Thanks to Michael Knutson, Paul Hamric, Greg Scott, and Chris Landes for helpful discussions and assistance related to the custom inert atmosphere sample holder and assistance in the University of Utah student machine shop. P.C. acknowledges the NSF GRFP under Grant No. 0750758. P.C. acknowledges the University of Utah Nanotechnology Training Fellowship. R.M. acknowledges a NSF CAREER Award No. 1054899 and funding from the USTAR Initiative.

注：执行下洁净室100级条件或更好以下所有步骤。 1.样品制备<ol><li>清理“直径2硅片缓冲氧化物刻蚀（BOE）解决方案（6部分40％NH 4 F和1份49％HF）2分钟（ 注意：危险化学品 ）。选择这种蚀刻时间以除去任何有机物或污染物的表面上。冲洗以去离子（DI）水中约5分钟。干燥晶片用干燥的N 2。 注意：不要使用HF时单独工作。总是戴着眼睛的保护，以防泄漏防护面罩和个人防护装备（PPE）。帖子准则在哪里进行蚀刻在实验室中使用和处理的HF浪费。 注意：步骤1.2至1.7仅用于电化学锁定 。如果执行通过溶解锁定进行第2步。 </li><li>放下工作电极，溅射铂（Pt）为100纳米到干净的2“直径的硅酸在晶圆。 </li><li>前蚀刻铂薄膜，清理从以前的干蚀刻任何杂质或剩余的光刻胶RIE室。 </li><li>抽空该室，直至1×10 -5乇达到基本压力。确保RF功率设置为200瓦，并且流速为氧气和氩气分别设置在50sccm和10sccm的。点燃的Ar / O 2等离子和运行至少1小时。 </li><li>关闭的Ar / O 2等离子体，并允许该腔室泄为大约10分钟。 </li><li>蚀刻铂薄膜表面，加载样品放入RIE室和向下泵送腔室以1×10 -5乇的基础压力。这个时间设定氩流量为0标准立方厘米。点燃O 2等离子，让这个过程运行30分钟。 </li><li>关闭的O 2等离子体，并让该室通风口10分钟。 </li></ol>光致变色分子使用自定义L 2.热蒸发流温度蒸发器（LTE）的<ol><li>填写ALO 2船BTE 30毫克，并加载到自定义的LTE源（ 图6）。 </li><li>装载硅片到样品安装。 </li><li>密封室端口和泵室下降到1×10 -6乇的基础压力。 </li><li>蒸发BTE在100℃的设定温度，以30nm的膜厚度。 </li><li>立即蒸发后，洪水照射样品以5分钟的UV改造BTE材料的封闭形式，1c上 。 </li><li>为了确定样本大小，切割的小片，使用金刚石划线划伤从硅表面的边缘的线的晶片。抢在划痕线两侧的晶片和弯曲晶片向下直至其断裂沿着晶体平面。 </li><li>执行验证BTE薄膜厚度轮廓测量。要做到这一点，从头开始用细边镊子样品。测量阶梯高度来回米此划痕，它是在左，右光标位置之间的高度差。 注：在薄膜厚度不准确将导致在曝光剂量差异。 </li><li>在N 2充满手套箱店内剩余的样品。 </li></ol> 3.曝光注：执行惰性气氛条件下，所有的风险敞口，以防止样品降解。 <ol><li>按照相同的步骤，在步骤2.6中概述裂解样品。 </li><li>在惰性气体样品架上加载样品。 </li><li>安装惰性样品架在舞台上。吹扫样品用N 2。 </li><li>利用干涉仪，将样品以期望的曝光时间暴露，如在图8中所示的那个。 </li></ol> 4.电化学氧化法三电极电池注：在惰性气氛的条件下进行电化学防止样品降解。 <ol><li>钳上热板的顶部上的干净的玻璃小瓶中。放置在小瓶一个清洁的搅拌棒。开启搅拌器。 </li><li>清洁新的铜剪辑甲醇。用甲醇清洗铂反电极。 </li><li>使用干净的铜夹，通过在特氟纶小瓶帽上的孔中的一个剪辑的样本。确保夹在只露出铂。 </li><li>把铁氟龙瓶盖到小瓶。夹在红色导线到铂电极和石墨到铜夹子拿着样品。 </li><li>使用干净的注射器，通过在特氟纶瓶盖第二孔填充用过滤的去离子（DI）水的小瓶中。作为填充不高对样品浸泡任何裸露的铂。 </li><li>通过水3-5分钟气泡的氮。关掉氮气。 </li><li>将参考电极在特氟隆瓶盖的第二个孔。剪辑铅白到参考电极。检查以确保无裸露铂邻n个样品浸入。 </li><li>用伏安，将氧化电压为0.5 V /秒。 </li><li>后所需要的氧化时间已经过去时，打开电源向伏安关闭。 </li><li>从铂反电极，铜夹，和参考电极取出红色，黑色，白色和剪辑。 </li><li>暴露样品于紫外线5分钟。 </li></ol> 5.样品开发-电化学锁定 注：在惰性气氛的条件下进行显影，以防止样品降解。 <ol><li>开发在过滤5（重量％）的异丙醇样品，95（重量％）乙二醇的时间的所需量。注意：通常为50nm的样品被开发为30-60秒，而为80nm的样品为60-180秒开发的。 </li><li>用干N 2干燥的样品。 </li><li>立即暴露样品到5分钟的紫外线。 </li></ol> 6.样品开发-溶解锁定 </eM&gt; 注：在惰性气氛的条件下进行显影，以防止样品降解。 <ol><li>在一个干净的玻璃烧杯用100毫升乙二醇中，开发所需的开发时间的暴露试料。 </li><li>用干N 2干燥的样品。立即暴露样品到5分钟的紫外线。 </li></ol> 7.多重曝光<ol><li>如果执行多次曝光重复步骤3-6具有相对于光学器件的样品的译文。 </li></ol>

<ol>
	<li>Brimhall, N., Andrew, T. L., Manthena, R. V., Menon, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Breaking+the+far-field+diffraction+limit+in+optical+nanopatterning+via+repeated+photochemical+and+electrochemical+transitions+in+photochromic+molecules.">Breaking the far-field diffraction limit in optical nanopatterning via repeated photochemical and electrochemical transitions in photochromic molecules.</a> Physical Review Letters. 107 (20), 205501 (2011).</li><li>Cantu, P., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Subwavelength+nanopatterning+of+photochromic+diaryethene+films.">Subwavelength nanopatterning of photochromic diaryethene films.</a> Applied Physics Letters. 100 (18), 183103 (2012).</li><li>Cantu, P., Andrew, T. L., Menon, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanopatterning+of+diarylethene+films+via+selective+dissolution+of+one+photoisomer.">Nanopatterning of diarylethene films via selective dissolution of one photoisomer.</a> Applied Physics Letters. 103 (17), 173112 (2013).</li><li>Abbe, E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Beitr&#228;ge+zur+Theorie+des+Mikroskops+und+der+mikroskopischen+Wahrnehmung.">Beitr&#228;ge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung.</a> Archiv f&#252;r mikroskopische Anatomie. 9 (1), 413-418 (1873).</li><li>Li, L., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Achieving+&#955;/20+resolution+by+one-color+initiation+and+deactivation+of+polymerization.">Achieving &#955;/20 resolution by one-color initiation and deactivation of polymerization.</a> Science. 324 (5929), 910-913 (2009).</li><li>Fischer, J., von Freymann, G., Wegener, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=The+materials+challenge+in+diffraction-unlimited+direct-laser-writing+optical+lithography.">The materials challenge in diffraction-unlimited direct-laser-writing optical lithography.</a> Advanced Materials. 22 (32), 3578-3582 (2010).</li><li>Mirkin, C. A., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Beam+pen+lithography.">Beam pen lithography.</a> Nature Nanotechnology. 5, 637-640 (2010).</li><li>Xie, X., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Manipulating+spatial+light+fields+for+micro-+and+nano-photonics.">Manipulating spatial light fields for micro- and nano-photonics.</a> Physica E: Low-dimensional Systems and Nanostructures. 44, 1109-1126 (2012).</li><li>Leroy, J., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=High-speed+metal-insulator+transition+in+vanadium+dioxide+films+induced+by+an+electrical+pulsed+voltage+over+nano-gap+electrodes.">High-speed metal-insulator transition in vanadium dioxide films induced by an electrical pulsed voltage over nano-gap electrodes.</a> Applied Physics Letters. 100 (21), 213507 (2012).</li><li>Carr, D., Sekaric, L., Craighead, H. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Measurement+of+nanomechanical+resonant+structures+in+single-crystal+silicon.">Measurement of nanomechanical resonant structures in single-crystal silicon.</a> Journal of Vacuum Science &amp; Technology B. 16 (6), 3821-3824 (1998).</li><li>Wilhelmi, O., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Rapid+prototyping+of+nanostructured+materials+with+a+focused+ion+beam.">Rapid prototyping of nanostructured materials with a focused ion beam.</a> Japanese Journal of Applied Physics. 47 (6), 2010-5014 (2008).</li><li>Hell, S. W. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Far-field+optical+nanoscopy.">Far-field optical nanoscopy.</a> Science. 316 (5828), 1153-1158 (2007).</li><li>Chou, S. Y., Krauss, P. R., Renstrom, P. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanoimprint+lithography.">Nanoimprint lithography.</a> Journal of Vacuum Science &amp; Technology B. 14, 4129 (1996).</li><li>Guillemette, M. D., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Surface+topography+induces+3D+self-orientation+of+cells+and+extracellular+matrix+resulting+in+improved+tissue+function.">Surface topography induces 3D self-orientation of cells and extracellular matrix resulting in improved tissue function.</a> Integrative Biology. 1 (2), 196-204 (2009).</li></ol>

The authors have nothing to disclose.

The fabrication, experimental setup and related operational procedures of Patterning via Optical Saturable Transitions (POST) have been described. By exploiting the linear switching properties of thermally stable photochromic molecules, POST offers new perspectives on circumventing the far-field diffraction limit.1-2,4
Previously long-term storage requirement of the samples was solved by storing the samples under N2, directly after the initial evaporation.2 How...

光学光刻是具有关键的重要性在纳米级的结构和设备的制造。在新的光刻技术的进步提高了能力，使新的一代新型设备8-11在这篇文章中，回顾，提出一类是取得使用新型的光开关分子深亚波长光学分辨率的光刻技术。这种方法被称为经光学-饱和转换（POST）图案。1-3 POST是独特地结合的饱和光致变色分子的光转换，具体地（1,2-双（5,5&#39;-二甲基-2,2&#39;- bithiophen基））的想法一新颖的纳米加工技术perfluorocyclopent -1-烯。通俗地，该化合物被称为BTE， 图1中 ，例如在受激发射损耗（STED）显微镜12使用时，与干涉光刻，这使得它的强大工具LARG深亚波长特征的e-区域并行纳米图案上的各种潜在扩展表面的至2-和3-维。 光致变色层最初是在一个均匀的状态。当该层暴露于λ1的均匀的照明，将其转换成所述第二异构态（1c）中 ， 图2，然后将样品在λ2，其中样品进入所述第一异构态（转换暴露于聚焦节点1O）无处不在，除了在节点的酒店附近。通过控制曝光剂量，未转化的区域的尺寸可以被任意小。异构体中的一个的后续定影步骤可以选择性地和不可逆变换（锁定）到第三状态（黑色）以锁定模式。接着，对层被均匀地暴露于λ1，它转换以外的所有锁定区域恢复到原来的状态。该的步骤顺序可以重复与相对于光学样品的位移，导致2锁定区域的间隔比所述远场衍射极限小。因此，任意的几何形状可被图案化在一个“点阵”时尚1-3

<table border="0" cellpadding="0" cellspacing="0" width="778">
	<tbody>
		<tr height="42">
			<td height="42" style="height:42px;width:216px;">Name of Material/ Equipment</td>
			<td style="width:205px;">Company</td>
			<td style="width:119px;">Catalog Number</td>
			<td style="width:239px;">Comments/Description</td>
		</tr>
		<tr height="63">
			<td height="63" style="height:63px;width:216px;">Isopropanol</td>
			<td style="width:205px;">Fisher Scientific</td>
			<td style="width:119px;">P/7500/15</td>
			<td style="width:239px;">CAUTION: flammable, use good 
			ventilation and avoid all ignition 
			sources.</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Buffered Oxide Etch</td>
			<td style="width:205px;"></td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="63">
			<td height="63" style="height:63px;width:216px;">Methanol</td>
			<td style="width:205px;">Ricca Chemical</td>
			<td style="width:119px;">48-293-2&#160;</td>
			<td style="width:239px;">CAUTION: flammable, use good 
			ventilation and avoid all ignition 
			sources.</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Ethylene Glycol</td>
			<td style="width:205px;">Sigma-Aldrich</td>
			<td style="width:119px;">324558</td>
			<td>CAUTION: Harmful if swallowed</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Silicon wafer</td>
			<td style="width:205px;"></td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Diamond Scribe</td>
			<td style="width:205px;"></td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Glass Beakers</td>
			<td style="width:205px;"></td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Tweezers</td>
			<td style="width:205px;">Ted Pella</td>
			<td style="width:119px;">5226</td>
			<td></td>
		</tr>
		<tr height="42">
			<td height="42" style="height:42px;width:216px;">Reactive Ion Etching System</td>
			<td style="width:205px;">Oxford</td>
			<td style="width:119px;">Plasma Lab 80 Plus</td>
			<td></td>
		</tr>
		<tr height="42">
			<td height="42" style="height:42px;width:216px;">Inert Atmosphere Sample Holder</td>
			<td style="width:205px;">Proprietary In-house Designed</td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Polarizing beamsplitter cube</td>
			<td style="width:205px;">Thorlabs</td>
			<td style="width:119px;">PBS052</td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">HeNe Laser</td>
			<td style="width:205px;">Melles Griot</td>
			<td style="width:119px;">25-LHP-171</td>
			<td>CAUTION: Wear safety glasses</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Half-wave plates</td>
			<td style="width:205px;">Thorlabs</td>
			<td style="width:119px;">WPH05M-633</td>
			<td></td>
		</tr>
		<tr height="42">
			<td height="42" style="height:42px;width:216px;">Thermal Evaporator</td>
			<td style="width:205px;">Proprietary In-house Designed</td>
			<td style="width:119px;"></td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">TMV Super</td>
			<td style="width:205px;">TM Vacuum Products</td>
			<td style="width:119px;">TMV Super</td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Voltammograph</td>
			<td style="width:205px;">Bioanalytical Systems</td>
			<td style="width:119px;">CV-37</td>
			<td></td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:216px;">Shortwave UV lamp 365nm</td>
			<td style="width:205px;">UVP Analytik Jena Company</td>
			<td style="width:119px;">UVGL-25</td>
			<td>CAUTION: Wear UV safety glasses</td>
		</tr>
	</tbody>
</table>

patterning via optical saturable transitions - fabrication and characterization

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical Saturable Transitions (POST). In this technique the chemical properties of organic photochromic molecules that undergo single-photon reactions are exploited, enabling rapid top-down nanopatterning over large areas at low light intensities, thereby, allowing for the circumvention of the far-field diffraction barrier.4 Simple, cost-effective, high throughput and resolution alternatives to nanopatterning are being explored, such as, two-photon polymerization5,6, beam pen lithography (BPL)7, scanning electron beam lithography (SEBL), and focused ion beam (FIB) patterning. However, multi-photon approaches require high light intensities, which limit their potential for high throughput and offer low image contrast. Although, electron and ion beam lithographic processes offer increased resolution, the serial nature of the process is limited to slow writing speeds, which also prevents patterning of features over large areas. Beam-pen lithography is an approach towards parallel near-field optical lithography. However, the gap between the source of the beam and the surface of the photoresist needs to be controlled extremely precisely for good pattern uniformity and this is very challenging to accomplish for large arrays of beams. Patterning via Optical Saturable Transitions (POST) is an alternative optical nanopatterning technique for patterning sub-wavelength features1-3. Since this technique uses single photons instead of electrons, it is extremely fast and does not require high light intensities1-3, opening the door to massive parallelization.

制作样品： 不同的氧化时间被表征为在0.85 V的循环伏安法测定的氧化电压在图3所示的原子力显微镜照片。的50纳米厚的薄膜暴露于0.95毫瓦/ cm 2的功率密度的驻波在周期为400nmλ= 647毫微米为60秒。作为氧化时间从10分钟增加到25分钟，可以清楚地看到的对比度的损失，因为一些由1O的地区得到氧化为好。显影剂（5（重量％）的异丙?...

Watch this Scientific Journal Video about Patterning via Optical Saturable Transitions - Fabrication and Characterization at JoVE.com

Patterning via Optical Saturable Transitions - Fabrication and Characterization

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

通过光学吸收跃迁图案 - 制备与表征

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

patterning-via-optical-saturable-transitions-fabrication

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6.7K 次观看.  The University of Utah. We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

视频: Patterning via Optical Saturable Transitions - Fabrication and Characterization

Simulation, Fabrication and Characterization of THz Metamaterial Absorbers

Metamaterials (MM), artificial materials engineered to have properties that may not be found in nature, have been widely explored since the first theoretical1 and experimental demonstration2 of their unique properties. MMs can provide a highly controllable electromagnetic response, and to date have been demonstrated in every technologically relevant spectral range including the optical3, near IR4, mid IR5 , THz6 , mm-wave7 , microwave8 and radio9 bands. Applications include perfect lenses10, sensors11, telecommunications12, invisibility cloaks13 and filters14,15. We have recently developed single band16, dual band17 and broadband18 THz metamaterial absorber devices capable of greater than 80% absorption at the resonance peak. The concept of a MM absorber is especially important at THz frequencies where it is difficult to find strong frequency selective THz absorbers19. In our MM absorber the THz radiation is absorbed in a thickness of ~ &lambda;/20, overcoming the thickness limitation of traditional quarter wavelength absorbers. MM absorbers naturally lend themselves to THz detection applications, such as thermal sensors, and if integrated with suitable THz sources (e.g. QCLs), could lead to compact, highly sensitive, low cost, real time THz imaging systems.

This protocol outlines the simulation, fabrication and characterization of THz metamaterial absorbers. Such absorbers, when coupled with an appropriate sensor, have applications in THz imaging and spectroscopy.

模拟，太赫兹超材料吸收器的制备与表征

Metamaterials (MM),  artificial materials engineered to have properties that may not be found in  nature, have been widely explored since the first ...

科研

工程学

Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view and for its considerable potential for practical applications. Slow light photonic crystal waveguides, in particular, have played a major part and have been successfully employed for delaying optical signals1-4 and the enhancement of both linear5-7 and nonlinear devices.8-11
Photonic crystal cavities achieve similar effects to that of slow light waveguides, but over a reduced band-width. These cavities offer high Q-factor/volume ratio, for the realization of optically12 and electrically13 pumped ultra-low threshold lasers and the enhancement of nonlinear effects.14-16 Furthermore, passive filters17 and modulators18-19 have been demonstrated, exhibiting ultra-narrow line-width, high free-spectral range and record values of low energy consumption.
To attain these exciting results, a robust repeatable fabrication protocol must be developed. In this paper we take an in-depth look at our fabrication protocol which employs electron-beam lithography for the definition of photonic crystal patterns and uses wet and dry etching techniques. Our optimised fabrication recipe results in photonic crystals that do not suffer from vertical asymmetry and exhibit very good edge-wall roughness. We discuss the results of varying the etching parameters and the detrimental effects that they can have on a device, leading to a diagnostic route that can be taken to identify and eliminate similar issues.
The key to evaluating slow light waveguides is the passive characterization of transmission and group index spectra. Various methods have been reported, most notably resolving the Fabry-Perot fringes of the transmission spectrum20-21 and interferometric techniques.22-25 Here, we describe a direct, broadband measurement technique combining spectral interferometry with Fourier transform analysis.26 Our method stands out for its simplicity and power, as we can characterise a bare photonic crystal with access waveguides, without need for on-chip interference components, and the setup only consists of a Mach-Zehnder interferometer, with no need for moving parts and delay scans.
When characterising photonic crystal cavities, techniques involving internal sources21 or external waveguides directly coupled to the cavity27 impact on the performance of the cavity itself, thereby distorting the measurement. Here, we describe a novel and non-intrusive technique that makes use of a cross-polarised probe beam and is known as resonant scattering (RS), where the probe is coupled out-of plane into the cavity through an objective. The technique was first demonstrated by McCutcheon et al.28 and further developed by Galli et al.29

Use of photonic crystal slow light waveguides and cavities has been widely adopted by the photonics community in many differing applications. Therefore fabrication and characterization of these devices are of great interest. This paper outlines our fabrication technique and two optical characterization methods, namely: interferometric (waveguides) and resonant scattering (cavities).

光子晶体慢光波导和腔体的制备与表征

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view ...

Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on photoconduction, which has been one of the most commonly used techniques for terahertz generation 1-8. Terahertz generation in a photoconductive emitter is achieved by pumping an ultrafast photoconductor with a pulsed or heterodyned laser illumination. The induced photocurrent, which follows the envelope of the pump laser, is routed to a terahertz radiating antenna connected to the photoconductor contact electrodes to generate terahertz radiation. Although the quantum efficiency of a photoconductive emitter can theoretically reach 100%, the relatively long transport path lengths of photo-generated carriers to the contact electrodes of conventional photoconductors have severely limited their quantum efficiency. Additionally, the carrier screening effect and thermal breakdown strictly limit the maximum output power of conventional photoconductive terahertz sources. To address the quantum efficiency limitations of conventional photoconductive terahertz emitters, we have developed a new photoconductive emitter concept which incorporates a plasmonic contact electrode configuration to offer high quantum-efficiency and ultrafast operation simultaneously. By using nano-scale plasmonic contact electrodes, we significantly reduce the average photo-generated carrier transport path to photoconductor contact electrodes compared to conventional photoconductors 9. Our method also allows increasing photoconductor active area without a considerable increase in the capacitive loading to the antenna, boosting the maximum terahertz radiation power by preventing the carrier screening effect and thermal breakdown at high optical pump powers. By incorporating plasmonic contact electrodes, we demonstrate enhancing the optical-to-terahertz power conversion efficiency of a conventional photoconductive terahertz emitter by a factor of 50 10.

We describe methods for the design, fabrication, and experimental characterization of plasmonic photoconductive emitters, which offer two orders of magnitude higher terahertz power levels compared to conventional photoconductive emitters.

电浆光电导太赫兹发射器的设计，制造和实验表征

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on ...

Fabrication and Characterization of Disordered Polymer Optical Fibers for Transverse Anderson Localization of Light

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. The developed polymer optical fiber is composed of 80,000 strands of poly (methyl methacrylate) (PMMA) and polystyrene (PS) that are randomly mixed and drawn into a square cross section optical fiber with a side width of 250 &mu;m. Initially, each strand is 200 &mu;m in diameter and 8-inches long. During the mixing process of the original fiber strands, the fibers cross over each other; however, a large draw ratio guarantees that the refractive index profile is invariant along the length of the fiber for several tens of centimeters. The large refractive index difference of 0.1 between the disordered sites results in a small localized beam radius that is comparable to the beam radius of conventional optical fibers. The input light is launched from a standard single mode optical fiber using the butt-coupling method and the near-field output beam from the disordered fiber is imaged using a 40X objective and a CCD camera. The output beam diameter agrees well with the expected results from the numerical simulations. The disordered optical fiber presented in this work is the first device-level implementation of 2D Anderson localization, and can potentially be used for image transport and short-haul optical communication systems.

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. This microstructured fiber can transport a small localized beam with a radius that is comparable to the beam radius of conventional optical fibers.

无序横向安德森本地化光聚合物光纤的制备和表征

We develop and characterize a disordered polymer optical fiber that uses transverse Anderson localization as a novel waveguiding mechanism. The developed ...

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned and bonded silicon wafers. Unlike confinements in porous materials often used for these types of experiments3, bonded wafers provide predesigned uniform spaces for confinement. The geometry of each cell is well known, which removes a large source of ambiguity in the interpretation of data.
Exceptionally flat, 5 cm diameter, 375 &#181;m thick Si wafers with about 1 &#181;m variation over the entire wafer can be obtained commercially (from Semiconductor Processing Company, for example). Thermal oxide is grown on the wafers to define the confinement dimension in the z-direction. A pattern is then etched in the oxide using lithographic techniques so as to create a desired enclosure upon bonding. A hole is drilled in one of the wafers (the top) to allow for the introduction of the liquid to be measured. The wafers are cleaned2 in RCA solutions and then put in a microclean chamber where they are rinsed with deionized water4. The wafers are bonded at RT and then annealed at ~1,100 &#176;C. This forms a strong and permanent bond. This process can be used to make uniform enclosures for measuring thermal and hydrodynamic properties of confined liquids from the nanometer to the micrometer scale.

A method for permanently bonding two silicon wafers so as to realize a uniform enclosure is described. This includes wafer preparation, cleaning, RT bonding, and annealing processes. The resulting bonded wafers (cells) have uniformity of enclosure ~1%1,2. The resulting geometry allows for measurements of confined liquids and gasses.

通过硅直接晶圆粘接制造均匀纳米级腔

Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned ...

Fabrication and Operation of a Nano-Optical Conveyor Belt

The technique of using focused laser beams to trap and exert forces on small particles has enabled many pivotal discoveries in the nanoscale biological and physical sciences over the past few decades. The progress made in this field invites further study of even smaller systems and at a larger scale, with tools that could be distributed more easily and made more widely available. Unfortunately, the fundamental laws of diffraction limit the minimum size of the focal spot of a laser beam, which makes particles smaller than a half-wavelength in diameter hard to trap and generally prevents an operator from discriminating between particles which are closer together than one half-wavelength. This precludes the optical manipulation of many closely-spaced nanoparticles and&#160;limits the&#160;resolution of optical-mechanical systems. Furthermore, manipulation using focused beams requires beam-forming or steering optics, which can be very bulky and expensive. To address these limitations in the system scalability of conventional optical trapping our lab has devised an alternative technique which utilizes near-field optics to move particles across a chip. Instead of focusing laser beams in the far-field, the optical near field of plasmonic resonators produces the necessary local optical intensity enhancement to overcome the restrictions of diffraction and manipulate particles at higher resolution. Closely-spaced resonators produce strong optical traps which can be addressed to mediate the hand-off of particles from one to the next in a conveyor-belt-like fashion. Here, we describe how to design and produce a conveyor belt using a gold surface patterned with plasmonic C-shaped resonators and how to operate it with polarized laser light to achieve super-resolution nanoparticle manipulation and transport. The nano-optical conveyor belt chip can be produced using lithography techniques and easily packaged and distributed.

The scalability and resolution of conventional optical manipulation techniques are limited by diffraction. We circumvent the diffraction limit and describe a method of optically transporting nanoparticles across a chip using a gold surface patterned with a path of closely spaced C-shaped plasmonic resonators.

一个纳米光输送带的制作和操作

The technique of using focused laser beams to trap and exert forces on small particles has enabled many pivotal discoveries in the nanoscale biological ...

Compact Lens-less Digital Holographic Microscope for MEMS Inspection and Characterization

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and automotive. However, effective inspection and characterization metrology systems are needed to ensure the functional reliability of MEMS. This study presents a system based on digital holography as a tool for MEMS metrology. Digital holography has gained increasing attention in the past 20 years. With the fast development and decreasing cost of sensor arrays, resolution of such systems has increased broadening potential applications. Thus, it has attracted attention from both research and industry sides as a potential reliable tool for industrial metrology. Indeed, by recording the interference pattern between an object beam (which contains sample height information) and a reference beam on a CCD camera, one can retrieve the quantitative phase information of an object. However, most of digital holographic systems are bulky and thus not easy to implement on industry production lines. The novelty of the system presented is that it is lens-less and thus very compact. In this study, it is shown that the Compact Digital Holographic Microscope (CDHM) can be used to evaluate several characteristics typically consider as criteria in MEMS inspections. The surface profiles of MEMS in both static and dynamic conditions are presented. Comparison with AFM is investigated to validate the accuracy of the CDHM.

We present a compact reflection digital holographic system (CDHM) for inspection and characterization of MEMS devices. A lens-less design using a diverging input wave providing natural geometrical magnification is demonstrated. Both static and dynamic studies are presented.

紧凑的镜头少数字全息显微镜的MEMS检测与表征

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and ...

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices have used devices prepared by spin coating, a process that is not amenable to large-scale fabrication. This mismatch in device fabrication makes it difficult to translate quantitative results obtained in the laboratory to the commercial level, making optimization difficult. Using a mini-slot die coater, this mismatch can be resolved by translating the commercial process to the laboratory and characterizing the structure formation in the active layer of the device in real time and in situ as films are coated onto a substrate. The evolution of the morphology was characterized under different conditions, allowing us to propose a mechanism by which the structures form and grow. This mini-slot die coater offers a simple, convenient, material efficient route by which the morphology in the active layer can be optimized under industrially relevant conditions. The goal of this protocol is to show experimental details of how a solar cell device is fabricated using a mini-slot die coater and technical details of running in situ structure characterization using the mini-slot die coater.

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Here, we present a protocol to fabricate organic thin film solar cells using a mini-slot die coater and related in-line structure characterizations using synchrotron scattering techniques.

散装异质结太阳能电池的印刷和制作<em&gt;原位</em&gt;形态特征

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

制备与表征超导谐振器的

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.