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Steven K. Dew

Department of Electrical and Computer Engineering

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PUBLICATIONS

SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography.

Nanoscale research letters , 2013 | Pubmed ID: 23531370

INSTITUTIONS

University of Alberta

National Research Council of Canada

JOVE ARTICLES

Robert F. Peters^1,2,

Luis Gutierrez-Rivera^1,2,

Steven K. Dew^1,2,

Maria Stepanova^1,2

¹Department of Electrical and Computer Engineering, University of Alberta,

²National Institute for Nanotechnology, National Research Council of Canada

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