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Fabricating Nanogaps by Nanoskiving

DOI :

10.3791/50406-v

May 13th, 2013

May 13th, 2013

10,835 Views

1Stratingh Institute for Chemistry and Zernike Institute for Advanced Materials, University of Groningen

The fabrication of electrically addressable, high-aspect-ratio (> 1000:1) metal nanowires separated by gaps of single nanometers using either sacrificial layers of aluminum and silver or self-assembled monolayers as templates is described. These nanogap structures are fabricated without a clean room or any photo- or electron-beam lithographic processes by a form of edge lithography known as nanoskiving.

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