S'identifier

JoVE Journal

Engineering

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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

3.9K Views

09:49 min

May 13th, 2020

May 13th, 2020

3,902 Views

0:04

Introduction

0:52

Fabrication Process and Electrical Characterization

2:33

Biasing Chip Mounting on Gridbar

3:14

Lamella Preparation and Biasing Chip Mounting

6:50

In Situ Transmission Electron Microscopy (TEM)

7:42

Results: Representative In Situ Electrical TEM

9:04

Conclusion

Transcription

In this protocol, we are showing the fabrication process of cross-point devices incorporating amorphous vanadium oxide, which actually dissolves in the water.And further, this protocol helps us to improve our understanding of nano-structural chang

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Presented here is a protocol for analyzing nanostructural changes during in situ biasing with transmission electron microscopy (TEM) for a stacked metal-insulator-metal structure. It has significant applications in resistive switching crossbars for the next generation of programmable logic circuits and neuromimicking hardware, to reveal their underlying operation mechanisms and practical applicability.

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