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Engineering

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Patterning via Optical Saturable Transitions - Fabrication and Characterization

6.7K Views

08:19 min

December 11th, 2014

December 11th, 2014

6,734 Views

0:05

Title

1:46

Preparation for Dissolution Locking and Thermal Evaporation of Photochromic Molecules

4:20

Exposures

5:35

Sample Development for Dissolution Locking

6:24

Results: Samples Fabricated Using Patterning via Optical Saturable Transitions (POST)

7:56

Conclusion

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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