Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy
2.5K Views
•
07:20 min
•
April 21st, 2022
DOI :
April 21st, 2022
•Explore More Videos
Chapters in this video
0:04
Introduction
0:55
Pattern the Photoresist and Silicon Nitride‐Deposited Si Wafer (SixNy)
2:31
Etching the Si and Eliminating the KOH Etching Residues
3:21
Prepare the Micro‐Patterned SixNy and Eliminate the PR
4:25
Transfer Graphene Oxide (GO) by the Drop‐Casting Method
5:30
Results: Analysis of the Micro‐Patterned Chip with GO Windows
6:35
Conclusion
Related Videos
Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
15.3K Views
A Fabrication Method for Highly Stretchable Conductors with Silver Nanowires
9.8K Views
Preparation of Liquid-exfoliated Transition Metal Dichalcogenide Nanosheets with Controlled Size and Thickness: A State of the Art Protocol
13.8K Views
Studying Dynamic Processes of Nano-sized Objects in Liquid using Scanning Transmission Electron Microscopy
12.6K Views
Enhanced Electron Injection and Exciton Confinement for Pure Blue Quantum-Dot Light-Emitting Diodes by Introducing Partially Oxidized Aluminum Cathode
8.7K Views
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10.0K Views
High Throughput Analysis of Liquid Droplet Impacts
6.3K Views
Fabrication and Characterization of Thickness Mode Piezoelectric Devices for Atomization and Acoustofluidics
6.7K Views
In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
4.0K Views
Cryogenic Liquid Jets for High Repetition Rate Discovery Science
2.9K Views
Copyright © 2025 MyJoVE Corporation. All rights reserved