这项研究得到了无人驾驶车辆先进的核心技术研究和开发方案的支持, 这是由科学、信通技术和未来规划部资助的无人驾驶车辆高级研究中心 (UVARC), 大韩民国 (2016M1B3A1A01937575)

警告: 在本协议中使用的某些化学品 (如 、缓冲氧化物蚀刻、异丙醇、 等) 可能对健康有害。在进行任何样品准备之前, 请查阅所有相关的材料安全数据表。在处理蚀刻和溶剂时, 使用适当的个人防护设备 ( 例如 、实验室大衣、安全眼镜、手套、 等 ) 和工程控制 (如 、湿站、油烟罩等). 
 1. 制备 Si 衬底 <ol> <li> 使用金刚石刀具, 将4英寸硅片切成 2 cm x 2 厘米大小的正方形。为了制作彩色样品, 基板通常是切割 2 cm x 2 厘米, 但可以更大, 取决于样品持有人用于倾斜角沉积的大小. </li>
	<li> 要使用聚四氟乙烯 (PTFE) 铲取本机氧化物, 请在缓冲氧化物蚀刻 (BOE) 中浸出切割硅衬底 3. 警告 : 请穿戴适当的安全防护。
	<li> 在丙酮、异丙醇 (国际音标) 和去离子 (DI) 水中依次清除 3 s 中的裂解 Si 衬底. 
	<ol> <li> 使用聚四氟乙烯清洗夹具, 在3分钟的频率为35赫的情况下, 用丙酮在超声波浴中几种切割 Si 衬底. </li>
		<li> 除去丙酮, 用国际音标冲洗所切割的 Si 衬底. </li>
		<li> 作为清洗的最后一步, 用 DI 水冲洗所切割的 Si 衬底. </li>
	</ol> </li> <li> 要去除湿气, 用氮气吹枪将干净的衬底用钳子夹住. 和 #160; </li> </ol> 2。沉积的 Au 反射器 <ol> <li> 使用镊子和碳带, 将已清洗的 Si 衬底固定在一个扁平试样架上, 并将支架放置在电子束蒸发器的腔内, 与钛和 Au 源相结合. </li>
	<li> 疏散会议厅1小时, 以达到高真空。真空室的基底压力应为 4 x 10 -6 乇. </li>
	<li> 将 Ti 层作为粘附层沉积到 10 nm 的厚度, 5-7% 的电子束功率以手动方式控制, 在 7.5 kV 的直流电压下, 使沉积速率为1和 #197;/sec. 
	注: 同一厚度的 Cr 层, 而不是钛层, 可以沉积为粘合层. </li>
	<li> 将 Au 层作为反射层沉积到 100 nm 的厚度, 13-15% 的电子束功率在 7.5 kV 的直流电压下以手动方式控制, 从而使沉积速率为2和 #197;/sec. 
	注: Au 反射层厚度可大于 100 nm。在这里沉积 100 nm 的厚度, 使反射层尽可能薄, 同时保持 Au 的光学特性. </li>
	<li> 在 Au 层沉积后, 排出腔室并取出样品。他们将需要重新加载与倾斜样品持有人的倾斜角沉积. </li>
</ol> 3。斜角沉积倾斜试样架的研制 注意: 有几种方法可以用于倾斜沉积, 如 z-axis 旋转恰克 16 , 但这需要设备的改造和薄膜只能一次放置在一个角度。为了有效地观察不同沉积角度产生的颜色变化, 我们采用了样品持有者在不同的角度对样品进行倾斜。为精确, 倾斜样品持有人可以使用金属加工设备。然而, 在本文中, 我们介绍了一个简单的方法, 可以很容易地遵循. 
<ol> <li> 准备由易于弯曲的金属 (如铝) 制成的金属板. </li>
	<li> 将金属板切成三 2 cm x 5 厘米的碎片. </li>
	<li> 将金属片固定在一个量角器旁边的地板上, 握住短边并将金属弯曲到所需的沉积角度 ( 即 、30和 #176;、45和 #176; 以及70和 #176;). </li>
	<li> 使用碳带将弯曲的金属件连接到4英寸样品架上. </li>
</ol> 4。Ge 层的斜角沉积 注意: 在本节中, 请参考在倾斜样品持有人身上的样品的 图 1 中的示意图, 以及多孔的 ge 薄膜, 下面的斜角度沉积. 
<ol> <li> 将四 Au 沉积样品与碳带固定在0和 #176 角的倾斜试样架上, 30 和 #176;, 45 和 #176;, 以及70和 #176; 分别. </li>
	<li> 将倾斜试样架上的金沉积样品加载到电子束蒸发器中, 并用 Ge 源进行斜角沉积. </li>
	<li> 疏散会议厅1小时, 以达到高真空。真空室的基底压力应为 4 x 10 -6 乇. </li>
	<li> 将 Ge 层作为着色层存放, 其 6-8% 的电子束功率在 7.5 kV 的直流电压下以手动方式控制, 从而使沉积速率为1和 #197;/sec。Ge 层在四样品上的沉积厚度分别为 10 nm、15 nm、20 nm 和 25 nm. 
	注: 选择 10 nm、15 nm、20 nm 和 25 nm 的沉积厚度, 便于比较每个沉积角度的颜色变化。可以选择不同的角度和厚度 (5-60 nm) 来实现特定的颜色. </li>
	<li> 在 Ge 层沉积后, 排出腔室并取出样品. </li>
</ol> 5。大面积斜角沉积过程 注意: 如果用于斜角沉积的试样的尺寸很小, 可以通过步骤4中详细描述的过程来制作。但是, 如果要制作的样品的尺寸很大, 由于 z-axis 16 的蒸发通量的变化, 很难维持胶片的均匀性。因此, 需要一个单独的额外过程, 步骤 5, 是制造更大的样品和达到统一的颜色. 
<ol> <li> 对于2英寸的硅片, 在步骤2中的大样本上沉积 au 层后, 将 au 沉积的大样本固定到45和 #176; 倾斜样本持有者. 
	注: 由于我们的倾斜样品持有人设计为适合小样本, 加载大样本的所有角度 ( 即 , 0 和 #176;, 30 和 #176;, 45 和 #176;, 70 和 #176;) 将在样本之间产生干扰。因此, 在一个过程中, 要在不同的角度倾斜地沉积大型样品, 就必须有一个适合于大型样品的倾斜试样夹. </li>
	<li> 在倾斜试样架上将 Au 沉积的大样本加载到电子束蒸发器中, 并用 Ge 源进行斜角沉积. 
	注: 当加载样品时, 第二沉积层必须与第一沉积物的方向相同, 所以请注意所载样品的方向。为方便起见, 建议将样品夹装在会议厅正面. </li>
	<li> 疏散会议厅1小时至达到高真空。真空室的基底压力应为 4 x 10 -6 乇. </li>
	<li> 将 Ge 层沉积为着色层, 沉积厚度为 10 nm, 这是目标厚度的一半 20 nm, 6-8% 的电子束功率控制在手动模式的直流电压为 7.5 kV, 这给了沉积率1和 #197;/sec. </li>
	<li> 在第一个 Ge 层的沉积完成后, 排出腔室并取出样品, 因为样品需要重新定位和重装. </li>
	<li> 将样品固定在倾斜的样品持有者的位置上, 就第一次沉积的位置而言是颠倒的. </li>
	<li> 将样品装在带有 Ge 源的倾斜样品持有者上, 以便持卡人与第一个沉积物的方向相同. </li>
	<li> 疏散会议厅1小时, 以达到高真空。真空室的基底压力应为 4 x 10 -6 乇. </li>
	<li> 将 Ge 层沉积为着色层, 沉积厚度为 10 nm, 这是目标厚度的一半 20 nm, 6-8% 的电子束功率控制在手动模式的直流电压为 7.5 kV, 这给了沉积率1和 #197;/sec. </li>
	<li> 在 Ge 层沉积后, 排出腔室并取出样品. </li>
</ol>

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作者没有什么可透露的。

在常规的着色薄膜涂层中,3、4、5、6, 可以通过改变不同的材质和调整厚度来控制颜色。材料的选择以不同的折射率是有限的调整各种各样的颜色。为了放宽这一限制, 我们利用斜角沉积法对薄膜色层进行了处理。根据沉积角度的不同, Ge 层的孔隙率由原子阴影11改变, 如<strong class="xfig...

一般而言, 薄膜光学涂层的性能是基于它们产生的光干涉的类型, 如高反射或透射。在介质薄膜中, 光干扰可以通过满足条件, 如四分之一波厚度 (λ/4 n) 得到。干涉原理早已被用于各种光学应用, 如法布里-珀罗干涉仪和分布式布拉格反射器1,2。近年来, 使用高吸水性材料如金属和半导体的薄膜结构得到了广泛的研究3,4,5,6。薄膜涂层上的吸收性半导体材料可以获得强光干扰, 在反射波中产生不平凡的相变。这种类型的结构允许超薄涂层比介质薄膜涂层更薄。
最近, 我们研究了利用孔隙率7提高高吸水性薄膜的色调谐和色纯度的方法。通过控制沉积膜的孔隙率, 可以改变薄膜介质的有效折射率8。这种有效折射率的变化使得光学特性得以改善。在此基础上, 利用严格耦合波分析 (RCWA)9, 设计了不同厚度和孔隙的超薄型彩色薄膜。我们的设计在每个孔隙度7中呈现不同胶片厚度的颜色。
采用了一种简单的斜角沉积方法来控制高吸水性薄膜涂层的孔隙率。斜角沉积技术基本上结合了一个典型的沉积系统, 如电子束蒸发器或热蒸发器, 与倾斜的基板10。入射通量的倾斜角产生原子阴影, 从而产生蒸汽通量无法直接到达11的区域。斜角沉积技术在各种薄膜涂层应用中得到了广泛使用12,13,14。
在这项工作中, 我们详细介绍了利用电子束蒸发器的斜淀积制备超薄彩色薄膜的工艺。另外, 还分别介绍了大面积加工的其他方法。除了工艺步骤外, 还详细说明了在制作过程中应注意的一些问题。
我们还回顾了测量加工样品的反射率并将它们转换成颜色信息进行分析的过程, 这样它们就可以用 CIE 的颜色坐标和 RGB 值15来表示。此外, 还讨论了超薄彩色薄膜制作过程中应考虑的一些问题。

<table><tbody><tr><td>&amp;nbsp;KVE-2004L</td><td>Korea Vacuum Tech. Ltd.</td><td></td><td>E-beam evaporator system</td></tr><tr><td>Cary 500</td><td>Varian, USA</td><td></td><td>UV-Vis-NIR spectrophotometer</td></tr><tr><td>T1-H-10</td><td>Elma</td><td></td><td>Ultrasonic bath</td></tr><tr><td>HSD150-03P</td><td>Misung Scientific Co., Ltd</td><td></td><td>Hot plate</td></tr><tr><td>Isopropyl Alcohol (IPA)</td><td>OCI Company Ltd.</td><td></td><td>Isopropyl Alcohol (IPA)</td></tr><tr><td>Buffered Oxide Etch 6:1</td><td>Avantor</td><td></td><td>Buffered Oxide Etch 6:1</td></tr><tr><td>Acetone</td><td>OCI Company Ltd.</td><td></td><td>Acetone</td></tr><tr><td>4 inch Silicon Wafer</td><td>Hi-Solar Co., Ltd.</td><td></td><td>4 inch Silicon Wafer (P-100, 1 - 20 ohm.cm, Single side polished, Thickness: 440 &amp;plusmn; 20 &amp;mu;m)</td></tr><tr><td>2 inch Silicon Wafer</td><td>Hi-Solar Co., Ltd.</td><td></td><td>2 inch Silicon Wafer (P-100, 1 - 20 ohm.cm, Single side polished, Thickness: 440 &amp;plusmn; 20 &amp;mu;m)</td></tr></tbody></table>

fabrication of ultra-thin color films with highly absorbing media using oblique angle deposition

超薄薄膜结构已被广泛应用于光学涂层, 但性能和制造方面的挑战依然存在。 提出了一种改进的超薄型彩色薄膜的制备方法。建议的过程涉及几个制造问题, 包括大面积处理。具体地说, 该协议描述了使用电子束蒸发器在硅 (Si) 衬底上的锗 (Ge) 和金 (Au) 的斜角沉积制备超薄彩色胶片的过程。 由斜角沉积产生的薄膜孔隙率导致超薄薄膜的颜色变化。颜色变化程度取决于沉积角度和膜厚等因素。超薄彩色薄膜的制备样品显示出改进的颜色调谐和颜色纯度。此外, 将所测样品的反射率转化为色值, 并根据颜色进行分析。我们的超薄薄膜制作方法可望用于各种超薄薄膜应用, 如柔性色电极、薄膜太阳能电池和光学滤光片等。此外, 在这里开发的过程中分析的颜色, 制作样品是广泛的有用的研究各种颜色结构。

图 2a显示了 2 cm x 2 cm 制作样品的图像。样品被制作了, 以便影片有不同的厚度 (即, 10 毫微米, 15 毫微米, 20 毫微米和25毫微米) 并且被存放了在不同的角度 (即, 0 °, 30 °, 45 °和 70)。沉积薄膜的颜色随样品厚度和沉积角度的不同而变化。颜色的变化是由于薄膜孔隙度的变化引起的。根据沉积角度, 在基板上创建单个纳米柱的倾斜阵列, 如图 2?...

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Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

用斜角沉积法制备高吸收介质的超薄彩色薄膜

本文介绍了一种改进的光学涂层超薄型彩色薄膜的制备方法。采用电子束蒸发器的斜角沉积技术可提高色调谐和纯度。利用反射测量和颜色信息转换, 分析了锗和 Au 在 Si 衬底上的制备膜。

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

fabrication-ultra-thin-color-films-with-highly-absorbing-media-using

Research

JoVE Journal

Engineering

8.2K 次观看.  Gwangju Institute of Science and Technology. 本文介绍了一种改进的光学涂层超薄型彩色薄膜的制备方法。采用电子束蒸发器的斜角沉积技术可提高色调谐和纯度。利用反射测量和颜色信息转换, 分析了锗和 Au 在 Si 衬底上的制备膜。

视频: Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas allows the deposition of metal oxides with tunable morphology, structure, density and stoichiometry by a proper control of the plasma plume expansion dynamics. Such versatility can be exploited to produce nanostructured films from compact and dense to nanoporous characterized by a hierarchical assembly of nano-sized clusters. In particular we describe the detailed methodology to fabricate two types of Al-doped ZnO (AZO) films as transparent electrodes in photovoltaic devices: 1) at low O2 pressure, compact films with electrical conductivity and optical transparency close to the state of the art transparent conducting oxides (TCO) can be deposited at room temperature, to be compatible with thermally sensitive materials such as polymers used in organic photovoltaics (OPVs); 2) highly light scattering hierarchical structures resembling a forest of nano-trees are produced at higher pressures. Such structures show high Haze factor (&gt;80%) and may be exploited to enhance the light trapping capability. The method here described for AZO films can be applied to other metal oxides relevant for technological applications such as TiO2, Al2O3, WO3 and Ag4O4.

We describe the experimental method to deposit nanostructured oxide thin films by nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas. By using this method Al-doped ZnO (AZO) films, from compact to hierarchically structured as nano-tree forests, can be deposited.

制备纳米设计的脉冲激光沉积透明导电氧化物

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

科研

工程学

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

空间密闭的复合氧化物制备

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Fabrication of Large-area Free-standing Ultrathin Polymer Films

This procedure describes a method for the fabrication of large-area and ultrathin free-standing polymer films. Typically, ultrathin films are prepared using either sacrificial layers, which may damage the film or affect its mechanical properties, or they are made on freshly cleaved mica, a substrate that is difficult to scale. Further, the size of ultrathin film is typically limited to a few square millimeters. In this method, we modify a surface with a polyelectrolyte that alters the strength of adhesion between polymer and deposition substrate. The polyelectrolyte can be shown to remain on the wafer using spectroscopy, and a treated wafer can be used to produce multiple films, indicating that at best minimal amounts of the polyelectrolyte are added to the film. The process has thus far been shown to be limited in scalability only by the size of the coating equipment, and is expected to be readily scalable to industrial processes. In this study, the protocol for making the solutions, preparing the deposition surface, and producing the films is described.

We describe a method for the fabrication of large-area (up to 13 cm diameter) and ultrathin (as thin as 8 nm) polymer films. Instead of using a sacrificial interlayer to delaminate the film from its substrate, we use a self-limiting surface treatment suitable for arbitrarily large areas.

大面积的制造自立性的超薄聚合物薄膜

This procedure describes a method for the fabrication of large-area and ultrathin free-standing polymer films.  Typically, ultrathin films are prepared ...

化学

Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition

Aerosol deposition (AD) is a thick-film deposition process that can produce layers up to several hundred micrometers thick with densities greater than 95% of the bulk. The primary advantage of AD is that the deposition takes place entirely at ambient temperature; thereby enabling film growth in material systems with disparate melting temperatures. This report describes in detail the processing steps for preparing the powder and for performing AD using the custom-built system. Representative characterization results are presented from scanning electron microscopy, profilometry, and ferromagnetic resonance for films grown in this system. As a representative overview of the capabilities of the system, focus is given to a sample produced following the described protocol and system setup. Results indicate that this system can successfully deposit 11 &#181;m thick yttrium iron garnet films that are &#160;&#62; 90% of the bulk density during a single 5 min deposition run. A discussion of methods to afford better control of the aerosol and particle selection for improved thickness and roughness variations in the film is provided.

This report describes the use of a custom-built system to perform aerosol deposition of thick films of yttrium iron garnet onto sapphire substrates at RT. The deposited films are characterized using scanning electron microscopy, profilometry, and ferromagnetic resonance to give a representative overview of the capabilities of the technique.

浓稠钇铁石榴石薄膜的形成使用气溶胶沉积

Aerosol deposition (AD) is a thick-film deposition process that can produce layers up to several hundred micrometers thick with densities greater than 95% ...

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices have used devices prepared by spin coating, a process that is not amenable to large-scale fabrication. This mismatch in device fabrication makes it difficult to translate quantitative results obtained in the laboratory to the commercial level, making optimization difficult. Using a mini-slot die coater, this mismatch can be resolved by translating the commercial process to the laboratory and characterizing the structure formation in the active layer of the device in real time and in situ as films are coated onto a substrate. The evolution of the morphology was characterized under different conditions, allowing us to propose a mechanism by which the structures form and grow. This mini-slot die coater offers a simple, convenient, material efficient route by which the morphology in the active layer can be optimized under industrially relevant conditions. The goal of this protocol is to show experimental details of how a solar cell device is fabricated using a mini-slot die coater and technical details of running in situ structure characterization using the mini-slot die coater.

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Here, we present a protocol to fabricate organic thin film solar cells using a mini-slot die coater and related in-line structure characterizations using synchrotron scattering techniques.

散装异质结太阳能电池的印刷和制作<em&gt;原位</em&gt;形态特征

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices ...

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two chalcogenide compositions are demonstrated: Ge23Sb7S70 and As40S60, which have both been studied extensively for planar mid-infrared (mid-IR) microphotonic devices. In this approach, uniform thickness films are fabricated through the use of computer numerical controlled (CNC) motion. Chalcogenide glass (ChG) is written over the substrate by a single nozzle along a serpentine path. Films were subjected to a series of heat treatments between 100 &#176;C and 200 &#176;C under vacuum to drive off residual solvent and densify the films. Based on transmission Fourier transform infrared (FTIR) spectroscopy and surface roughness measurements, both compositions were found to be suitable for the fabrication of planar devices operating in the mid-IR region. Residual solvent removal was found to be much quicker for the As40S60 film as compared to Ge23Sb7S70. Based on the advantages of electrospray, direct printing of a gradient refractive index (GRIN) mid-IR transparent coating is envisioned, given the difference in refractive index of the two compositions in this study.

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.

厚度均匀葛电沉积<sub&gt; 23</sub&gt;锑<sub&gt; 7</sub&gt;取值<sub&gt; 70</sub&gt;和As<sub&gt; 40</sub&gt;取值<sub&gt; 60</sub&gt;硫系玻璃薄膜

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two ...

Enhanced Electron Injection and Exciton Confinement for Pure Blue Quantum-Dot Light-Emitting Diodes by Introducing Partially Oxidized Aluminum Cathode

Stable and efficient red (R), green (G), and blue (B) light sources based on solution-processed quantum dots (QDs) play important roles in next-generation displays and solid-state lighting technologies. The brightness and efficiency of blue QDs-based light-emitting diodes (LEDs) remain inferior to their red and green counterparts, due to the inherently unfavorable energy levels of different colors of light. To solve these problems, a device structure should be designed to balance the injection holes and electrons into the emissive QD layer. Herein, through a simple autoxidation strategy, pure blue QD-LEDs which are highly bright and efficient are demonstrated, with a structure of ITO/PEDOT:PSS/Poly-TPD/QDs/Al:Al2O3. The autoxidized Al:Al2O3 cathode can effectively balance the injected charges and enhance radiative recombination without introducing an additional electron transport layer (ETL). As a result, high color-saturated blue QD-LEDs are achieved with a maximum luminance over 13,000 cd m-2, and a maximum current efficiency of 1.15 cd A-1. The easily controlled autoxidation procedure paves the way for achieving high-performance blue QD-LEDs.

A protocol is presented for fabricating high-performance, pure blue ZnCdS/ZnS-based quantum dots light-emitting diodes by employing an autoxidized aluminum cathode.

采用部分氧化铝阴极增强电子注入和激子约束的纯蓝色量子点发光二极管

Stable and efficient red (R), green (G), and blue (B) light sources based on solution-processed quantum dots (QDs) play important roles in next-generation ...

Bulk and Thin Film Synthesis of Compositionally Variant Entropy-stabilized Oxides

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (Cu variant) entropy-stabilized oxides. Phase pure and chemically homogeneous (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (x = 0.20, 0.27, 0.33) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (x = 0.11, 0.27) ceramic pellets are synthesized and used in the deposition of ultra-high quality, phase pure, single crystalline thin films of the target stoichiometry. A detailed methodology for the deposition of smooth, chemically homogeneous, entropy-stabilized oxide thin films by pulsed laser deposition on (001)-oriented MgO substrates is described. The phase and crystallinity of bulk and thin film materials are confirmed using X-ray diffraction. Composition and chemical homogeneity are confirmed by X-ray photoelectron spectroscopy and energy dispersive X-ray spectroscopy. The surface topography of thin films is measured with scanning probe microscopy. The synthesis of high quality, single crystalline, entropy-stabilized oxide thin films enables the study of interface, size, strain, and disorder effects on the properties in this new class of highly disordered oxide materials.

The synthesis of high quality bulk and thin film (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O entropy-stabilized oxides is presented.

组分变熵稳定氧化物的体积和薄膜合成

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and ...

Procedure for the Transfer of Polymer Films Onto Porous Substrates with Minimized Defects

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support substrates. Accomplishing this transfer in a highly controlled, mechanized, and reproducible manner can eliminate the creation of macroscale defect structures (e.g., tears, cracks, and wrinkles) within the thin film that compromise device performance and the usable area per sample. Here, we describe a general protocol for the highly controlled and mechanized transfer of a polymeric thin film onto an arbitrary porous support substrate for eventual use as a water filtration membrane device. Specifically, we fabricate a block copolymer (BCP) thin film on top of a sacrificial, water-soluble poly(acrylic acid) (PAA) layer and silicon wafer substrate. We then utilize a custom-designed, 3D-printed transfer tool and drain chamber system to deposit, lift-off, and transfer the BCP thin film onto the center of a porous anodized aluminum oxide (AAO) support disc. The transferred BCP thin film is shown to be consistently placed onto the center of the support surface due to the guidance of the meniscus formed between the water and the 3D-printed plastic drain chamber. We also compare our mechanized transfer-processed thin films to those that have been transferred by hand with the use of tweezers. Optical inspection and image analysis of the transferred thin films from the mechanized process confirm that little-to-no macroscale inhomogeneities or plastic deformations are produced, as compared to the multitude of tears and wrinkles produced from manual transfer by hand. Our results suggest that the proposed strategy for thin film transfer can reduce defects when compared to other methods across many systems and applications.

We present a procedure for highly controlled and wrinkle-free transfer of block copolymer thin films onto porous support substrates using a 3D-printed drain chamber. The drain chamber design is of general relevance to all procedures involving transfer of macromolecular films onto porous substrates, which is normally done by hand in an irreproducible fashion.

聚合物薄膜在多孔基板上的转移程序,具有最小化的缺陷

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support ...

Development of Efficient OLEDs from Solution Deposition

The use of highly efficient organic emitters based on the thermally activated delayed fluorescence (TADF) concept is interesting due to their 100% internal quantum efficiency. Presented here is a solution deposition method for the fabrication of efficient organic light-emitting diodes (OLEDs) based on a TADF emitter in a simple device structure. This fast, low-cost, and efficient process can be used for all OLED emissive layers that follow the host-guest concept. The fundamental steps are described along with necessary information for further reproduction. The goal to establish a general protocol that can be easily adapted for principal organic emitters currently under study and development.

Presented here is a protocol for the fabrication of efficient, simple, solution-deposited organic light-emitting diodes with low roll-off.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

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