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Department of Electrical and Computer Engineering
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SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography.
Nanoscale research letters , 2013 | Pubmed ID: 23531370
University of Alberta
National Research Council of Canada
Robert F. Peters1,2,
Luis Gutierrez-Rivera1,2,
Steven K. Dew1,2,
Maria Stepanova1,2
1Department of Electrical and Computer Engineering, University of Alberta,
2National Institute for Nanotechnology, National Research Council of Canada
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