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Method Article
We present the synthesis of the organic-based ferrimagnet vanadium tetracyanoethylene (V[TCNE]x, x~2) via low temperature chemical vapor deposition (CVD). This optimized recipe yields an increase in Curie temperature from 400 K to over 600 K and a dramatic improvement in magnetic resonance properties.
Recent progress in the field of organic materials has yielded devices such as organic light emitting diodes (OLEDs) which have advantages not found in traditional materials, including low cost and mechanical flexibility. In a similar vein, it would be advantageous to expand the use of organics into high frequency electronics and spin-based electronics. This work presents a synthetic process for the growth of thin films of the room temperature organic ferrimagnet, vanadium tetracyanoethylene (V[TCNE]x, x~2) by low temperature chemical vapor deposition (CVD). The thin film is grown at <60 °C, and can accommodate a wide variety of substrates including, but not limited to, silicon, glass, Teflon and flexible substrates. The conformal deposition is conducive to pre-patterned and three-dimensional structures as well. Additionally this technique can yield films with thicknesses ranging from 30 nm to several microns. Recent progress in optimization of film growth creates a film whose qualities, such as higher Curie temperature (600 K), improved magnetic homogeneity, and narrow ferromagnetic resonance line-width (1.5 G) show promise for a variety of applications in spintronics and microwave electronics.
The organic-based ferrimagnetic semiconductor vanadium tetracyanoethylene (V[TCNE]x, x~2) exhibits room temperature magnetic ordering and promises the advantages of organic materials for magnetoelectronic applications, such as flexibility, low cost production, and chemical tunability. Previous studies have demonstrated functionality in spintronic devices, including hybrid organic/inorganic1,2 and all-organic spin valves3, and as a spin polarizer in an active organic/inorganic semiconductor heterostructure4. In addition, V[TCNE]x~2 has demonstrated promise for inclusion in high frequency electronics due to its extremely narrow ferromagnetic resonance linewidth5.
There are four different methods which have been established for synthesizing V[TCNE]x~26-9. V[TCNE]x~2 was first synthesized as powder in dichloromethane via reaction of TCNE and V(C6H6)6. These powders exhibited the first room temperature magnetic ordering observed in an organic-based material. However, the powder form of this material is extremely air sensitive, limiting its application in thin film devices. In 2000, a chemical vapor deposition (CVD) method was established for creating V[TCNE]x~2 thin films7. More recently physical vapor deposition (PVD)8 and molecular layer deposition (MLD)9 have also been used to fabricate thin films. The PVD method requires an ultra-high vacuum (UHV) system and both PVD and mLD methods require extremely long times to grow films thicker than 100 nm, whereas the CVD films can easily be deposited in thicknesses ranging from 30 nm to several microns. In addition to the variety of thicknesses available with the CVD method, extensive studies have yielded optimized films that consistently show high quality magnetic properties including: narrow ferromagnetic resonance (FMR) linewidth (1.5 G), high Curie temperature (600 K), and sharp magnetic switching5.
Magnetic ordering in V[TCNE]x~2 thin films proceeds via an unconventional route. SQUID magnetometry measurements show strong local magnetic ordering, but the absence of X-ray diffraction peaks and featureless transmission electron microscopy (TEM)10 morphology reveal a lack of long-range structural order. However, extended X-ray absorption fine-structure (EXAFS) studies11 show that each vanadium ion is octahedrally coordinated with six different TCNE molecules, indicating a robust local structural order with a vanadium-nitrogen bond length of 2.084(5) Å. Magnetism arises from an antiferromagnetic exchange coupling between the unpaired spins of the TCNE- radical anions, which are distributed across the entire TCNE- molecule , and the spins on the V2+ ions, leading to a local ferrimagnetic ordering with TC ~ 600 K for optimized films5. In addition to exhibiting room temperature magnetic ordering, V[TCNE]x~2 films are semiconducting with 0.5 eV bandgap12. Other properties of note include possible sperimagnetism below a freezing temperature of ~150 K13,14, anomalous positive magnetoresistance12,15,16, and photo-induced magnetism13,17,18.
The CVD method for synthesizing V[TCNE]x~2 thin films is compatible with a variety of substrates due to low temperature (<60 °C) and conformal deposition. Previous studies have shown successful deposition of V[TCNE]x~2 on both rigid and flexible substrates7. Further, this deposition technique lends itself to tuning through modification of precursors and growth parameters.19-22 While the protocol shown here yields the most optimized films to date, significant progress has been made in improving some of the film properties since the discovery of this method and further gains may be possible.
1. Synthesis and Preparation of Precursors
2. Set up Deposition System inside an Argon Glovebox
3. Clean up
Figure 1. (A) Fully assembled custom chemical vapor deposition (CVD) system. (B) Expanded view of the components for the CVD system. Please click here to view a larger version of this figure.
Figure 2. (A) A top view of the substrates in the reactor showing their location. (B) Approximate film thickness as function of position inside the reactor tube, Part A from Figure 1B for a deposition of 75 min. Please click here to view a larger version of this figure.
The first and easiest method for determining if a deposition is successful is to do a visual inspection of the films. The film should appear dark purple with a mirror finish that is uniform across the substrates. If there are spots on the surface of the substrate where there is no V[TCNE]x~2 or it is lighter in color, then this is likely due to the presence of solvents or other impurities on the substrate surface. Additionally the film should be opaque. Unless a thin film was deposited over a short ti...
The key parameters for V[TCNE]x~2 deposition include temperature, carrier gas flow, pressure, and ratio of precursors. Because the chemical vapor deposition set-up is not commercially available these parameters will need to be optimized for each system. A previous study by Shima et al. revealed that the temperature has the largest impact on the sublimation rate of the TCNE precursor26. The temperature can be modified both by the value set on the temperature controller and also by m...
The authors have nothing to disclose.
This work was supported by NSF Grant No. DMR-1207243, the NSF MRSEC program (DMR-0820414), DOE Grant No. DE-FG02-03ER46054, and the OSU-Institute for Materials Research. The authors acknowledge the NanoSystems Laboratory at Ohio State University, and technical assistance from C. Y. Kao and C.Y. Chen.
Name | Company | Catalog Number | Comments |
Equipment | |||
Nitrogen Glovebox | Vacuum Atmospheres | Omni | steps done in nitrogen glovebox can also be done in an argon glovebox |
1 L three-neck round bottom flask | Corning | 4965A-1L | |
500 ml round bottom flask | Sigma Aldrich | 64678 | |
Turbo vacuum pumping station | Agilent Varian | G8701A-011-037 | |
Glass Stopcock | Kontes | 185000-2440 | |
Glass two way connecting tube | Corning | 8940-24 | Corning Pyrex(R) 105 degree Angled Tube Adapter with Two-Way 24/40 Standard Taper Joint |
Coldfinger | Custom part made by OSU chemistry glass shop | ||
Argon Glovebox | Vacuum Atmospheres | Nexus I | |
Hot plate stirrer | Corning | 6795 | |
Thermoeletric cooler | Advanced Thermoelectric | TCP-50 | |
Temperature controller | Advanced Thermoelectric | TLZ10 | for TE cooler |
Power supply | Advanced Thermoelectric | PS-145W-12V | for TE cooler and temperature controller |
Temperature controller | J-Kem Scientific | Model 150 | For heating coil |
Heating wire | Pelican Wire Company | Nichrome 60 | |
Custom glassware pieces | Made by OSU Chemistry glass shop | ||
Vacuum pump | BOC Edwards | XDS-5 | Connected to the CVD set-up |
Flow meter | Gilmont | GF-2260 | |
Micrometer valve | Gilmont | 7300 | Controls flow of argon over TCNE |
Micrometer valve | Gilmont | 7100 | Controls flow of argon over V(CO)6 |
Tubing | Tygon | R3603 | 1/8 in walls, connected between valves and meter |
3-way Stopcock | Nalgene | 6470 | used to adjust the flow rates |
Pressure gauge | Matheson | 63-4105 | connects to the top of Figure 1 part A |
SQUID magnetometer | Quantum Design | MPMS-XL | |
EPR | Bruker | Elexsys | |
PPMS | Quantum Design | 14T PPMS | |
Sourcemeter | Keithely | 2400 | |
Materials | |||
Sodium metal | Sigma Aldrich | 262714 | |
Anthracene | Sigma Aldrich | 141062 | |
Anhydrous tetrahydrofuran | Sigma Aldrich | 186562 | |
Vanadium(III) chloride tetrahydrofuran complex | Sigma Aldrich | 395382 | |
Carbon monoxide gas | OSU stores | 98610 | |
Tetraethylammonium bromide | Sigma Aldrich | 241059 | |
Phosphoric acid | Sigma Aldrich | 79622 | |
Methanol | Sigma Aldrich | 14262 | |
Silcone oil | Sigma Aldrich | 146153 | |
Copper pellets | Cut from spare copper wire | ||
Tetracyanoethylene | Sigma Aldrich | T8809 | |
Glass slides | Gold Seal | 3010 | |
Activated Charcoal | Sigma Aldrich | 242276 |
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