Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
2:55
Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
4:00
Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
8:49
Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
10:20
Conclusion
副本
Nowadays, quartz-based sensors are limited by the miniaturization process and the monolithic integration of this material on silicon. These bottlenecks are now overcome with the first chemical integration of epitaxial requirements in the form of h
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This work presents a detailed protocol for the microfabrication of nanostructured α-quartz cantilever on a Silicon-On-Insulator(SOI) technology substrate starting from the epitaxial growth of quartz film with the dip coating method and then nanostructuration of the thin film via nanoimprint lithography.