Fabrication Process and Electrical Characterization
2:33
Biasing Chip Mounting on Gridbar
3:14
Lamella Preparation and Biasing Chip Mounting
6:50
In Situ Transmission Electron Microscopy (TEM)
7:42
Results: Representative In Situ Electrical TEM
9:04
Conclusion
Transcript
In this protocol, we are showing the fabrication process of cross-point devices incorporating amorphous vanadium oxide, which actually dissolves in the water.And further, this protocol helps us to improve our understanding of nano-structural chang
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Presented here is a protocol for analyzing nanostructural changes during in situ biasing with transmission electron microscopy (TEM) for a stacked metal-insulator-metal structure. It has significant applications in resistive switching crossbars for the next generation of programmable logic circuits and neuromimicking hardware, to reveal their underlying operation mechanisms and practical applicability.