1. 기판 준비 <ol><li> 1cm에게시 웨이퍼에서 X 1cm 실리콘 기판을 잘라 실리콘은 SEM 특성 (비행기보기 및 단면)에 좋습니다. </li><li> 1cm에게 X 1cm 유리 (소다 석회, 두께 1mm)를 잘라 유리는 광학 및 전기 특성에 적합합니다. </li><li> 연락처는 유리 기판에 필요한 경우, AU 연락처는 마스크를 사용하여 진공 상태에서 증발 할 수 있습니다. 보증금 AU, 끊을 보증금을 50 nm의 접착력을 향상시키는 내부와 같은 크롬의 10 nm의. </li><li> (예 : 에틸렌 테트라 플루오르 에틸렌, ETFE) 1cm에게 X 1cm 폴리머 샘플을 잘라 버릴거야. </li><li> 5-10 분 동안 이소프로판올에 sonicating하여 기판을 청소하고 N이 흐름을 이용하여 건조 이소프로판올에 린스. </li></ol> 2. 레이저 매개 변수의 레이저 정렬 및 선택 <ol><li> ND 따뜻한 - 업 : YAG 레이저와 사분의 일 고조파 발생기 (FHG)를 사용하여 선택 IV 고조파 방출 (266 nm의 파장이) 두 SE로 구성폭포에서 cond 고조파 발생기 (SHG). </li><li> 2 %의 중량를 탑재합니다. 알 2 O 3 :. 대상 속이는에서 ZnO 원형 대상 (2 &quot;직경)의 타겟 회전과 번역을 시작하고 최대 수직 범위를 설정 대상의 중심에 레이저 자리를 정렬 레이저 스폿은 외부에 손을 대면 절대 있는지 확인합니다. 강철 반지는 목표를 해결하기 위해 사용됩니다. 대상이 전체 대상 표면의 균일 절제를 할 수있는 로토 - 병진 운동과 함께 이동합니다. </li><li> 반복 속도 (예 : 10 Hz에서) 및 펄스 에너지 (예 : 75 MJ)를 선택합니다. 전원 측정기에 의해 펄스 에너지와 모니터 레이저 안정성을 조정합니다. </li><li> 선택한 위치로 초점 렌즈를 이동하고 그 자리의 크기를 측정 할 수있는 대상에 연결된 민감한 종이를 사용합니다. 종이에 초점 렌즈 화재 1-5 레이저 샷의 위치하십시오. 1 J / cm 2의 레이저 fluence를 할 수있는 렌즈 위치를 선택합니다. </li></ol> 3. PLD 설정증착 매개 변수의 D 선택 <ol><li> 기판 위치 정렬 <ol><li> 정렬 테스트를위한 기판으로 2 &quot;직경에 대한 원형 종이 시트를 탑재합니다. </li><li> 대상 - 투 - 기판 거리 D TS = 50 mm까지 기판 홀더를 이동합니다. </li><li> 진공 레벨이 10 -2 아빠!에 도달 할 때까지 기본 및 turbomolecular 펌프와 챔버를 펌핑 시작 </li><li> 가스 유형 (예 : 산소)를 선택하고 적절한 가스 압력을 (섹션 4와 5 참조) 할 속도와 가스의 흐름을 펌핑 조정합니다. 원형 코로나를 통해 균일 한 막 두께를 확보 할 수 깃털 센터와 관련하여 기판 속이는 오프 축 XY 위치를 조정합니다. </li><li> 빔 마개 / 전원 미터를 제거하여 절개를 시작합니다. 목표는 새로운 또는이 오랜 기간 동안 사용되지 않은 경우,이 사전 절제가 대상을 청소하는 데 필요한 경우. </li><li> 보증금 파페에 볼 수 있습니다 때 절개를 중지R은 뷰포트에서 찾고. </li></ol></li><li> 플라즈마 기둥 길이의 결정 <ol><li> 단계 3.1.1를 따르십시오. 3.1.5까지 절제하는 동안 0.5과 디지털 카메라로 사진을 찍을 - 1 초 축적 시간을 평균으로 다른 플라즈마 남게 이상. </li><li> 참조 (그림 3 참조) D TS을 취하는 사진에서 보이는 플라즈마 깃털의 길이를 측정합니다. </li></ol></li><li> 필름 두께의 보정 <ol><li> 대상 (예 100mm 등)에서 멀리 기판을 이동하고 대상에서 D TS와 같은 거리에있는 석영 마이크로 잔액 (QCM)를 이동합니다. </li><li> 보증금 1000 레이저 샷 (예 : 1 &#39;40 &#39;&#39;)과 증착 질량 값을 측정 한 다음 거리에 QCM 이동합니다. </li><li> 1.1로시 기판을 탑재합니다. </li><li> 테스트 샘플을 입금 (예 : 18,000 레이저 샷 즉, 30 &#39;)와 c에 단면 SEM 이미지를 사용증착 속도 (NM / 펄스)를 alibrate. </li></ol></li></ol> 4. Nanoengineered 아조 영화의 증착 <ol><li> 접착제 테이프를 사용하여 샘​​플 홀더 속이는 섹션에서 1로 준비된 기판을 탑재합니다. </li><li> 3.1.3 - 3.1.2 단계를 따르십시오. </li><li> 기판 회전을 시작합니다. </li><li> 소형 아조 필름의 증착 <ol><li> 20 sccm (압력 10 -2 아빠 범위에있는)에서 75-100 W 및 아르곤 가스 유량 100 EV, RF 전력에 이온 총과 세트 이온 에너지 전환합니다. 아르곤과 깨끗한 기판 + 5-10 분을위한 이온 총. 청소 치료 가까이에 가스 유입 후와 아르곤을 제거 할 수있는 챔버를 펌프. </li><li> 산소 가스를 넣고이 아빠 산소가 속도와 가스 유량을 펌핑 조정합니다. </li><li> 18,000 샷 (30 &#39;)에 대한 절제와 보증금을 시작합니다. 단계 3.2 결정 깃털의 길이는 동일 절제 확인 중. </li><li> 중지 절제 가까이 g입구로 챔버를 펌프. </li></ol></li><li> 계층 구조의 아조 필름의 증착 <ol><li> 산소 가스를 넣고 160 아빠 산소가 속도와 가스의 흐름을 펌핑 조정합니다. </li><li> 18,000 샷 (30 &#39;)에 대한 절제와 보증금을 시작합니다. 단계 3.2 결정 깃털의 길이는 동일 절제 확인 중. </li><li> 챔버를 펌프, 절제, 가까이에 가스 유입를 중지합니다. </li></ol></li><li> 챔버를 환기하고 샘플을 제거 </li></ol> 5. 전기 광학 특성 <ol><li> 네 프로브 기술을 (예 반 데르 Pauw 방법)를 사용하여 인 비행기 수송 특성을 측정합니다. 연락처 계획에 대한 그림 4를 참조하십시오. 프로브 전류의 일반적인 값은 10mA 범위 제 1 μA에 있습니다. 성능은 더 나은 두께 균일 성을 (약 5 %) 보장하기 위해 0.7 cm X 0.7 cm로 감소 샘플 영역에 수행됩니다. </li><li> optica 측정샘플과 베어 기판의 난 투과율. 유리 / 필름 인터페이스에서 1로 강도를 설정하여 기판 기여에 대한 스펙트럼을 수정합니다. 정확한 보정 프로 시저에 대한 예제는 입사 빔을 마주 유리 기판에 장착되어 있는지 확인하십시오. 400-700 nm의 범위에서의 평균 투과율을 계산하여 가시 광선 투명도를 결정합니다. 빛의 분산 비율을 측정하기 위해 150mm 직경 통합 영역을 사용하여, 안개 계수가 전체 전송 빛 (즉, 분산 앞으로 전송)에 의해 분산 된 일부를 나누어 계산 될 수있다 그림 5를 참조하십시오. </li></ol>

<ol>
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T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Pulsed+Laser+Deposition+of+Nanostructured+Oxides:+from+Clusters+to+Functional+Films.">Pulsed Laser Deposition of Nanostructured Oxides: from Clusters to Functional Films.</a> Advances in Laser and Optics Research. 7, 65-100 (2012).</li><li>Amoruso, S., Sambri, A., Vitiello, M., Wang, X. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plume+expansion+dynamics+during+laser+ablation+of+manganates+in+oxygen+atmosphere.">Plume expansion dynamics during laser ablation of manganates in oxygen atmosphere.</a> Applied Surface Science. 252, 4712-4716 (2006).</li><li>Uccello, A., Dellasega, D., Perissinotto, S., Lecis, N., Passoni, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanostructured+Rhodium+Films+for+Advanced+Mirrors+Produced+by+Pulsed+Laser+Deposition.">Nanostructured Rhodium Films for Advanced Mirrors Produced by Pulsed Laser Deposition.</a> Journal of Nuclear Materials. , (2013).</li><li>Gondoni, P., Ghidelli, M., Fonzo, F. D. i., Russo, V., Bruno, P., Mart&#237;-Rujas, J., Bottani, C. E., Li Bassi, A., Casari, C. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Highly+Performing+Al:ZnO+Thin+Films+grown+by+Pulsed+Laser+Deposition+at+Room+Temperature.">Highly Performing Al:ZnO Thin Films grown by Pulsed Laser Deposition at Room Temperature.</a> Nanoscience and Nanotechnology. , (2013).</li></ol>

관심 없음 충돌이 선언 없습니다.

플라즈마 깃털 모양 특히 가스의 존재에 밀접하게 절제 프로세스에 관련되어, 육안 검사에 의해 플라즈마 깃털을 모니터링하면 증착을 제어하는​​ 것이 중요합니다. 산화물 타겟을 흡열하여 금속 산화물을 증착 할 때, 산소는 절제 과정에서 산소 손실을 지원하기 위해 필요합니다. 낮은 산소 배경 가스 압력에서 증착 된 물질은 산소 공석이있을 수 있습니다. 이 효과는 가스 압력을 증가시켜 ?...

펄스 레이저 증착 (PLD)는 필름 (그림 1 참조) 1 성장 기판에 증착 될 수있다 ablated 종의 플라즈마 형성에 결과 고체 타겟의 레이저 절제를 고용합니다. 배경의 분위기 (불활성 또는 반응성)과의 상호 작용은 가스 상태 (그림 2 참조) 2,3에 균일 클러스터 핵을 유도하는 데 사용할 수 있습니다. PLD에 의한 물질 합성에 대한 전략을주의 깊게 PLD 과정에서 생성 된 플라즈마 역학을 제어하여 상향식 접근 재료 특성의 조정에 기반을두고 있습니다. 클러스터 크기, 운동 에너지와 구성은 4,5 형태학 및 구조 변화의 영화 성장과 결과에 영향을 증착 매개 변수의 적절한 설정에 의해 다양 할 수 있습니다. 이용하여 방법은 우리가 (예 : WO 3, 자세 4 O 4, 알 2 O 3 산화물의 숫자에 대해 시연 여기에 설명차 티오 2) nanoscale 6-11의 자료 구조를 수정하여 형태를 조정하는 기능, 밀도, 다공성, 구조 주문, 화학량 론과 단계의 학위를 취득했습니다. 이 특정 응용 프로그램 12-16에 대한 자료의 디자인을 할 수 있습니다. 태양 광 응용 프로그램을 참조하여, 우리는 계층 염료 sensitized 태양 전지에 photoanodes로 고용 할 때 13 흥미로운 결과를 보여주는 &#39;나무의 숲&#39;과 유사한 나노와 mesostructure (DSSC에 조립 나노 입자 (&lt;10 nm 정도)가 주최 nanostructured 티오 2 합성 ) 17. 이러한 이전 결과를 바탕으로 우리는 투명 전도성 산화물 등의 알 - 도핑 된 ZnO (아조) 영화의 증착에 대한 프로토콜을 설명합니다. 투명 실시 산화물 (TCOs)는 저항 &lt;10 -3 옴 - cm와 80 % 이상 광 transmi를 표시하는 높은 밴드 갭 (&gt; 3 EV) 무거운 도핑에 의해 지휘자로 변환 자료입니다눈에 보이는 범위의 ttance. 그들은 이러한 터치 스크린과 태양 전지 18-21 많은 응용 프로그램을위한 핵심 요소이며, 그들은 일반적으로 스퍼터링, 펄스 레이저 증착, 화학 기상 증착, 스프레이 열분해 및 솔루션 기반 화학 방법과 같은 다른 기법으로 재배하고 있습니다. TCOs 중 인듐 - 주석 산화물 (ITO)이 널리는 낮은 저항에 대한 연구되었지만 높은 비용과 인듐의 낮은 가용성의 단점을 앓고. 연구는 현재 F-도핑 된 SnO 2 (FTO), 알 - 도핑 된 ZnO (아조)와 F-도핑 된 ZnO (FZO)과 같은 인듐 - 무료 시스템으로 이동합니다. 사고 빛의 지능형 관리 (빛 트래핑)를 제공 할 수 전극은 태양 광 애플리케이션을위한 특히 재미 있습니다. 빛의 파장 (예 : 300-1,000 nm 정도)에 좋은 컨트롤에 필적하는 규모의 변조 구조와 morphologies를 통해 분산 가시 광선에 가능성을 이용하려면영화 형태 및 클러스터 조립 아키텍처가 필요합니다. 특히 우리는 형태와 아조 필름의 구조를 조정하는 방법에 대해 설명합니다. 컴팩트 아조은 저압 (2 아빠 산소)에 있으며, 룸 온도에서 증착은 낮은 저항 (4.5 × 10 -4 옴 cm)와 아조은 높은 온도에서 증착과 경쟁력 가시 광선 투명도 (&gt; 90 %)을 특징으로하는 동안 아조 계층 구조는이 구조는 80 %, 22,23 이상으로 연기 계수와 강력한 빛의 분산 기능을 표시 100 아빠! 위의 O 2 압력에서 흡열에 의해 얻어진다.

<table border="1"><tbody><tr><td> 시약 / 재료의 이름 </td><td> 회사 </td><td> 카탈로그 번호 </td></tr><tr><td> 펄스 레이저 </td><td> 연속체 - Quantronix </td><td> Powerlite 8010 </td></tr><tr><td> 파워 미터 </td><td> 응집성의 </td><td> FieldMaxII-TO </td></tr><tr><td> 이온 건 </td><td> 맨티스 출발지 </td><td> RFMax60 </td></tr><tr><td> 질량 유량 제어기 </td><td> Mks </td><td> 2179 ° </td></tr><tr><td> 석영 크리스탈 Microbalance </td><td> Infcon </td><td> XTC / 2 </td></tr><tr><td> 배경 가스 </td><td> Rivoira - Praxair </td><td> 5.0 산소 </td></tr><tr><td> 목표 </td><td> 커트 Lesker </td><td> (요청했다) </td></tr><tr><td> 이소프로판올 </td><td> 시그마 알드리치 </td><td> 190764-2L </td></tr><tr><td> 소스 미터 </td><td> Keithley </td><td> K2400 </td></tr><tr><td> 자석 키트 </td><td> Ecopia </td><td> 0.55T - 키트 </td></tr><tr><td> 분광 광도계 </td><td> PerkinElmer </td><td> 람다 1050 </td></tr></tbody></table>

fabrication of nano-engineered transparent conducting oxides by pulsed laser deposition

배경 가스의 존재에 나노초 펄스 레이저 증착 (PLD)는 수있는 플라즈마 깃털 확장 역학의 적절한 제어에 의해 조정할 수 형태, 구조, 밀도 및 화학량 론과 금속 산화물의 증착. 이러한 융통성은 나노 크기의 클러스터의 계층 구조 조립이 특징으로 작고 조밀 한 nanoporous에서 nanostructured 영화를 만들어 악용 할 수 있습니다. 특히 우리는 태양 광 발전 장치의 투명 전극으로 알 - 도핑 된 ZnO (아조) 영화의 두 종류를 조작 할 수있는 자세한 방법 설명 : 낮은 O 2 압력 1), 예술의 상태로 전기 전도성 및 광학 투명 가까이있는 소형 영화 찌르다 아르 나노 나무 숲을 닮은 2) 높은 빛의 분산 계층 구조, 투명 실시 산화물 (TCO)이 같은 유기 광전지 (OPVs)에 사용되는 폴리머와 같은 열 민감한 자료와 호환을 위해 실온에서 증착 될 수있다높은 압력에서 uced. 이러한 구조는 높은 안개 계수를 표시 (&gt; 80 %)와 빛을 트래핑 능력을 향상시키기 위해 악용 될 수 있습니다. 아조 영화에 대한 설명 여기 방법 등 할아버지 2, 알 2 O 3, WO 3 자세 4 O 4와 같은 기술 응용 프로그램에 관련된 다른 금속 산화물에 적용 할 수 있습니다.

산소 분위기에서 PLD에 의한 아조의 증착이 낮은 배경 가스 압력 (즉, 두 PA)와 높은 압력 (즉, 160 PA)의 계층 조립 클러스터로 구성 메조 기공 숲과 같은 구조의 컴팩트 한 투명 전도성 필름을 생산하고 있습니다. 자료는 그의 사이즈 2 파 22에서 최대 (30 nm 정도)입니다 nanocrystalline 도메인로 구성되어 있습니다. ablated 종 및 배경 가스 사이의 충돌로 인해 플?...

Watch this Scientific Journal Video about Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition at JoVE.com

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

우리는 배경 가스의 존재에 나노초 펄스 레이저 증착 (PLD)에 의해 nanostructured 산화물 박막을 증착 할 수있는 실험 방법을 설명합니다. 알 - 도핑 된 ZnO (아조) 영화이 방법을 사용하여 소형에서 계층 적 나노 나무 숲으로 구성까지, 증착 될 수있다.

의 제작 펄스 레이저 증착에 의해 투명 실시 산화물 나노 설계

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

fabrication-nano-engineered-transparent-conducting-oxides-pulsed

Research

JoVE Journal

Engineering

15.4K 조회수.  Politecnico di Milano. 우리는 배경 가스의 존재에 나노초 펄스 레이저 증착 (PLD)에 의해 nanostructured 산화물 박막을 증착 할 수있는 실험 방법을 설명합니다. 알 - 도핑 된 ZnO (아조) 영화이 방법을 사용하여 소형에서 계층 적 나노 나무 숲으로 구성까지, 증착 될 수있다.

비디오: Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Investigation of Early Plasma Evolution Induced by Ultrashort Laser Pulses

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a significant role in laser-material interaction, especially in the air environment1-11.
Early plasma evolution has been captured through pump-probe shadowgraphy1-3 and interferometry1,4-7. However, the studied time frames and applied laser parameter ranges are limited. For example, direct examinations of plasma front locations and electron number densities within a delay time of 100 picosecond (ps) with respect to the laser pulse peak are still very few, especially for the ultrashort pulse of a duration around 100 femtosecond (fs) and a low power density around 1014 W/cm2. Early plasma generated under these conditions has only been captured recently with high temporal and spatial resolutions12. The detailed setup strategy and procedures of this high precision measurement will be illustrated in this paper. The rationale of the measurement is optical pump-probe shadowgraphy: one ultrashort laser pulse is split to a pump pulse and a probe pulse, while the delay time between them can be adjusted by changing their beam path lengths. The pump pulse ablates the target and generates the early plasma, and the probe pulse propagates through the plasma region and detects the non-uniformity of electron number density. In addition, animations are generated using the calculated results from the simulation model of Ref. 12 to illustrate the plasma formation and evolution with a very high resolution (0.04 ~ 1 ps).
Both the experimental method and the simulation method can be applied to a broad range of time frames and laser parameters. These methods can be used to examine the early plasma generated not only from metals, but also from semiconductors and insulators.

An experimental method to examine the early plasma evolution induced by ultrashort laser pulses is described. Using this method, high quality images of early plasma are obtained with high temporal and spatial resolutions. A novel integrated atomistic model is used to simulate and explain the mechanisms of early plasma.

초기 플라즈마 진화의 조사는 극단으로 짧은 레이저 펄스에 의해 유도된

Early plasma is generated owing to high intensity laser irradiation of target and the subsequent target material ionization. Its dynamics plays a ...

연구

공학

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

공간적으로 밀폐 복합 산화물의 제조

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Making Record-efficiency SnS Solar Cells by Thermal Evaporation and Atomic Layer Deposition

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent thermal evaporation, and it absorbs visible light strongly. However, for a long time the record power conversion efficiency of SnS solar cells remained below 2%. Recently we demonstrated new certified record efficiencies of 4.36% using SnS deposited by atomic layer deposition, and 3.88% using thermal evaporation. Here the fabrication procedure for these record solar cells is described, and the statistical distribution of the fabrication process is reported. The standard deviation of efficiency measured on a single substrate is typically over 0.5%. All steps including substrate selection and cleaning, Mo sputtering for the rear contact (cathode), SnS deposition, annealing, surface passivation, Zn(O,S) buffer layer selection and deposition, transparent conductor (anode) deposition, and metallization are described. On each substrate we fabricate 11 individual devices, each with active area 0.25 cm2. Further, a system for high throughput measurements of current-voltage curves under simulated solar light, and external quantum efficiency measurement with variable light bias is described. With this system we are able to measure full data sets on all 11 devices in an automated manner and in minimal time. These results illustrate the value of studying large sample sets, rather than focusing narrowly on the highest performing devices. Large data sets help us to distinguish and remedy individual loss mechanisms affecting our devices.

Tin sulfide (SnS) is a candidate material for Earth-abundant, non-toxic solar cells. Here, we demonstrate the fabrication procedure of the SnS solar cells employing atomic layer deposition, which yields 4.36% certified power conversion efficiency, and thermal evaporation which yields 3.88%.

열 증발 및 원자 층 증착에 의해 기록 효율 SNS 태양 전지 만들기

Tin sulfide (SnS) is a candidate absorber material for Earth-abundant, non-toxic solar cells. SnS offers easy phase control and rapid growth by congruent ...

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of biosensing devices. We report on a protocol of using KrF and ArF lasers irradiating Si (001) samples immersed in a liquid environment with low number of pulses and operating at moderately low pulse fluences to induce Si wettability modification. Wafers immersed for up to 4 hr in a 0.01% H2O2/H2O solution did not show measurable change in their initial contact angle (CA) ~75&#176;. However, the 500-pulse KrF and ArF lasers irradiation of such wafers in a microchamber filled with 0.01% H2O2/H2O solution at 250 and 65 mJ/cm2, respectively, has decreased the CA to near 15&#176;, indicating the formation of a superhydrophilic surface. The formation of OH-terminated Si (001), with no measurable change of the wafer&#8217;s surface morphology, has been confirmed by X-ray photoelectron spectroscopy and atomic force microscopy measurements. The selective area irradiated samples were then immersed in a biotin-conjugated fluorescein-stained nanospheres solution for 2 hr, resulting in a successful immobilization of the nanospheres in the non-irradiated area. This illustrates the potential of&#160;the method for selective area biofunctionalization and fabrication of advanced Si-based biosensing architectures. We also describe a similar protocol of irradiation of wafers immersed in methanol (CH3OH) using ArF laser operating at pulse fluence of 65 mJ/cm2 and in situ formation of a strongly hydrophobic surface of Si (001) with the CA of 103&#176;. The XPS results indicate ArF laser induced formation of Si&#8211;(OCH3)x compounds responsible for the observed hydrophobicity. However, no such compounds were found by XPS on the Si surface irradiated by KrF laser in methanol, demonstrating the inability of the KrF laser to photodissociate methanol and create -OCH3 radicals.

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with&#160;H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

액체 환경에서의 펄스 자외선 레이저 조사에 의한 실리콘 표면의 젖음성의 선택 영역 수정

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of ...

Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using femtosecond laser-induced ablation. We show that thousands of periodic nano-craters are fabricated on an optical nanofiber by irradiating with just a single femtosecond laser pulse. For a typical sample, periodic nano-craters with a period of 350 nm and with diameter gradually varying from 50 - 250 nm over a length of 1 mm are fabricated on a nanofiber with diameter around 450 - 550 nm. A key aspect of such a nanofabrication is that the nanofiber itself acts as a cylindrical lens and focuses the femtosecond laser beam on its shadow surface. Moreover, the single-shot fabrication makes it immune to mechanical instabilities and other fabrication imperfections. Such periodic nano-craters on nanofiber, act as a 1-D PhC and enable strong and broadband reflection while maintaining the high transmission out of the stopband. We also present a method to control the profile of the nano-crater array to fabricate apodized and defect-induced PhC cavities on the nanofiber. The strong confinement of the field, both transverse and longitudinal, in the nanofiber-based PhC cavities and the efficient integration to the fiber networks, may open new possibilities for nanophotonic applications and quantum information science.

We present a protocol for fabricating 1-D photonic crystal cavities on subwavelength diameter silica fibers (optical nanofibers) using femtosecond laser-induced ablation.

펨토초 레이저에 의한 절제를 사용하여 나노 섬유에 1-D 광자 크리스탈 캐비티의 제작

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

광 공진기 및 레이저 응용을위한 고분자 미소 구의 제조

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a polymer film. This paper also presents a low-cost, vacuum-free fabrication method for this novel TE; the approach combines lithography, electroplating, and imprint transfer (LEIT) processing. The embedded nature of the EMTEs offers many advantages, such as high surface smoothness, which is essential for organic electronic device production; superior mechanical stability during bending; favorable resistance to chemicals and moisture; and strong adhesion with plastic film. LEIT fabrication features an electroplating process for vacuum-free metal deposition and is favorable for industrial mass production. Furthermore, LEIT allows for the fabrication of metal mesh with a high aspect ratio (i.e., thickness to linewidth), significantly enhancing its electrical conductance without adversely losing optical transmittance. We demonstrate several prototypes of flexible EMTEs, with sheet resistances lower than 1 &#937;/sq and transmittances greater than 90%, resulting in very high figures of merit (FoM) &#8211; up to 1.5 x 104 &#8211; which are amongst the best values in the published literature.

This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

기울기 각도 증 착을 사용 하 여 미디어를 흡수 하는 높은 가진 매우 얇은 필름의 제조

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

Production of Single Tracks of Ti-6Al-4V by Directed Energy Deposition to Determine the Layer Thickness for Multilayer Deposition

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal powder is injected as particles. In general, this technique is employed to either fabricate or repair different components. In this technique, the final characteristics are affected by many factors. Indeed, one of the main tasks in building components by DED is the optimization of process parameters (such as laser power, laser speed, focus, etc.) which is usually carried out through an extensive experimental investigation. However, this sort of experiment is extremely lengthy and costly. Thus, in order to accelerate the optimization process, an investigation was conducted to develop a method based on the melt pool characterizations. In fact, in these experiments, single tracks of Ti-6Al-4V were deposited by a DED process with multiple combinations of laser power and laser speed. Surface morphology and dimensions of single tracks were analyzed, and geometrical characteristics of melt pools were evaluated after polishing and etching the cross-sections. Helpful information regarding the selection of optimal process parameters can be achieved by examining the melt pool features. These experiments are being extended to characterize the larger blocks with multiple layers. Indeed, this manuscript describes how it would be possible to quickly determine the layer thickness for the massive deposition, and avoid over or under-deposition according to the calculated energy density of the optimum parameters. Apart from the over or under-deposition, time and materials saving are the other great advantages of this approach in which the deposition of multilayer components can be started without any parameter optimization in terms of layer thickness.

In this research, a rapid method based on melt pool characterization is developed to estimate the layer thickness of Ti-6Al-4V components produced by directed energy deposition.

Ti-6Al-4V 멀티 레이어 증 착에 대 한 레이어 두께 결정 하기 위해 증 착 지시 에너지의 단일 트랙의 생산

Directed Energy Deposition (DED), which is an additive manufacturing technique, involves the creation of a molten pool with a laser beam where metal ...

Generation and Coherent Control of Pulsed Quantum Frequency Combs

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional states on-chip in a practical way have remained elusive due to the increasing complexity of the quantum circuitry needed to prepare and process such states. Here, we outline how high-dimensional, frequency-bin entangled, two-photon states can be generated at a stable, high generation rate by using a nested-cavity, actively mode-locked excitation of a nonlinear micro-cavity. This technique is used to produce pulsed quantum frequency combs. Moreover, we present how the quantum states can be coherently manipulated using standard telecommunications components such as programmable filters and electro-optic modulators. In particular, we show in detail how to accomplish state characterization measurements such as density matrix reconstruction, coincidence detection, and single photon spectrum determination. The presented methods form an accessible, reconfigurable, and scalable foundation for complex high-dimensional state preparation and manipulation protocols in the frequency domain.

A protocol is presented for the practical generation and coherent manipulation of high-dimensional frequency-bin entangled photon states using integrated micro-cavities and standard telecommunications components, respectively.

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional ...