JoVE Logo
Faculty Resource Center

Sign In

Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics

DOI :

10.3791/54235-v

September 28th, 2016

September 28th, 2016

11,495 Views

1Department of Physics and Institute of Nanoscience, National Chung Hsing University, 2Metallurgy Section, Materials & Electro-Optics Research Division, National Chung-Shan Institute of Science and Technology, 3National Center for High-Performance Computing

This paper reports the nanomaterial fabrication of a fullerene Si substrate inspected and verified by nanomeasurements and molecular dynamic simulation.

-- Views

Related Videos

article

Fabricating Metamaterials Using the Fiber Drawing Method

article

Probing and Mapping Electrode Surfaces in Solid Oxide Fuel Cells

article

Molecular Beam Mass Spectrometry With Tunable Vacuum Ultraviolet (VUV) Synchrotron Radiation

article

Concurrent Quantitative Conductivity and Mechanical Properties Measurements of Organic Photovoltaic Materials using AFM

article

Atom Probe Tomography Studies on the Cu(In,Ga)Se2 Grain Boundaries

article

Setting Limits on Supersymmetry Using Simplified Models

article

Ultrahigh Density Array of Vertically Aligned Small-molecular Organic Nanowires on Arbitrary Substrates

article

Using Neutron Spin Echo Resolved Grazing Incidence Scattering to Investigate Organic Solar Cell Materials

article

Measurement and Analysis of Atomic Hydrogen and Diatomic Molecular AlO, C2, CN, and TiO Spectra Following Laser-induced Optical Breakdown

article

Experiments on Ultrasonic Lubrication Using a Piezoelectrically-assisted Tribometer and Optical Profilometer

JoVE Logo

Privacy

Terms of Use

Policies

Research

Education

ABOUT JoVE

Copyright © 2024 MyJoVE Corporation. All rights reserved