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Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy

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07:20 min

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April 21st, 2022

DOI :

10.3791/63739-v

April 21st, 2022

•

2,470 Views

Min-Ho Kang¹^,², Minyoung Lee³^,⁴, Sungsu Kang³^,⁴, Jungwon Park³^,⁴^,⁵^,⁶

¹Department of Biomedical-Chemical Engineering, The Catholic University of Korea, ²Department of Biotechnology, The Catholic University of Korea, ³School of Chemical and Biological Engineering, and Institute of Chemical Processes, Seoul National University, ⁴Center for Nanoparticle Research, Institute of Basic Science (IBS), ⁵Institute of Engineering Research, College of Engineering, Seoul National University, ⁶Advanced Institutes of Convergence Technology, Seoul National University

章

文字起こし

要約

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Micro patterned Chip

Controlled Thickness

High throughput Cryogenic Electron Microscopy

MEMS Fabrication

Silicon Nitride Membrane

Photoresist Patterning

Reactive Ion Etching

Potassium Hydroxide Etching

3D Structure Analysis

Biomolecules

Drug Discovery

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