualmente se i risultati desiderati non sono raggiunti. Troppo alta temperatura possono ...

<table border="1"><tbody><tr><td> Nome del reattivo </td><td> Azienda </td><td> Numero di catalogo </td><td> Comments </td></tr><tr><td> PMMA </td><td> Sigma-Aldrich Co. </td><td> 495C9 </td><td> Il solvente è cholorobenzene. Maneggiare soluzione PMMA sotto una cappa aspirante con ventilazione adeguata. Non respirare il vapore. Consultare MSDS per le istruzioni di manipolazione sicura. </td></tr><tr><td> PpY </td><td> Sigma-Aldrich Co. </td><td> - </td><td> 5% in peso in acqua. Usato come ricevuto. </td></tr><tr><td> PEDOT-PSS </td><td> HC Starck Co. </td><td> Baytron P V4 HC </td><td> Proprietary solvente. Usato come ricevuto. </td></tr><tr><td> Spani </td><td> Sigma-Aldrich Co. </td><td> - </td><td> L&#39;acqua forma solubile. Usato come ricevuto. </td></tr><tr><td> Goffratura macchina a caldo </td><td> JenoptikMikrotechnik Co. </td><td> HEX 01/LT </td><td></td></tr><tr><td> Sputter macchina </td><td> Cressington Co. </td><td> 208HR </td><td></td></tr><tr><td> FIB macchina </td><td> Zeiss Co. </td><td> FIB Crossbeam 1540 XB </td><td></td></tr><tr><td> Spin coater </td><td> Headway Reseach Co. </td><td> PWM32-PS-R790 Spinner sistema </td><td></td></tr><tr><td> RIE macchina </td><td> Technics MicroRIE Co. </td><td> - </td><td></td></tr><tr><td> Photoresist </td><td> Shipley Co. </td><td> S1813 </td><td></td></tr><tr><td> PDMS </td><td> Dow Corning </td><td> Sylgard 184 silicone kit elastomero </td><td></td></tr><tr><td> HDPE foglio </td><td> Incorporare gli Stati Uniti in plastica </td><td> - </td><td></td></tr><tr><td> PMMA </td><td> Cyro Co. </td><td> - </td><td></td></tr><tr><td> Double-sided Adhesive nastro </td><td> Scotch Co. </td><td> - </td><td></td></tr><tr><td> Un solo lato del nastro </td><td> Delphon Co. </td><td> Ultratape # 1310 </td><td></td></tr><tr><td> Micropipette di vetro </td><td> FHC Co. </td><td> 30-30-1 </td><td></td></tr><tr><td> Clip </td><td> Office Depot Co. </td><td> Bulldog Clip </td><td></td></tr><tr><td> Umidificatore </td><td> Vicks Co. </td><td> Filtro umidificatore libero </td><td></td></tr></tbody></table>

micropunching lithography for generating micro- and submicron-patterns on polymer substrates

Polimeri conduttori hanno attirato grande attenzione dal momento che la scoperta di alta conducibilità in poliacetilene drogato nel 1977 1. Essi offrono i vantaggi di peso ridotto, facile sartoria di proprietà e un ampio spettro di applicazioni 2,3. Grazie alla sensibilità dei polimeri conduttori alle condizioni ambientali (ad esempio, aria, soluzioni di ossigeno, umidità, temperatura elevata e chimica), tecniche litografiche presentano notevoli sfide tecniche quando si lavora con questi materiali 4. Ad esempio, gli attuali metodi fotolitografiche, come ultravioletta (UV), sono inadatti per patterning i polimeri conduttori a causa del coinvolgimento dei processi di attacco chimico ad umido e / o secco in questi metodi. Inoltre, le attuali micro / nanosistemi hanno principalmente una forma planare 5,6. Uno strato di strutture è costruito sulle superfici superiori di un altro strato di caratteristiche fabbricati. Più livelli di queste strutture sono impilati insieme per formare su numerosi dispositiviun substrato comune. Le superfici laterali delle microstrutture non sono stati utilizzati in dispositivi costruzione. D&#39;altra parte, i modelli laterali potrebbe essere utilizzato, ad esempio, di costruire 3-D circuiti, modificare canali fluidici e diretto crescita orizzontale di nanofili e nanotubi. Un metodo macropunching è stato applicato nel settore della produzione di creare macropatterns in lamiera da oltre cento anni. Motivati ​​da questo approccio, abbiamo sviluppato un metodo di litografia micropunching (MPL) per superare gli ostacoli di patterning polimeri conduttori e la generazione di modelli laterali. Come il metodo macropunching, la MPL comprende inoltre due operazioni (Fig. 1): (i) di taglio, e (ii) disegno. L&#39;operazione di &quot;taglio&quot; è stato applicato al modello tre polimeri conduttori 4, polipirrolo (PpY), poli (3,4-ethylenedioxythiophen)-poli (4-styrenesulphonate) (PEDOT) e polianilina (PANI). È stato anche impiegato per creare microstrutture Al 7. Le microstrutture fabbricate di polimeri conduttori sono stati usati come umidità 8, chimica 8, e glucosio sensori 9. Microstrutture combinati di Al e polimeri conduttori sono stati impiegati per fabbricare condensatori e eterogiunzioni vari 9,10,11. L&#39;operazione di &quot;taglio&quot; è stato applicato anche per generare i modelli inferiori al micron, come la 100 - e le linee PpY da 500 nm a livello, nonché 100-nm a livello fili Au. L&#39;operazione di &quot;disegno&quot; è stato impiegato per due applicazioni: (i) produzione di modelli di Au laterali in polietilene ad alta densità (HDPE), canali che potrebbero essere utilizzati per la costruzione di microsistemi 3D 12,13,14, e (ii) fabbricare polidimetilsilossano (PDMS) micropillars su substrati HDPE per aumentare l&#39;angolo di contatto del canale 15.

Watch this Scientific Journal Video about Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates at JoVE.com

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Un approccio litografia micropunching è sviluppato per generare micro-e submicroniche modelli sopra, fianchi e superfici di fondo di polimero substrati. Esso supera gli ostacoli patterning di polimeri conduttori e generare modelli laterali. Questo metodo permette una rapida realizzazione di funzioni multiple ed è libero di chimica aggressiva.

Micropunching litografia per la generazione di Micro-e submicroniche modelli sul Polymer Substrati

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of ...

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15.1K Views.  University of Texas at Arlington. Un approccio litografia micropunching è sviluppato per generare micro-e submicroniche modelli sopra, fianchi e superfici di fondo di polimero substrati. Esso supera gli ostacoli patterning di polimeri conduttori e generare modelli laterali. Questo metodo permette una rapida realizzazione di funzioni multiple ed è libero di chimica aggressiva.

Video: Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Ultrahigh Density Array of Vertically Aligned Small-molecular Organic Nanowires on Arbitrary Substrates

In recent years &pi;-conjugated organic semiconductors have emerged as the active material in a number of diverse applications including large-area, low-cost displays, photovoltaics, printable and flexible electronics and organic spin valves. Organics allow (a) low-cost, low-temperature processing and (b) molecular-level design of electronic, optical and spin transport characteristics. Such features are not readily available for mainstream inorganic semiconductors, which have enabled organics to carve a niche in the silicon-dominated electronics market. The first generation of organic-based devices has focused on thin film geometries, grown by physical vapor deposition or solution processing. However, it has been realized that organic nanostructures can be used to enhance performance of above-mentioned applications and significant effort has been invested in exploring methods for organic nanostructure fabrication.	
A particularly interesting class of organic nanostructures is the one in which vertically oriented organic nanowires, nanorods or nanotubes are organized in a well-regimented, high-density array. Such structures are highly versatile and are ideal morphological architectures for various applications such as chemical sensors, split-dipole nanoantennas, photovoltaic devices with radially heterostructured "core-shell" nanowires, and memory devices with a cross-point geometry. Such architecture is generally realized by a template-directed approach. In the past this method has been used to grow metal and inorganic semiconductor nanowire arrays. More recently &pi;-conjugated polymer nanowires have been grown within nanoporous templates. However, these approaches have had limited success in growing nanowires of technologically important &pi;-conjugated small molecular weight organics, such as tris-8-hydroxyquinoline aluminum (Alq3), rubrene and methanofullerenes, which are commonly used in diverse areas including organic displays, photovoltaics, thin film transistors and spintronics.	
Recently we have been able to address the above-mentioned issue by employing a novel "centrifugation-assisted" approach. This method therefore broadens the spectrum of organic materials that can be patterned in a vertically ordered nanowire array. Due to the technological importance of Alq3, rubrene and methanofullerenes, our method can be used to explore how the nanostructuring of these materials affects the performance of aforementioned organic devices. The purpose of this article is to describe the technical details of the above-mentioned protocol, demonstrate how this process can be extended to grow small-molecular organic nanowires on arbitrary substrates and finally, to discuss the critical steps, limitations, possible modifications, trouble-shooting and future applications.

We report a simple method for fabricating an ultrahigh density array of vertically ordered small-molecular organic nanowires. This method allows for synthesis of complex heterostructured hybrid nanowire geometries, which can be inexpensively grown on arbitrary substrates. These structures have potential applications in organic electronics, optoelectronics, chemical sensing, photovoltaics and spintronics.

Altissima densità Array of allineato verticalmente Nanofili organici piccola molecolari su substrati arbitrarie

In  recent years &pi;-conjugated  organic semiconductors have emerged as the active material in a number of  diverse applications including large-area, ...

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Micro-masonry for 3D Additive Micromanufacturing

Transfer printing is a method to transfer solid micro/nanoscale materials (herein called &#8216;inks&#8217;) from a substrate where they are generated to a different substrate by utilizing elastomeric stamps. Transfer printing enables the integration of heterogeneous materials to fabricate unexampled structures or functional systems that are found in recent advanced devices such as flexible and stretchable solar cells and LED arrays. While transfer printing exhibits unique features in material assembly capability, the use of adhesive layers or the surface modification such as deposition of self-assembled monolayer (SAM) on substrates for enhancing printing processes hinders its wide adaptation in microassembly of microelectromechanical system (MEMS) structures and devices. To overcome this shortcoming, we developed an advanced mode of transfer printing which deterministically assembles individual microscale objects solely through controlling surface contact area without any surface alteration. The absence of an adhesive layer or other modification and the subsequent material bonding processes ensure not only mechanical bonding, but also thermal and electrical connection between assembled materials, which further opens various applications in adaptation in building unusual MEMS devices.

This paper introduces a 3D additive micromanufacturing strategy (termed &#8216;micro-masonry&#8217;) for the flexible fabrication of microelectromechanical system (MEMS) structures and devices. This approach involves transfer printing-based assembly of micro/nanoscale materials in conjunction with rapid thermal annealing-enabled material bonding techniques.

Micro-muratura per 3D Additivo Micromanufacturing

Transfer printing is a method to transfer solid micro/nanoscale materials (herein called &#8216;inks&#8217;) from a substrate where they are generated to ...

Preparation and Friction Force Microscopy Measurements of Immiscible, Opposing Polymer Brushes

Solvated polymer brushes are well known to lubricate high-pressure contacts, because they can sustain a positive normal load while maintaining low friction at the interface. Nevertheless, these systems can be sensitive to wear due to interdigitation of the opposing brushes. In a recent publication, we have shown via molecular dynamics simulations and atomic force microscopy experiments, that using an immiscible polymer brush system terminating the substrate and the slider surfaces, respectively, can eliminate such interdigitation. As a consequence, wear in the contacts is reduced. Moreover, the friction force is two orders of magnitude lower compared to traditional miscible polymer brush systems. This newly proposed system therefore holds great potential for application in industry. Here, the methodology to construct an immiscible polymer brush system of two different brushes each solvated by their own preferred solvent is presented. The procedure how to graft poly(N-isopropylacrylamide) (PNIPAM) from a flat surface and poly(methyl methacrylate) (PMMA) from an atomic force microscopy (AFM) colloidal probe is described. PNIPAM is solvated in water and PMMA in acetophenone. Via friction force AFM measurements, it is shown that the friction for this system is indeed reduced by two orders of magnitude compared to the miscible system of PMMA on PMMA solvated in acetophenone.

The methodology to perform friction force microscopy experiments for contacting brushes is presented: Two polymer brushes that are grafted from (a) substrates and (b) colloidal probes are slid to show that, by using two contacting immiscible brush systems, friction in sliding contacts is reduced compared to miscible brush systems.

Preparazione e attrito Forza Microscopia Misure di Immiscibile, Opposing Pennelli Polymer

Solvated polymer brushes are well known to lubricate high-pressure contacts, because they can sustain a positive normal load while maintaining low ...

Electroactive Polymer Nanoparticles Exhibiting Photothermal Properties

A method for the synthesis of electroactive polymers is demonstrated, starting with the synthesis of extended conjugation monomers using a three-step process that finishes with Negishi coupling. Negishi coupling is a cross-coupling process in which a chemical precursor is first lithiated, followed by transmetallation with ZnCl2. The resultant organozinc compound can be coupled to a dibrominated aromatic precursor to give the conjugated monomer. Polymer films can be prepared via electropolymerization of the monomer and characterized using cyclic voltammetry and ultraviolet-visible-near infrared (UV-Vis-NIR) spectroscopy. Nanoparticles (NPs) are prepared via emulsion polymerization of the monomer using a two-surfactant system to yield an aqueous dispersion of the polymer NPs. The NPs are characterized using dynamic light scattering, electron microscopy, and UV-Vis-NIR-spectroscopy. Cytocompatibility of NPs is investigated using the cell viability assay. Finally, the NP suspensions are irradiated with a NIR laser to determine their effectiveness as potential materials for photothermal therapy (PTT).

A protocol is presented for the synthesis and preparation of nanoparticles consisting of electroactive polymers.

Proprietà elettroattivo Polymer Nanoparticelle Esporre fototermiche

A method for the synthesis of electroactive polymers is demonstrated, starting with the synthesis of extended conjugation monomers using a three-step ...

Adsorption Device Based on a Langatate Crystal Microbalance for High Temperature High Pressure Gas Adsorption in Zeolite H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate crystal microbalance, LCM) and its use for gas adsorption measurements in zeolite H-ZSM-5. Prior to the adsorption measurements, zeolite H-ZSM-5 crystals were synthesized on the gold electrode in the center of the LCM, without covering the connection points of the gold electrodes to the oscillator, by the steam-assisted crystallization (SAC) method, so that the zeolite crystals remain attached to the oscillating microbalance while keeping good electroconductivity of the LCM during the adsorption measurements. Compared to a conventional quartz crystal microbalance (QCM) which is limited to temperatures below 80 &#176;C, the LCM can realize the adsorption measurements in principle at temperatures as high as 200-300 &#176;C (i.e., at or close to the reaction temperature of the target application of one-stage DME synthesis from the synthesis gas), owing to the absence of crystalline-phase transitions up to its melting point (1,470 &#176;C). The system was applied to investigate the adsorption of CO2, H2O, methanol and dimethyl ether (DME), each in the gas phase, on zeolite H-ZSM-5 in the temperature and pressure range of 50-150 &#176;C and 0-18 bar, respectively. The results showed that the adsorption isotherms of these gases in H-ZSM-5 can be well fitted by Langmuir-type adsorption isotherms. Furthermore, the determined adsorption parameters, i.e., adsorption capacities, adsorption enthalpies, and adsorption entropies, compare well to literature data. In this work, the results for CO2 are shown as an example.

A protocol for high-temperature and high-pressure gas adsorption measurements on zeolite H-ZSM-5 using an adsorption measurement device based on a langatate crystal microbalance is presented. Prior to the adsorption measurements, the synthesis of zeolite H-ZSM-5 on the langatate crystal microbalance sensor by the steam-assisted crystallization (SAC) method is demonstrated.

Dispositivo adsorbimento Sulla base di un Langatate cristallo Microbilancia per ALTA TEMPERATURA ALTA PRESSIONE adsorbimento di gas a Zeolite H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate ...

Morphology Control for Fully Printable Organic&#8211;Inorganic Bulk-heterojunction Solar Cells Based on a Ti-alkoxide and Semiconducting Polymer

The photoactive layer of a typical organic thin-film bulk-heterojunction (BHJ) solar cell commonly uses fullerene derivatives as the electron-accepting material. However, fullerene derivatives are air-sensitive; therefore, air-stable material is needed as an alternative. In the present study, we propose and describe the properties of Ti-alkoxide as an alternative electron-accepting material to fullerene derivatives to create highly air-stable BHJ solar cells. It is well-known that controlling the morphology in the photoactive layer, which is constructed with fullerene derivatives as the electron acceptor, is important for obtaining a high overall efficiency through the solvent method. The conventional solvent method is useful for high-solubility materials, such as fullerene derivatives. However, for Ti-alkoxides, the conventional solvent method is insufficient, because they only dissolve in specific solvents. Here, we demonstrate a new approach to morphology control that uses the molecular bulkiness of Ti-alkoxides without the conventional solvent method. That is, this method is one approach to obtain highly efficient, air-stable, organic-inorganic bulk-heterojunction solar cells.

A method for fully printable, fullerene-free, highly air-stable, bulk-heterojunction solar cells based on Ti alkoxides as the electron acceptor and the electron-donating polymer fabrication is described here. Moreover, a method for controlling the morphology of the photoactive layer through the molecular bulkiness of the Ti-alkoxide units is reported.

Controllo Morfologia per Bulk-eterogiunzione completamente stampabili celle solari organiche-inorganici a base di un Ti-alcossido e semiconduttore Polymer

The photoactive layer of a typical organic thin-film bulk-heterojunction (BHJ) solar cell commonly uses fullerene derivatives as the electron-accepting ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

Fabbricazione di microsfere di polimeri per risonatore ottico e applicazioni laser

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing in combination with new nanofabrication techniques. A plasmon is a quantum of charge density oscillation that lends nanoscale metals such as gold and silver unique optical properties. In particular, gold and silver nanoparticles exhibit localized surface plasmon resonances-collective charge density oscillations on the surface of the nanoparticle-in the visible spectrum. Here, we focus on the fabrication of periodic arrays of anisotropic plasmonic nanostructures. These half-shell (or nanocup) structures can exhibit additional unique light-bending and polarization-dependent optical properties that simple isotropic nanostructures cannot. Researchers are interested in the fabrication of periodic arrays of nanocups for a wide variety of applications such as low-cost optical devices, surface-enhanced Raman scattering, and tamper indication. We present a scalable technique based on colloidal lithography in which it is possible to easily fabricate large periodic arrays of nanocups using spin-coating and self-assembled commercially available polymeric nanospheres. Electron microscopy and optical spectroscopy from the visible to near-infrared (near-IR) was performed to confirm successful nanocup fabrication. We conclude with a demonstration of the transfer of nanocups to a flexible, conformal adhesive film.

We demonstrate the fabrication of periodic gold nanocup arrays using colloidal lithographic techniques and discuss the importance of nanoplasmonic films.

Fabbricazione di matrici Nanocup oro periodica mediante Litografia colloidale

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing ...

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF) magnetron sputtering. LSMO nanoparticles were deposited with diameters from 10 to 20 nm and heights between 20 and 50 nm. At the same time, (Gd) Ba2Cu3O7&#8722;&#948; ((Gd) BCO) films were fabricated on both undecorated and LSMO nanoparticle decorated STO substrates using RF magnetron sputtering. This report also describes the properties of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 quasi-bilayer films structures (e.g., crystalline phase, morphology, chemical composition); magnetization, magneto-transport, and superconducting transport properties were also evaluated.

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7ÃƒÆ’Ã‚Â¢Ãƒâ€¹Ã¢â‚¬Â 'ÃƒÆ’Ã…Â½ Â´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates

Here, we present a protocol to grow LSMO nanoparticles and (Gd) BCO films on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF)-sputtering.

Radio frequenza Magnetron Sputtering di GdBa2Cu3O7−δ/ La0.67Sr0.33MnO3 quasi-bilayer film su substrati di singolo-cristallo di SrTiO3 (STO)

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio ...

Generating Lap Joints Via Friction Stir Spot Welding on DP780 Steel

Friction stir spot welding (FSSW), a derivative of friction stir welding (FSW), is a solid-state welding technique that was developed in 1991. An industry application was found in the automotive industry in 2003 for the aluminum alloy that was used in the rear doors of automobiles. Friction stir spot welding is mostly used in Al alloys to create lap joints. The benefits of friction stir spot welding include a nearly 80% melting temperature that lowers the thermal deformation welds without splashing compared to resistance spot welding. Friction stir spot welding includes 3 steps: plunging, stirring, and retraction. In the present study, other materials including high strength steel are also used in the friction stir welding method to create joints. DP780, whose traditional welding process involves the use of resistance spot welding, is one of several high strength steel materials used in the automotive industry. In this paper, DP780 was used for friction stir spot welding, and its microstructure and microhardness were measured. The microstructure data showed that there was a fusion zone with fine grain and a heat effect zone with island martensite. The microhardness results indicated that the center zone exhibited a greater degree of hardness compared with the base metal. All data indicated that the friction stir spot welding used in dual phase steel 780 can create a good lap joint. In the future, friction stir spot welding can be used in high-strength steel welding applied in industrial manufacturing processes.

Here, we present a friction stir spot welding (FSSW) protocol on dual phase 780 steel. A tool pin with high-speed rotation generates heat from friction to soften the material, and then, the pin plunges into 2 sheet joints to create the lap joint.

Generazione di giunti a giro tramite saldatura spot di attrito su ACCIAIO DP780

Friction stir spot welding (FSSW), a derivative of friction stir welding (FSW), is a solid-state welding technique that was developed in 1991. An industry ...