기금은 유타 대학에 의해 제공되었다. 우리는 유용한 토론 박사 J. 쑤 (UC 머 시드) 박사 BJN 레디 (UC 어바인)을 감사드립니다.

1. 980 nm의 파장 단일 광학 트랩 설치 <ol><li> 생물 물리학 실험하고 저렴한 레이저 다이오드는 300 mW의로 높은 출력과 쉽게 사용할 수있는 980 nm의 파장에서 광 트래핑은 종종 최적입니다. 그것은 알려진 모드 필드 직경 단일 모드 광섬유 편광 유지에 중계 커넥터되는 다이오드 레이저 바람직하다. 섬유 모드 필터의 역할을 할 수있을만큼 충분히 길어야합니다 일반적으로 FC / PC 또는 FC / APC 커넥터 하나와 함께 종료됩니다. 이들 중, FC / APC 빛과 잠재적 인 피드백 불안의 반사를 다시 최소화하는 것이 바람직하다. </li><li> 전력 및 온도 제어를 허용하는 마운트 980 nm의 레이저 다이오드를 고정합니다. 그것은 직접 수동 히트 싱크를 극대화하고이를 온도 조절기의 고장으로 인해 다이오드 실패의 위험을 최소화 광학 테이블 마운트를 고정하는 것이 좋습니다. </li><li> 빔 콜리 메이팅 광학 PC / APC 광섬유 커넥터를 장착합니다. 그것은이다조정 섬유 포트가 가장 유용하므로 평행 빔이 최소한의 발산을 확신하는 것이 중요합니다. 선택한 섬유 포트 다이오드 변발 섬유의 모드 필드 직경과 일치하는지 확인하십시오. 빔 음향 광학 디플렉터 (AOD) 또는 전기 광학 디플렉터를 사용하여 래스터 (raster) 할 경우 (EOD) 다음 평행 레이저 빔 허리는 디플렉터 구멍의 크기보다 약간 작아야합니다. </li><li> 빔 경로, 확장, 및 기타 필요한 구성 요소의 배치를 허용하는 현미경 충분한 거리에서 광학 테이블에 시준 어댑터를 고정합니다. 현미경 전체 빔 경로에 비해 거리에 일관된 빔 허리를 보장하기 위해 광섬유 포트를 조정합니다. </li><li> 그림 1에 표시된 거울을 설치합니다. 현미경 목표를 제거하고 객관적 설치 단계에서 조리개를 통해 라우팅 빔을에 거울을 사용합니다. 선호하는 경우, 이색 거울 DM1과 DM3의 배치가 될 때까지 생략 할 수 있습니다나중에. DM2와 DM3는 shortpass 둘 다와 IR 근처에 이상 반영하면서 가시 광선을 전송합니다. </li><li> 일시적으로 현미경의 광학 축에 정렬 목적의 장소에서 빨간색 레이저 포인터를 장착하는 것이 도움이됩니다. 사용자 정의 기계적 어댑터는 레이저 포인터의 centration을 보장 할 필요가있다. 레이저 포인터 눈에 보이는 광속은 다음 광섬유 포트 구멍의 중심으로 다시 라우팅 할 수 후 렌즈를 (아래 참조)를 설치하는 데 사용할 수 있습니다. </li><li> 필요한 1과 스티어링 부품의 미래를 삽입 (AOD 또는 EOD)을 허용하는 광섬유 포트에서 적절한 거리에서 980 nm의 빔 확장기 (L8 및 L9)를 설치합니다. 확장 빔이 약간 목적의 뒷면 초점 조리개를 너무 많이 넣다해야합니다. (여기에서 125 mm와 60mm의 초점 거리를 가진 렌즈는 약 빔 허리를 두 배로 케플러 배열에서). 적절한 렌즈 배치와 거친 정렬을 보장하기 위해 가시 레이저 빔 (1.6 절 참조). </li><li> 안치하다난 망원경 배열에서 980 nm의 스티어링 렌즈 (L2 및 L3)은 (여기에서 모두 60mm 초점 길이가 1) 표시된대로. L3는 목적의 후면 초점 평면에 평면 결합에 장착되어 있습니다. 정밀 XYZ 위치 결정 스테이지에 장착 L3 빔 조향을 허용합니다. 그것은 반복 위치와 트랩의 위치 변경을 허용, 자사의 마이크로 미터 디지털 표시기를 가지고 XYZ 스테이지에 도움이됩니다. 여행 0.5 &quot;범위는 충분합니다, 광학 축을 따라 L3 위치에 대한하지만 더 이상 여행은 도움이 될 수 있습니다. 적절한 렌즈 배치와 거친 정렬을 보장하기 위해 (1.6 절 참조) 가시 레이저 빔을 사용합니다. </li></ol> 2. 레이저 감지기 설치 <ol><li> 그림 1과 같이 콘덴서 위의 이색 거울 DM3를 설치합니다. 사용자 정의 마운트는 일반적으로 필요합니다. 콘덴서 어셈블리의 측면과 ENS에 쿼드 포토 다이오드 (QPD) 또는 위치에 민감한 검출기 (PSD) 8 확보980 nm의 레이저 빔이 DM3에 반영하는 URE는 대략 중앙에 타격합니다. QPD를 사용하는 경우, 그것은 레이저 빔 센서의 중심 정확한 수 있도록 작은 XY 스테이지에 장착되어 있는지 확인합니다. </li><li> DM3와 센서 사이의 L1 (일반적으로 30 mm 렌즈)를 설치합니다. 위치 L1 정도로 센서의 단일 지점에 빔을 집중한다. </li><li> L1은 현미경 조명과 주변 조명에서 1,064 nm의 광선뿐만 아니라 처진 눈에 보이는 빛의 반사를 차단하기 직전 노치 필터를 설치합니다. </li></ol> 3. 1,064 nm의 파장 홀로그램 트랩 설치 <ol><li> 설정의 홀로그램 부분은이 패키지에 사용되는 홀로그램 거울은 5 또는 10 W / cm 2의 최대 사건 전원에 평가하고 상업적으로 이용 가능한 하드웨어 / 소프트웨어 패키지 주위에 내장되어 있습니다. 이 전력 범위의 단일 모드 TEM00 광속은 쉽게 1,064 nm의 파장에서 DPSS 레이저에서 공급 될 수있다. </li><li> 상승에 1,064 nm의 레이저를 탑재플랫폼은 대략 980 선 (1 절 참조) 빔 경로의 높이를 일치합니다. </li><li> 직접 제어하지 않는 경우, 레이저 출력은 수동으로 오른쪽 레이저 출력 조리개 후 반 파장 판 (HWP) 및 편광판 (PBS)를 설치하여 조정할 수 있습니다. 그것은 빔 편광 홀로그램 거울 요구 사항을 일치 할 수 로터리 스테이지에 편광판을 장착하는 것이 도움이됩니다. </li><li> 1,064 nm의 빔 확장기 (L6 및 L7)를 설치합니다. 레이저 빔 허리 홀로그램 거울의 대각선 크기에 맞게 확대해야합니다. 큰 확장 비율에 대한 (10 배 이상)는 확장기의 크기를 작게 유지하는 문제가 될 수 있습니다. (: 17 mm와 175mm 여기에) 따라서 비정상적으로 작은 초점 거리를 가진 렌즈를 사용하는 것이 바람직 할 수 있습니다. </li><li> 목표를 통해 1,064 nm의 광선을 직접 지시로 다른 미러를 설치합니다. <ol><li> 이 undiminishe을 허용하도록 보안 DM1 운동 마운트 이색 (입사각 45 ° 각도)과 980 nm의 빔 경로에 어셈블리를 배치그 빔의 D 전송. </li><li> 레이저 포인터 빛을 활성화합니다. DM1 미러가 제대로이 빔의 경로에 공간 광 변조기 (SLM)를 배치하는 가시 광선의 충분한 양의를 반영해야합니다. SLM은 수신 및 발신 레이저 광선은 정상적인 발생에 최대한 가까이되도록 각도를해야합니다. 그러나 입사각은 레이저 빔이 렌즈 마운트 및 기타 광학 부품으로 클리핑되지 않도록 충분히 커야합니다. 5 °의 각도를 쉽게 달성 할 수 있으며 충분히 작해야한다. 마지막으로 DM1에서 SLM까지의 거리를 정확하게 렌즈 L4와 L5의 삽입 (아래 3.6 참조) SLM 거울면과 목표의 백 초점면을 활용할 수 있도록 측정해야합니다. </li><li> 1,064 nm의 빔 확장기에서 SLM에 빛을 직접 거울을 설치합니다. 레이저 포인터 빛은 중앙의 빔 확장기 조리개 안타 있는지 확인합니다. </li></ol></li><li> L4와 L5 렌즈를 설치합니다 (여기서는 12 개 렌즈5mm와 200mm 각각). 이 망원경 쌍은 목표의 뒤에 초점 평면에 SLM 거울 평면을 어원도 약간 과충전 목적의 뒷면 조리개에 빔 허리를 줄일 수 있습니다. 우리는 SLM 멀리 DM1의 공간으로 긴 초점 거리를 가진 렌즈를 선택했습니다. 이 두 번째 레이저 라인을위한 공간을 지 웁니다뿐만 아니라 정렬을 쉽게하는 경향이뿐만 아니라. </li><li> 레이저 포인터를 제거합니다. 거친 정렬 조리개 역할을 장착 어댑터를 남겨주세요. </li></ol> 4. 시스템 설치 및 정렬 참고 사항 <ol><li> 목표의 뒤에 초점면에 광학적으로 결합 할로 렌즈 L3 및 SLM 그렇게 배치해야합니다. 광학 트래핑 빔은 현미경의 무한 공간으로 주입하는 경우 L5 L4와의 공동 초점은 샘플 평면 광학 결합이다. </li><li> 노래 IR 카드 뷰어 레이저 포인터 어댑터 구멍의 중심 축을 따라 이동 980 nm의 광선을 맞 춥니 다. </li><li> IR 카드 T를 사용O는 1,064 nm의 빔 DM1, L2 및 L3에와 1,064 nm의 빔 레이저 포인터 어댑터 구멍의 중심 축을 따라 간다 980 nm의 빔과 같은 장소 안타 있는지 확인합니다. </li><li> 목적으로 레이저 포인터를 장착 어댑터를 교체하십시오. 높은 수치 조리개 기름이나 물이 목표는 일반적입니다. </li><li> 방사상으로 대칭 간섭 패턴이 카메라에서 볼 때까지 레이저 빔을 &quot;도보&quot;에 의해 9에 설명 된대로 980 nm의 트랩을 맞 춥니 다. </li><li> 홀로그램 거울 오프로 (즉, 수동 미러 역할) 1,064 nm의 트랩을 정렬하는 undiffracted 1,064 nm의 광선을 &quot;걷기&quot;로 SLM 및 DM1를 사용합니다. </li><li> SLM은 시야에서 강력한 불가능한 레이저 트랩 결과 상당한 undiffracted 빔을 생성합니다. 이 정렬을위한 유용하지만 실험 바람직 할 수 있습니다. 이 트랩을 차단 한 (샘플 평면에 위치 켤레에 undiffracted 빛의 경로에 작은 불투명 한 개체를 삽입 할 수 있습니다 예를 들어, 일L4와 L5)의 전자 일반적인 초점. 이 중앙 자리 차단기의 크기는 집중 조명 (기술 시스템에 대한 100 ~ 300 μm의 직경 차단)에 대한 에어리 디스크의 직경보다 약간 크게해야합니다. </li><li> SLM의 방향과 일치하는 편광판을 사용하여 1,064 nm의 빔 편광을 djust. 원하는 빔의 출력 전력을 설정하는 반 파장 판을 회전합니다. </li><li> 원하는 경우, 980 nm의 레이저 라인에 AOD 또는 EOD 빔 스티어링 요소를 삽입합니다. 목적의 후면 초점 평면에 이러한 요소의 적절한 활용을 보장하고 트랩을 다시 맞 춥니 다. 그것은 고니 오 미터 무대에서 스티어링 요소를 탑재 도움이됩니다. </li></ol>

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저자는 공개 아무것도 없어.

우리는 개체 조작 및 측정을위한 별도의 포집 설비를 제공하는 다른 종류의 두 개의 광 트랩 (그림 1)를 결합 악기를 구축했다. &quot;종래의&quot;광학 트랩은 980 nm의 다이오드 레이저 주위에 내장되어 있습니다. 이 빔은, 확장 조종하고 (그림 1의 &quot;빛 빨강&quot;빔) 우리의 거꾸로 현미경으로 주입된다. 홀로그램 광학 트랩이 1,064 nm의 DPSS 레이저 주위에 내장되어 있습니다....

광 트래핑은 생물 물리학 6의 핵심 기술 중 하나입니다. 광 트래핑의 중요한 발전은 오히려 기존 점 트랩 7보다 입체적으로 트래핑 패턴의 생성을 허용 홀로그램 트랩의 개발이다. 이러한 홀로그램 트랩은 굴절 오브젝트의 위치에 다양성의 장점을 가지고있다. 그러나 기존의 트랩은 쉽게 시중에서 홀로그램 키트보다 더 대칭 적으로 정렬 할 수 있습니다. 그들은 또한 덫을 객체의 빠른 정확한 추적 할 수 있습니다. 여기에서 우리는 하나의 악기 두 트래핑 방법을 결합하여 사용자가 적절한 양의 이점을 악용 할 수있는 시스템 (그림 1)을 설명합니다. 건설 광학 트랩 (하나 또는 여러 개의 레이저 빔 기준)의 일반적인 고려 사항은 다른 8-10 자세히 설명되어 있습니다. 여기에, 우리는 우리의의 고려 사항 특정 개요etup하고 정렬 절차의 세부 사항을 제공합니다. 예를 들어, 두 개의 광학 트래핑 빔이있는 시스템은 일반적으로 굴절 개체를 포획하고 포획 된 개체의 위치의 분리 판독을 위해 (의도적으로 낮은 전력 빔) 다른 사용을위한 하나의 레이저 빔을 사용 (예 : REF. 11) 앞에서 설명한되었습니다 . 여기 그러나 두 레이저 빔은 모두 트래핑에 사용되는 때문에 (300 mW의 이상) 전원 공급 높은해야합니다. 생물학적 시스템의 측정, 트래핑에 사용되는 레이저는 최적의 조명에 의한 단백질 분해 1을 최소화하기 위해 파장의 특정 NIR 창 내에 있어야합니다. 여기에서 우리는 980 nm의 다이오드 때문에 그들의 낮은 비용, 높은 가용성 및 운영의 용이성 1,064 nm의 DPSS 레이저를 사용하기로 결정했다. 우리는 또한 4,5 실시간으로 동시에 여러 트랩을 생성하고 조작하는 공간 광 변조기 (SLM)를 사용하도록 선택했습니다. 이 장치는 상업적으로 사용할 수 있습니다그러나 전체 설치에 그들의 통합은 독특한 도전을 선물한다. 여기에서 우리는 이러한 잠재적 인 어려움을 해결하고 매​​우 다양한 악기를 제공하는 실용적인 방법을 설명합니다. 우리는 수정 된 설계를위한 가이드로 사용할 수있는 설명 특정 설정에 대한 명시적인 예를 제공합니다.

<table border="1">
	<tbody>
		<tr>
			<td>Equipment</td>
			<td>Company</td>
			<td>Catalog Number</td>
			<td>Comments</td>
		</tr>
		<tr>
			<td>Optical table</td>
			<td>Newport corporation</td>
			<td>ST-UT2-56-8</td>
			<td>Irvine, CA</td>
		</tr>
		<tr>
			<td>Microscope, Inverted, Eclipse Ti</td>
			<td>Nikon USA</td>
			<td>MEA53220</td>
			<td>Melville, NY</td>
		</tr>
		<tr>
			<td>Plan apo 100X oil objective (1.4 NA)</td>
			<td>Nikon USA</td>
			<td>MRD01901</td>
			<td>Melville, NY</td>
		</tr>
		<tr>
			<td>Oil condenser Lens 1.4 NA</td>
			<td>Nikon USA</td>
			<td>MEL41410</td>
			<td>Melville, NY</td>
		</tr>
		<tr>
			<td>EMCCD camera</td>
			<td>Andor technology USA</td>
			<td>Ixon DU897</td>
			<td>South Windsor, CT</td>
		</tr>
		<tr>
			<td>1/3" CCD IEEE1394 camera</td>
			<td>NET USA Inc</td>
			<td>Foculus FO124SC</td>
			<td>Highland IN</td>
		</tr>
		<tr>
			<td>Laser, TEM00, SLM, 1,064 nm wavelength</td>
			<td>Klastech Laser Technologies</td>
			<td>Senza-1064-1000</td>
			<td>Dortmund; Germany</td>
		</tr>
		<tr>
			<td>laser diode, TEM00, SLM, 980 nm</td>
			<td>Axcel Photonics</td>
			<td>BF-979-0300-P5A</td>
			<td>Marlborough, MA</td>
		</tr>
		<tr>
			<td>laser diode mount</td>
			<td>ILX Lightwave</td>
			<td>LDX-3545, LDT-5525, and LDM-4984</td>
			<td>Bozeman, MT</td>
		</tr>
		<tr>
			<td>adjustable fiber ports</td>
			<td>Thorlabs</td>
			<td>PAF-X-11-B</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>holographic system</td>
			<td>Arryx</td>
			<td>HOTKIT-ADV-1064</td>
			<td>Chicago, IL</td>
		</tr>
		<tr>
			<td>holographic mirror</td>
			<td>Boulder Non-linear Systems</td>
			<td>this is a part of HOTKIT-ADV-1064</td>
			<td>Lafayette, CO</td>
		</tr>
		<tr>
			<td>Calcite polarizer</td>
			<td>Thorlabs</td>
			<td>GL10-B</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>half-wave plate</td>
			<td>Thorlabs</td>
			<td>WPH05M-1064</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>Polarizer rotation mount</td>
			<td>Thorlabs</td>
			<td>PRM1</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>half-wave plate rotation mount</td>
			<td>Thorlabs</td>
			<td>RSP1</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>Shutter</td>
			<td>Thorlabs</td>
			<td>SH05</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>dichroic mirrors (DM2 &amp; DM3); 45&deg; AOI</td>
			<td>Chroma Technology</td>
			<td>t750spxrxt</td>
			<td>Bellows Falls, VT</td>
		</tr>
		<tr>
			<td>dichroic mirror (DM1); 45&deg; AOI</td>
			<td>Thorlabs</td>
			<td>DMSP1000R</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>custom mechanical adapter</td>
			<td>Thorlabs</td>
			<td>SM1A11 and AD12F with enlarged inner bore</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>notch filter</td>
			<td>Semrock</td>
			<td>FF01-850/310-25</td>
			<td>Rochester, NY</td>
		</tr>
		<tr>
			<td>Acousto-Optic deflector (2-axis)</td>
			<td>intraAction</td>
			<td>DTD-584CA28</td>
			<td>Bellwood, IL</td>
		</tr>
		<tr>
			<td>goniometric stage</td>
			<td>New Focus</td>
			<td>9081</td>
			<td>Santa Clara, CA</td>
		</tr>
		<tr>
			<td>60 mm steering lenses</td>
			<td>Thorlabs</td>
			<td>LA1134-B</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>16 mm aspherical expander lens</td>
			<td>Thorlabs</td>
			<td>AC080-016-C</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>175 mm expander lens</td>
			<td>Thorlabs</td>
			<td>LA1229-C</td>
			<td>Newton, NJ</td>
		</tr>
		<tr>
			<td>Spot blocker (cabron-steel sphere)</td>
			<td>Bal-Tec</td>
			<td>0.0100" diameter</td>
			<td>Los Angeles, CA</td>
		</tr>
		<tr>
			<td>Microspheres (Carboxyl-polystyrene)</td>
			<td>Spherotech</td>
			<td>CP-45-10</td>
			<td>Lake Forest, IL</td>
		</tr>
	</tbody>
</table>

construction of a high resolution microscope with conventional and holographic optical trapping capabilities

광학 트랩 고해상도 현미경 시스템은 유전체 구슬 1 또는 세포 소기관 2,3뿐만 아니라, 트랩의 중심을 기준으로 자신의 위치의 높은 공간과 시간적 해상도 판독 등 다양한 굴절 개체의 정확한 조작 할 수 있습니다. 이 시스템은 여기에 980 nm에서 하나의 &quot;전통적인&quot;트랩이 운영이 설명했다. 그것은 또한 동시에 1,064 ㎚의 파장에서 4,5 현미경의 시야 복잡한 트래핑 패턴을 만들고 조작하는 데 시중에서 홀로그램 패키지를 사용하여 두 번째 광 트래핑 시스템을 제공합니다. 동시에 높은 속도와 움직임과 나노 미터 piconewton 규모에 힘 생산의 고해상도 측정을 수행하는 동안 두 시스템의 조합은 동시에 여러 굴절 개체의 조작을 할 수 있습니다.

조립 설치는 운영자가 실시간으로 여러 굴절 오브젝트를 트랩하고 시야 내의 모든 세 가지 차원에서 그들을 배치 할 수 있습니다. 우리는 11 마이크로 (그림 2)를 포집하여 악기의 홀로그램 기능을 보여줍니다. 각 개체를 수감 트랩을 수동으로 최종 배열은이 실험이 수행 된 유타 대학의 로고를 묘사하도록 트래핑에 다시 배치됩니다. 홀로그램과 기존 함정의 결합 기능은 그림 3?...

Watch this Scientific Journal Video about Construction of a High Resolution Microscope with Conventional and Holographic Optical Trapping Capabilities at JoVE.com

Construction of a High Resolution Microscope with Conventional and Holographic Optical Trapping Capabilities

여기에 설명 된 시스템은 여러 개의 트랩을 생성하고 조작 할 수있는 기존의 광학 트랩뿐만 아니라 독립적 인 홀로그램 광학 트래핑 라인을 사용합니다. 또한 생물 효소의 활동을 동시에 고속, 고해상도 측정을 허용하는 동안이 굴절 입자의 복잡한 기하학적 배열을 만들 수 있습니다.

기존 및 홀로 그래픽 광학 트래핑 기능과 고해상도 현미경의 구조

High resolution microscope systems with optical traps allow for precise manipulation of various refractive objects, such as dielectric beads 1 or cellular ...

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12.0K 조회수.  University of Utah. 여기에 설명 된 시스템은 여러 개의 트랩을 생성하고 조작 할 수있는 기존의 광학 트랩뿐만 아니라 독립적 인 홀로그램 광학 트래핑 라인을 사용합니다. 또한 생물 효소의 활동을 동시에 고속, 고해상도 측정을 허용하는 동안이 굴절 입자의 복잡한 기하학적 배열을 만들 수 있습니다.

비디오: Construction of a High Resolution Microscope with Conventional and Holographic Optical Trapping Capabilities

Polycrystalline Silicon Thin-film Solar cells with Plasmonic-enhanced Light-trapping

One of major approaches to cheaper solar cells is reducing the amount of semiconductor material used for their fabrication and making cells thinner. To compensate for lower light absorption such physically thin devices have to incorporate light-trapping which increases their optical thickness. Light scattering by textured surfaces is a common technique but it cannot be universally applied to all solar cell technologies. Some cells, for example those made of evaporated silicon, are planar as produced and they require an alternative light-trapping means suitable for planar devices. Metal nanoparticles formed on planar silicon cell surface and capable of light scattering due to surface plasmon resonance is an effective approach.
The paper presents a fabrication procedure of evaporated polycrystalline silicon solar cells with plasmonic light-trapping and demonstrates how the cell quantum efficiency improves due to presence of metal nanoparticles.
To fabricate the cells a film consisting of alternative boron and phosphorous doped silicon layers is deposited on glass substrate by electron beam evaporation. An Initially amorphous film is crystallised and electronic defects are mitigated by annealing and hydrogen passivation. Metal grid contacts are applied to the layers of opposite polarity to extract electricity generated by the cell. Typically, such a ~2 &mu;m thick cell has a short-circuit current density (Jsc) of 14-16 mA/cm2, which can be increased up to 17-18 mA/cm2 (~25% higher) after application of a simple diffuse back reflector made of a white paint.
To implement plasmonic light-trapping a silver nanoparticle array is formed on the metallised cell silicon surface. A precursor silver film is deposited on the cell by thermal evaporation and annealed at 23&deg;C to form silver nanoparticles. Nanoparticle size and coverage, which affect plasmonic light-scattering, can be tuned for enhanced cell performance by varying the precursor film thickness and its annealing conditions. An optimised nanoparticle array alone results in cell Jsc enhancement of about 28%, similar to the effect of the diffuse reflector. The photocurrent can be further increased by coating the nanoparticles by a low refractive index dielectric, like MgF2, and applying the diffused reflector. The complete plasmonic cell structure comprises the polycrystalline silicon film, a silver nanoparticle array, a layer of MgF2, and a diffuse reflector. The Jsc for such cell is 21-23 mA/cm2, up to 45% higher than Jsc of the original cell without light-trapping or ~25% higher than Jsc for the cell with the diffuse reflector only.
Introduction
Light-trapping in silicon solar cells is commonly achieved via light scattering at textured interfaces. Scattered light travels through a cell at oblique angles for a longer distance and when such angles exceed the critical angle at the cell interfaces the light is permanently trapped in the cell by total internal reflection (Animation 1: Light-trapping). Although this scheme works well for most solar cells, there are developing technologies where ultra-thin Si layers are produced planar (e.g. layer-transfer technologies and epitaxial c-Si layers) 1 and or when such layers are not compatible with textures substrates (e.g. evaporated silicon) 2. For such originally planar Si layer alternative light trapping approaches, such as diffuse white paint reflector 3, silicon plasma texturing 4 or high refractive index nanoparticle reflector 5 have been suggested.
Metal nanoparticles can effectively scatter incident light into a higher refractive index material, like silicon, due to the surface plasmon resonance effect 6. They also can be easily formed on the planar silicon cell surface thus offering a light-trapping approach alternative to texturing. For a nanoparticle located at the air-silicon interface the scattered light fraction coupled into silicon exceeds 95% and a large faction of that light is scattered at angles above critical providing nearly ideal light-trapping condition (Animation 2: Plasmons on NP). The resonance can be tuned to the wavelength region, which is most important for a particular cell material and design, by varying the nanoparticle average size, surface coverage and local dielectric environment 6,7. Theoretical design principles of plasmonic nanoparticle solar cells have been suggested 8. In practice, Ag nanoparticle array is an ideal light-trapping partner for poly-Si thin-film solar cells because most of these design principle are naturally met. The simplest way of forming nanoparticles by thermal annealing of a thin precursor Ag film results in a random array with a relatively wide size and shape distribution, which is particularly suitable for light-trapping because such an array has a wide resonance peak, covering the wavelength range of 700-900 nm, important for poly-Si solar cell performance. The nanoparticle array can only be located on the rear poly-Si cell surface thus avoiding destructive interference between incident and scattered light which occurs for front-located nanoparticles 9. Moreover, poly-Si thin-film cells do not requires a passivating layer and the flat base-shaped nanoparticles (that naturally result from thermal annealing of a metal film) can be directly placed on silicon further increases plasmonic scattering efficiency due to surface plasmon-polariton resonance 10.
The cell with the plasmonic nanoparticle array as described above can have a photocurrent about 28% higher than the original cell. However, the array still transmits a significant amount of light which escapes through the rear of the cell and does not contribute into the current. This loss can be mitigated by adding a rear reflector to allow catching transmitted light and re-directing it back to the cell. Providing sufficient distance between the reflector and the nanoparticles (a few hundred nanometers) the reflected light will then experience one more plasmonic scattering event while passing through the nanoparticle array on re-entering the cell and the reflector itself can be made diffuse - both effects further facilitating light scattering and hence light-trapping. Importantly, the Ag nanoparticles have to be encapsulated with an inert and low refractive index dielectric, like MgF2 or SiO2, from the rear reflector to avoid mechanical and chemical damage 7. Low refractive index for this cladding layer is required to maintain a high coupling fraction into silicon and larger scattering angles, which are ensured by the high optical contrast between the media on both sides of the nanoparticle, silicon and dielectric 6. The photocurrent of the plasmonic cell with the diffuse rear reflector can be up to 45% higher than the current of the original cell or up to 25% higher than the current of an equivalent cell with the diffuse reflector only.

Polycrystalline silicon thin-film solar cells on glass are fabricated by deposition of boron and phosphorous doped silicon layers followed by crystallisation, defect passivation and metallisation. Plasmonic light-trapping is introduced by forming Ag nanoparticles on the silicon cell surface capped with a diffused reflector resulting in ~45% photocurrent enhancement.

Plasmonic 강화된 라이트 - 트래핑과 다결정 실리콘 박막 태양 전지

One of major approaches to cheaper solar cells is reducing the amount of semiconductor material used for their fabrication and making cells thinner. To ...

연구

공학

Construction and Testing of Coin Cells of Lithium Ion Batteries

Rechargeable lithium ion batteries have wide applications in electronics, where customers always demand more capacity and longer lifetime. Lithium ion batteries have also been considered to be used in electric and hybrid vehicles1 or even electrical grid stabilization systems2. All these applications simulate a dramatic increase in the research and development of battery materials3-7, including new materials3,8, doping9, nanostructuring10-13, coatings or surface modifications14-17 and novel binders18. Consequently, an increasing number of physicists, chemists and materials scientists have recently ventured into this area. Coin cells are widely used in research laboratories to test new battery materials; even for the research and development that target large-scale and high-power applications, small coin cells are often used to test the capacities and rate capabilities of new materials in the initial stage. 
 In 2010, we started a National Science Foundation (NSF) sponsored research project to investigate the surface adsorption and disordering in battery materials (grant no. DMR-1006515). In the initial stage of this project, we have struggled to learn the techniques of assembling and testing coin cells, which cannot be achieved without numerous help of other researchers in other universities (through frequent calls, email exchanges and two site visits). Thus, we feel that it is beneficial to document, by both text and video, a protocol of assembling and testing a coin cell, which will help other new researchers in this field. This effort represents the "Broader Impact" activities of our NSF project, and it will also help to educate and inspire students.
In this video article, we document a protocol to assemble a CR2032 coin cell with a LiCoO2 working electrode, a Li counter electrode, and (the mostly commonly used) polyvinylidene fluoride (PVDF) binder. To ensure new learners to readily repeat the protocol, we keep the protocol as specific and explicit as we can. However, it is important to note that in specific research and development work, many parameters adopted here can be varied. First, one can make coin cells of different sizes and test the working electrode against a counter electrode other than Li. Second, the amounts of C black and binder added into the working electrodes are often varied to suit the particular purpose of research; for example, large amounts of C black or even inert powder were added to the working electrode to test the "intrinsic" performance of cathode materials14. Third, better binders (other than PVDF) have also developed and used18. Finally, other types of electrolytes (instead of LiPF6) can also be used; in fact, certain high-voltage electrode materials will require the uses of special electrolytes7.

A protocol to construct and test coin cells of lithium ion batteries is described. The specific procedures of making a working electrode, preparing a counter electrode, assembling a cell inside a glovebox and testing the cell are presented.

건설과 리튬 이온 배터리의 동전 전지의 테스트

Rechargeable lithium ion batteries have wide applications in electronics, where customers always demand more capacity and longer lifetime.  Lithium ion ...

Optical Trapping of Nanoparticles

Optical trapping is a technique for immobilizing and manipulating small objects in a gentle way using light, and it has been widely applied in trapping and manipulating small biological particles. Ashkin and co-workers first demonstrated optical tweezers using a single focused beam1. The single beam trap can be described accurately using the perturbative gradient force formulation in the case of small Rayleigh regime particles1. In the perturbative regime, the optical power required for trapping a particle scales as the inverse fourth power of the particle size. High optical powers can damage dielectric particles and cause heating. For instance, trapped latex spheres of 109 nm in diameter were destroyed by a 15 mW beam in 25 sec1, which has serious implications for biological matter2,3.
A self-induced back-action (SIBA) optical trapping was proposed to trap 50 nm polystyrene spheres in the non-perturbative regime4. In a non-perturbative regime, even a small particle with little permittivity contrast to the background can influence significantly the ambient electromagnetic field and induce a large optical force. As a particle enters an illuminated aperture, light transmission increases dramatically because of dielectric loading. If the particle attempts to leave the aperture, decreased transmission causes a change in momentum outwards from the hole and, by Newton's Third Law, results in a force on the particle inwards into the hole, trapping the particle. The light transmission can be monitored; hence, the trap can become a sensor. The SIBA trapping technique can be further improved by using a double-nanohole structure.
The double-nanohole structure has been shown to give a strong local field enhancement5,6. Between the two sharp tips of the double-nanohole, a small particle can cause a large change in optical transmission, thereby inducing a large optical force. As a result, smaller nanoparticles can be trapped, such as 12 nm silicate spheres7 and 3.4 nm hydrodynamic radius bovine serum albumin proteins8. In this work, the experimental configuration used for nanoparticle trapping is outlined. First, we detail the assembly of the trapping setup which is based on a Thorlabs Optical Tweezer Kit. Next, we explain the nanofabrication procedure of the double-nanohole in a metal film, the fabrication of the microfluidic chamber and the sample preparation. Finally, we detail the data acquisition procedure and provide typical results for trapping 20 nm polystyrene nanospheres.

The following setup approach details low power optical trapping of dielectric nanoparticles using a double-nanohole in metal film.

나노 입자의 광학 트래핑

Optical trapping is a technique for immobilizing and manipulating small objects in a gentle way using light, and it has been widely applied in trapping ...

High-resolution, High-speed, Three-dimensional Video Imaging with Digital Fringe Projection Techniques

Digital fringe projection (DFP) techniques provide dense 3D measurements of dynamically changing surfaces.&#160;Like the human eyes and brain, DFP uses triangulation between matching points in two views of the same scene at different angles to compute depth.&#160;However, unlike a stereo-based method, DFP uses a digital video projector to replace one of the cameras1. The projector rapidly projects a known sinusoidal pattern onto the subject, and the surface of the subject distorts these patterns in the camera&#8217;s field of view. Three distorted patterns (fringe images) from the camera can be used to compute the depth using triangulation.
Unlike other 3D measurement methods, DFP techniques lead to systems that tend to be faster, lower in equipment cost, more flexible, and easier to develop.&#160;DFP systems can also achieve the same measurement resolution as the camera.&#160;For this reason, DFP and other digital structured light techniques have recently been the focus of intense research (as summarized in1-5). Taking advantage of DFP, the graphics processing unit, and optimized algorithms, we have developed a system capable of 30&#160;Hz 3D video data acquisition, reconstruction, and display for over 300,000 measurement points per frame6,7.&#160;Binary defocusing DFP methods can achieve even greater speeds8.
Diverse applications can benefit from DFP techniques. Our collaborators have used our systems for facial function analysis9, facial animation10, cardiac mechanics studies11, and fluid surface measurements, but many other potential applications exist.&#160;This video will teach the fundamentals of DFP techniques and illustrate the design and operation of a binary defocusing DFP system.

This video describes the fundamentals of digital fringe projection techniques, which provide dense 3D measurements of dynamically changing surfaces.&#160;It also demonstrates the design and operation of a high-speed binary defocusing system based on these techniques.

Digital fringe projection (DFP) techniques provide dense 3D measurements of dynamically changing surfaces.&#160;Like the human eyes and brain, DFP uses ...

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats &amp; Spheres

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial shape (i.e., surface figure), will converge to final surface figure with excellent surface quality under a fixed, unchanging set of polishing parameters in a single polishing iteration. In contrast, conventional full aperture polishing methods require multiple, often long, iterative cycles involving polishing, metrology and process changes to achieve the desired surface figure. The Convergent Polishing process is based on the concept of workpiece-lap height mismatch resulting in pressure differential that decreases with removal and results in the workpiece converging to the shape of the lap. The successful implementation of the Convergent Polishing process is a result of the combination of a number of technologies to remove all sources of non-uniform spatial material removal (except for workpiece-lap mismatch) for surface figure convergence and to reduce the number of rogue particles in the system for low scratch densities and low roughness. The Convergent Polishing process has been demonstrated for the fabrication of both flats and spheres of various shapes, sizes, and aspect ratios on various glass materials. The practical impact is that high quality optical components can be fabricated more rapidly, more repeatedly, with less metrology, and with less labor, resulting in lower unit costs. In this study, the Convergent Polishing protocol is specifically described for fabricating 26.5 cm square fused silica flats from a fine ground surface to a polished ~&#955;/2 surface figure after polishing 4 hr per surface on a 81 cm diameter polisher.

A novel optical polishing process, called &#8220;Convergent Polishing&#8221;, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

집중적 인 연마 : 고품질 광학 플랫 &amp; 분야의 단순, 신속, 전체 조리개 연마 공정

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial ...

Compact Lens-less Digital Holographic Microscope for MEMS Inspection and Characterization

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and automotive. However, effective inspection and characterization metrology systems are needed to ensure the functional reliability of MEMS. This study presents a system based on digital holography as a tool for MEMS metrology. Digital holography has gained increasing attention in the past 20 years. With the fast development and decreasing cost of sensor arrays, resolution of such systems has increased broadening potential applications. Thus, it has attracted attention from both research and industry sides as a potential reliable tool for industrial metrology. Indeed, by recording the interference pattern between an object beam (which contains sample height information) and a reference beam on a CCD camera, one can retrieve the quantitative phase information of an object. However, most of digital holographic systems are bulky and thus not easy to implement on industry production lines. The novelty of the system presented is that it is lens-less and thus very compact. In this study, it is shown that the Compact Digital Holographic Microscope (CDHM) can be used to evaluate several characteristics typically consider as criteria in MEMS inspections. The surface profiles of MEMS in both static and dynamic conditions are presented. Comparison with AFM is investigated to validate the accuracy of the CDHM.

We present a compact reflection digital holographic system (CDHM) for inspection and characterization of MEMS devices. A lens-less design using a diverging input wave providing natural geometrical magnification is demonstrated. Both static and dynamic studies are presented.

MEMS 검사 및 특성화를위한 소형 렌즈가없는 디지털 홀로그램 현미경

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and ...

Plasmonic Trapping and Release of Nanoparticles in a Monitoring Environment

Plasmonic tweezers use surface plasmon polaritons to confine polarizable nanoscale objects. Among the various designs of plasmonic tweezers, only a few can observe immobilized particles. Moreover, a limited number of studies have experimentally measured the exertable forces on the particles. The designs can be classified as the protruding nanodisk type or the suppressed nanohole type. For the latter, microscopic observation is extremely challenging. In this paper, a new plasmonic tweezer system is introduced to monitor particles, both in directions parallel and orthogonal to the symmetric axis of a plasmonic nanohole structure. This feature enables us to observe the movement of each particle near the rim of the nanohole. Furthermore, we can quantitatively estimate the maximal trapping forces using a new fluidic channel.

A microchip fabrication process that incorporates plasmonic tweezers is presented here. The microchip enables the imaging of a trapped particle to measure maximal trapping forces.

모니터링 환경에서 플라즈몬 트랩 및 나노 입자의 릴리스

Plasmonic tweezers use surface plasmon polaritons to confine polarizable nanoscale objects. Among the various designs of plasmonic tweezers, only a few ...

Demonstration of a Hyperlens-integrated Microscope and Super-resolution Imaging

The use of super-resolution imaging to overcome the diffraction limit of conventional microscopy has attracted the interest of researchers in biology and nanotechnology. Although near-field scanning microscopy and superlenses have improved the resolution in the near-field region, far-field imaging in real-time remains a significant challenge. Recently, the hyperlens, which magnifies and converts evanescent waves into propagating waves, has emerged as a novel approach to far-field imaging. Here, we report the fabrication of a spherical hyperlens composed of alternating silver (Ag) and titanium oxide (TiO2) thin layers. Unlike a conventional cylindrical hyperlens, the spherical hyperlens allows for two-dimensional magnification. Thus, incorporation into conventional microscopy is straightforward. A new optical system integrated with the hyperlens is proposed, allowing for a sub-wavelength image to be obtained in the far-field region in real time. In this study, the fabrication and imaging setup methods are explained in detail. This work also describes the accessibility and possibility of the hyperlens, as well as practical applications of real-time imaging in living cells, which can lead to a revolution in biology and nanotechnology.

The use of a hyperlens has been regarded as a novel super-resolution imaging technique due to its advantages in real-time imaging and its simple implementation with conventional optics. Here, we present a protocol describing the fabrication and imaging applications of a spherical hyperlens.

Hyperlens 통합 현미경 및 슈퍼 해상도 영상

The use of super-resolution imaging to overcome the diffraction limit of conventional microscopy has attracted the interest of researchers in biology and ...

Method for Recording Broadband High Resolution Emission Spectra of Laboratory Lightning Arcs

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional camera film methods and then digital camera technology, from which several important characteristics have been derived. However, such work has always been limited due to the inherently random and non-repeatable nature of natural lightning events in the field. Recent developments in lightning test facilities now allow the reproducible generation of lightning arcs within controlled laboratory environments, providing a test bed for the development of new sensors and diagnostic techniques to understand lightning mechanisms better. One such technique is a spectroscopic system using digital camera technology capable of identifying the chemical elements with which the lightning arc interacts, with these data then being used to derive further characteristics. In this paper, the spectroscopic system is used to obtain the emission spectrum from a 100 kA peak, 100 &#181;s duration lightning arc generated across a pair of hemispherical tungsten electrodes separated by a small air gap. To maintain a spectral resolution of less than 1 nm, several individual spectra were recorded across discrete wavelength ranges, averaged, stitched, and corrected to produce a final composite spectrum in the 450 nm (blue light) to 890 nm (near infrared light) range. Characteristic peaks within the data were then compared to an established publicly available database to identify the chemical element interactions. This method is readily applicable to a variety of other light emitting events, such as fast electrical discharges, partial discharges, and sparking in electrical equipment, apparatus, and systems.

Emission spectroscopy techniques have traditionally been used to analyze inherently random lightning arcs occurring in nature. In this paper, a method developed to obtain the emission spectroscopy from reproducible lightning arcs generated within a laboratory environment is described.

실험실 번개 아크의 광대역 고분해능 방출 스펙트럼을 기록하는 방법

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional ...

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by employing an aberration-corrected scanning transmission electron microscope as the exposure tool. Here, we present results of single-digit nanometer patterning of two widely used electron-beam resists: poly (methyl methacrylate) and hydrogen silsesquioxane. The method achieves sub-5 nanometer features in poly (methyl methacrylate) and sub-10 nanometer resolution in hydrogen silsesquioxane. High-fidelity transfer of these patterns into target materials of choice can be performed using metal lift-off, plasma etch, and resist infiltration with organometallics.

We use an aberration-corrected scanning transmission electron microscope to define single-digit nanometer patterns in two widely-used electron-beam resists: poly (methyl methacrylate) and hydrogen silsesquioxane. Resist patterns can be replicated in target materials of choice with single-digit nanometer fidelity using liftoff, plasma etching, and resist infiltration by organometallics.

자리 나노미터 전자 빔 리소 그래피는 수 차 수정 스캐닝 전송 전자 현미경으로

We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by ...