作者非常感谢利玛窦加利博士西蒙L. Portalupi博士从帕维亚大学和卢西奥C. Andreani教授的有益讨论相关的遥感技术和测量的执行。

免责声明：以下协议给出了一般的工艺流程，包括光子晶体波导和腔体的制备和表征技术。流进行优化的方法，对于特定的设备，在我们的实验室提供，和参数可能会有所不同，如果其他的试剂或设备使用。 1。样品制备<ol><li>样品劈开 - 以绝缘体上硅（SOI）晶片，并使用金刚石划线划伤从硅表面的边缘大约1-2毫米长的线，确保划痕在晶片的边缘上延伸。划痕对齐的直边缘（ 例如 ，在显微镜载玻片）和应用甚至正压的划伤的两侧：晶片将在暂存位置沿晶面解理。重复此过程来定义整个芯片。 </li><li>样品的注意丙酮的清洁 - 将样品用小镊子一个第二清洁在超声波浴1-2分钟。从丙酮中取出的样品，从样品使用注意异丙醇（30秒）（丙酮，异丙醇是易燃的使用良好的通风，避免所有火源），任何剩余的丙酮冲洗。干燥样品，使用清洁干燥的氮气枪。 </li><li>旋转抵抗 - 上旋涂机将样品。移液器电子敏感的抵抗注意ZEP520A（ZEP520A是易燃的，对人体有害，应避免吸入和接触皮肤和眼睛）在样品上 - 使用足够的抵抗完全覆盖样品没有抵抗的边缘流过。旋转样本，以便得到一个大约。 350 nm厚的膜和烘烤10分钟，在180℃的加热板上对。我们发现，这个厚度是最佳的厚度，平衡的分辨率和耐蚀刻性（见下文）。 </li></ol> 2。图案定义<ol><li>设计 - 使用合适的软件，模拟所需的光子晶体图案。麻木洱有用的套装软体，包括但不限于：麻省理工学院光子带（MPB），全波（RSoft），MIT电磁方程传播（MEEP）。 </li><li>模式生成-创建30曝光文件（GDS格式一般）和接近错误正确使用合适的软件。 </li><li>模式曝光 - 加载样品室的电子束光刻系统（LEO 1530 /瑞瑟Elphy的）和抽空。一旦已取得了真空，超高压电源切换，并设置为30千伏。发布系统1小时，在此状态下，允许样品，舞台和室达到的平衡温度。设置您的具体的电子束光刻系统的用户手册中所指示的曝光。露出样品使用一个合适的基本步长（ 如 2 nm）的（这是最小像素尺寸，该系统可以公开），稳定时间至少在1毫秒（这是系统等待时间之间移动的光束，揭露的特定部分的图案），和面积剂量55μAcm-2。 </li><li>样品开发 - 使用注意二甲苯（二甲苯易燃，剧毒的工作在通风良好的地方，远离火源，避免接触皮肤和眼睛），在温度为23°C开发的样品，持续45秒。在异丙醇冲洗。 </li></ol> 3。彭定康转让<ol><li> RIE商会清洗 - 设置到200sccm氩气和氢气的流速。踩下油门，通过一个蝶形阀，泵，来实现腔室压力为1×10 -1毫巴。设置到100 W的RF功率，点燃等离子体，并运行至少10分钟 - 约700 V的应该观察到的DC偏置。切断后的Ar / H 2等离子体，使腔室泵约1分钟。设定流量的氧气进入到200sccm的腔室，并再次节流腔室的压力降低到1×10 -1毫巴。点燃第二等离子体的氧气与100瓦的功率，并运行5分钟。这些程序后，腔室将是免费的污染物，如聚合物的残基，从以前的任何干式蚀刻。我们之前执行此过程的每一个变化蚀刻配方，以确保最大的可重复性。此过程被优化为我们的系统，该系统包括一个平行板，阴极装，RIE法;用的主腔室直径为12英寸，14英寸的高度，包括一个12英寸的两个节流阀和涡轮分子泵的连接端口与。 </li><li>光子晶体蚀刻-样品加载到的RIE主腔室和泵系统下的背 ​​景&lt;3×10 -6毫巴，以确保腔室是免费的水蒸汽的压力。开始由预调节蚀刻的蚀刻气体（即CHF 3和SF 6）的腔室：两种气体的流率设置到100sccm（ 即设置的气体的比例为1:1），并使用节流阀带来室压力为5×10 <s最多&gt; -2毫巴;允许气体流至少10分钟。预调节后，设置RF功率约20瓦，点燃的等离子体;蚀刻的样品的约2分钟（这些蚀刻参数硅的刻蚀速率为约150纳米/分钟），同时确保室压保持5×10 -2毫巴。应达到200〜220 V之间的直流偏置整个蚀刻期。 </li><li>样品清洗以除去残留的电子敏感的抵抗 - 干法刻蚀，清洗后的样品冲洗注意1165卸妆（1165是易燃品，会刺激眼睛，鼻腔和呼吸道），用超声波搅拌1-2分钟，接着用丙酮和异丙醇正如上文所述（步骤1.2）。 </li><li>膜分离 - 旋涂UV敏感的样品照片抵抗的注意的Microposit S1818 G2（S1818 G2是可燃和会刺激眼睛，鼻腔和呼吸道）（见1.3）。使用的都是适宜的Ë光罩，定义在抗蚀剂使用UV光罩对准光子晶体的模式。露出样品约30-45秒。发展的抗蚀剂的Microposit开发MF-319（MF-319是一种碱性液体，并能引起对眼睛的刺激，鼻腔和呼吸道）30-45秒，在去离子水漂洗后在小心。准备一个塑料烧杯中，注意1:5的氢氟酸（1.1499克/毫升48-51％HF）（HF极强的腐蚀性，容易破坏组织，处理时使用完整的个人防护设备的额定HF）的混合物，以去离子水。请注意，为安全起见，只塑料烧杯和镊子应使用氢氟酸。样品浸没在氢氟酸混合物15分钟。蚀刻后，在去离子水中彻底冲洗的样品。取出剩余的光致抗蚀剂，用丙酮和异丙醇（见步骤1.2） - 从这个阶段及以后超声搅拌不能使用。为了确保样本尽可能的干净，按照丙酮，异丙醇冲洗的冲洗注意Piranha溶液（食人鱼的解决方案是非常有活力，潜在的爆炸性攻击的有机材料，当处理使用个人防护装备），（3:1警告硫酸（硫酸酸具有腐蚀性，毒性很大，处理时使用个人防护装备，并避免吸入蒸气或烟雾）注意过氧化氢（双氧水是非常危险的情况下，皮肤和眼睛的接触，处理时使用个人防护设备））5分钟，然后在去离子水，丙酮和异丙醇冲洗样本。请注意，为安全起见，只有玻璃烧杯和应使用的Piranha溶液金属镊子。 Piranha溶液可以用丙酮或异丙醇接触爆炸，它应远离这些试剂处理。 </li><li>小关节劈开 - 如果准备的光子晶体慢光波导，样品需要方面的裂解。顺劈斩的sa通过以下概述的相同的步骤，在步骤1.1中，除了作为尽可能小的划痕的mple应该被使用。 SOI芯片〜700微米厚的基板可以可靠地切割下来，长4-5毫米样品。 </li></ol> 4。光子晶体慢光波导表征<ol><li>在安装的前期准备工作 - 小心宽带放大自发辐射（ASE）光源（不可见的红外辐射：避免不必要的高功率，盖梁的路径如果可能的话），以3 dB的光纤分路器，并使用每个输出的输出连接光耦合到自由空间的Mach-Zehnder interferometeter仪（MZI），如在图9中所示的两个臂。使用非球面透镜，准直从纤维中的光输出。在一个武器的干涉，使用另外两个非球面镜片，光束的样品芯片和耦合。放置一个偏振分束器（PBS）中的样品臂的TE-极化警示灯吨输入的样本。使用非球面透镜耦合输出光束准直双臂到第二个3 dB光纤分路器，在那里他们将重新组合。连接到红外检测器的输出之一，并使用读出的检测器，以最大限度地提高光耦合到样品中的另一个输出连接到光学频谱分析仪（OSA）的。 MZI的两个臂的应具有大致相同的光学长度，当在样品的存在下：确保MZI的两个臂的纤维具有相同的标称长度，并包括一个可调谐的延迟级，以允许在参考臂精细调整其长度。在样品臂轴精密级上，安装了非球面镜片，以获得最佳的耦合到的样本。 </li><li>调整参考臂长度-光束耦合到一个空白的（ 即没有光子晶体）脊型波导（相同的类型，作为访问波导饲料内的光子晶体的光）的Wi薄的样品臂在同一个芯片中。运行的OSA和连续扫描，观察测量的波长范围。如果这两个武器的MZI有大致相同的光学长度，建设性和破坏性的干扰光谱显示出条纹，这些条纹，则不会出现的MZI的武器有很大的不同的光学长度（厘米）。条纹间隔是成反比的两个臂之间的光学路径长度的差异。移动延迟级，以使参考臂短，并观察在OSA的边缘：如果他们成为致密（稀疏），参考臂短比样品臂（更长）。设置的延迟级，以确保比样品臂和结果的约5至10在10 nm的波长范围内的条纹（参见图10a）中的条纹间距的参考臂短。最后，执行此优化上的设备，可提供的最大延迟时间，然后保持整个测量固定延迟将整个样品。 </li><li>校准运行 - 同时仍然空白波导上对齐，运行三个扫描上的OSA：干扰频谱的一次扫描，为每个单独的两个臂（通过阻断其他臂得到）和一个扫描。使用分辨率为0.05〜0.1 nm的。记录每个测得的光谱。 </li><li>慢光数据采集 - 运行，并记录在芯片上的每个光子晶体波导步骤4.3三种光谱。 </li><li>傅立叶数据分析 - 频谱的干扰（干涉）I（ω）在数学上表示为： I（ω）= S（ω）+ R（ω）+的sqrt [S（ω）R（ω）] {exp〔Iφ（ω） - iωτ] +抄送}的 其中，S（ω）和R（ω）是分开计量的样品和参考臂，分别的谱密度。延迟τ的延迟级的参考臂中所设定的位置。在分散体上的光子晶体波导的信息被包含在相位长期，我们必须从测量数据中提取。 减去非干扰背景S（ω）+ R（ω）从干涉只隔离干扰项。计算傅里叶变换的干扰术语：术语的sqrt（SR）exp〔（Φ-ωτ）]和它的复数共轭对应的峰值集中在t =τ和t =-τ，分别。过滤数字之一，这两个术语和转换到频域。微分相位Φ（ω） - ωτ相对于ω，得到的两个臂之间的群延迟差Δτg时 ，所产生的数据。本组指数N G = C / V G，V G的群速度，计算公式如下： N G =（Δτ 克 光子晶体 - Δτ 克 CAL）C / L + N CAL， 其中Δτ 克 cal时采取酒店fr从校准数据得到嗡空白波导，L是光子晶体波导长度和Ň 校准 = 2.7是参考脊型波导的有效折射率。考虑到延迟从各光学元件的设置的贡献在校准运行，因此，在此步骤中减去，。 </li></ol><ol start="6"><li>透射率曲线 - 计算的传输曲线进行归空白波导的光子晶体光波导的样品光谱。 </li></ol> 5。光子晶体共振腔表征<ol><li>设置-设置（ 图14），为RS的制备包括：开关可交换元件的偏振分束器;插入一个偏振器中的输入臂，以及在输出臂的分析器;翻转成镜探针臂以允许使用的近红外源，允许照明样品。安装样品垂直的轴线方向为45°偏振器（ 图18）上的差分驱动xyz的微块，调整微块，使样品处于对焦及一个空腔中可以看出，如在图15（左）与相机。使用放大自发发射（ASE）光源，光束对准与中心空腔图15（右）。走翻转的照明镜和允许的输出臂进入光谱仪（单色器与连接的阵列检测器）。一个由低到中度分辨率，以确定腔峰开始了广阔的扫描。获得的粗精度为1nm的ASE扫描（ 图16a）中的谐振波长。小心可调激光源（TLS）（ 图16b）（不可见的红外辐射：避免不必要的高功率，盖梁的路径如果可能的话），也有可能获得广泛的扫描。一个人必须小心，分辨率设置为最高值，以采样线宽度的每一个峰值。 </li><li>进行高分辨率扫描所确定的峰 - 输入臂连接的TLS和光束衰减到兆瓦级。通过使由光检测器收集的输出臂和下午1时，分辨率为2 nm范围内，在以前找到的谐振波长为中心设置了一个连续扫描扫描的高分辨率扫描的准备。此步骤的重要性的信号-噪声比（SNR），其目的是改善以获得Lorentzian线的形状共振：改变的 xyz的微块的位置，并重新运行扫描，直至SNR最大化和线路的形状是接近的劳伦兹，在代表性的结果部分所示。 </li></ol>

<ol>
	<li>Baba, T., Kawasaki, T., Sasaki, H., Adachi, J., Mori, D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Large+delay-bandwidth+product+and+tuning+of+slow+light+pulse+in+photonic+crystal+coupled+waveguide.">Large delay-bandwidth product and tuning of slow light pulse in photonic crystal coupled waveguide.</a> Opt. Express. 16 (12), 9245-9253 (2008).</li><li>Melloni, A., Canciamilla, A., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Tunable+delay+lines+in+silicon+photonics:+coupled+resonators+and+photonic+crystals,+a+comparison.">Tunable delay lines in silicon photonics: coupled resonators and photonic crystals, a comparison.</a> IEEE Photon. J. 2 (2), 181-194 (2010).</li><li>Ishikura, N., Baba, T., Kuramochi, E., Notomi, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Large+tunable+fractional+delay+of+slow+light+pulse+and+its+application+to+fast+optical+correlator.">Large tunable fractional delay of slow light pulse and its application to fast optical correlator.</a> Opt. Express. 19 (24), 24102-24108 (2011).</li><li>Beggs, D. M., Rey, I. H., Kampfrath, T., Rotenberg, N., Kuipers, L., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Ultrafast+tunable+optical+delay+line+based+on+indirect+photonic+transitions.">Ultrafast tunable optical delay line based on indirect photonic transitions.</a> Phys. Rev. Lett. 108 (21), 213901 (2012).</li><li>Beggs, D. M., White, T. P., O'Faolain, L., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Ultracompact+and+low-power+optical+switch+based+on+silicon+photonic+crystals.">Ultracompact and low-power optical switch based on silicon photonic crystals.</a> Opt. Lett. 33 (2), 147-149 (2008).</li><li>Nguyen, H. C., Sakai, Y., Shinkawa, M., Ishikura, N., Baba, T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=10+Gb/s+operation+of+photonic+crystal+silicon+optical+modulators.">10 Gb/s operation of photonic crystal silicon optical modulators.</a> Opt. Express. 19 (14), 13000-13007 (1364).</li><li>Kampfrath, T., Beggs, D. M., White, T. P., Melloni, A., Krauss, T. F., Kuipers, L. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Ultrafast+adiabatic+manipulation+of+slow+light+in+a+photonic+crystal.">Ultrafast adiabatic manipulation of slow light in a photonic crystal.</a> Phys. Rev. A. 81 (4), 043837 (2010).</li><li>Monat, C., Corcoran, B., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Slow+light+enhancement+of+nonlinear+effects+in+silicon+engineered+photonic+crystal+waveguides.">Slow light enhancement of nonlinear effects in silicon engineered photonic crystal waveguides.</a> Opt. Express. 17 (4), 2944-2953 (2009).</li><li>Corcoran, B., Monat, C., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=light+emission+in+silicon+through+slow-light+enhanced+third-harmonic+generation+in+photonic-crystal+waveguides.">light emission in silicon through slow-light enhanced third-harmonic generation in photonic-crystal waveguides.</a> Nature Photon. 3, 206-210 (2009).</li><li>Li, J., O'Faolain, L., Rey, I. H., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Four-wave+mixing+in+photonic+crystal+waveguides:+slow+light+enhancement+and+limitations.">Four-wave mixing in photonic crystal waveguides: slow light enhancement and limitations.</a> Opt. Express. 19 (5), 4458-4463 (2010).</li><li>Checoury, X., Han, Z., Boucaud, P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Stimulated+Raman+scattering+in+silicon+photonic+crystal+waveguides+under+continuous+excitation.">Stimulated Raman scattering in silicon photonic crystal waveguides under continuous excitation.</a> Phys. Rev. B. 82 (4), 041308 (2010).</li><li>Y, <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Photonic+crystal+nanocavity+laser+with+a+single+quantum+dot+gain.">Photonic crystal nanocavity laser with a single quantum dot gain.</a> Opt. Express. 17 (18), 15975-15982 (2009).</li><li>Ellis, B., Mayer, M. A., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Ultralow-threshold+electrically+pumped+quantum-dot+photonic-crystal+nanocavity+laser.">Ultralow-threshold electrically pumped quantum-dot photonic-crystal nanocavity laser.</a> Nature Photon. 24, 297-300 (2011).</li><li>Galli, M., Gerace, D., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Low-power+continuous-wave+generation+of+visible+harmonics+in+silicon+photonic+crystal+nanocavities.">Low-power continuous-wave generation of visible harmonics in silicon photonic crystal nanocavities.</a> Opt. Express. 18 (25), 26613-26624 (2010).</li><li>Notomi, M., Shinya, A., Mitsugi, S., Kira, G., Kuramochi, E., Tanabe, T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Optical+bistable+switching+action+of+Si+high-Q+photonic-crystal+nanocavities.">Optical bistable switching action of Si high-Q photonic-crystal nanocavities.</a> Opt. Express. 13 (7), 2678-2687 (2005).</li><li>Shambat, G., Rivoire, K., Lu, J., Hatami, F., Vu&#269;kovi&#269;, J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Tunable-wavelength+second+harmonic+generation+from+GaP+photonic+crystal+cavities+coupled+to+fiber+tapers.">Tunable-wavelength second harmonic generation from GaP photonic crystal cavities coupled to fiber tapers.</a> Opt. Express. 18 (12), 12176-12184 (2010).</li><li>Fan, S., Villeneuve, P. R., Joannopoulos, J. D., Haus, H. A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Channel+drop+filters+in+photonic+crystals.">Channel drop filters in photonic crystals.</a> Opt. Express. 3 (1), 4-11 (1998).</li><li>Tanabe, T., Nishiguchi, K., Kuramochi, E., Notomi, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Low+power+and+fast+electro-optic+silicon+modulator+with+lateral+p-i-n+embedded+photonic+crystal+nanocavity.">Low power and fast electro-optic silicon modulator with lateral p-i-n embedded photonic crystal nanocavity.</a> Opt. Express. 17 (25), 22505-22513 (2009).</li><li>Nozaki, K., Tanabe, T., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Sub-femtojoule+all-optical+switching+using+a+photonic-crystal+nanocavity.">Sub-femtojoule all-optical switching using a photonic-crystal nanocavity.</a> Nature Photon. 4, 477-483 (2010).</li><li>Notomi, M., Yamada, K., Shinya, A., Takahashi, J., Takahashi, C., Yokohama, I. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Extremely+large+group-velocity+dispersion+of+line-defect+waveguides+in+photonic+crystal+slabs.">Extremely large group-velocity dispersion of line-defect waveguides in photonic crystal slabs.</a> Phys. Rev. Lett. 87 (25), 253902 (2001).</li><li>Labilloy, D., Benisty, H., Weisbuch, C., Smith, C. J. M., Krauss, T. F., Houdr&#233;, R., Oesterle, U. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Finely+resolved+transmission+spectra+and+band+structure+of+two-dimensional+photonic+crystals+using+emission+from+InAs+quantum+dots.">Finely resolved transmission spectra and band structure of two-dimensional photonic crystals using emission from InAs quantum dots.</a> Phys. Rev. B. 59 (3), 1649-1652 (1999).</li><li>Inan&#231; Tarhan, I., Zinkin, M. P., Watson, G. H. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Interferometric+technique+for+the+measurement+of+photonic+band+structure+in+colloidal+crystals.">Interferometric technique for the measurement of photonic band structure in colloidal crystals.</a> Opt. Lett. 20 (14), 1571-1573 (1995).</li><li>Galli, M., Marabelli, F., Guizzetti, G. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Direct+measurement+of+refractive-index+dispersion+of+transparent+media+by+white-light+interferometry.">Direct measurement of refractive-index dispersion of transparent media by white-light interferometry.</a> Appl. Opt. 42 (19), 3910-3914 (1364).</li><li>Galli, M., Bajoni, D., Marabelli, F., Andreani, L. C., Pavesi, L., Pucker, G. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Photonic+bands+and+group-velocity+dispersion+in+Si/SiO2+photonic+crystals+from+white-light+interferometry.">Photonic bands and group-velocity dispersion in Si/SiO2 photonic crystals from white-light interferometry.</a> Phys. Rev. B. 69 (11), 115107 (2004).</li><li>Vlasov, Y. A., O'Boyle, M., Hamann, H. F., McNab, S. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Active+control+of+slow+light+on+a+chip+with+photonic+crystal+waveguides.">Active control of slow light on a chip with photonic crystal waveguides.</a> Nature. 438, 65-69 (2005).</li><li>Gomez-Iglesias, A., O'Brien, D., O'Faolain, L., Miller, A., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Direct+measurement+of+the+group+index+of+photonic+crystal+waveguide+via+Fourier+transform+spectral+interferometry.">Direct measurement of the group index of photonic crystal waveguide via Fourier transform spectral interferometry.</a> Appl. Phys. Lett. 90 (26), 261107 (2007).</li><li>Akahane, Y., Asano, T., Song, B. -. S., Noda, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=High-Q+photonic+nanocavity+in+a+two-dimensional+photonic+crystal.">High-Q photonic nanocavity in a two-dimensional photonic crystal.</a> Nature. 425, 944-947 (2003).</li><li>McCutcheon, M. W., Rieger, G. W., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Resonant+scattering+and+second-harmonic+spectroscopy+of+planar+photonic+crystal+microcavities.">Resonant scattering and second-harmonic spectroscopy of planar photonic crystal microcavities.</a> Appl. Phys. Lett. 87 (22), 221110 (2005).</li><li>Galli, M., Portalupi, S. L., Belotti, M., Andreani, L. C., O'Faolain, L., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Light+scattering+and+Fano+resonances+in+high-Q+photonic+crystal+nanocavities.">Light scattering and Fano resonances in high-Q photonic crystal nanocavities.</a> Appl. Phys. Lett. 94 (7), 71101 (2009).</li><li>W&#195;est, R., Strasser, P., Jungo, M., Robin, F., Erni, D., J&#252;ckel, H. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=An+efficient+proximity-effect+correction+method+for+electron-beam+patterning+of+photonic-crystal+devices.">An efficient proximity-effect correction method for electron-beam patterning of photonic-crystal devices.</a> Microelectron Eng. 67-68, 182-188 (2003).</li><li>Tanaka, Y., Asano, T., Akahane, Y., Song, B. -. S., Noda, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Theoretical+investigation+of+a+two-dimensional+photonic+crystal+slab+with+truncated+cone+air+holes.">Theoretical investigation of a two-dimensional photonic crystal slab with truncated cone air holes.</a> Appl. Phys. Lett. 82 (11), 1661 (2003).</li><li>Asano, T., Song, B. -. S., Noda, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Analysis+of+the+experimental+Q+factors+(~+1+million)+of+photonic+crystal+nanocavities.">Analysis of the experimental Q factors (~ 1 million) of photonic crystal nanocavities.</a> Opt. Express. 14 (5), 1996-2002 (2006).</li><li>O'Faolain, L., Schulz, S. A., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Loss+engineered+slow+light+waveguides.">Loss engineered slow light waveguides.</a> Opt. Express. 18 (26), 27627-27638 (2010).</li><li>Joannopoulos, J. D., Johnson, S. G., Winn, J. N., Meade, R. D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Photonic crystals, molding the flow of light. , (2008).</li><li>Li, J., White, T. P., O'Faolain, L., Gomez-Iglesias, A., Krauss, T. F. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Systematic+design+of+flat+band+slow+light+in+photonic+crystal+waveguides.">Systematic design of flat band slow light in photonic crystal waveguides.</a> Opt. Express. 16 (9), 6227-6232 (2008).</li><li>Takeda, M., Ina, H., Kobayashi, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fourier-transform+method+of+fringe-pattern+analysis+for+computer-based+topography+and+interferometry.">Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry.</a> J. Opt. Soc. Am. 72 (1), 156-160 (1982).</li></ol>

没有利益冲突的声明。

样品制备我们的选择是由于同时分辨率高，耐蚀刻性电子束抗蚀剂（ 即番520A）。我们相信ZEP 520A由从架空实验室灯发射的UV光可能会受到影响，因此，我们建议将旋涂样品UV不透明的容器中，而将它们移动到另一个从一个实验室。 移动到定义的光子晶体图案，露出了样品之前，我们已经发现，使电子束光刻系统解决了至少一个小时后负荷减少误配准?...

<table border="1">
	<tbody>
		<tr>
			<td>Name </td>
			<td>Company </td>
			<td>Catalogue number </td>
			<td>Comments (optional) </td>
		</tr>
		<tr>
			<td>Acetone</td>
			<td>Fisher Scientific</td>
			<td>A/0520/17</td>
			<td>CAUTION: flammable, use good ventilation and avoid all ignition sources.</td>
		</tr>
		<tr>
			<td>Isopropanol</td>
			<td>Fisher Scientific</td>
			<td>P/7500/15</td>
			<td>CAUTION: flammable, use good ventilation and avoid all ignition sources.</td>
		</tr>
		<tr>
			<td>Electron Beam resist</td>
			<td>Marubeni Europe plc.</td>
			<td>ZEP520A</td>
			<td>CAUTION: flammable, harmful by inhalation, avoid contact with skin and eyes.</td>
		</tr>
		<tr>
			<td>Xylene</td>
			<td>Fisher Scientific</td>
			<td>X/0100/17</td>
			<td>CAUTION: flammable and highly toxic, use good ventilation, avoid all ignition sources, avoid contact with skin and eyes.</td>
		</tr>
		<tr>
			<td>Microposit S1818 G2</td>
			<td>Chestech Ltd.</td>
			<td>10277866</td>
			<td>CAUTION: flammable and causes irritation to eyes, nose and respiratory tract.</td>
		</tr>
		<tr>
			<td>Microposit Developer MF-319</td>
			<td>Chestech Ltd.</td>
			<td>10058721</td>
			<td>CAUTION: alkaline liquid and can cause irritation to eyes, nose and respiratory tract.</td>
		</tr>
		<tr>
			<td>Hydrofluoric Acid</td>
			<td>Fisher Scientific</td>
			<td>22333-5000</td>
			<td>CAUTION: extremely corrosive, readily destroys tissue; handle with full personal protective equipment rated for HF.</td>
		</tr>
		<tr>
			<td>Microposit 1165 Remover</td>
			<td>Chestech Ltd.</td>
			<td>10058734</td>
			<td>CAUTION: flammable and causes irritation to eyes, nose and respiratory tract.</td>
		</tr>
		<tr>
			<td>Sulphuric Acid</td>
			<td>Fisher Scientific</td>
			<td>S/9120/PB17</td>
			<td>CAUTION: corrosive and very toxic; handle with personal protective equipment and avoid inhalation of vapours or mists.</td>
		</tr>
		<tr>
			<td>Hydrogen Peroxide</td>
			<td>Fisher Scientific</td>
			<td>BPE2633-500</td>
			<td>CAUTION: very hazardous in case of skin and eye contact; handle with personal protective equipment.</td>
		</tr>
		<tr>
			<td>&nbsp;</td>
			<td>&nbsp;</td>
			<td>&nbsp;</td>
			<td>Equipment</td>
		</tr>
		<tr>
			<td>Silicon-on-Insulator wafer</td>
			<td>Soitec</td>
			<td>G8P-110-01</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Diamond Scribe</td>
			<td>J &amp; M Diamond Tool Inc.</td>
			<td>HS-415</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Microscope slides</td>
			<td>Fisher Scientific</td>
			<td>FB58622</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Beakers</td>
			<td>Fisher Scientific</td>
			<td>FB33109</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Tweezers</td>
			<td>SPI Supplies</td>
			<td>PT006-AB</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Ultrasonic Bath</td>
			<td>Camlab</td>
			<td>1161436</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Spin-Coater</td>
			<td>Electronic Micro Systems Ltd.</td>
			<td>EMS 4000</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Pipette</td>
			<td>Fisher Scientific</td>
			<td>FB55343</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>E-beam Lithography System</td>
			<td>Raith Gmbh</td>
			<td>Raith 150</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Reactive Ion Etching System</td>
			<td>Proprietary In-house Designed</td>
			<td>--</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>UV Mask Aligner</td>
			<td>Karl Suss</td>
			<td>MJB-3</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>ASE source</td>
			<td>Amonics</td>
			<td>ALS-CL-15-B-FA</td>
			<td>CAUTION: invisible IR radiation.</td>
		</tr>
		<tr>
			<td>Single mode fibers</td>
			<td>Thorlabs</td>
			<td>P1-SMF28E-FC-2</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>3 dB fiber splitters</td>
			<td>Thorlabs</td>
			<td>C-WD-AL-50-H-2210-35-FC/FC</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Aspheric lenses</td>
			<td>New Focus</td>
			<td>5720-C</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>XYZ stages</td>
			<td>Melles Griot</td>
			<td>17AMB003/MD</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Polarizing beamsplitter cube</td>
			<td>Thorlabs</td>
			<td>PBS104</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>IR detector</td>
			<td>New Focus</td>
			<td>2033</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>100&times; Objective</td>
			<td>Nikon</td>
			<td>BD Plan 100x</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Oscilloscope</td>
			<td>Tektronix</td>
			<td>TDS1001B</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Optical Spectrum Analyzer</td>
			<td>Advantest</td>
			<td>Q8384</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>IR sensor card</td>
			<td>Newport</td>
			<td>F-IRC2</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>TLS source</td>
			<td>Agilent</td>
			<td>81940A</td>
			<td>CAUTION: invisible IR radiation.</td>
		</tr>
		<tr>
			<td>IR Camera</td>
			<td>Electrophysics</td>
			<td>7290A</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>IR Detector</td>
			<td>New Focus</td>
			<td>2153</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Digital Multimeter</td>
			<td>Agilent</td>
			<td>34401A</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Illumination</td>
			<td>Stocker Yale</td>
			<td>Lite Mite</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Monochromator</td>
			<td>Spectral Products</td>
			<td>DK480</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>Array Detector</td>
			<td>Andor</td>
			<td>DU490A-1.7</td>
			<td>&nbsp;</td>
		</tr>
		<tr>
			<td>GIF Fiber</td>
			<td>Thorlabs</td>
			<td>31L02</td>
			<td>&nbsp;</td>
		</tr>
	</tbody>
</table>

fabrication and characterization of photonic crystal slow light waveguides and cavities

慢光一直在光电子社会关注的热点话题之一，在过去的十年中，无论是从基本面来看，在实际应用中取得了巨大的潜在产生极大的兴趣。慢光光子晶体波导，尤其是发挥了重要作用，并已成功用于光信号延迟1-4和加强两个线性的5-7和非线性设备。8-11 光子晶体腔缓慢光波导实现类似的效果，但超过减少带宽。这些空腔提供高Q-factor/volume比率，为实现光学12和电13泵浦超低阈值的激光器和非线性效应的增强。14-16此外，无源滤波器17和调制器18-19已经证明，表现出的超窄线宽，高光谱ŕ安格和记录值能耗低。 为了达到这些令人振奋的结果，一个强大的可重复的制造协议必须得到发展。在本文中，我们将在深入了解我们的制造协议，采用电子束光刻的光子晶体图案的定义和采用湿法和干法刻蚀技术。我们的优化的制造配方结果不遭受垂直光子晶体中的不对称性和表现出非常不错的边壁的粗糙度。我们将讨论蚀刻参数和在设备上的不利影响，他们可以有不同的结果，导致诊断的路由，可以采取类似问题来确定和消除。 评估慢光波导的关键是被动的传输特性和组指数谱。各种方法已被报道，最明显的解决的Fabry-Perot干涉条纹中的透射光谱20-21ð干涉测量技术。22日至25日在这里，我们描述了一个直接，宽带光谱干涉测量技术相结合的傅里叶变换分析。站出来为它的简单性和强大26我们的方法，我们可以描述一个访问波导的裸光子晶体与，而不需要片上的干扰分量，并且设置只包括一个Mach-Zehnder干涉仪，与没有必要为移动部件和延迟扫描。 当表征光子晶体空腔，涉及内部源21或外部波导直接耦合到腔27腔本身的性能的影响的技术，从而扭曲的测量。在这里，我们描述了一种新颖的和非侵入性技术，使得使用一个交叉偏振探测光束和被称为共振散射（RS），其中探针是满分的平面耦合到空腔通过客观。该技术是第一示范29特德·麦卡琴等28 Galli 等人进一步发展。

Fabricated samples
Figure 1 shows a scanning electron microscope (SEM) image of an exposed and developed pattern in electron beam resist - it is evident from the "clean" edge between the resist and the silicon substrate that complete exposure/development has been accomplished. Exposure of dose test patterns, consisting of simple repeated shapes (in our case 50 &times; 50 &mu;m squares), each with a differing base dose, are used to determine the correct dose factor and developmen...

Watch this Scientific Journal Video about Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities at JoVE.com

Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

使用的光子晶体慢光波导和腔体已被广泛采用的光电子社区，在许多不同的应用。因此这些器件的制备和表征的极大兴趣。本文概述了我们的制造技术和了两个光学特性方法，即：干涉（波导）和共振散射（蛀牙）。

光子晶体慢光波导和腔体的制备与表征

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view ...

fabrication-characterization-photonic-crystal-slow-light-waveguides

Research

JoVE Journal

Engineering

18.8K 次观看.  University of St Andrews. 使用的光子晶体慢光波导和腔体已被广泛采用的光电子社区，在许多不同的应用。因此这些器件的制备和表征的极大兴趣。本文概述了我们的制造技术和了两个光学特性方法，即：干涉（波导）和共振散射（蛀牙）。

视频: Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

Simulation, Fabrication and Characterization of THz Metamaterial Absorbers

Metamaterials (MM), artificial materials engineered to have properties that may not be found in nature, have been widely explored since the first theoretical1 and experimental demonstration2 of their unique properties. MMs can provide a highly controllable electromagnetic response, and to date have been demonstrated in every technologically relevant spectral range including the optical3, near IR4, mid IR5 , THz6 , mm-wave7 , microwave8 and radio9 bands. Applications include perfect lenses10, sensors11, telecommunications12, invisibility cloaks13 and filters14,15. We have recently developed single band16, dual band17 and broadband18 THz metamaterial absorber devices capable of greater than 80% absorption at the resonance peak. The concept of a MM absorber is especially important at THz frequencies where it is difficult to find strong frequency selective THz absorbers19. In our MM absorber the THz radiation is absorbed in a thickness of ~ &lambda;/20, overcoming the thickness limitation of traditional quarter wavelength absorbers. MM absorbers naturally lend themselves to THz detection applications, such as thermal sensors, and if integrated with suitable THz sources (e.g. QCLs), could lead to compact, highly sensitive, low cost, real time THz imaging systems.

This protocol outlines the simulation, fabrication and characterization of THz metamaterial absorbers. Such absorbers, when coupled with an appropriate sensor, have applications in THz imaging and spectroscopy.

模拟，太赫兹超材料吸收器的制备与表征

Metamaterials (MM),  artificial materials engineered to have properties that may not be found in  nature, have been widely explored since the first ...

科研

工程学

Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on photoconduction, which has been one of the most commonly used techniques for terahertz generation 1-8. Terahertz generation in a photoconductive emitter is achieved by pumping an ultrafast photoconductor with a pulsed or heterodyned laser illumination. The induced photocurrent, which follows the envelope of the pump laser, is routed to a terahertz radiating antenna connected to the photoconductor contact electrodes to generate terahertz radiation. Although the quantum efficiency of a photoconductive emitter can theoretically reach 100%, the relatively long transport path lengths of photo-generated carriers to the contact electrodes of conventional photoconductors have severely limited their quantum efficiency. Additionally, the carrier screening effect and thermal breakdown strictly limit the maximum output power of conventional photoconductive terahertz sources. To address the quantum efficiency limitations of conventional photoconductive terahertz emitters, we have developed a new photoconductive emitter concept which incorporates a plasmonic contact electrode configuration to offer high quantum-efficiency and ultrafast operation simultaneously. By using nano-scale plasmonic contact electrodes, we significantly reduce the average photo-generated carrier transport path to photoconductor contact electrodes compared to conventional photoconductors 9. Our method also allows increasing photoconductor active area without a considerable increase in the capacitive loading to the antenna, boosting the maximum terahertz radiation power by preventing the carrier screening effect and thermal breakdown at high optical pump powers. By incorporating plasmonic contact electrodes, we demonstrate enhancing the optical-to-terahertz power conversion efficiency of a conventional photoconductive terahertz emitter by a factor of 50 10.

We describe methods for the design, fabrication, and experimental characterization of plasmonic photoconductive emitters, which offer two orders of magnitude higher terahertz power levels compared to conventional photoconductive emitters.

电浆光电导太赫兹发射器的设计，制造和实验表征

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on ...

Fabrication and Characterization of Disordered Polymer Optical Fibers for Transverse Anderson Localization of Light

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. The developed polymer optical fiber is composed of 80,000 strands of poly (methyl methacrylate) (PMMA) and polystyrene (PS) that are randomly mixed and drawn into a square cross section optical fiber with a side width of 250 &mu;m. Initially, each strand is 200 &mu;m in diameter and 8-inches long. During the mixing process of the original fiber strands, the fibers cross over each other; however, a large draw ratio guarantees that the refractive index profile is invariant along the length of the fiber for several tens of centimeters. The large refractive index difference of 0.1 between the disordered sites results in a small localized beam radius that is comparable to the beam radius of conventional optical fibers. The input light is launched from a standard single mode optical fiber using the butt-coupling method and the near-field output beam from the disordered fiber is imaged using a 40X objective and a CCD camera. The output beam diameter agrees well with the expected results from the numerical simulations. The disordered optical fiber presented in this work is the first device-level implementation of 2D Anderson localization, and can potentially be used for image transport and short-haul optical communication systems.

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. This microstructured fiber can transport a small localized beam with a radius that is comparable to the beam radius of conventional optical fibers.

无序横向安德森本地化光聚合物光纤的制备和表征

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. The developed ...

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned and bonded silicon wafers. Unlike confinements in porous materials often used for these types of experiments3, bonded wafers provide predesigned uniform spaces for confinement. The geometry of each cell is well known, which removes a large source of ambiguity in the interpretation of data.
Exceptionally flat, 5 cm diameter, 375 &#181;m thick Si wafers with about 1 &#181;m variation over the entire wafer can be obtained commercially (from Semiconductor Processing Company, for example). Thermal oxide is grown on the wafers to define the confinement dimension in the z-direction. A pattern is then etched in the oxide using lithographic techniques so as to create a desired enclosure upon bonding. A hole is drilled in one of the wafers (the top) to allow for the introduction of the liquid to be measured. The wafers are cleaned2 in RCA solutions and then put in a microclean chamber where they are rinsed with deionized water4. The wafers are bonded at RT and then annealed at ~1,100 &#176;C. This forms a strong and permanent bond. This process can be used to make uniform enclosures for measuring thermal and hydrodynamic properties of confined liquids from the nanometer to the micrometer scale.

A method for permanently bonding two silicon wafers so as to realize a uniform enclosure is described. This includes wafer preparation, cleaning, RT bonding, and annealing processes. The resulting bonded wafers (cells) have uniformity of enclosure ~1%1,2. The resulting geometry allows for measurements of confined liquids and gasses.

通过硅直接晶圆粘接制造均匀纳米级腔

Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned ...

Using Microwave and Macroscopic Samples of Dielectric Solids to Study the Photonic Properties of Disordered Photonic Bandgap Materials

Recently, disordered photonic materials have been suggested as an alternative to periodic crystals for the formation of a complete photonic bandgap (PBG). In this article we will describe the methods for constructing and characterizing macroscopic disordered photonic structures using microwaves. The microwave regime offers the most convenient experimental sample size to build and test PBG media. Easily manipulated dielectric lattice components extend flexibility in building various 2D structures on top of pre-printed plastic templates. Once built, the structures could be quickly modified with point and line defects to make freeform waveguides and filters. Testing is done using a widely available Vector Network Analyzer and pairs of microwave horn antennas. Due to the scale invariance property of electromagnetic fields, the results we obtained in the microwave region can be directly applied to infrared and optical regions. Our approach is simple but delivers exciting new insight into the nature of light and disordered matter interaction.

Our representative results include the first experimental demonstration of the existence of a complete and isotropic PBG in a two-dimensional (2D) hyperuniform disordered dielectric structure. Additionally we demonstrate experimentally the ability of this novel photonic structure to guide electromagnetic waves (EM) through freeform waveguides of arbitrary shape.

Disordered structures offer new mechanisms for forming photonic bandgaps and unprecedented freedom in functional-defect designs. To circumvent the computational challenges of disordered systems, we construct modular macroscopic samples of the new class of PBG materials and use microwaves to characterize their scale-invariant photonic properties, in an easy and inexpensive manner.

利用微波和电介质固体的宏观样本，研究无序光子带隙材料的光子特性

Recently, disordered photonic materials have been suggested as an alternative to periodic crystals for the formation of a complete photonic bandgap (PBG). ...

Patterning via Optical Saturable Transitions - Fabrication and Characterization

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical Saturable Transitions (POST). In this technique the chemical properties of organic photochromic molecules that undergo single-photon reactions are exploited, enabling rapid top-down nanopatterning over large areas at low light intensities, thereby, allowing for the circumvention of the far-field diffraction barrier.4 Simple, cost-effective, high throughput and resolution alternatives to nanopatterning are being explored, such as, two-photon polymerization5,6, beam pen lithography (BPL)7, scanning electron beam lithography (SEBL), and focused ion beam (FIB) patterning. However, multi-photon approaches require high light intensities, which limit their potential for high throughput and offer low image contrast. Although, electron and ion beam lithographic processes offer increased resolution, the serial nature of the process is limited to slow writing speeds, which also prevents patterning of features over large areas. Beam-pen lithography is an approach towards parallel near-field optical lithography. However, the gap between the source of the beam and the surface of the photoresist needs to be controlled extremely precisely for good pattern uniformity and this is very challenging to accomplish for large arrays of beams. Patterning via Optical Saturable Transitions (POST) is an alternative optical nanopatterning technique for patterning sub-wavelength features1-3. Since this technique uses single photons instead of electrons, it is extremely fast and does not require high light intensities1-3, opening the door to massive parallelization.

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

通过光学吸收跃迁图案 - 制备与表征

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices have used devices prepared by spin coating, a process that is not amenable to large-scale fabrication. This mismatch in device fabrication makes it difficult to translate quantitative results obtained in the laboratory to the commercial level, making optimization difficult. Using a mini-slot die coater, this mismatch can be resolved by translating the commercial process to the laboratory and characterizing the structure formation in the active layer of the device in real time and in situ as films are coated onto a substrate. The evolution of the morphology was characterized under different conditions, allowing us to propose a mechanism by which the structures form and grow. This mini-slot die coater offers a simple, convenient, material efficient route by which the morphology in the active layer can be optimized under industrially relevant conditions. The goal of this protocol is to show experimental details of how a solar cell device is fabricated using a mini-slot die coater and technical details of running in situ structure characterization using the mini-slot die coater.

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Here, we present a protocol to fabricate organic thin film solar cells using a mini-slot die coater and related in-line structure characterizations using synchrotron scattering techniques.

散装异质结太阳能电池的印刷和制作<em&gt;原位</em&gt;形态特征

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices ...

Free-form Light Actuators &#8212; Fabrication and Control of Actuation in Microscopic Scale

Liquid crystalline elastomers (LCEs) are smart materials capable of reversible shape-change in response to external stimuli, and have attracted researchers&#39; attention in many fields. Most of the studies focused on macroscopic LCE structures (films, fibers) and their miniaturization is still in its infancy. Recently developed lithography techniques, e.g., mask exposure and replica molding, only allow for creating 2D structures on LCE thin films. Direct laser writing (DLW) opens access to truly 3D fabrication in the microscopic scale. However, controlling the actuation topology and dynamics at the same length scale remains a challenge.
In this paper we report on a method to control the liquid crystal (LC) molecular alignment in the LCE microstructures of arbitrary three-dimensional shape. This was made possible by a combination of direct laser writing for both the LCE structures as well as for micrograting patterns inducing local LC alignment. Several types of grating patterns were used to introduce different LC alignments, which can be subsequently patterned into the LCE structures. This protocol allows one to obtain LCE microstructures with engineered alignments able to perform multiple opto-mechanical actuation, thus being capable of multiple functionalities. Applications can be foreseen in the fields of tunable photonics, micro-robotics, lab-on-chip technology and others.

Free-form Light Actuators &amp;#8212; Fabrication and Control of Actuation in Microscopic Scale

Here, we fabricate 3D polymeric micro/nano structures in which both the shape and the molecular alignment can be engineered with nanometer scale accuracy by the use of direct laser writing. Light induced deformation of several types of liquid crystalline elastomer microstructures can be controlled in the microscopic scale.

自由形式的光驱动器 - 制作和开动控制在微观尺度

Liquid crystalline elastomers (LCEs) are smart materials capable of reversible shape-change in response to external stimuli, and have attracted ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

制备与表征超导谐振器的

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Fabrication of White Light-emitting Electrochemical Cells with Stable Emission from Exciplexes

The authors present an approach for fabricating stable white light emission from polymer light-emitting electrochemical cells (PLECs) having an active layer which consists of blue-fluorescent poly(9,9-di-n-dodecylfluorenyl-2,7-diyl) (PFD) and &#960;-conjugated triphenylamine molecules. This white light emission originates from exciplexes formed between PFD and amines in electronically excited states. A device containing PFD, 4,4&#39;,4&#39;&#39;-tris[2-naphthyl(phenyl)amino]triphenylamine (2-TNATA), Poly(ethylene oxide) and K2CF3SO3 showed white light emission with Commission internationale de l&#39;&#233;clairage (CIE) coordinates of (0.33, 0.43) and a Color Rendering Index (CRI) of Ra = 73 at an applied voltage of 3.5 V. Constant voltage measurements showed that the CIE coordinates of (0.27, 0.37), Ra of 67, and the emission color observed immediately after application of a voltage of 5 V were nearly unchanged and stable after 300 sec.

The authors present a method for fabricating stable white-light-emitting electrochemical cells utilizing emission from exciplexes formed between a blue-emitting fluorene polymer and aromatic amines.

白的制造发光电化学细胞与来自激发络合物稳定的发射

The authors present an approach for fabricating stable white light emission from polymer light-emitting electrochemical cells (PLECs) having an active ...