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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

7.6K Views

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12:05 min

•

February 21st, 2019

DOI :

10.3791/59017-v

February 21st, 2019

•
7,648 Views

1European Commission, Joint Research Centre, Directorate for Nuclear Safety and Security

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U2O5
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