Bu çalışma NSFDMI-0508454, NSF / LEQSF (2006)-Pfund-53, NSF-CMMI-0.811.888, ve NSF-CMMI-0.900.595 hibe yoluyla kısmen desteklenmiştir.

<ol>
	<li>Menon, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Conducting+polymers:+Nobel+Prize+in+Chemistry,+2000.">Conducting polymers: Nobel Prize in Chemistry, 2000.</a> Current Science. 79, 1632 (2000).</li><li>Inzelt, G., Pineri, M., Schultze, J. W., Vorotyntsev, M. A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Electron+and+proton+conducting+polymers:+recent+developments+and+prospects.">Electron and proton conducting polymers: recent developments and prospects.</a> Electrochimica Acta. 45, 2403 (2000).</li><li>Adhikari, B., Majumdar, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Polymers+in+sensor+applications.">Polymers in sensor applications.</a> Progress in Polymer Science. 29, 699 (2004).</li><li>Chakraborty, A., Liu, X., Parthasarathi, G., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=An+intermediate-layer+lithography+method+for+generating+multiple+microstructures+made+of+different+conducting+polymers.">An intermediate-layer lithography method for generating multiple microstructures made of different conducting polymers.</a> Microsystem Technologies. 13 (8), 1175 (2007).</li><li>Madou, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Fundamentals of Microfabrication. , (1995).</li><li>Bustillo, J. M., Howe, R. T., Muller, R. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Surface+micromachining+for+microelectromechanical+systems.">Surface micromachining for microelectromechanical systems.</a> Proceedings of the IEEE. 86, 1552 (1998).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Intermediate-layer+lithography+for+producing+metal+micropatterns.">Intermediate-layer lithography for producing metal micropatterns.</a> Journal of Vacuum Science and Technology B. 25, 677 (2007).</li><li>Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Multiple+conducting+polymer+microwire+sensors.">Multiple conducting polymer microwire sensors.</a> Microsystem Technologies. 15, 1737 (2009).</li><li>Chakraborty, A., Liu, X., Luo, C., Mason, E. C., Weber, A. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Polypyrrole: A new patterning approach and applications. Polypyrrole: Properties, Performance and Applications. , (2011).</li><li>Poddar, R., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=A+novel+approach+to+fabricate+a+PPy/p-type+Si+heterojunction.">A novel approach to fabricate a PPy/p-type Si heterojunction.</a> Solid-State Electronics. 50, 1687 (2006).</li><li>Liu, X., Chakraborty, A., Luo, C., Martingale, J. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Generation of all-polymeric diodes and capacitors using an innovative intermediate-layer lithography. Progress in Solid State Electronics Research. , 127-139 (2008).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+Au+sidewall+micropatterns+using+a+Si-reinforced+PDMS+mold.">Fabrication of Au sidewall micropatterns using a Si-reinforced PDMS mold.</a> Sensors and Actuators A. 152, 96 (2009).</li><li>Liu, X., Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+the+sidewalls+of+a+thermal+shape+memory+polystyreme+block.">Fabrication of micropatterns on the sidewalls of a thermal shape memory polystyreme block.</a> Journal of Micromechanics and Microengineering. 20, 095025 (2010).</li><li>Chakraborty, A., Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+channel+sidewalls+using+strain-recovery+property+of+a+shape-memory+polymer.">Fabrication of micropatterns on channel sidewalls using strain-recovery property of a shape-memory polymer.</a> Sensors and Actuators A. , (2011).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+supe-hydrophobic+channels.">Fabrication of supe-hydrophobic channels.</a> Journal of Micromechanics and Microengineering. 20, 25029 (2010).</li><li>Luo, C., Meng, F., Liu, X., Guo, Y. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Reinforcement+of+PDMS+master+using+an+oxide-coated+silicon+plate.">Reinforcement of PDMS master using an oxide-coated silicon plate.</a> Microelectronics Journal. 37, 5 (2006).</li><li>Luo, C., Garra, J., Schneider, T., White, R., Currie, J., Paranjape, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Thermal+ablation+of+PMMA+for+water+release+using+a+microheater.">Thermal ablation of PMMA for water release using a microheater.</a> Sensors and Actuators A. 114, 123 (2004).</li></ol>

Çıkar çatışması ilan etti.

Sorun giderme bilgileri: &quot;kesme&quot; işlemi kullanılarak polimer ve metallerin iletken tek ve çok katmanlı micropatterns nesil ilgili Kritik noktalar: (1) kabartma Sıcaklık optimum sonuçlar üretir ara PMMA tabakasının akışkanlığını sağlar. Bu aralığın alt limitten başlar ve istenen sonuçları elde değilse yavaş yavaş sıcaklığını artırmak için önerilir. Çok yüksek sıcaklıkta, kimyasal ve / veya elektrik özelliklerini değiştirmek için ileten polimer tabakası...

<table border="1"><tbody><tr><td> Reaktif Adı </td><td> Şirket </td><td> Katalog numarası </td><td> Yorumlar </td></tr><tr><td> PMMA </td><td> Sigma-Aldrich Co </td><td> 495C9 </td><td> Çözücü cholorobenzene olup. Yeterli havalandırma olan bir çeker ocak altında PMMA çözüm taşıyınız. Buharı teneffüs etmeyiniz. Güvenli kullanım talimatları için MSDS bakın. </td></tr><tr><td> Polipirol </td><td> Sigma-Aldrich Co </td><td> - </td><td> Su içinde ağırlıkça% 5 oranında. İkinci el olarak aldı. </td></tr><tr><td> PEDOT-PSS </td><td> HC Starck A.Ş. </td><td> V4 Baytron P HC </td><td> Solvent Tescilli. İkinci el olarak aldı. </td></tr><tr><td> SPANI </td><td> Sigma-Aldrich Co </td><td> - </td><td> Suda çözünen formu. İkinci el olarak aldı. </td></tr><tr><td> Sıcak kabartma makinesi </td><td> JenoptikMikrotechnik A.Ş. </td><td> HEX 01/LT </td><td></td></tr><tr><td> Makine Sputter </td><td> Cressington A.Ş. </td><td> 208HR </td><td></td></tr><tr><td> FIB makinesi </td><td> Zeiss Co </td><td> FIB kiriş 1540 XB </td><td></td></tr><tr><td> Spin coater </td><td> Sefer Araştırma A.Ş. </td><td> PWM32-PS-R790 Spinner Sistemi </td><td></td></tr><tr><td> RIE makinesi </td><td> Teknikleri MicroRIE A.Ş. </td><td> - </td><td></td></tr><tr><td> Rezist </td><td> Shipley A.Ş. </td><td> S1813 </td><td></td></tr><tr><td> PDMS </td><td> Dow Corning </td><td> Sylgard 184 Silikon elastomer kiti </td><td></td></tr><tr><td> HDPE sac </td><td> ABD Plastik birleştirme </td><td> - </td><td></td></tr><tr><td> PMMA levha </td><td> Cyro A.Ş. </td><td> - </td><td></td></tr><tr><td> Çift taraflı adhesive bandı </td><td> Scotch A.Ş. </td><td> - </td><td></td></tr><tr><td> Tek taraflı bant </td><td> Delphon A.Ş. </td><td> # 1310 Ultratape </td><td></td></tr><tr><td> Cam mikropipetler </td><td> FHC A.Ş. </td><td> 30-30-1 </td><td></td></tr><tr><td> Kırpmak </td><td> Office Depot A.Ş. </td><td> Bulldog klip </td><td></td></tr><tr><td> Nemlendirici </td><td> Vicks A.Ş. </td><td> Filter ücretsiz nemlendirici </td><td></td></tr></tbody></table>

micropunching lithography for generating micro- and submicron-patterns on polymer substrates

İletken polimerler 1977 1 yılında katkılı poliasetilen yüksek iletkenlik keşfedilmesinden bu yana büyük ilgi çekmiştir. Onlar düşük ağırlık, özelliklerin kolay terzilik ve uygulamaları 2,3 geniş bir yelpazenin avantajlar sunmaktadır. Bu malzemeler 4 çalışırken çevre koşullarına iletken polimerlerin hassasiyeti nedeniyle (örneğin, hava, oksijen, nem, yüksek sıcaklık ve kimyasal çözümler), taşbaskı teknikleri önemli teknik zorluklar. Örneğin, ultraviyole (UV) olarak mevcut fotolitografik yöntemleri, bu yöntemlerde, ıslak ve / veya kuru aşındırma proseslerin tutulum nedeniyle desenlendirme iletken polimerler için uygun değildir. Ayrıca, mevcut mikro / nano ağırlıklı bir düzlemsel formunu 5,6 var. Yapılardan biri tabakası imal özellikleri başka bir katman en üst yüzeyleri üzerinde inşa edilmiştir. Bu yapılardan çoklu katmanlar üzerinde çok sayıda aygıt oluşturmak üzere birlikte dizilirortak bir substrat. Mikro yapıların yan yüzeyleri inşa cihazlarda kullanılan edilmemiştir. Diğer taraftan, yanak desen değiştirebilir, akışkan kanalı ve nanoteller ve nanotüplerin doğrudan yatay büyüme 3-D devreleri inşa etmek için, örneğin, kullanılan olabilir. Bir macropunching yöntemi yüz yılı aşkın bir sac macropatterns oluşturmak için imalat sanayi uygulanmıştır. Bu yaklaşım hareketle, biz iletken polimerlerin ve yanak modelleri üreten desenlendirmenin engelleri aşmak için bir micropunching litografi yöntemi (MPL) geliştirdik. Ve (ii) çizim (i) kesme: macropunching metodu gibi, MPL da iki işlem (Şekil 1) içerir. &quot;Kesme&quot; işlemi desen üç iletken polimerler 4, polipirol (PPy), poli (3,4-ethylenedioxythiophen)-poli (4-styrenesulphonate) (PEDOT) ve Polianilin (PANI) uygulanmıştır. Ayrıca Al mikro 7 oluşturmak için istihdam edildi. Iletken polimerlerin imal mikroyapıları nem 8, kimyasal 8, 9 ve glikoz sensörler olarak kullanılmıştır. Al ve iletken polimerlerin Kombine mikro kapasitörler ve çeşitli heterojunctions 9,10,11 imal etmek için kullanılmıştır. &quot;Kesme&quot; işlemi de 100 gibi Mikronaltı-desenleri oluşturmak için uygulandı - ve 500 nm çapında polipirol hatları gibi 100 nm çapında Au teller. &quot;Çizim&quot; operasyonu iki uygulamalar için kullanıldı: (i) yüksek yoğunluklu polietilen (HDPE) 3D mikrosistemler 12,13,14 oluşturmak için kullanılabilecek kanallar Au yanak kalıplarını üretmek, ve (ii) polidimetilsiloksan (PDMS) micropillars imal HDPE yüzeylerde kanalı 15 ile temas açısı arttırmaktır.

Watch this Scientific Journal Video about Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates at JoVE.com

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Bir micropunching litografi bir yaklaşım oluşturmak için mikro ve Mikronaltı-desen üst, yanak ve polimer yüzeylerde alt yüzeylerinde geliştirilmiştir. Bu desenlendirme iletken polimerlerin ve yanak modelleri üretme engellerin üstesinden gelir. Bu yöntem birden fazla özelliklerin hızlı üretimi sağlayan ve agresif kimya ücretsizdir.

Mikro ve mikron altı-desen Polimer yüzeyler üzerine oluşturuluyor için Litografi Micropunching

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of ...

micropunching-lithography-for-generating-micro-submicron-patterns-on

Research

JoVE Journal

Engineering

15.1K Görüntüleme.  University of Texas at Arlington. Bir micropunching litografi bir yaklaşım oluşturmak için mikro ve Mikronaltı-desen üst, yanak ve polimer yüzeylerde alt yüzeylerinde geliştirilmiştir. Bu desenlendirme iletken polimerlerin ve yanak modelleri üretme engellerin üstesinden gelir. Bu yöntem birden fazla özelliklerin hızlı üretimi sağlayan ve agresif kimya ücretsizdir.

Video: Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Ultrahigh Density Array of Vertically Aligned Small-molecular Organic Nanowires on Arbitrary Substrates

In recent years &pi;-conjugated organic semiconductors have emerged as the active material in a number of diverse applications including large-area, low-cost displays, photovoltaics, printable and flexible electronics and organic spin valves. Organics allow (a) low-cost, low-temperature processing and (b) molecular-level design of electronic, optical and spin transport characteristics. Such features are not readily available for mainstream inorganic semiconductors, which have enabled organics to carve a niche in the silicon-dominated electronics market. The first generation of organic-based devices has focused on thin film geometries, grown by physical vapor deposition or solution processing. However, it has been realized that organic nanostructures can be used to enhance performance of above-mentioned applications and significant effort has been invested in exploring methods for organic nanostructure fabrication.	
A particularly interesting class of organic nanostructures is the one in which vertically oriented organic nanowires, nanorods or nanotubes are organized in a well-regimented, high-density array. Such structures are highly versatile and are ideal morphological architectures for various applications such as chemical sensors, split-dipole nanoantennas, photovoltaic devices with radially heterostructured "core-shell" nanowires, and memory devices with a cross-point geometry. Such architecture is generally realized by a template-directed approach. In the past this method has been used to grow metal and inorganic semiconductor nanowire arrays. More recently &pi;-conjugated polymer nanowires have been grown within nanoporous templates. However, these approaches have had limited success in growing nanowires of technologically important &pi;-conjugated small molecular weight organics, such as tris-8-hydroxyquinoline aluminum (Alq3), rubrene and methanofullerenes, which are commonly used in diverse areas including organic displays, photovoltaics, thin film transistors and spintronics.	
Recently we have been able to address the above-mentioned issue by employing a novel "centrifugation-assisted" approach. This method therefore broadens the spectrum of organic materials that can be patterned in a vertically ordered nanowire array. Due to the technological importance of Alq3, rubrene and methanofullerenes, our method can be used to explore how the nanostructuring of these materials affects the performance of aforementioned organic devices. The purpose of this article is to describe the technical details of the above-mentioned protocol, demonstrate how this process can be extended to grow small-molecular organic nanowires on arbitrary substrates and finally, to discuss the critical steps, limitations, possible modifications, trouble-shooting and future applications.

We report a simple method for fabricating an ultrahigh density array of vertically ordered small-molecular organic nanowires. This method allows for synthesis of complex heterostructured hybrid nanowire geometries, which can be inexpensively grown on arbitrary substrates. These structures have potential applications in organic electronics, optoelectronics, chemical sensing, photovoltaics and spintronics.

Keyfi Yüzeyler üzerinde Dikey dizilmiş Küçük-moleküler Organik Nanoteller bir ultra yüksek Yoğunluk Dizi

In  recent years &pi;-conjugated  organic semiconductors have emerged as the active material in a number of  diverse applications including large-area, ...

Mühendislik

Preparation and Friction Force Microscopy Measurements of Immiscible, Opposing Polymer Brushes

Solvated polymer brushes are well known to lubricate high-pressure contacts, because they can sustain a positive normal load while maintaining low friction at the interface. Nevertheless, these systems can be sensitive to wear due to interdigitation of the opposing brushes. In a recent publication, we have shown via molecular dynamics simulations and atomic force microscopy experiments, that using an immiscible polymer brush system terminating the substrate and the slider surfaces, respectively, can eliminate such interdigitation. As a consequence, wear in the contacts is reduced. Moreover, the friction force is two orders of magnitude lower compared to traditional miscible polymer brush systems. This newly proposed system therefore holds great potential for application in industry. Here, the methodology to construct an immiscible polymer brush system of two different brushes each solvated by their own preferred solvent is presented. The procedure how to graft poly(N-isopropylacrylamide) (PNIPAM) from a flat surface and poly(methyl methacrylate) (PMMA) from an atomic force microscopy (AFM) colloidal probe is described. PNIPAM is solvated in water and PMMA in acetophenone. Via friction force AFM measurements, it is shown that the friction for this system is indeed reduced by two orders of magnitude compared to the miscible system of PMMA on PMMA solvated in acetophenone.

The methodology to perform friction force microscopy experiments for contacting brushes is presented: Two polymer brushes that are grafted from (a) substrates and (b) colloidal probes are slid to show that, by using two contacting immiscible brush systems, friction in sliding contacts is reduced compared to miscible brush systems.

Polimer Fırçalar Karşı karışmayan hazırlanması ve Sürtünme Kuvvet Mikroskobu Ölçümleri,

Solvated polymer brushes are well known to lubricate high-pressure contacts, because they can sustain a positive normal load while maintaining low ...

Adsorption Device Based on a Langatate Crystal Microbalance for High Temperature High Pressure Gas Adsorption in Zeolite H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate crystal microbalance, LCM) and its use for gas adsorption measurements in zeolite H-ZSM-5. Prior to the adsorption measurements, zeolite H-ZSM-5 crystals were synthesized on the gold electrode in the center of the LCM, without covering the connection points of the gold electrodes to the oscillator, by the steam-assisted crystallization (SAC) method, so that the zeolite crystals remain attached to the oscillating microbalance while keeping good electroconductivity of the LCM during the adsorption measurements. Compared to a conventional quartz crystal microbalance (QCM) which is limited to temperatures below 80 &#176;C, the LCM can realize the adsorption measurements in principle at temperatures as high as 200-300 &#176;C (i.e., at or close to the reaction temperature of the target application of one-stage DME synthesis from the synthesis gas), owing to the absence of crystalline-phase transitions up to its melting point (1,470 &#176;C). The system was applied to investigate the adsorption of CO2, H2O, methanol and dimethyl ether (DME), each in the gas phase, on zeolite H-ZSM-5 in the temperature and pressure range of 50-150 &#176;C and 0-18 bar, respectively. The results showed that the adsorption isotherms of these gases in H-ZSM-5 can be well fitted by Langmuir-type adsorption isotherms. Furthermore, the determined adsorption parameters, i.e., adsorption capacities, adsorption enthalpies, and adsorption entropies, compare well to literature data. In this work, the results for CO2 are shown as an example.

A protocol for high-temperature and high-pressure gas adsorption measurements on zeolite H-ZSM-5 using an adsorption measurement device based on a langatate crystal microbalance is presented. Prior to the adsorption measurements, the synthesis of zeolite H-ZSM-5 on the langatate crystal microbalance sensor by the steam-assisted crystallization (SAC) method is demonstrated.

Zeolit ​​Yüksek Sıcaklık Yüksek Basınçlı Gaz Adsorpsiyon için Langatate kristal mikro dayanarak Adsorpsiyon Cihazı H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate ...

Morphology Control for Fully Printable Organic&#8211;Inorganic Bulk-heterojunction Solar Cells Based on a Ti-alkoxide and Semiconducting Polymer

The photoactive layer of a typical organic thin-film bulk-heterojunction (BHJ) solar cell commonly uses fullerene derivatives as the electron-accepting material. However, fullerene derivatives are air-sensitive; therefore, air-stable material is needed as an alternative. In the present study, we propose and describe the properties of Ti-alkoxide as an alternative electron-accepting material to fullerene derivatives to create highly air-stable BHJ solar cells. It is well-known that controlling the morphology in the photoactive layer, which is constructed with fullerene derivatives as the electron acceptor, is important for obtaining a high overall efficiency through the solvent method. The conventional solvent method is useful for high-solubility materials, such as fullerene derivatives. However, for Ti-alkoxides, the conventional solvent method is insufficient, because they only dissolve in specific solvents. Here, we demonstrate a new approach to morphology control that uses the molecular bulkiness of Ti-alkoxides without the conventional solvent method. That is, this method is one approach to obtain highly efficient, air-stable, organic-inorganic bulk-heterojunction solar cells.

Morphology Control for Fully Printable Organic&amp;#8211;Inorganic Bulk-heterojunction Solar Cells Based on a Ti-alkoxide and Semiconducting Polymer

A method for fully printable, fullerene-free, highly air-stable, bulk-heterojunction solar cells based on Ti alkoxides as the electron acceptor and the electron-donating polymer fabrication is described here. Moreover, a method for controlling the morphology of the photoactive layer through the molecular bulkiness of the Ti-alkoxide units is reported.

Ti-alkoksit ve Yarıiletken Polimer dayanarak Tamamen Yazdırılabilir Organik-İnorganik Toplu heteroeklem Güneş Pilleri için Morfoloji Kontrolü

The photoactive layer of a typical organic thin-film bulk-heterojunction (BHJ) solar cell commonly uses fullerene derivatives as the electron-accepting ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

Optik Rezonatör ve Lazer Uygulamalarında Polimer Mikrokürelerin Üretimi

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF) magnetron sputtering. LSMO nanoparticles were deposited with diameters from 10 to 20 nm and heights between 20 and 50 nm. At the same time, (Gd) Ba2Cu3O7&#8722;&#948; ((Gd) BCO) films were fabricated on both undecorated and LSMO nanoparticle decorated STO substrates using RF magnetron sputtering. This report also describes the properties of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 quasi-bilayer films structures (e.g., crystalline phase, morphology, chemical composition); magnetization, magneto-transport, and superconducting transport properties were also evaluated.

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7ÃƒÂ¢Ã‹â€ &#039;ÃƒÅ½ ´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates

Here, we present a protocol to grow LSMO nanoparticles and (Gd) BCO films on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF)-sputtering.

Radyo frekansı Magnetron GdBa2Cu3O7−δfışkırtması / La0,67Sr0,33MnO3 yarı bilayer Filmler SrTiO3 (STO) tek-kristal yüzeyler üzerinde

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio ...

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by employing an aberration-corrected scanning transmission electron microscope as the exposure tool. Here, we present results of single-digit nanometer patterning of two widely used electron-beam resists: poly (methyl methacrylate) and hydrogen silsesquioxane. The method achieves sub-5 nanometer features in poly (methyl methacrylate) and sub-10 nanometer resolution in hydrogen silsesquioxane. High-fidelity transfer of these patterns into target materials of choice can be performed using metal lift-off, plasma etch, and resist infiltration with organometallics.

We use an aberration-corrected scanning transmission electron microscope to define single-digit nanometer patterns in two widely-used electron-beam resists: poly (methyl methacrylate) and hydrogen silsesquioxane. Resist patterns can be replicated in target materials of choice with single-digit nanometer fidelity using liftoff, plasma etching, and resist infiltration by organometallics.

Tek basamaklı nanometre elektron ışını litografi bir sapma düzeltilmiş tarama transmisyon elektron mikroskobu ile

We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by ...

Generating Lap Joints Via Friction Stir Spot Welding on DP780 Steel

Friction stir spot welding (FSSW), a derivative of friction stir welding (FSW), is a solid-state welding technique that was developed in 1991. An industry application was found in the automotive industry in 2003 for the aluminum alloy that was used in the rear doors of automobiles. Friction stir spot welding is mostly used in Al alloys to create lap joints. The benefits of friction stir spot welding include a nearly 80% melting temperature that lowers the thermal deformation welds without splashing compared to resistance spot welding. Friction stir spot welding includes 3 steps: plunging, stirring, and retraction. In the present study, other materials including high strength steel are also used in the friction stir welding method to create joints. DP780, whose traditional welding process involves the use of resistance spot welding, is one of several high strength steel materials used in the automotive industry. In this paper, DP780 was used for friction stir spot welding, and its microstructure and microhardness were measured. The microstructure data showed that there was a fusion zone with fine grain and a heat effect zone with island martensite. The microhardness results indicated that the center zone exhibited a greater degree of hardness compared with the base metal. All data indicated that the friction stir spot welding used in dual phase steel 780 can create a good lap joint. In the future, friction stir spot welding can be used in high-strength steel welding applied in industrial manufacturing processes.

Here, we present a friction stir spot welding (FSSW) protocol on dual phase 780 steel. A tool pin with high-speed rotation generates heat from friction to soften the material, and then, the pin plunges into 2 sheet joints to create the lap joint.

DP780 Çelikte Sürtünme Ile Tur Mafsalları Üretmek Spot Kaynak

Friction stir spot welding (FSSW), a derivative of friction stir welding (FSW), is a solid-state welding technique that was developed in 1991. An industry ...

Procedure for the Transfer of Polymer Films Onto Porous Substrates with Minimized Defects

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support substrates. Accomplishing this transfer in a highly controlled, mechanized, and reproducible manner can eliminate the creation of macroscale defect structures (e.g., tears, cracks, and wrinkles) within the thin film that compromise device performance and the usable area per sample. Here, we describe a general protocol for the highly controlled and mechanized transfer of a polymeric thin film onto an arbitrary porous support substrate for eventual use as a water filtration membrane device. Specifically, we fabricate a block copolymer (BCP) thin film on top of a sacrificial, water-soluble poly(acrylic acid) (PAA) layer and silicon wafer substrate. We then utilize a custom-designed, 3D-printed transfer tool and drain chamber system to deposit, lift-off, and transfer the BCP thin film onto the center of a porous anodized aluminum oxide (AAO) support disc. The transferred BCP thin film is shown to be consistently placed onto the center of the support surface due to the guidance of the meniscus formed between the water and the 3D-printed plastic drain chamber. We also compare our mechanized transfer-processed thin films to those that have been transferred by hand with the use of tweezers. Optical inspection and image analysis of the transferred thin films from the mechanized process confirm that little-to-no macroscale inhomogeneities or plastic deformations are produced, as compared to the multitude of tears and wrinkles produced from manual transfer by hand. Our results suggest that the proposed strategy for thin film transfer can reduce defects when compared to other methods across many systems and applications.

We present a procedure for highly controlled and wrinkle-free transfer of block copolymer thin films onto porous support substrates using a 3D-printed drain chamber. The drain chamber design is of general relevance to all procedures involving transfer of macromolecular films onto porous substrates, which is normally done by hand in an irreproducible fashion.

Polimer filmlerin küçültülmüş kusurlarla gözenekli substratlar üzerine aktarımı için prosedür

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support ...

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Resistive switching crossbar architecture is highly desired in the field of digital memories due to low cost and high-density benefits. Different materials show variability in resistive switching properties due to the intrinsic nature of the material used, leading to discrepancies in the field because of underlying operation mechanisms. This highlights a need for a reliable technique to understand mechanisms using nanostructural observations. This protocol explains a detailed process and methodology of in&#160;situ nanostructural analysis as a result of electrical biasing using transmission electron microscopy (TEM). It provides visual and reliable evidence of underlying nanostructural changes in real time memory operations. Also included is the methodology of fabrication and electrical characterizations for asymmetric crossbar structures incorporating amorphous vanadium oxide. The protocol explained here for vanadium oxide films can be easily extended to any other materials in a metal-dielectric-metal sandwiched structure. Resistive switching crossbars are predicted to serve the programmable logic and neuromorphic circuits for next-generation memory devices, given the understanding of the operation mechanisms. This protocol reveals the switching mechanism in a reliable, timely, and cost-effective way in any type of resistive switching materials, and thereby predicts the device&#39;s applicability.

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Presented here is a protocol for analyzing nanostructural changes during in&#160;situ biasing with transmission electron microscopy (TEM) for a stacked metal-insulator-metal structure. It has significant applications in resistive switching crossbars for the next generation of programmable logic circuits and neuromimicking hardware, to reveal their underlying operation mechanisms and practical applicability.