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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

DOI :

10.3791/59017-v

12:05 min

February 21st, 2019

February 21st, 2019

7,622 Views

1European Commission, Joint Research Centre, Directorate for Nuclear Safety and Security

This protocol presents the preparation of U2O5 thin films obtained in situ under ultra-high vacuum. The process involves oxidation and reduction of UO2 films with atomic oxygen and atomic hydrogen, respectively.

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U2O5 Film

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